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1. 发明授权

US10105883B2 Imprint lithography system and method for manufacturing 有权
公开(公告)号：US10105883B2
公开(公告)日：2018-10-23
申请号：US14776568
申请日：2014-03-16
申请人： Nanonex Corporation
发明人： Hua Tan , Lin Hu , Wei Zhang , Stephen Y. Chou
IPC分类号： B29C59/02 , B29C43/58 , G03F7/00 , B29C39/02 , B29C43/02 , B29L9/00
摘要： A nanoimprint lithography system and method for manufacturing substrates with nano-scale patterns, having a process chamber with transparent sections on both top and side walls, a robot for automatic molds and substrates loading and unloading, and optical and stage apparatuses to obtain the desired spatial relationship between the mold and substrate, with an enclosed volume referring to mold mini-chamber being formed between the mold/holder and top wall of the chamber and with the process chamber and mini-chamber being capable of both vacuuming and pressurizing, and inside the chamber, a ring shape seal assembly is installed and a mold support assembly can be installed that aids in imprinting all the way to the edge of the substrate with various embodiments for carrying out fluid pressure imprinting, separation, measurement and control of mold and substrate gap, substrate thickness, and system axial force.

2. 发明申请

US20160039126A1 IMPRINT LITHOGRAPHY SYSTEM AND METHOD FOR MANUFACTURING 审中-公开
公开(公告)号：US20160039126A1
公开(公告)日：2016-02-11
申请号：US14776568
申请日：2014-03-16
申请人： NANONEX CORPORATION
发明人： Hua Tan , Lin Hu , Wei Zhang , Stephen Y. Chou
IPC分类号： B29C43/58 , B29C59/02 , G03F7/00 , B29C43/02
CPC分类号： B29C43/58 , B29C39/026 , B29C43/021 , B29C59/02 , B29C59/022 , B29C2043/5833 , B29L2009/00 , G03F7/0002
摘要： A nanoimprint lithography system and method for manufacturing substrates with nano-scale patterns, having a process chamber with transparent sections on both top and side walls, a robot for automatic molds and substrates loading and unloading, and optical and stage apparatuses to obtain the desired spatial relationship between the mold and substrate, with an enclosed volume referring to mold mini-chamber being formed between the mold/holder and top wall of the chamber and with the process chamber and mini-chamber being capable of both vacuuming and pressurizing, and inside the chamber, a ring shape seal assembly is installed and a mold support assembly can be installed that aids in imprinting all the way to the edge of the substrate with various embodiments for carrying out fluid pressure imprinting, separation, measurement and control of mold and substrate gap, substrate thickness, and system axial force.
摘要翻译：一种用于制造具有纳米尺度图案的衬底的纳米压印光刻系统和方法，具有在顶壁和侧壁上具有透明部分的处理室，用于自动模具和衬底装载和卸载的机器人，以及获得期望空间的光学和平台装置模具和基板之间的关系，具有封闭的体积，参考在模具/保持器和室的顶壁之间形成的模具小室，并且处理室和小室能够同时进行真空和加压，并且在室，安装环形密封组件，并且可以安装模具支撑组件，其可以通过用于执行流体压力压印，分离，测量和控制模具和衬底间隙的各种实施方式一直保持到衬底的边缘，基板厚度和系统轴向力。

3. 发明授权

US09533445B2 Fast nanoimprinting methods using deformable mold 有权
标题翻译：使用可变形模具的快速纳米压印方法
公开(公告)号：US09533445B2
公开(公告)日：2017-01-03
申请号：US14301101
申请日：2014-06-10
申请人： Nanonex Corporation
发明人： Wei Zhang , Hua Tan , Lin Hu , Stephen Y. Chou
IPC分类号： B29C59/02 , B82Y10/00 , B82Y40/00 , G03F7/00 , B29L7/00
CPC分类号： B29C59/02 , B29L2007/001 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： Methods for nanoimprint lithography using a deformable mold. Generally, the method includes a deformable mold fixed firmly onto a hollow mold holder around its full periphery is attached to top inner surface of the chamber and positioned underneath the transparent section. The central area of the mold is freely accessible from underneath through the opening of the mold holder. At beginning of the imprinting, the substrate with a layer of resist is positioned underneath the mold at a predetermined gap between them and a substrate is moved up to contact with the mold either under vacuum or under atmosphere. After consolidating the resist, the substrate is separated from the mold by either direct pull-down enabled by stage movement or deforming the mold enabled by differential pressure between the mold mini-chamber and the bulk volume of the chamber, or mixing of both.
摘要翻译：使用可变形模具进行纳米压印光刻的方法。通常，该方法包括一个可变形的模具，其牢固地固定在围绕其整个周边的空心模具架上，附着到腔室的顶部内表面并且位于透明部分下方。模具的中心区域可以通过模具夹具的开口从下面自由进入。在刻印开始时，具有抗蚀剂层的基板位于模具下方的预定间隙处，并且在真空下或在大气压下将基板向上移动以与模具接触。在固化抗蚀剂之后，通过在模具微型室和室的体积之间的差压或通过两者的混合的阶段移动或使模具变形来实现直接下拉，衬底与模具分离。

