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1. 发明专利

NZ760149A Method and system for surface modification of substrate for ion beam target 未知
公开(公告)号：NZ760149A
公开(公告)日：2022-09-30
申请号：NZ76014917
申请日：2017-06-05
申请人： SAKASE TAKAO , NEUTRON THERAPEUTICS INC , PARK WILLIAM H JR , LAMBERT MARK , GILLESPIE JOSEPH , SMICK NOAH
发明人： SAKASE TAKAO , PARK WILLIAM , LAMBERT MARK , GILLESPIE JOSEPH , SMICK NOAH
IPC分类号： G21K1/00 , A61N5/10 , G21K5/04
摘要： The present disclosure generally relates to design and making method of a neutron generating target which can be used in boron neutron capture therapy. In the target used in the prior art, the surface of the target substrate is substantially flat and neutron source materials are bonded on the top surface of the target substrate. Protons with similar energies will stop in the target at a same depth. As a result, hydrogen concentration may become high at this depth and lead to target damage. The present disclosure provides a target design which significantly reduces target blistering failure. The present disclosure shows a different target design where the surface of the target substrate is modified by a neutron source layer disposed on the surface of a roughened target substrate to create a roughened neutron source layer of non-uniform thickness An advantage of the target design with substrate surface modification described herein over the existing design in the art is that protons will not stop in the target uniformly because of the roughness of the substrate. As a result, the hydrogen will not be concentrated at a same depth. This design can reduce blistering and material exfoliation in the target.

2. 发明专利

CA3065504A1 METHOD AND SYSTEM FOR SURFACE MODIFICATION OF SUBSTRATE FOR ION BEAM TARGET 未知
公开(公告)号：CA3065504A1
公开(公告)日：2018-12-13
申请号：CA3065504
申请日：2017-06-05
申请人： NEUTRON THERAPEUTICS INC , PARK WILLIAM H JR , LAMBERT MARK , GILLESPIE JOSEPH , SMICK NOAH , SAKASE TAKAO
发明人： PARK WILLIAM H JR , LAMBERT MARK , GILLESPIE JOSEPH , SMICK NOAH , SAKASE TAKAO
IPC分类号： G21K1/00 , A61N5/10 , G21K5/04
摘要： Design and making methods of a neutrons generating target are described. In some embodiments, a surface of a target substrate can be modified to form one or more surface features. In some embodiments, a neutron source layer can be disposed on the surface of the target substrate. In some embodiments, the neutron source layer and the target substrate can be heated to an elevated temperature to form a bond between the two. In some embodiments, the surface modification of the target substrate can reduce blistering and material exfoliation in the target. The target can be used in boron neutron capture therapy.

3. 发明专利

AU2017417478A1 Method and system for surface modification of substrate for ion beam target 未知
公开(公告)号：AU2017417478A1
公开(公告)日：2020-01-16
申请号：AU2017417478
申请日：2017-06-05
申请人： GILLESPIE JOSEPH , LAMBERT MARK , NEUTRON THERAPEUTICS INC , PARK JR WILLIAM H , SAKASE TAKAO , SMICK NOAH
发明人： PARK JR WILLIAM H , LAMBERT MARK , GILLESPIE JOSEPH , SMICK NOAH , SAKASE TAKAO
IPC分类号： G21K1/00 , A61N5/10 , G21K5/04
摘要： Design and making methods of a neutrons generating target are described. In some embodiments, a surface of a target substrate can be modified to form one or more surface features. In some embodiments, a neutron source layer can be disposed on the surface of the target substrate. In some embodiments, the neutron source layer and the target substrate can be heated to an elevated temperature to form a bond between the two. In some embodiments, the surface modification of the target substrate can reduce blistering and material exfoliation in the target. The target can be used in boron neutron capture therapy.

