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1. 发明授权

US06723997B2 Aberration corrector for instrument utilizing charged-particle beam 有权
标题翻译：使用带电粒子束的仪器畸变校正器
公开(公告)号：US06723997B2
公开(公告)日：2004-04-20
申请号：US10281378
申请日：2002-10-25
申请人： Miyuki Matsuya , Kazuhiro Honda
发明人： Miyuki Matsuya , Kazuhiro Honda
IPC分类号： H01J314
CPC分类号： H01J37/153 , G01N23/225 , G21K1/087 , H01J37/265 , H01J37/28
摘要： An aberration corrector comprises four stages of electrostatic quadrupole elements, two stages of electrostatic quadrupole elements for superimposing a magnetic potential distribution analogous to the electric potential distribution created by the two central ones of the four stages of the electrostatic quadrupole elements on the electric potential distribution, an objective lens, a manual operation portion permitting a user to modify the accelerating voltage or the working distance, a power supply for supplying voltages to the four stages of electrostatic quadrupole elements, a power supply for exciting the two stages of magnetic quadrupole elements, a power supply for the objective lens, and a control portion for controlling the power supplies according to a manual operation or setting performed on the manual operation portion.
摘要翻译：像差校正器包括四级静电四极元件，两级静电四极元件，用于叠加与由静电四极元件四级中的两个中心的电位分布类似的电位分布，该电位分布与电位分布相同，物镜，允许用户修改加速电压或工作距离的手动操作部分，用于向四级静电四极元件提供电压的电源，用于激励两级磁四极元件的电源，用于物镜的电源，以及用于根据在手动操作部分执行的手动操作或设置来控制电源的控制部分。

2. 发明授权

US5225676A Electrooptical viewing apparatus capable of switching depth of focus 失效
标题翻译：电动观察装置可切换深度聚焦
公开(公告)号：US5225676A
公开(公告)日：1993-07-06
申请号：US886623
申请日：1992-05-21
申请人： Miyuki Matsuya
发明人： Miyuki Matsuya
IPC分类号： H01J37/141 , H01J37/26 , H01J37/28
CPC分类号： H01J37/28
摘要： An electron microscope capable of switching its depth-of-focus mode between a first and a second mode. The microscope includes an electron gun, a first condenser lens, a second condenser lens, an objective aperture, scan coils, and an objective lens arranged in this order in the direction of travel of the electron beam. The mode is switched by changing the excitation of the first and second condenser lenses and of the objective lens so that the electron beam is in focus at the specimen surface. The distance a between the principal plane of the objective lens and the focal point of the second condenser lens in the first mode and the distance b between the principal plane of the objective lens and the focal point of the second condenser lens in the second mode are set sufficiently larger than the maximum distance w.sub.2 between the principal plane of the objective lens and the specimen.
摘要翻译：能够在第一和第二模式之间切换其深度聚焦模式的电子显微镜。显微镜包括电子枪，第一聚光透镜，第二聚光透镜，物镜孔，扫描线圈和在电子束行进方向上依次排列的物镜。通过改变第一和第二聚光透镜和物镜的激发来切换模式，使得电子束在样品表面处聚焦。在第一模式中物镜的主平面与第二聚光透镜的焦点之间的距离a和物镜的主平面与第二模式中的第二聚光透镜的焦点之间的距离b是设定得足够大于物镜的主平面与样本之间的最大距离w2。

