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    • 1. 发明申请
    • Method of detecting displacement of exposure position marks
    • 检测曝光位置标记位移的方法
    • US20080002203A1
    • 2008-01-03
    • US11542073
    • 2006-10-03
    • Mutsumi Fujita
    • Mutsumi Fujita
    • G01B11/00
    • G03F7/70633
    • Exposure position marks are reliably recognized and the displacement of an exposure position is correctly and efficiently detected based on measurement results produced by recognizing the marks. The exposure position marks are constructed of a first pattern made up of an inner quadrangular pattern and an outer quadrangular pattern and a second pattern shaped as a rectangular frame whose inner edge and outer edge are formed as quadrangular patterns. The first pattern and the second pattern are formed with an intention of making center positions of the first pattern and the second pattern match and of having the second pattern disposed inside a region between an inner quadrangular pattern and an outer quadrangular pattern of the first pattern. The displacement of the exposure position is found by calculating an average of a measurement produced by detecting a displacement between the center positions of the inner quadrangular pattern of the first pattern and the quadrangular pattern that is the inner edge of the second pattern and a measurement produced by detecting a displacement between the center positions of the outer quadrangular pattern of the first pattern and the quadrangular pattern that is the outer edge of the second pattern
    • 可以基于通过识别标记产生的测量结果,可靠地识别曝光位置标记并且正确有效地检测曝光位置的位移。 曝光位置标记由内部四边形图案和外部四边形图案构成的第一图案和形成为内边缘和外边缘形成为四边形图案的矩形框架的第二图案构成。 形成第一图案和第二图案的目的是使第一图案和第二图案的中心位置匹配,并且将第二图案设置在第一图案的内四边形图案和外四边形图案之间的区域内。 通过计算通过检测第一图案的内部四边形图案的中心位置和作为第二图案的内边缘的四边形图案之间的位移产生的测量值的平均值,并且产生测量来找到曝光位置的位移 通过检测第一图案的外部四边形图案的中心位置与作为第二图案的外边缘的四边形图案之间的位移
    • 6. 发明授权
    • Method of detecting displacement of exposure position marks
    • 检测曝光位置标记位移的方法
    • US07466412B2
    • 2008-12-16
    • US11542073
    • 2006-10-03
    • Mutsumi Fujita
    • Mutsumi Fujita
    • G01B11/00
    • G03F7/70633
    • Exposure position marks are reliably recognized and the displacement of an exposure position is correctly and efficiently detected based on measurement results produced by recognizing the marks. The exposure position marks are constructed of a first pattern made up of an inner quadrangular pattern and an outer quadrangular pattern and a second pattern shaped as a rectangular frame whose inner edge and outer edge are formed as quadrangular patterns. The first pattern and the second pattern are formed with an intention of making center positions of the first pattern and the second pattern match and of having the second pattern disposed inside a region between an inner quadrangular pattern and an outer quadrangular pattern of the first pattern. The displacement of the exposure position is found by calculating an average of a measurement produced by detecting a displacement between the center positions of the inner quadrangular pattern of the first pattern and the quadrangular pattern that is the inner edge of the second pattern and a measurement produced by detecting a displacement between the center positions of the outer quadrangular pattern of the first pattern and the quadrangular pattern that is the outer edge of the second pattern.
