专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明专利

JP2013132577A Gas cleaning apparatus 有权
标题翻译：气体清洁装置
公开(公告)号：JP2013132577A
公开(公告)日：2013-07-08
申请号：JP2011283120
申请日：2011-12-26
申请人： Morikawa Sangyo Kk , 森川産業株式会社
发明人： MORIKAWA KENJI , KOMORI SHIGEKAZU
IPC分类号： B01D53/38 , B01D47/02 , B01D47/06 , B01D53/18 , B01D53/77
摘要： PROBLEM TO BE SOLVED: To improve cleaning performance of a gas cleaning apparatus that cleans an exhaust gas including environmental contaminants.SOLUTION: The gas cleaning apparatus is provided with a partition plate 4 partitioning a space formed above a water tank 3 into a first chamber R1 in which the exhaust gas flows and a second chamber R2 communicating with a gas exhaust port 16c and configured to put the lower end part of a partition plate 4 in a cleaning liquid W, and also provided with differential pressure generation means of generating differential pressure between the first and second chambers R1, R2 and configured to clean the exhaust gas again on the second chamber side by moving the cleaning liquid W through a communication part formed below the partition plate 4 according to generation of the differential pressure, pushing up a second liquid level H2 in the second chamber R2 while lowering a first liquid level H1 in the first chamber R1 down to the position of the communication part, and then guiding the exhaust gas flowing in the first chamber and cleaned into the cleaning liquid on the second chamber side through the communication part below the partition plate.
摘要翻译：要解决的问题：为了改善清洁包括环境污染物在内的废气的气体净化装置的清洁性能。解决方案：气体清洁装置设置有将形成在水箱3上方的空间分隔成第一室R1的隔板4 其中废气流动，第二室R2与排气口16c连通并且被配置为将隔板4的下端部分放置在清洗液W中，并且还设置有差压产生装置，第一和第二室R1，R2，并且构造成通过根据差压的产生移动清洁液W通过形成在隔板4下方的连通部，从而再次清洁第二室侧的废气，向上推第二液体同时将第一室R1中的第一液面H1降低到通信位置然后引导在第一室中流动的废气，并通过分隔板下方的连通部分清洁到第二室侧的清洗液中。

2. 发明专利

JP2011125800A Method for desorbing/recovering organic solvent adsorbed on activated carbon 审中-公开
标题翻译：用于吸附/回收吸附在活性炭上的有机溶剂的方法
公开(公告)号：JP2011125800A
公开(公告)日：2011-06-30
申请号：JP2009287385
申请日：2009-12-18
申请人： Morikawa Co Ltd , Morikawa Sangyo Kk , 株式会社モリカワ , 森川産業株式会社
发明人： MORIKAWA KENJI , KOMORI SHIGEKAZU , TAKANO ZENICHI , TANAKA MASAHIRO
IPC分类号： B01D53/04 , B01D53/44 , B01D53/81 , B01J20/34
摘要： PROBLEM TO BE SOLVED: To provide a method for desorbing/recovering an organic solvent adsorbed on activated carbon, in which the adsorption/desorption efficiency is made higher by quickly reporting the fact that the desorption is completed, when the organic solvent such as toluene is desorbed from an adsorption/desorption tank packed with the organic solvent-adsorbed activated carbon by using superheated steam.
SOLUTION: In desorbing adsorbed toluene in the adsorption/desorption tank 15 of a practical level by using the superheated steam of 220°C, when the temperature of the supply downstream side of the adsorption/desorption tank 15 to which the superheated steam is supplied, becomes the same as that of the supplied superheated steam, the fact that the desorption is completed is easily determined.
COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：待解决的问题：为了提供一种吸附/回收吸附在活性炭上的有机溶剂的方法，其中通过快速报告解吸完成的事实使吸附/解吸附效率提高得更高，当有机溶剂如因为甲苯通过使用过热蒸汽从装有有机溶剂吸附的活性炭的吸附/解吸槽中解吸。解决方案：通过使用220℃的过热蒸汽解吸附着在吸附/解吸槽15中的吸附/解吸槽15中的吸附/解吸槽15的过热蒸汽的供给下游侧的温度被提供，变得与所提供的过热蒸汽相同，容易确定解吸完成的事实。版权所有（C）2011，JPO＆INPIT

3. 发明专利

JP2011012326A Method for cleaning and drying machining chip and method for reusing casting material with the use of treated machining chip 有权
标题翻译：用于清洁和干燥加工芯片的方法和使用处理加工芯片来重新铸造材料的方法
公开(公告)号：JP2011012326A
公开(公告)日：2011-01-20
申请号：JP2009159428
申请日：2009-07-06
申请人： Morikawa Sangyo Kk , 森川産業株式会社
发明人： KOMORI SHIGEKAZU , TAKAHASHI AKIO , DAIMON NOBUO
IPC分类号： C22B1/00 , C22B1/248 , C22B7/02 , F26B3/04 , F26B21/00
CPC分类号： Y02P10/212
摘要： PROBLEM TO BE SOLVED: To provide a method for cleaning and drying machining chips, which efficiently removes a cutting oil depositing on the machining chips as much as possible, further is environmentally friendly, and reduces the waste of energy to be consumed.SOLUTION: This cleaning and drying method includes: making the machining chips stay in a furnace 4 for cleaning and drying, which is maintained at a predetermined temperature, for a predetermined period of time; heating a saturated vapor which has been generated in a vapor boiler 7 and has been heated to the first temperature range, to the second temperature range which has higher temperature than the first temperature range in a superheated-vapor-generating unit 8, to produce a superheated vapor; pressure-feeding the vapor into the furnace; and discharging the cutting oil depositing on the machining chips together with the superheated vapor to clean and dry the machining chips.
摘要翻译：要解决的问题：为了提供一种用于清洁和干燥加工芯片的方法，其有效地去除了尽可能多地在切削加工芯片上沉积的切削油，进一步是环境友好的，并且减少了被消耗的能量的浪费。解决方案：这清洗和干燥方法包括：使加工屑保持在保持在预定温度的预定时间段内的用于清洁和干燥的炉4中; 将在蒸气锅炉7中产生并已经被加热到第一温度范围的饱和蒸气加热到在过热蒸汽发生单元8中具有比第一温度范围更高的温度的第二温度范围，以产生过热蒸气将蒸汽压入炉中; 并且将与过热蒸汽一起沉积在加工芯片上的切削油排出以清洁和干燥加工芯片。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式