3. 发明授权

US07015481B2 Charged-particle optical system 有权
标题翻译：带电粒子光学系统
公开(公告)号：US07015481B2
公开(公告)日：2006-03-21
申请号：US10778937
申请日：2004-02-13
申请人： Miyuki Matsuya
发明人： Miyuki Matsuya
IPC分类号： H01J3/14
CPC分类号： H01J37/28 , H01J37/153
摘要： On a charged-particle optical system for achieving optimum aberration correction and obtaining a minimum probe diameter, the optical system focuses a beam of charged particles onto a surface of a specimen, and has four stages of multipole elements arranged along the optical axis of the beam, power supplies capable of supplying five or more independent octopole electric or magnetic potentials, and a control portion for correcting third-order aperture aberrations by adjusting the five or more independent octopole electric or magnetic potentials independently. The power supplies apply normal octopole electric or magnetic potentials to at least three of the four stages of multipole elements independently and apply skew octopole electric or magnetic potentials to at least two of the multipole elements independently.
摘要翻译：在用于实现最佳像差校正并获得最小探针直径的带电粒子光学系统中，光学系统将带电粒子束聚焦到样品的表面上，并且具有沿着光束的光轴布置的四级多极元件能够提供五个或更多个独立的八极杆电位或电位的电源，以及通过独立地调整五个或更多个独立的八极电势或磁电位来校正三次孔径像差的控制部分。电源将独立的四极级元件中的至少三个的正常八极杆电或磁电势独立地应用于至少两个多极元件的偏置八极电势或磁势。

4. 发明申请

US20050017194A1 Charged-particle beam instrument and method of correcting aberration therein 有权
标题翻译：带电粒子束仪及其中的像差校正方法
公开(公告)号：US20050017194A1
公开(公告)日：2005-01-27
申请号：US10861775
申请日：2004-06-04
申请人： Miyuki Matsuya , Shinobu Uno
发明人： Miyuki Matsuya , Shinobu Uno
IPC分类号： H01J37/153 , H01J3/14
CPC分类号： H01J37/153
摘要： An aberration correction method and charged-particle beam instrument with four stages of multipole units. The two central stages of multipole units function as two stages of magnetic quadrupole components for superimposing a magnetic potential distribution analogous with an applied electric potential distribution on this electric potential distribution. The instrument further includes an objective lens, an objective aperture mounted in the optical path for a beam of charged particles, an operation portion for varying the accelerating voltage or the working distance between the objective lens and a specimen, and a control portion for controlling the multipole units according to an operation of the operation portion. When the accelerating voltage or working distance is varied, the resultant magnification of the four stages of multipole units and objective lens mounted behind the units is adjusted to maintain constant at least one of octupole component-activating potentials for correcting third-order aperture aberrations.
摘要翻译：具有四级多极单元的像差校正方法和带电粒子束仪器。多极单元的两个中心阶段用作两级磁性四极组件，用于将与施加的电势分布类似的磁势分布叠加在该电势分布上。该仪器还包括物镜，安装在用于带电粒子束的光路中的物镜孔，用于改变加速电压或物镜与样本之间的工作距离的操作部分，以及用于控制物镜根据操作部分的操作的多极单元。当加速电压或工作距离变化时，调节安装在单元后面的四级多极单元和物镜的合成放大倍率以保持用于校正三次孔径像差的八极分量激活电位中的至少一个。

5. 发明授权

US06852983B2 Charged-particle beam apparatus equipped with aberration corrector 有权
标题翻译：装有像差校正器的带电粒子束装置
公开(公告)号：US06852983B2
公开(公告)日：2005-02-08
申请号：US10300670
申请日：2002-11-20
申请人： Miyuki Matsuya , Hiroyoshi Kazumori
发明人： Miyuki Matsuya , Hiroyoshi Kazumori
IPC分类号： H01J37/10 , H01J37/153 , H01J37/28 , G21K1/08
CPC分类号： H01J37/153 , H01J2237/1516 , H01J2237/153 , H01J2237/1534
摘要： Particle-beam apparatus is realized which is equipped with an aberration corrector capable of controlling the angular aperture of a particle beam after performing aberration correction. The corrector comprises four stages of electrostatic quadrupole elements, two stages of magnetic quadrupole elements for superimposing a magnetic potential distribution analogous to the electric potential distribution created by the two central stages of the electrostatic quadrupole elements, and four stages of electrostatic octupole elements for superimposing an octupole electric potential on the electric potential distribution created by the four stages of electrostatic quadrupole elements. An objective lens is located downstream of the corrector. An objective aperture is located upstream of the corrector. An angular aperture control lens is located downstream of the objective aperture to control the angular aperture of the probe hitting a specimen surface.
摘要翻译：实现了粒子束装置，其配备有能够在执行像差校正之后控制粒子束的角度孔径的像差校正器。校正器包括四级静电四极元件，两级磁四极元件，用于叠加类似于由静电四极元件的两个中心级产生的电势分布的磁势分布，以及用于叠加静电四极元件的四级静电八极元件由四级静电四极元件产生的电位分布上的八极电位。物镜位于校正器的下游。物镜孔位于校正器的上游。角度孔径控制透镜位于物镜孔的下游，以控制探头撞击样品表面的角度孔径。

