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    • 2. 发明申请
    • METHOD FOR PRODUCING A REFLECTIVE OPTICAL ELEMENT FOR EUV LITHOGRAPHY
    • 用于生成反射光学元件的方法用于EUV光刻
    • WO2012175494A1
    • 2012-12-27
    • PCT/EP2012/061704
    • 2012-06-19
    • CARL ZEISS SMT GMBHKUZNETZOV, AlexeyGLEESON, MichaelVAN DE KRUIJS, Robbert W. E.BIJKERK, Frederik
    • KUZNETZOV, AlexeyGLEESON, MichaelVAN DE KRUIJS, Robbert W. E.BIJKERK, Frederik
    • G21K1/06G02B5/08G03F7/20C23C14/54C23C14/58
    • G03F7/70958B82Y10/00C23C14/35C23C14/542G02B5/0875G02B5/0891G21K1/062
    • Method for producing a reflective optical element for EUV lithography In order to reduce the tendency toward blistering and cracking as well as chipping in the topmost layers of a multilayer system in the presence of reactive hydrogen, a method for producing a reflective optical element (50) for EUV lithography, which element has a maximum reflectivity at an operating wavelength in the range of 5 nm to 20 nm, is proposed comprising the following steps: - applying to a substrate (52) a multilayer system (51) composed of thirty to sixty stacks (53) arranged one above another, wherein each stack has a layer (54) having a thickness d MLs composed of a material having a higher real part of the refractive index at the operating wavelength, and a layer (55) having a thickness d MLa composed of a material having a lower real part of the refractive index at the operating wavelength, wherein the thickness ratio is d MLa /(d MLa +d MLs ) = Γ ML, - applying one, two, three, four or five further stacks (56) to the multilayer system, said at least one further stack having a layer (54) having a thickness ds composed of a material having a higher real part of the refractive index at the operating wavelength, and a layer (55) having a thickness da composed of a material having a lower real part of the refractive index at the operating wavelength, wherein the thickness ratio is d a /(d a +d s ) = Γ and wherein Γ ≠ Γ ML .
    • 用于EUV光刻的反射型光学元件的制造方法为了减少在存在反应性氢的情况下多层体系的最上层的起泡和开裂以及切屑的倾向,可以举出反射型光学元件(50)的制造方法, 对于EUV光刻,提出了在5nm至20nm的范围内的工作波长处的最大反射率的EUV光刻,包括以下步骤: - 将基板(52)施加到由三十到六十个 其中每个叠层具有一层(54),该层具有由在工作波长处具有较高实部折射率的材料构成的厚度dML,以及厚度为dMLa的层(55) 由在工作波长处具有较低折射率实部的材料组成,其中厚度比为dMLa /(dMLa + dMLs)= GML, - 应用一个,两个,三个,四个或五个另外的堆叠(56) 所述至少一个另外的堆叠具有层(54),所述层(54)具有由在工作波长处具有较高实部折射率的材料构成的厚度ds,以及组合有厚度的层(55) 的具有在工作波长处的折射率的较低实部的材料,其中厚度比为da /(da + ds)= G,并且其中G' GML。
    • 3. 发明申请
    • CAROUSEL ADVERTISING SYSTEM
    • CAROUSEL广告系统
    • WO2009109851A1
    • 2009-09-11
    • PCT/IB2009/000449
    • 2009-03-06
    • GLEESON, MichaelCLARK, ZacharyZWAHLEN, Tracy
    • GLEESON, MichaelCLARK, ZacharyZWAHLEN, Tracy
    • G09F19/22
    • G09F19/22B65G15/30G06Q30/0241G09F7/12
    • Advertising system that adheres printed indicia to surfaces is described. The advertising system can contain a substrate containing the printed indicia layer and an adhesive layer. A protective layer, formed of a substantially clear or transparent material, can be used to protect an exterior surface of the substrate. The printed indicia may be coated, screen printed, digitally printed transfer laminated, etc., to the underlying surface to which the advertising system is attached, as can the protective layer and the adhesive layer when present. The advertising system can be used on non-durable surfaces, as well as surfaces which are exposed to extreme conditions and/or continuous wear. The advertising system can also be used with moving and non-moving, vertical and horizontal surfaces. The advertising systems also allow application and removal of advertisements quickly and effectively without removing, mechanically altering, or damaging the surfaces to which they are applied. Other embodiments are described.
    • 描述了将打印标记粘贴到表面的广告系统。 广告系统可以包含含有印刷标记层和粘合剂层的基板。 由基本上透明或透明的材料形成的保护层可用于保护基底的外表面。 打印的标记可以涂覆,丝网印刷,数字印刷转印层压等到广告系统附着的下面的表面,如果存在的话,保护层和粘合剂层也是如此。 广告系统可以用于非耐用的表面以及暴露于极端条件和/或持续磨损的表面。 广告系统也可以与移动和不移动,垂直和水平表面一起使用。 广告系统还允许快速有效地应用和移除广告,而不会移除,机械地改变或损坏其应用的表面。 描述其他实施例。