4. 发明专利

AU2021229255A1 Method and system for surface modification of substrate for ion beam target 未知
公开(公告)号：AU2021229255A1
公开(公告)日：2021-10-07
申请号：AU2021229255
申请日：2021-09-10
申请人： GILLESPIE JOSEPH , LAMBERT MARK , NEUTRON THERAPEUTICS INC , PARK JR WILLIAM , SAKASE TAKAO , SMICK NOAH
发明人： PARK JR WILLIAM , GILLESPIE JOSEPH , SMICK NOAH , SAKASE TAKAO , LAMBERT MARK
IPC分类号： G21K1/00 , A61N5/10 , G21K5/04
摘要： Abstract A method for making a neutron generating target, the method comprising: disposing a neutron source layer on a surface of a target substrate; and modifying a surface of the neutron source layer to form one or more uneven surface features, wherein the modified surface of the neutron source layer is oriented to receive ions. 180572051 (GHMatters) P45662AU01

5. 发明申请

WO2012092026A3 A METHOD AND APPARATUS FOR FORMING A THIN LAMINA 审中-公开
标题翻译：一种形成薄板的方法和设备
公开(公告)号：WO2012092026A3
公开(公告)日：2012-10-11
申请号：PCT/US2011066195
申请日：2011-12-20
申请人： TWIN CREEKS TECHNOLOGIES INC , KELL ADAM , CLARK-PHELPS ROBERT , GILLESPIE JOSEPH D , PRABHU GOPAL , SAKASE TAKAO , SMICK THEODORE H , ZUNIGA STEVE , BABABYAN STEVE
发明人： KELL ADAM , CLARK-PHELPS ROBERT , GILLESPIE JOSEPH D , PRABHU GOPAL , SAKASE TAKAO , SMICK THEODORE H , ZUNIGA STEVE , BABABYAN STEVE
IPC分类号： H01L31/18 , H01L21/265 , H01L21/67 , H01L31/042
CPC分类号： H01L21/6838 , H01L21/67092 , H01L21/67132 , H01L21/76254 , H01L31/022466 , H01L31/056 , H01L31/1804 , Y02E10/52 , Y02E10/547 , Y02P70/521
摘要： A method for producing a lamina from a donor body includes implanting the donor body with an ion dosage and heating the donor body to an implant temperature during implanting. The donor body is separably contacted with a susceptor assembly, where the donor body and the susceptor assembly are in direct contact. A lamina is exfoliated from the donor body by applying a thermal profile to the donor body. Implantation and exfoliation conditions may be adjusted in order to maximize the defect-free area of the lamina.
摘要翻译：用于由施主体产生薄层的方法包括用离子剂量植入施主体并在植入期间将施主体加热至植入温度。施主体与感受器组件分离地接触，其中施主体和感受器组件直接接触。通过对供体施加热分布来将层压体从供体中剥离。可以调整植入和剥离条件以最大化椎板的无缺陷区域。

6. 发明申请

WO2008053139A3 SHAPED APERTURES IN AN ION IMPLANTER 审中-公开
标题翻译：在离子植入物中形成的形状
公开(公告)号：WO2008053139A3
公开(公告)日：2008-10-02
申请号：PCT/GB2007003672
申请日：2007-09-26
申请人： APPLIED MATERIALS INC , RYDING GEOFFREY , SAKASE TAKAO , FARLEY MARVIN , HAYS STEPHEN
发明人： RYDING GEOFFREY , SAKASE TAKAO , FARLEY MARVIN , HAYS STEPHEN
IPC分类号： H01J37/09 , H01J37/317
CPC分类号： H01J37/3171 , H01J37/09 , H01J2237/0451
摘要： This invention relates to shaped apertures (54a-h) in an ion implanter that may act to clip an ion beam (34,34) and so adversely affect uniformity of an implant. In particular, the present invention finds application in ion implanters that employ scanning of a substrate to be implanted relative to the ion beam such that the ion beam traces a raster pattern over the substrate. An ion implanter is provided comprising: a substrate scanner arranged to scan a substrate repeatedly through an ion beam in a scanning direction substantially transverse to the ion beam path, thereby forming a series of scan lines across the substrate; and an aperture pl-ate (52a-h)] having provided therein an aperture positioned on the ion beam path upstream of the substrate scanner, and wherein the aperture is defined in part by an inwardly- facing projection (57a, 57b, 59a, 59b).
摘要翻译：本发明涉及离子注入机中的成形孔（54a-h），其可以用于夹住离子束（34,34），并且因此不利地影响植入物的均匀性。特别地，本发明应用于使用相对于离子束进行植入的衬底的扫描的离子注入器，使得离子束在衬底上追踪光栅图案。提供了一种离子注入机，包括：衬底扫描器，其布置成在基本上横向于离子束路径的扫描方向上反复扫描基板通过离子束，从而在衬底上形成一系列扫描线; 和一个开口（52a-h）]，其中设置有位于基板扫描器上游的离子束路径上的孔，并且其中孔径部分地由向内的突起（57a，57b，59a， 59B）。

