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    • 7. 发明授权
    • In-situ device removal for multi-chip modules
    • 多芯片模块的原位设备拆除
    • US5553766A
    • 1996-09-10
    • US342563
    • 1994-11-21
    • Raymond A. JacksonKathleen A. LidestriDavid C. LinnellRaj N. Master
    • Raymond A. JacksonKathleen A. LidestriDavid C. LinnellRaj N. Master
    • B23K1/018H05K13/04H05K3/34B23K3/00
    • H05K13/0486B23K1/018B23K2201/40
    • Deformation of a lifting ring of bimetallic structure or memory metal is matched to a solder softening or melting temperature to apply forces to lift a chip from a supporting structure, such as a substrate or multi-chip module, only when the solder connections between the chip and the supporting structure are softened or melted. The temperature of the chip, module and solder connections there between is achieved in a commercially available box oven or belt furnace or the like and results in much reduced internal chip temperatures and thermal gradients within the chip as compared to known hot chip removal processes. Tensile and/or shear forces at solder connections and chip and substrate contacts are much reduced in comparison with known cold chip removal processes. Accordingly, the process is repeatable at will without significant damage to or alteration of electrical characteristics of the chip or substrate.
    • 双金属结构或记忆金属的提升环的变形与焊料软化或熔化温度匹配,以施加力以从支撑结构(例如基板或多芯片模块)提升芯片,只有当芯片之间的焊料连接 支撑结构软化或熔化。 与市售的盒式炉或带式炉等相比,芯片,模块和焊料连接的温度是可以实现的,并且与已知的热切屑去除工艺相比,在芯片内的内部芯片温度和热梯度大大降低。 与已知的冷芯片去除工艺相比,焊料连接和芯片和基板触点处的拉伸和/或剪切力大大降低。 因此,该过程可以随意重复,而不会显着损坏或改变芯片或衬底的电特性。
    • 9. 发明授权
    • Apparatus and method for removing interconnections
    • 用于去除互连的装置和方法
    • US06497357B2
    • 2002-12-24
    • US09850350
    • 2001-05-07
    • Raymond A. JacksonScott A. BradleyStephen A. DeLaurentisMario J. InterranteDavid C. Linnell
    • Raymond A. JacksonScott A. BradleyStephen A. DeLaurentisMario J. InterranteDavid C. Linnell
    • B23K120
    • B08B1/008B08B7/0071H01L21/4864H05K3/3436H05K3/3457
    • A method for removing at least one molten or solid structure from a surface including: placing the surface with the at least one molten or solid structure in a fixture; disposing said wiper assembly acted on by a bias proximate the at least one molten or solid structure; retaining the wiper assembly in a first position with a device having a first temperature point level equivalent to or higher than a second melting point level of the at least one molten or solid structure; and raising the temperature of the fixture to the first temperature point level; wherein the at least one molten or solid structure is wiped from the surface when the device reaches the first temperature point level. An apparatus for removing at least one molten or solid structure from a substrate for rework, the apparatus comprising: a fixture for sustaining and biasing the substrate against a wiper assembly; the wiper assembly configured and positioned to slidably engage at least a portion of the substrate; a bias for translating the wiper assembly along a surface of the substrate having the at least one molten or solid structure to be removed; and a guide block assembly capable of guiding and locking the wiper assembly.
    • 一种用于从表面去除至少一种熔融或固体结构的方法,包括:将具有至少一种熔融或固体结构的表面放置在固定装置中; 将所述擦拭器组件布置成靠近所述至少一个熔融或固体结构的偏压; 将所述刮水器组件保持在具有等于或高于所述至少一个熔融或固体结构的第二熔点水平的第一温度点水平的装置的第一位置; 并将夹具的温度提高到第一温度点水平; 其中当所述装置达到所述第一温度点水平时,所述至少一个熔融或固体结构从所述表面擦拭。 一种用于从基板去除至少一个熔融或固体结构以进行返修的装置,所述装置包括:固定装置,用于将所述基板保持并偏置在刮水器组件上; 所述擦拭器组件被构造和定位成可滑动地接合所述衬底的至少一部分; 用于沿着具有要移除的至少一个熔融或固体结构的衬底的表面平移擦拭器组件的偏压; 以及能够引导和锁定刮水器组件的导块组件。