6. 发明授权

US06933512B2 Charged particle beam instrument 有权
标题翻译：带电粒子束仪
公开(公告)号：US06933512B2
公开(公告)日：2005-08-23
申请号：US09798881
申请日：2001-03-02
申请人： Miyuki Matsuya
发明人： Miyuki Matsuya
IPC分类号： G01N23/04 , G01Q10/00 , G21K1/087 , G21K7/00 , H01J37/10 , H01J37/21 , H01J37/28 , H01J37/065
CPC分类号： H01J37/21 , G01N23/04 , H01J2237/216
摘要： A charged particle beam instrument capable of reducing the spread of the probe diameter while maintaining the probe current constant. An electrical current Id is detected by a detection aperture to create a feedback signal. The feedback signal is supplied to a condenser lens control and to an objective lens control via a signal adjuster. The objective lens control portion controls the objective lens such that the charged particle probe is in focus.
摘要翻译：一种带电粒子束仪器，能够在保持探针电流恒定的同时减小探头直径的扩展。通过检测孔检测电流I 以产生反馈信号。反馈信号通过信号调节器提供给聚光镜控制和物镜控制。物镜控制部分控制物镜使得带电粒子探针被聚焦。

7. 发明授权

US06930312B2 Charged-particle beam instrument and method of correcting aberration therein 有权
公开(公告)号：US06930312B2
公开(公告)日：2005-08-16
申请号：US10861775
申请日：2004-06-04
申请人： Miyuki Matsuya , Shinobu Uno
发明人： Miyuki Matsuya , Shinobu Uno
IPC分类号： H01J37/153 , H01J37/14
CPC分类号： H01J37/153
摘要： An aberration correction method and charged-particle beam instrument with four stages of multipole units. The two central stages of multipole units function as two stages of magnetic quadrupole components for superimposing a magnetic potential distribution analogous with an applied electric potential distribution on this electric potential distribution. The instrument further includes an objective lens, an objective aperture mounted in the optical path for a beam of charged particles, an operation portion for varying the accelerating voltage or the working distance between the objective lens and a specimen, and a control portion for controlling the multipole units according to an operation of the operation portion. When the accelerating voltage or working distance is varied, the resultant magnification of the four stages of multipole units and objective lens mounted behind the units is adjusted to maintain constant at least one of octupole component-activating potentials for correcting third-order aperture aberrations.

8. 发明授权

US06924488B2 Charged-particle beam apparatus equipped with aberration corrector 有权
标题翻译：装有像差校正器的带电粒子束装置
公开(公告)号：US06924488B2
公开(公告)日：2005-08-02
申请号：US10603304
申请日：2003-06-25
申请人： Miyuki Matsuya , Fumio Hosokawa
发明人： Miyuki Matsuya , Fumio Hosokawa
IPC分类号： G01Q40/00 , H01J37/153 , G21R5/10 , G21K1/08
CPC分类号： H01J37/153 , H01J2237/12
摘要： A charged-particle beam instrument with an aberration corrector which comprises four stages of electrostatic quadrupole elements, two stages of magnetic quadrupole elements for superimposing a magnetic potential distribution analogous to the electric potential distribution created by the two central quadrupole elements of the four stages of electrostatic quadrupole elements on this electric potential distribution, and four stages of electrostatic octopole elements for superimposing an electric octopole potential on the electric potential distribution created by the four stages of electrostatic quadrupole elements.
摘要翻译：具有像差校正器的带电粒子束仪器包括四级静电四极元件，两级磁四极元件，用于叠加与由静电四级中的两个中心四极元件产生的电势分布类似的磁势分布该电位分布上的四极元件，以及四级静电八极元件，用于将电八极电位叠加在由四级静电四极元件产生的电位分布上。

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