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    • 1. 发明申请
    • Device for measuring surface defects
    • 测量表面缺陷的装置
    • US20030193666A1
    • 2003-10-16
    • US10237909
    • 2002-09-09
    • NANOPHOTONICS AG
    • Michael AbrahamAndreas LangMichael Schweiger
    • G01N021/00
    • G01F23/284G01N21/211G01N21/47G01N21/9501
    • In view of the miniaturization of semiconductor components, the prevention of particles and other defects on the wafer surface during production is of great importance. The inspection should proceed as process-oriented as possible. For this purpose, devices are needed which on the one hand, are of very compact construction, while on the other hand, they still are equipped with measuring systems meeting the highest requirements. The device according to the invention for measuring surface defects, comprising a sample holder, a rotation drive for the sample holder, wherein the rotational axis runs perpendicular to the sample surface to be measured, an optical measuring system (10) for measuring scattered light, as well as at least one linear drive (23) for the measuring system, wherein the rotational direction is radial to the rotational axis of the sample holder, is capable of scanning the entire sample surface (16). By moving not only the sample, but also the measuring system, the need for space as a whole is reduced and the total device can be constructed with a more compact design.
    • 鉴于半导体部件的小型化,在生产中防止晶片表面上的颗粒和其它缺陷是非常重要的。 检查应尽可能以过程为导向。 为此,需要一种非常紧凑的结构的设备,另一方面它们仍然配备了满足最高要求的测量系统。 根据本发明的用于测量表面缺陷的装置,包括样品保持器,用于样品保持器的旋转驱动器,其中旋转轴线垂直于待测量的样品表面延伸,光学测量系统( 10 ),以及用于测量系统的至少一个线性驱动( 23 ),其中旋转方向与样本保持器的旋转轴线径向,能够扫描 整个样品表面( 16 )。 通过不仅移动样品,而且移动测量系统,整体上减少了对空间的需求,并且可以以更紧凑的设计构建整个装置。