会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 5. 发明申请
    • SIGNAL PROCESSING DEVICE FOR OPTICAL DISC, INTEGRATED CIRCUIT, OPTICAL DISC DEVICE, AND OPTIMUM RECORDING FOCUS POSITION DETECTING METHOD
    • 用于光盘,集成电路,光盘装置和最佳记录聚焦位置检测方法的信号处理装置
    • US20090290462A1
    • 2009-11-26
    • US12307838
    • 2007-07-09
    • Katsumi Morita
    • Katsumi Morita
    • G11B7/00G11B7/12
    • G11B7/0908G11B7/1267
    • An optical disc signal processing device includes a focus position determining section, wherein when test recording is performed while changing a focus position through a plurality of positions, the focus position determining section obtains an optimum recording focus position based on recording qualities of regions on the optical disc where the test recording has been performed. The focus position determining section includes: a recording state measuring section for measuring, for each focus position, a recording quality of a region on the optical disc where the test recording has been performed; and a determination section for determining, according to a predetermined criterion, whether laser power during the test recording is suitable for obtaining the optimum recording focus position, based on the recording quality obtained for each focus position by the recording state measuring section. When it is determined by the determination section that the laser power during the test recording is not suitable for obtaining the optimum recording focus position, the optical disc signal processing device controls the optical pickup so that the test recording is performed again with the laser power changed.
    • 光盘信号处理装置包括聚焦位置确定部分,其中当通过多个位置改变聚焦位置时执行测试记录时,聚焦位置确定部分基于光学上的区域的记录质量获得最佳记录聚焦位置 进行测试记录的光盘。 焦点位置确定部分包括:记录状态测量部分,用于针对每个焦点位置测量执行了测试记录的光盘上的区域的记录质量; 以及确定部分,用于根据预定标准,基于由记录状态测量部分为每个聚焦位置获得的记录质量,确定测试记录期间的激光功率是否适于获得最佳记录聚焦位置。 当由确定部确定测试记录期间的激光功率不适合于获得最佳记录聚焦位置时,光盘信号处理装置控制光学拾取器,使得再次以激光功率改变进行测试记录 。
    • 7. 发明授权
    • Dropout detection circuit and optical disc apparatus
    • 压差检测电路和光盘装置
    • US07567488B2
    • 2009-07-28
    • US11349884
    • 2006-02-09
    • Masayoshi AbeTeruhiko IzumiKatsumi Morita
    • Masayoshi AbeTeruhiko IzumiKatsumi Morita
    • G11B15/52
    • G11B7/00375G11B7/0948G11B20/10009
    • The dropout detection circuit of the invention includes: a high-speed envelope detection circuit for detecting an envelope of a reflection signal of a light beam with a first time constant; a low-speed envelope detection circuit for detecting an envelope of the reflection signal with a second time constant larger than the first time constant; a differential circuit for generating a difference signal indicating the difference between the envelopes detected by the envelope detection circuits; and a comparator for converting the difference signal to a binary value according to a predetermined binary criterion. The high-speed envelope detection circuit makes the first time constant larger during recording than during reproduction, to enable stable dropout detection irrespective of during reproduction or during recording.
    • 本发明的压差检测电路包括:高速包络检测电路,用于以第一时间常数检测光束的反射信号的包络; 低速包络检测电路,用于以大于第一时间常数的第二时间常数检测反射信号的包络; 差分电路,用于产生指示由包络检测电路检测的信封之间的差异的差分信号; 以及比较器,用于根据预定的二进制标准将差信号转换为二进制值。 高速包络检测电路在记录期间比在再现期间第一次恒定更大,以使得能够在再现期间或在记录期间进行稳定的压差检测。
    • 9. 发明授权
    • Target for sputtering equipment
    • 溅射设备目标
    • US5798029A
    • 1998-08-25
    • US777114
    • 1996-12-30
    • Katsumi Morita
    • Katsumi Morita
    • C23C14/34H01J37/32H01J37/34C23C14/40
    • H01J37/3402C23C14/3407
    • In sputtering equipment, a pair of targets are positioned in spaced apart relation defining a space therebetween. Each of the targets forms an electrode that is connected to a voltage supply unit. The voltage generates an electric field between the target pair. Furthermore, a process gas is supplied to the space between the targets. As the gas flows through this space, the electric field excites the gas into a plasma state. The plasma, being proximate the targets, causes the material comprising the targets to be sputtered. Additionally, to increase the plasma density in the space between the targets, a magnetic field is applied orthogonally to the electric field. A substrate, upon which the target material is sputtered, is positioned within the sputtering equipment opposite the targets. Further, because the target surfaces from which the material is sputtered are not parallel to the substrate, sputtered particles strike the substrate from an oblique angle. Such oblique striking angles produce a thin film upon the substrate having improved step coverage.
    • 在溅射设备中,一对靶被定位成间隔开的关系,其间限定了它们之间的空间。 每个目标形成连接到电压供应单元的电极。 电压在目标对之间产生电场。 此外,将工艺气体供应到靶之间的空间。 当气体流过该空间时,电场将激发气体进入等离子体状态。 靠近目标的等离子体使得包含靶的材料被溅射。 此外,为了增加目标之间的空间中的等离子体密度,将磁场垂直于电场施加。 溅射目标材料的基板被放置在与靶相对的溅射装置内。 此外,由于溅射材料的目标表面不平行于基板,溅射的颗粒从倾斜角度撞击基板。 这样的倾斜撞击角在衬底上产生具有改进的台阶覆盖的薄膜。
    • 10. 发明授权
    • Plasma generation apparatus with interleaved electrodes and
corresponding method
    • 具有交错电极的等离子体发生装置及相应的方法
    • US5543688A
    • 1996-08-06
    • US296968
    • 1994-08-26
    • Katsumi Morita
    • Katsumi Morita
    • H01J37/32H01J7/24
    • H01J37/32082H01J37/32541
    • A plasma generator having two groups of interleaved electrodes to which power is allied at high or radio frequency, to form a plasma in a region sufficiently removed from a substrate to avoid damage and unwanted exposure of the substrate to the plasma. In one embodiment of the invention, the electrodes are flat parallel plates. One group of electrodes includes all the odd-numbered plates and the other group includes all the even-numbered plates. In another embodiment of the invention, the electrodes are concentric cylinders instead of flat plates. In either case, plasma generation makes use of a relatively large electrode surface area in a small volume, and the resulting plasma is not in direct contact with the substrate being processed.
    • 一种具有两组交替电极的等离子体发生器,其功率在高频或射频频率下被联合,以在从衬底充分去除的区域中形成等离子体,以避免衬底对等离子体的损坏和不必要的曝光。 在本发明的一个实施例中,电极是平的平行板。 一组电极包括所有奇数板,另一组包括所有偶数板。 在本发明的另一个实施例中,电极是同心圆筒而不是平板。 在任一种情况下,等离子体产生使用较小体积的较大的电极表面积,并且所得到的等离子体不与待处理的基板直接接触。