7. 发明专利

CA2983413A1 NEUTRON TARGET FOR BORON NEUTRON CAPTURE THERAPY 未知
公开(公告)号：CA2983413A1
公开(公告)日：2016-11-10
申请号：CA2983413
申请日：2016-05-05
申请人： NEUTRON THERAPEUTICS INC
发明人： PARK WILLIAM H , KONISH STEVEN P , SMICK THEODERE H , SAKASE TAKAO
IPC分类号： A61N5/10 , G21G1/10 , G21G4/02 , H05H6/00
摘要： Apparatuses and methods for producing neutrons for applications such as boron neutron capture therapy (BNCT) are described. An apparatus can include a rotary fixture with a coolant inlet and a coolant outlet, and a plurality of neutron-producing segments. Each neutron- producing segment of the plurality of neutron-producing segments is removably coupled to the rotary fixture, and includes a substrate having a coolant channel circuit defined therein and a solid neutron source layer disposed thereon. The coolant channel circuits are in fluid communication with the coolant inlet and the coolant outlet.

8. 发明专利

HK1256039A1 用於硼中子俘獲治療的中子靶未知
公开(公告)号：HK1256039A1
公开(公告)日：2019-09-13
申请号：HK18115091
申请日：2018-11-26
申请人： NEUTRON THERAPEUTICS INC
发明人： PARK WILLIAM H JR , KONISH STEVEN P , SMICK THEODORE H , SAKASE TAKAO
IPC分类号： A61N20060101 , G21G20060101 , H05H20060101

9. 发明专利

ES2879661T3 Objetivo de neutrones para terapia de captura de neutrones por boro 未知
公开(公告)号：ES2879661T3
公开(公告)日：2021-11-22
申请号：ES16790079
申请日：2016-05-05
申请人： NEUTRON THERAPEUTICS INC
发明人： PARK WILLIAM , KONISH STEVEN , SMICK THEODORE , SAKASE TAKAO
IPC分类号： A61N5/10 , G21G1/10 , G21G4/02 , H05H6/00
摘要： Un aparato, que comprende: un dispositivo giratorio (112) que incluye una entrada de refrigerante (112A) y una salida de refrigerante (112B); y una pluralidad de segmentos de producción de neutrones (104A-104D), cada segmento de producción de neutrones (104A-104D) de la pluralidad de segmentos de producción de neutrones (104A-104D) acoplado de manera desmontable al dispositivo giratorio (112), cada segmento de producción de neutrones (104A-104D) de la pluralidad de segmentos de producción de neutrones (104A-104D) que comprende: un sustrato (106A-D) que tiene un circuito de canal de refrigerante (110A-D) definido dentro del mismo, el circuito de canal de refrigerante (110A-D) en comunicación fluida con la entrada de refrigerante (112A) y la salida de refrigerante (112B); y una capa de fuente de neutrones sólida (108A-D), dispuesta en una superficie del sustrato (106A-D).

10. 发明专利

HK1252346A1 用於硼中子俘獲治療的中子靶未知
公开(公告)号：HK1252346A1
公开(公告)日：2019-05-24
申请号：HK18111631
申请日：2018-09-10
申请人： NEUTRON THERAPEUTICS INC
发明人： PARK WILLIAM H JR , KONISH STEVEN P , SMICK THEODORE H , SAKASE TAKAO
IPC分类号： A61N20060101 , G21G20060101 , H05H20060101

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