专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

WO2004093177B1 POLISHING PAD AND METHOD FOR PRODUCING SAME 审中-公开
标题翻译：抛光垫及其制造方法
公开(公告)号：WO2004093177B1
公开(公告)日：2005-03-31
申请号：PCT/JP2004005078
申请日：2004-04-08
申请人： NIHON MICROCOATING CO LTD , OHNO HISATOMO , IZUMI TOSHIHIRO , SAITO MITSURU , NAGAMINE TAKUYA , MILLER CLAUGHTON , KODAKA ICHIRO
发明人： OHNO HISATOMO , IZUMI TOSHIHIRO , SAITO MITSURU , NAGAMINE TAKUYA , MILLER CLAUGHTON , KODAKA ICHIRO
IPC分类号： B24B37/20 , B24B37/24 , B24B37/26 , H01L21/304 , B24B37/00
CPC分类号： B24B37/205
摘要： A polishing pad is disclosed which enables to stably polish the surface of an object smooth and flat by applying the polishing technique for determining when polishing is completed. A method for producing such a polishing pad is also disclosed. A polishing pad (10) is composed of a light-transmitting pad having a polishing surface (11a) on the front side. By forming a recess (12) on the back side (11b) of the light-transmitting pad (11), the light transmittance can be locally changed. The light-transmitting pad (11) has a light transmittance of not less than 10%, preferably of not less than 30%, to at least a light having a wavelength within the region of 350-900 nm. The light-transmitting pad (11) has a light transmittance of not less than 10% preferably over the light wavelength region of 370-900 nm, more preferably over the light wavelength region of 390-900 nm. The light-transmitting pad (11) has a light transmittance of not less than 30% preferably over the light wavelength region of 400-900 nm, more preferably over the light wavelength region of 450-900 nm.
摘要翻译：公开了一种抛光垫，其通过应用用于确定抛光完成时的抛光技术，能够使物体的表面光滑平坦地被抛光。还公开了一种用于制造这种抛光垫的方法。抛光垫（10）由在前侧具有研磨面（11a）的透光垫构成。通过在透光垫（11）的背面（11b）上形成凹部（12），可以局部地改变透光率。透光垫（11）对波长在350-900nm范围内的至少一种光具有不小于10％，优选不小于30％的透光率。透光垫（11）的透光率优选在370-900nm的光波长区域以上，更优选在390-900nm的光波长区域以上的10％以上的透光率。透光垫（11）的透光率优选在400-900nm的光波长区域以上，更优选在450〜900nm的光波长区域以上30％以上的透光率。

2. 发明申请

WO2005070059A2 LAYERED SUPPORT AND METHOD FOR LAMINATING CMP PADS 审中-公开
标题翻译：层叠支撑和层压CMP垫的方法
公开(公告)号：WO2005070059A2
公开(公告)日：2005-08-04
申请号：PCT/US2005000385
申请日：2005-01-07
申请人： MIPOX INTERNAT CORP , KODAKA ICHIRO , SISCHILE CHARLES , TIMBANG ALVIN , CASTILLO MARGARITA , MILLER CLAUGHTON
发明人： KODAKA ICHIRO , SISCHILE CHARLES , TIMBANG ALVIN , CASTILLO MARGARITA , MILLER CLAUGHTON
IPC分类号： B24B37/04 , B32B37/12
CPC分类号： B24B37/22 , B24D18/00 , B32B37/0007 , B32B37/12 , B32B37/26
摘要： A device and method for laminating CMP pads includes supporting the CMP pad with a board having material compositions similar to the CMP pad. By thus supporting the CMP pad during lamination, there is less likelihood of damage to the CMP pad and better adhesion from lamination. In particular, the CMP pad materials are laminated while in contact with a first board that may have a recess to accept the CMP pad. The pad has dimensions that are equal to or greater than the pad material. In an alternative embodiment, a board is provided on the opposite side of the CMP pad for lamination.
摘要翻译：用于层压CMP垫的装置和方法包括用具有类似于CMP垫的材料组成的板来支撑CMP垫。通过在层压期间支撑CMP焊盘，不太可能损坏CMP焊盘并且具有更好的层压附着力。特别地，CMP垫材料与第一板接触，该第一板可以具有凹部以接受CMP垫。垫具有等于或大于垫材料的尺寸。在替代实施例中，在CMP垫的相对侧上设置有用于层压的板。

3. 发明公开

EP1622193A4 POLISHING PAD AND METHOD FOR PRODUCING SAME 审中-公开
标题翻译： POLIERST CK UND VRFAHREN ZU SEINERHERSTELLUNG
公开(公告)号：EP1622193A4
公开(公告)日：2008-08-20
申请号：EP04726616
申请日：2004-04-08
申请人： NIHON MICROCOATING CO LTD
发明人： OHNO HISATOMO , IZUMI TOSHIHIRO , SAITO MITSURU , NAGAMINE TAKUYA , MILLER CLAUGHTON , KODAKA ICHIRO
IPC分类号： H01L21/304 , B24B37/20 , B24B37/24 , B24B37/26
CPC分类号： B24B37/205
摘要： A polishing pad is disclosed which enables to stably polish the surface of an object smooth and flat by applying the polishing technique for determining when polishing is completed. A method for producing such a polishing pad is also disclosed. A polishing pad (10) is composed of a light-transmitting pad having a polishing surface (11a) on the front side. By forming a recess (12) on the back side (11b) of the light-transmitting pad (11), the light transmittance can be locally changed. The light-transmitting pad (11) has a light transmittance of not less than 10%, preferably of not less than 30%, to at least a light having a wavelength within the region of 350-900 nm. The light-transmitting pad (11) has a light transmittance of not less than 10% preferably over the light wavelength region of 370-900 nm, more preferably over the light wavelength region of 390-900 nm. The light-transmitting pad (11) has a light transmittance of not less than 30% preferably over the light wavelength region of 400-900 nm, more preferably over the light wavelength region of 450-900 nm.
摘要翻译：公开了一种抛光垫，其通过应用用于确定抛光何时完成的抛光技术而能够稳定地抛光物体表面平滑和平坦。还公开了用于制造这种抛光垫的方法。抛光垫（10）由在前侧具有抛光表面（11a）的透光垫构成。通过在透光衬垫（11）的背面（11b）上形成凹部（12），可以局部改变透光率。透光衬垫（11）具有不小于10％，优选不小于30％的透光率，至少具有在350-900nm范围内的波长的光。透光垫（11）优选在370-900nm的光波长范围内，更优选在390-900nm的光波长范围内具有不小于10％的透光率。透光垫（11）优选在400-900nm的光波长范围内，更优选在450-900nm的光波长范围内具有不小于30％的透光率。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式