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    • 2. 发明申请
    • Dendrimer and electronic device element employing the same
    • 树枝状聚合物和使用其的电子器件元件
    • US20060102890A1
    • 2006-05-18
    • US10521846
    • 2003-07-14
    • Motohiro YamaharaSatoru ObaraKentaro Tada
    • Motohiro YamaharaSatoru ObaraKentaro Tada
    • H01L51/00H01B1/12
    • C08G83/003H01B1/122H01L51/0061H01L51/0068H01L51/0095H01L51/0508H01L51/4253H01L51/5048Y10T428/31504
    • An object of the invention is to provide a novel dendrimer serving as an organic semiconductor material which is isotropic and which exhibits remarkably high carrier conductivity. Another object of the invention is to provide an electronic device employing the dendrimer. These objects are attained by a dendrimer having a branching structure in which repeating units each having a branch portion are repeatedly linked through the divergent method or the convergent method, each of said repeating units having a structure represented by formula (1), and containing a linear portion X formed of an optionally substituted divalent organic group and a branch portion Y formed of an optionally substituted trivalent organic group: characterized in that the linear portion X contains at least one thienylene moiety and is at least partially conjugated with the branch portion Y.
    • 本发明的目的是提供一种用作有机半导体材料的新颖的树枝状聚合物,其具有各向同性并且具有显着高的载流子导电性。 本发明的另一个目的是提供一种采用树状聚合物的电子装置。 这些目的通过具有支化结构的树枝状聚合物来实现,其中每个具有分支部分的重复单元通过发散方法或收敛方法重复连接,每个所述重复单元具有由式(1)表示的结构,并且含有 由任选取代的二价有机基团形成的线性部分X和由任选取代的三价有机基团形成的分支部分Y,其特征在于线性部分X含有至少一个亚噻吩基部分并且至少部分地与分支部分共轭Y.
    • 4. 发明授权
    • Process for producing dendrimer, building block compound, and process for producing thiophene compound
    • 树枝状大分子,结构单元化合物的制造方法,以及噻吩化合物的制造方法
    • US07531619B2
    • 2009-05-12
    • US10521689
    • 2003-07-14
    • Satoru ObaraKentaro Tada
    • Satoru ObaraKentaro Tada
    • C08G75/06C08G75/00C08G61/00C08G61/12
    • C08G83/003C07D333/18C08G61/126
    • A method for producing a dendrimer having a structural repeating unit which is represented by formula (1) and which contains a linear portion including a thienylene moiety and a branch portion Y formed of an optionally substituted trivalent organic group. The method is based on the convergent method and includes reaction step 1 of converting α-position hydrogen of the thiophene ring of a thienylene-moiety-containing compound (a) for forming end moieties to an active group V1 which undergoes Suzuki cross-coupling reaction, to thereby form compound (b); reaction step 2 of subjecting a compound (c) to Suzuki cross-coupling reaction with the compound (b), to thereby yield compound (d), the compound (c) having a linear portion and a branch portion Y and having, at the branch portion Y, two active groups V2 which undergo Suzuki cross-coupling reaction with the active group V1; reaction step 3 of converting α-position hydrogen of the thiophene ring of the thus-formed compound to an active group V1 which undergoes Suzuki cross-coupling reaction, and reacting the compound (c) with the active group V1, to thereby form a dendron of a subsequent generation; and a step of repeating the reaction step 3 in accordance with needs, to thereby form a dendrimer.
    • 一种制备具有由式(1)表示的结构重复单元并含有包含由任意取代的三价有机基团形成的亚噻吩基部分和分支部分Y的直链部分的树枝状聚合物的方法。 该方法基于收敛方法,包括将形成末端部分的含噻吩烯部分的化合物(a)的噻吩环的α-位氢转化为进行Suzuki交叉偶联反应的活性基团V1的反应步骤1 ,从而形成化合物(b); 使化合物(c)与化合物(b)进行Suzuki交叉偶联反应的反应步骤2,得到化合物(d),具有直链状部分和分支部分Y的化合物(c) 分支部分Y,与活性基团V1进行Suzuki交叉偶联反应的两个活性基团V2; 将由此形成的化合物的噻吩环的α-位氢转化为进行Suzuki交叉偶联反应的活性基团V1,并使化合物(c)与活性基团V1反应从而形成树突状物的反应步骤3 的后代 以及根据需要重复反应步骤3的步骤,从而形成树枝状聚合物。
    • 5. 发明申请
    • Process for producing dendrimer, building block compound, and process for producing thiophene compound
    • 树枝状大分子,结构单元化合物的制造方法,以及噻吩化合物的制造方法
    • US20060122364A1
    • 2006-06-08
    • US10521689
    • 2003-07-14
    • Satoru ObaraKentaro Tada
    • Satoru ObaraKentaro Tada
    • C08G75/32C07D409/14
    • C08G83/003C07D333/18C08G61/126
    • A method for producing a dendrimer having a structural repeating unit which is represented by formula (1) and which contains a linear portion including a thienylene moiety and a branch portion Y formed of an optionally substituted trivalent organic group. The method is based on the convergent method and includes reaction step 1 of converting α-position hydrogen of the thiophene ring of a thienylene-moiety-containing compound (a) for forming end moieties to an active group V1 which undergoes Suzuki cross-coupling reaction, to thereby form compound (b); reaction step 2 of subjecting a compound (c) to Suzuki cross-coupling reaction with the compound (b), to thereby yield compound (d), the compound (c) having a linear portion and a branch portion Y and having, at the branch portion Y, two active groups V2 which undergo Suzuki cross-coupling reaction with the active group V1; reaction step 3 of converting α-position hydrogen of the thiophene ring of the thus-formed compound to an active group V1 which undergoes Suzuki cross-coupling reaction, and reacting the compound (c) with the active group V1, to thereby form a dendron of a subsequent generation; and a step of repeating the reaction step 3 in accordance with needs, to thereby form a dendrimer.