    • 可以基于通过识别标记产生的测量结果,可靠地识别曝光位置标记并且正确有效地检测曝光位置的位移。 曝光位置标记由内部四边形图案和外部四边形图案构成的第一图案和形成为内边缘和外边缘形成为四边形图案的矩形框架的第二图案构成。 形成第一图案和第二图案的目的是使第一图案和第二图案的中心位置匹配,并且将第二图案设置在第一图案的内四边形图案和外四边形图案之间的区域内。 通过计算通过检测第一图案的内部四边形图案的中心位置和作为第二图案的内边缘的四边形图案之间的位移产生的测量值的平均值,并且产生测量来找到曝光位置的位移 通过检测第一图案的外部四边形图案的中心位置与作为第二图案的外边缘的四边形图案之间的位移。
    • 7. 发明授权
    • Thin film magnetic head having sectional shape of write magnetic pole formed as a trapezoid
    • 具有形成为梯形的写入磁极的截面形状的薄膜磁头
    • US07369359B2
    • 2008-05-06
    • US10953307
    • 2004-09-29
    • Mutsumi FujitaTakashi Ito
    • Mutsumi FujitaTakashi Ito
    • G11B5/147
    • G11B5/3945G11B5/3116G11B5/312G11B5/313G11B5/3967
    • A thin film magnetic head having a high write-in accuracy can be produced by suppressing a magnetic field leak between upper and lower magnetic poles. The method of producing the thin film magnetic head, in which a head substrate, magnetoresistance effect element, lower magnetic pole, write gap layer and an upper magnetic pole are formed in this order, has the lower magnetic pole patterned with a larger width than that of the upper magnetic pole in a write magnetic pole after the lower magnetic pole is formed. An insulation layer is formed in the same layer as the lower magnetic pole such that the insulation layer is flattened with the lower magnetic pole. The upper magnetic pole is formed on a surface of the write gap layer after the write gap layer is formed, and a protrusion of the lower magnetic pole is removed from a side face thereof.
    • 可以通过抑制上下磁极之间的磁场泄漏来制造具有高写入精度的薄膜磁头。 依次形成头基板,磁阻效应元件,下磁极,写间隙层和上磁极的薄膜磁头的制造方法,其下磁极的图案宽度大于 在形成下磁极之后的写磁极中的上磁极。 绝缘层形成在与下磁极相同的层中,使得绝缘层与下磁极平坦化。 在形成写间隙层之后,在写间隙层的表面上形成上磁极,并且从其侧面去除下磁极的突起。
    • 8. 发明申请
    • Thin film magnetic head and production method thereof
    • 薄膜磁头及其制造方法
    • US20050041338A1
    • 2005-02-24
    • US10953307
    • 2004-09-29
    • Mutsumi FujitaTakashi Ito
    • Mutsumi FujitaTakashi Ito
    • G11B5/31G11B5/39G11B5/147
    • G11B5/3945G11B5/3116G11B5/312G11B5/313G11B5/3967
    • The thin film magnetic head having a high write-in accuracy can be easily produced by suppressing a magnetic field leak between an upper magnetic pole and a lower magnetic pole. The method of producing the thin film magnetic head, in which a head substrate, a magnetoresistance effect element (14), a lower magnetic pole (20), a write gap layer (24) and an upper magnetic pole (26) are formed in this order, is characterized in that the lower magnetic pole (20) is so patterned as to have a larger width than the width of the upper magnetic pole (26) in a write magnetic pole after the lower magnetic pole is formed, that subsequently an insulation layer (30) composed of a non-magnetic material is formed in the same layer as the lower magnetic pole (20) in such a manner that the insulation layer (30) is flattened together with the lower magnetic pole, that the upper magnetic pole (26) is formed on a surface of the write gap layer (24) after the write gap layer (24) is formed on surfaces of the lower magnetic pole (20) and the insulation layer (30), and that finally a protrusion of the lower magnetic pole is removed from a side face thereof by FIB trimming.
    • 通过抑制上磁极和下磁极之间的磁场泄漏,可以容易地制造具有高写入精度的薄膜磁头。 在其中形成头基板,磁阻效应元件(14),下磁极(20),写间隙层(24)和上磁极(26)的薄膜磁头的制造方法 该顺序的特征在于,下磁极(20)被图案化以在形成下磁极后的写磁极中具有比上磁极(26)的宽度更大的宽度,随后将 由绝缘层(30)与非磁性材料构成的绝缘层(30)与下磁极(20)形成在同一层中,使得绝缘层(30)与下磁极一起变平,上磁 在写入间隙层(24)形成在下部磁极(20)和绝缘层(30)的表面上之后,在写入间隙层(24)的表面上形成极(26),最后形成突起 通过FIB修剪从其侧面去除下磁极。