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    • 1. 发明申请
    • MULTI-CHANNEL OPTICAL METROLOGY
    • 多通道光学计量学
    • WO2008048315A2
    • 2008-04-24
    • PCT/US2006/048609
    • 2006-12-20
    • NIKOONAHAD, Mehrdad
    • NIKOONAHAD, Mehrdad
    • G01B11/14
    • G01N23/20G01B11/24G01N21/9501G01N21/95607G01N21/95623
    • A metrology system of the instant invention is configured to characterize features or structures formed on a surface of an article of manufacture. A metrology or measurement system comprises at least two channels wherein each channel comprises one or more radiation sources, illumination optics, collection optics comprising at least one window and one detector array, and processing means for comparing a received signal pattern to a calculated or previously processed signal pattern of a predetermined array of two dimension or three dimension structures or features on a surface of an article of manufacture such as a wafer, in a preferred embodiment .
    • 本发明的计量系统被配置为表征形成在制品制品的表面上的特征或结构。 计量或测量系统包括至少两个通道,其中每个通道包括一个或多个辐射源,照明光学器件,包括至少一个窗口和一个检测器阵列的收集光学器件,以及用于将接收到的信号模式与计算出或预先处理的信号模式进行比较的处理装置 在优选实施例中,诸如晶片的制品的表面上的二维或三维结构或特征的预定阵列的信号图案。