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    • 3. 发明申请
    • METHODS FOR FORMING PATTERNED STRUCTURES
    • 形成图案结构的方法
    • WO2008022097A2
    • 2008-02-21
    • PCT/US2007/075856
    • 2007-08-14
    • API NANOFABRICATION AND RESEARCH CORP.DENG, XuedongWANG, Jian JimCHEN, LeiNIKOLOV, Anguel N.O'BRIEN, NadaLIU, Xiaoming
    • DENG, XuedongWANG, Jian JimCHEN, LeiNIKOLOV, Anguel N.O'BRIEN, NadaLIU, Xiaoming
    • H01L21/20
    • G02B5/1857
    • In general, in a first aspect, the invention features a method that includes forming a first layer comprising a first material over a surface of a second layer, wherein forming the first layer includes sequentially forming a plurality of monolayers of the second material over the surface of the second layer, the second layer comprises a plurality of rows of a second material extending along a first direction and spaced from one another in a second direction orthogonal to the first direction, and the first layer conforms to the surface of the second layer. The method further includes removing portions of the first layer to produce a plurality of rows of the first material extending along the first direction and spaced from one another in the second direction and removing portions of a third layer comprising a third material, where the portions correspond to intervals between the second plurality of rows so that removing the portions forms a plurality of rows of the third material extending along the first direction and spaced apart from one another. The first and second materials are different.
    • 通常,在第一方面,本发明的特征在于一种方法,其包括在第二层的表面上形成包含第一材料的第一层,其中形成所述第一层包括在所述表面上顺序地形成所述第二材料的多个单层 所述第二层包括沿着第一方向延伸并沿与所述第一方向正交的第二方向彼此间隔开的多行第二材料,并且所述第一层符合所述第二层的表面。 该方法还包括去除第一层的部分以产生沿着第一方向延伸并在第二方向上彼此间隔的多行第一材料,并且去除包括第三材料的第三层的部分,其中部分对应于 到所述第二多个行之间的间隔,使得去除所述部分形成沿着所述第一方向延伸并彼此间隔开的所述第三材料的多行。 第一和第二种材料是不同的。