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    • 1. 发明授权
    • Liquid crystal display device and a method of fabricating same
    • 液晶显示装置及其制造方法
    • US5739890A
    • 1998-04-14
    • US597206
    • 1996-02-06
    • Mitsuru UdaMasami ShinoharaMamoru Nishida
    • Mitsuru UdaMasami ShinoharaMamoru Nishida
    • G02F1/1335G02F1/1339G02F1/1362
    • G02F1/13394G02F1/136277G02F1/133512G02F1/133553
    • This invention relates to a reflection liquid crystal display device using a reflection liquid crystal light bulb and a method for fabricating such liquid crystal display devices, and an object thereof is to provide a liquid crystal display device and its manufacture wherein the numerical aperture of the subpixel is increased to improve the display brightness. The present method comprises the steps of forming an optical absorbing layer 26 on a semiconductor substrate 1; forming a plurality of light reflecting films 32 on the optical absorbing layer 26 via an insulating film 28; forming an insulating film 36 all over the surface; coating positive photoresist all over the insulating film 36 to form a resist layer 64; exposing and developing the resist layer 64 from above to form a mask in such a way that the resist layer 64 remains only on the regions between the plurality of light reflecting films 32 in a self-aligned manner; and using the mask to etch the insulating film 36 to form pillar-shape spacers 34 on the regions between the plurality of light reflecting films 32.
    • 本发明涉及一种使用反射型液晶灯泡的反射型液晶显示装置及其制造方法,其目的在于提供一种液晶显示装置及其制造方法,其中子像素的数值孔径 增加显示亮度。 本方法包括在半导体衬底1上形成光吸收层26的步骤; 通过绝缘膜28在光吸收层26上形成多个光反射膜32; 在整个表面上形成绝缘膜36; 在绝缘膜36上涂覆正性光致抗蚀剂层以形成抗蚀剂层64; 从上方露出和显影抗蚀剂层64以使得抗蚀剂层64以自对准方式仅保留在多个光反射膜32之间的区域上的方式形成掩模; 并且使用掩模来蚀刻绝缘膜36,以在多个光反射膜32之间的区域上形成柱状间隔物34。
    • 3. 发明授权
    • Reflection type liquid crystal device, manufacturing method therefor, and projection display system
    • 反射型液晶装置及其制造方法和投影显示系统
    • US06614502B2
    • 2003-09-02
    • US09824674
    • 2001-04-04
    • Masami ShinoharaMitsuru Uda
    • Masami ShinoharaMitsuru Uda
    • G02F11335
    • G02F1/13439G02F1/133553G02F1/136G02F2001/133357
    • An active matrix reflective liquid crystal device includes an array substrate which includes switching elements corresponding to pixels and an array of pixel electrodes connected to the switching elements; and an opposing substrate which has a transparent electrode opposite the array of pixel electrodes with a liquid crystal layer inserted therebetween. Each of the pixel electrodes includes an array of electrode studs, (e.g., divided electrode elements). The regions between the electrodes are filled with an insulating material, and the surface of the stud array is planarized by chemical-mechanical polishing (CMP). A dielectric light reflective film is formed on the planarized surface of the stud array, and a liquid crystal molecule alignment film is deposited thereon. Thus, a reflection type liquid crystal device is provided having a planarized light reflective face for a reduced reflection loss, along with a method for manufacturing the same, and a projection display system using such a reflection type liquid crystal device.
    • 有源矩阵反射型液晶装置包括阵列基板,其包括与像素相对应的开关元件和连接到开关元件的像素电极阵列; 以及对置基板,其具有与像素电极阵列相对的透明电极,液晶层插入其间。 每个像素电极包括电极柱的阵列(例如分开的电极元件)。 电极之间的区域填充有绝缘材料,并且通过化学机械抛光(CMP)将螺柱阵列的表面平坦化。 在螺柱阵列的平坦化表面上形成电介质光反射膜,并在其上沉积液晶分子取向膜。 因此,提供一种反射型液晶装置,其具有用于降低反射损耗的平坦化的光反射面及其制造方法,以及使用这种反射型液晶装置的投影显示系统。
    • 6. 发明授权
    • Reflection type liquid crystal device, manufacturing method therefor, and projection display system
    • 反射型液晶装置及其制造方法和投影显示系统
    • US06292246B1
    • 2001-09-18
    • US09256292
    • 1999-02-24
    • Masami ShinoharaMitsuru Uda
    • Masami ShinoharaMitsuru Uda
    • G02F11335
    • G02F1/13439G02F1/133553G02F1/136G02F2001/133357
    • An active matrix reflective liquid crystal device includes an array substrate which includes switching elements corresponding to pixels and an array of pixel electrodes connected to the switching elements; and an opposing substrate which has a transparent electrode opposite the array of pixel electrodes with a liquid crystal layer inserted therebetween. Each of the pixel electrodes includes an array of electrode studs, (e.g., divided electrode elements). The regions between the electrodes are filled with an insulating material, and the surface of the stud array is planarized by chemical-mechanical polishing (CMP). A dielectric light reflective film is formed on the planarized surface of the stud array, and a liquid crystal molecule alignment film is deposited thereon. Thus, a reflection type liquid crystal device is provided having a planarized light reflective face for a reduced reflection loss, along with a method for manufacturing the same, and a projection display system using such a reflection type liquid crystal device.
