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    • 7. 发明申请
    • ELECTRO-OPTICAL DEVICE STACK
    • 电光设备堆叠
    • WO2014046539A1
    • 2014-03-27
    • PCT/NL2013/050424
    • 2013-06-14
    • NEDERLANDSE ORGANISATIE VOOR TOEGEPAST-NATUURWETENSCHAPPELIJK ONDERZOEK TNO
    • MICHELS, Jasper JoostBLOM, Paulus Wilhelmus MariaGÖTZ, Georg Thomas Jakob
    • H01L51/50H01L51/56H01L51/48
    • H01L51/5088C23C14/22C23C14/54H01L51/0037H01L51/42H01L51/44H01L51/5012H01L51/56H01L2251/5392H01L2251/568Y02E10/549Y02P70/521
    • There is provided a method of manufacturing an electro-optical device stack (10), the method comprising providing a multi-layered structure comprising an electro-optical layer (13) contacting a charge injection layer (12), the charge injection layer (12) comprising an acidic compound (12m); depositing a resist layer (14) onto the electro-optical layer (13), the resist layer (14) comprising a cationically-crosslinkable resist material (14m); having the resist material (14m) react adjacent breaches (12',13') in the electro-optical layer (13) by a cross-linking reaction induced by protons (12p) from the charge injection layer (12) thereby covering said breaches (12',13') with patches (14p) comprising cross-linked resist material (14c); and removing parts of the resist material (14m) that have not cross-linked, wherein the patches (14p) remain arranged for providing electrical insulation between the charge injection layer (12) and a layer subsequently deposited onto the electro-optical layer (13) and patches (14p).
    • 提供了一种制造电光器件堆叠(10)的方法,该方法包括提供多层结构,其包括与电荷注入层(12)接触的电光层(13),电荷注入层(12) )包含酸性化合物(12m); 将抗蚀剂层(14)沉积到所述电光层(13)上,所述抗蚀剂层(14)包含阳离子交联抗蚀剂材料(14m); 具有抗蚀剂材料(14m)通过由电荷注入层(12)由质子(12p)引起的交联反应来反应电光层(13)中的相邻裂缝(12',13'),从而覆盖所述破坏 (12',13'),其中包含交联抗蚀剂材料(14c)的贴片(14p); 以及去除未交联的抗蚀剂材料(14m)的部分,其中所述贴片(14p)保持布置用于在电荷注入层(12)和随后沉积在电光层(13)上的层之间提供电绝缘 )和贴片(14p)。