    • 一种制备具有由式(1)表示的结构重复单元并含有包含由任意取代的三价有机基团形成的亚噻吩基部分和分支部分Y的直链部分的树枝状聚合物的方法。 该方法基于收敛方法,包括将形成末端部分的含噻吩烯部分的化合物(a)的噻吩环的α-位氢转化成活性基团V 1的反应步骤1 进行Suzuki交叉偶联反应,从而形成化合物(b); 使化合物(c)与化合物(b)进行Suzuki交叉偶联反应的反应步骤2,得到化合物(d),具有直链状部分和分支部分Y的化合物(c) 分支部分Y,与活性基团V 1进行Suzuki交叉偶联反应的两个活性基团V 2 2; 将由此形成的化合物的噻吩环的α-位氢转化成活性基团V 1的反应步骤3进行Suzuki交叉偶联反应,并使化合物(c)与活性 组V 1,从而形成下一代的树突; 以及根据需要重复反应步骤3的步骤,从而形成树枝状聚合物。
    • 6. 发明授权
    • Dendritic polymer and electronic device element employing the polymer
    • 树枝状聚合物和采用该聚合物的电子器件元件
    • US07585933B2
    • 2009-09-08
    • US10521843
    • 2003-07-14
    • Yamahara MotohiroSatoru ObaraKentaro Tada
    • Yamahara MotohiroSatoru ObaraKentaro Tada
    • C08G75/00C08G61/12C08G83/00B05D5/12B32B27/00H01B1/12H01L51/05H01L51/50
    • C08G83/003H01B1/122H01L51/0061H01L51/0068H01L51/0095H01L51/0508H01L51/4253H01L51/5048Y10T428/31504
    • An object of the invention is to provide a novel dendritic polymer serving as an organic semiconductor material which is isotropic and which exhibits remarkably high carrier conductivity. Another object of the invention is to provide an electronic device employing the dendritic polymer. These objects are attained by a dendritic polymer having a branching structure including repeating units each having a branch portion, each of said repeating units having a structure represented by formula (1), and containing a linear portion X formed of an optionally substituted divalent organic group and a branch portion Y formed of an optionally substituted trivalent organic group: characterized in that the linear portion X contains at least one thienylene moiety and is at least partially conjugated with the branch portion Y, and in that the polymer reversibly assumes an insulative state and a metallic state, depending on the presence of an external factor.
    • 本发明的目的是提供一种用作有机半导体材料的新型树枝状聚合物,其是各向同性的并且具有显着的高载流子导电性。 本发明的另一个目的是提供一种使用树枝状聚合物的电子装置。 这些目的是通过具有支链结构的树枝状聚合物来实现的,所述树枝状聚合物包括各自具有分支部分的重复单元,每个所述重复单元具有由式(1)表示的结构,并且含有由任选取代的二价有机基团形成的直链部分X 以及由任选取代的三价有机基团形成的分支部分Y,其特征在于,线性部分X含有至少一个亚噻吩基部分并且至少部分地与分支部分Y共轭,并且聚合物可逆地呈现绝缘状态, 金属状态,取决于外部因素的存在。
    • 7. 发明申请
    • Method for producing a pattern formation mold
    • US20060189160A1
    • 2006-08-24
    • US10526384
    • 2003-08-29
    • Tadashi HattoriYuichi UtsumiNobuji SakaiKentaro Tada
    • Tadashi HattoriYuichi UtsumiNobuji SakaiKentaro Tada
    • H01L21/31H01L21/469
    • B81C99/009C08G59/32C08G59/3218G03F7/0017G03F7/038
    • The method for producing a pattern formation mold includes: a first step of applying to a substrate a radiation-sensitive negative-type resist composition containing an epoxy resin represented by formula (I): (wherein R1 represents a moiety derived from an organic compound having k active hydrogen atoms (k represents an integer of 1 to 100); each of n1, n2, through nk represents 0 or an integer of 1 to 100; the sum of n1, n2, through nk falls within a range of 1 to 100; and each of “A” s, which may be identical to or different from each other, represents an oxycyclohexane skeleton represented by formula (II): (wherein X represents any of groups represented by formulas (III) to (V): and at least two groups represented by formula (III) are contained in one molecule of the epoxy resin)), along with a radiation-sensitive cationic polymerization initiator, and a solvent for dissolving the epoxy resin therein; a second step of drying the substrate coated with the radiation-sensitive negative-type resist composition, to thereby form a resist film; a third step of selectively exposing the formed resist film to an active energy beam according to a desired pattern; a fourth step of heating the exposed resist film so as to enhance a contrast of a pattern to be formed; a fifth step of developing the heated resist film, to thereby remove the unexposed area of the resist film through dissolution, thereby forming a patterned layer; and a sixth step of applying to the patterned layer a material other than that of the patterned layer such that spaces present in the patterned layer are filled, at least to some height, with the material, to thereby form a second layer, and removing the second layer, to thereby yield a pattern formation mold.