4. 发明申请

US20140239529A1 System and Methods For Nano-Scale Manufacturing 审中-公开
标题翻译：纳米级制造系统与方法
公开(公告)号：US20140239529A1
公开(公告)日：2014-08-28
申请号：US14042618
申请日：2013-09-30
申请人： Nanonex Corporation
发明人： Hua Tan , Lin Hu , Yi Yao , Stephen Y. Chou
IPC分类号： B29C59/00
CPC分类号： G03F7/0002 , G03F9/703
摘要： A system and method for patterning a substrate includes a mold holding fixture for holding a mold with nanostructures and a substrate holding fixture for holding a substrate having a molding surface, a stage assembly has two or more independent axis movements for moving either the mold or the substrate therein, a contact force sensor sensing a contact force between the mold surface and the molding surface, a chamber for holding the mold and substrate and for the applying of a pressure inside that is higher or lower than atmospheric pressure, a pressure regulator and a manifold for changing the pressure inside the chamber, a door on the chamber housing provides for selectively allowing the substrate and the mold to pass there through, and means to divide the chamber into two fluidly separate sub-chambers.
摘要翻译：用于图案化基板的系统和方法包括用于保持具有纳米结构的模具的模具保持固定件和用于保持具有模制表面的基板的基板保持夹具，台架组件具有两个或更多个独立的轴线运动，用于移动模具或基板，其中感测模具表面和模制表面之间的接触力的接触力传感器，用于保持模具和基板并用于施加高于或低于大气压力的压力的室，压力调节器和用于改变腔室内的压力的歧管，腔室壳体上的门提供选择性地允许衬底和模具通过其中，以及将腔室分成两个流体分离的子室的手段。

5. 发明授权

US10108086B2 System and methods of mold/substrate separation for imprint lithography 有权
公开(公告)号：US10108086B2
公开(公告)日：2018-10-23
申请号：US14776607
申请日：2014-03-17
申请人： Nanonex Corporation
发明人： Hua Tan , Lin Hu , Stephen Y. Chou
IPC分类号： G03F7/00 , B82Y40/00 , B82Y10/00 , B29C43/50 , B29C43/56 , B29C43/58 , B29C59/02
摘要： A nanoimprint system and methods for separating imprinted substrates with nano-scale patterns from mold for manufacturing. Generally, the system includes means to create, monitor, and control relative movement between the mold and substrate for separation. It is capable of controlling where and when the separation happens and finishes. The relative movement may be generated by motion stages, springs, stage driven flexures, inflatable O-rings, gas flow, and other mechanical means. It may be monitored by separation force, overhead camera, and vacuum/pressures in different area of the system. The relative movement may be any combination of stages movements and movement sequences. The separation speed, direction, and force can be well controlled in the system to achieve fast and reliable separation between mold and substrate, and at the same time maintain the pattern shape and details on the consolidated imprint resist.

6. 发明申请

US20150069672A1 FAST NANOIMPRINTING METHODS USING DEFORMABLE MOLD 有权
标题翻译：使用可变模具的快速纳米法
公开(公告)号：US20150069672A1
公开(公告)日：2015-03-12
申请号：US14301101
申请日：2014-06-10
申请人： Nanonex Corporation
发明人： Wei Zhang , Hua Tan , Lin Hu , Stephen Y. Chou
IPC分类号： B29C59/02
CPC分类号： B29C59/02 , B29L2007/001 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： Methods for nanoimprint lithography using a deformable mold. Generally, the method includes a deformable mold fixed firmly onto a hollow mold holder around its full periphery is attached to top inner surface of the chamber and positioned underneath the transparent section. The central area of the mold is freely accessible from underneath through the opening of the mold holder. At beginning of the imprinting, the substrate with a layer of resist is positioned underneath the mold at a predetermined gap between them and a substrate is moved up to contact with the mold either under vacuum or under atmosphere. After consolidating the resist, the substrate is separated from the mold by either direct pull-down enabled by stage movement or deforming the mold enabled by differential pressure between the mold mini-chamber and the bulk volume of the chamber, or mixing of both.
摘要翻译：使用可变形模具进行纳米压印光刻的方法。通常，该方法包括一个可变形的模具，其牢固地固定在围绕其整个周边的空心模具架上，附着到腔室的顶部内表面并且位于透明部分下方。模具的中心区域可以通过模具夹具的开口从下面自由进入。在刻印开始时，具有抗蚀剂层的基板位于模具下方的预定间隙处，并且在真空下或在大气压下将基板向上移动以与模具接触。在固化抗蚀剂之后，通过在模具微型室和室的体积之间的差压或通过两者的混合的阶段移动或使模具变形来实现直接下拉，衬底与模具分离。

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