    • 有源矩阵反射型液晶装置包括阵列基板,其包括与像素相对应的开关元件和连接到开关元件的像素电极阵列; 以及对置基板,其具有与像素电极阵列相对的透明电极,液晶层插入其间。 每个像素电极包括电极柱的阵列(例如分开的电极元件)。 电极之间的区域填充有绝缘材料,并且通过化学机械抛光(CMP)将螺柱阵列的表面平坦化。 在螺柱阵列的平坦化表面上形成电介质光反射膜,并在其上沉积液晶分子取向膜。 因此,提供一种反射型液晶装置,其具有用于降低反射损耗的平坦化的光反射面及其制造方法,以及使用这种反射型液晶装置的投影显示系统。
    • 8. 发明授权
    • Apparatus and method for color filter inspection
    • 彩色滤光片检查装置及方法
    • US07440118B2
    • 2008-10-21
    • US11419030
    • 2006-05-18
    • Mitsuru UdaAtsushi KohayaseHiroshi Yamashita
    • Mitsuru UdaAtsushi KohayaseHiroshi Yamashita
    • G01B11/30
    • G01N21/95G01N21/86G01N2021/9511
    • The present invention provides an apparatus and method for detecting flatness and/or unevenness of a surface of an overcoat layer on a colored pixel layer of a color filter with a high degree of accuracy. The apparatus includes: a light source 34, placed almost directly above the surface of a plate 30, for emitting an emission-line spectrum corresponding to at least one color of coloring particles in a color filter 32; a photo-receiver 36, placed obliquely upward with respect to the surface of the plate 30 and having a spectral sensitivity corresponding to the emission-line spectrum of the light source, for receiving reflected light from the color filter 32 on the plate 30 during inspection; and a detection means 42 for creating a brightness distribution for a color using a color signal output from the photo-receiver 36 as corresponding to its spectral sensitivity to detect the flatness (unevenness) of the surface of an overcoat layer 16.
    • 本发明提供了一种用于以高精度检测滤色器的着色像素层上的外涂层的表面的平坦度和/或不均匀性的装置和方法。 该装置包括:几乎位于板30表面上方的光源34,用于发射与滤色器32中的至少一种着色颗粒颜色相对应的发射线光谱; 相对于板30的表面倾斜向上放置并具有与光源的发射线光谱相对应的光谱灵敏度的光电接收器36,用于在检查期间接收来自板30上的滤色器32的反射光 ; 以及检测装置42,用于根据其光谱灵敏度,使用从光接收器36输出的颜色信号产生颜色的亮度分布,以检测外涂层16的表面的平坦度(不均匀性)。
    • 10. 发明授权
    • Inspection apparatus and inspection method for pattern profile, and exposure apparatus
    • 图案轮廓的检查装置和检查方法以及曝光装置
    • US07525651B2
    • 2009-04-28
    • US11924126
    • 2007-10-25
    • Mitsuru UdaKazunari TerakawaAkira SusukiChiaki OishiYasuharu YamadaTeruhiko Havano
    • Mitsuru UdaKazunari TerakawaAkira SusukiChiaki OishiYasuharu YamadaTeruhiko Havano
    • G01N21/00
    • G03F7/70616G01N21/956G03F7/70641
    • Disclosed is a pattern inspection apparatus which easily and highly accurately detects a profile error (deviation) of at least one pattern having a cross section with projections and recesses. The inspection apparatus for the pattern 32 is for detecting the profile error of the pattern having a cross section with a projection and a recess. This inspection apparatus includes a plate 30 on which a pattern is mounted, light sources 40, 42 and 44 which can change angles of illuminating light emitted onto the pattern, within a range of 15 to 75 degrees with reference to the top surface of the pattern, and photodetectors 52 and 54 which can receive reflected light from the pattern at an angle within a range of 15 to 75 degrees with reference to the top surface of the pattern. The inspection apparatus is characterized by that the profile error of the pattern is detected based on an amount of the reflected light from an edge between the top surface and the side surface of each of the patterns.
    • 公开了一种图案检查装置,其容易且高精度地检测至少一个具有突起和凹陷的横截面的图案的轮廓误差(偏差)。 用于图案32的检查装置用于检测具有突起和凹部的横截面的图案的轮廓误差。 该检查装置包括其上安装图案的板30,可以将照射到图案上的照明光的角度相对于图案的顶表面在15至75度的范围内变化的光源40,42和44 以及光电检测器52和54,其可以以相对于图案的顶表面以15至75度的范围内的角度接收来自图案的反射光。 检查装置的特征在于,基于来自每个图案的顶表面和侧表面之间的边缘的反射光的量来检测图案的轮廓误差。