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1. 发明专利

JP2012233021A Method for manufacturing polyimide film 有权
标题翻译：制备聚酰亚胺膜的方法
公开(公告)号：JP2012233021A
公开(公告)日：2012-11-29
申请号：JP2011100333
申请日：2011-04-28
申请人： Mitsui Chemicals Inc , 三井化学株式会社
发明人： MATSUDA TOSHINORI , ONO YOSUKE , KAGAYAMA AKISHI , SAKATA YOSHIHIRO , YAMASHITA WATARU , FUKUKAWA KENICHI
IPC分类号： C08J5/18 , C08G73/10
摘要： PROBLEM TO BE SOLVED: To provide a method for manufacturing a polyimide film, which does not cause appearance defects and a decrease in strength, and whitening and the like involved in the imidization reaction.SOLUTION: The method for manufacturing a polyimide film includes: (a) a step of coating on a support a polyamic acid-containing solution obtained by reacting a specific tetracarboxylic dianhydride with a specific diamine in a solvent; (b) a step of drying the solvent in the polyamic acid-containing solution at a temperature of 150°C or lower until a polyamic acid-containing film composed of a coating film of the polyamic acid-containing solution becomes tack-free; (c) a step of peeling the polyamic acid-containing film from the support; and (d) a step of fixing and heating the polyamic acid-containing film while the temperature is being raised from 150°C or lower to imidize the polyamic acid to thereby obtain the polyimide film.
摘要翻译：要解决的问题：提供一种不引起外观缺陷和强度降低的方法，以及涉及酰亚胺化反应的美白等。聚酰亚胺膜的制造方法包括：（a）在载体上涂布通过使特定的四羧酸二酐与特定的二胺在溶剂中反应得到的含聚酰胺酸的溶液的工序; （b）在150℃以下的温度下干燥含有聚酰胺酸的溶液中的溶剂，直到由含聚酰胺酸的溶液的涂膜组成的含聚酰胺酸的膜变得无粘性的步骤; （c）从载体剥离含聚酰胺酸的膜的步骤; 和（d）在将温度从150℃以上升温至聚酰胺酸酰亚胺化的同时，对含有聚酰胺酸的膜进行固定加热的步骤，得到聚酰亚胺膜。版权所有（C）2013，JPO＆INPIT

2. 发明专利

JP2005189256A Photosensitive resin composition for volume hologram recording and volume hologram using the same 审中-公开
标题翻译：使用相同的体积卷曲记录和体积卷曲的感光树脂组合物
公开(公告)号：JP2005189256A
公开(公告)日：2005-07-14
申请号：JP2003426712
申请日：2003-12-24
申请人： Mitsui Chemicals Inc , 三井化学株式会社
发明人： TAKAMATSU YASUSHI , ONISHI HITOSHI , SAKATA YOSHIHIRO
IPC分类号： G03F7/004 , G03F7/029 , G03H1/02
摘要： PROBLEM TO BE SOLVED: To provide a photosensitive resin composition for a volume hologram recording, the photosensitive resin composition having high sensitivity in a visible light region, in particular, to the second harmonic waves (at 532 nm) of a YAG laser which is a stable laser light source with high output, emission lines (at 458 nm, 488 nm and 514.5 nm) of an argon laser, or krypton ion laser light (647.1 nm), and having preferable compatibility with other resin compositions such as a photosensitizing agent.
SOLUTION: The photosensitive resin composition for volume hologram recording contains a photo-cation polymerizable compound, a binder resin, a photo cation initiator and a specified dipyrromethene boron complex compound.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：为了提供用于体积全息图记录的感光性树脂组合物，在可见光区域中具有高灵敏度的感光性树脂组合物，特别是YAG激光器的第二谐波（532nm）其是具有高输出的稳定的激光光源，氩激光器的发射线（在458nm，488nm和514.5nm）或氪离子激光（647.1nm），并且与其它树脂组合物光敏剂。解决方案：用于体积全息记录的感光性树脂组合物含有光阳离子聚合性化合物，粘合剂树脂，光阳离子引发剂和特定的二吡咯亚甲基硼络合物。版权所有（C）2005，JPO＆NCIPI

3. 发明专利

JP2014034590A Polyimide film and method for producing the same 有权
标题翻译：聚酰亚胺膜及其制造方法
公开(公告)号：JP2014034590A
公开(公告)日：2014-02-24
申请号：JP2012175013
申请日：2012-08-07
申请人： Mitsui Chemicals Inc , 三井化学株式会社
发明人： SAKATA YOSHIHIRO , FUKUKAWA KENICHI , OKAZAKI MASAKI , URAGAMI TATSUNOBU , MATSUDA TOSHINORI , ONO YOSUKE , YAMASHITA WATARU
IPC分类号： C08J5/18 , B29C41/12 , C08G73/10 , G02B5/20 , G02F1/1333 , H01L51/50 , H05B33/02
摘要： PROBLEM TO BE SOLVED: To provide a polyimide film and a method for producing the same, the film having high optical transparency and a small in-plane retardation.SOLUTION: A production method is provided for a polyimide film having overall light transmittance of 80% or more and an in-plane retardation of 10 nm or less. The method includes steps of: (a) applying a polyimide precursor-containing solution containing a polyimide precursor on a substrate; (b) heating a polyimide precursor film comprising the coating film of the polyimide precursor-containing solution until an imidization rate of the polyimide precursor reaches 90% or more and the residual amount of the solvent is reduced to 1 mass% or less; (c) peeling off the film obtained in step (b) from the substrate; and (d) heating the film obtained in step (c) again. In the step (d), a heating temperature of the film obtained in step (c) is controlled to be equal to or lower than the glass transition temperature of the polyimide.
摘要翻译：要解决的问题：为了提供一种聚酰亚胺膜及其制造方法，该膜具有高的光学透明度和小的面内延迟。解决方案：提供了一种制备方法，该聚酰亚胺膜的总透光率为80％以上，面内延迟为10nm以下。该方法包括以下步骤：（a）在基材上涂布含有聚酰亚胺前体的含聚酰亚胺前体溶液; （b）加热含有聚酰亚胺前体的溶液的涂膜的聚酰亚胺前体膜，直到聚酰亚胺前体的酰亚胺化率达到90％以上，溶剂的残留量为1质量％以下。（c）从基板剥离步骤（b）中获得的膜; 和（d）再次加热步骤（c）中获得的膜。在步骤（d）中，将步骤（c）中获得的膜的加热温度控制在等于或低于聚酰亚胺的玻璃化转变温度。

4. 发明专利

JP2012255985A Liquid crystal aligning agent, liquid crystal alignment film, and liquid crystal display element having the liquid crystal alignment film 有权
标题翻译：液晶晶体代理，液晶对准膜和液晶显示元件，液晶对准膜
公开(公告)号：JP2012255985A
公开(公告)日：2012-12-27
申请号：JP2011130091
申请日：2011-06-10
申请人： Mitsui Chemicals Inc , 三井化学株式会社
发明人： YAMASHITA WATARU , FUKUKAWA KENICHI , OKAZAKI MASAKI , SAKATA YOSHIHIRO , URAGAMI TATSUNOBU
IPC分类号： G02F1/1337 , C08G73/10
摘要： PROBLEM TO BE SOLVED: To provide a liquid crystal alignment film extremely excellent in aligning property for a liquid crystal cell, an appearance of the liquid crystal cell and transparency, and achieving both of a low coefficient of thermal expansion and cost reduction, and to provide a liquid crystal aligning agent capable of achieving the above excellent effects.SOLUTION: The liquid crystal aligning agent comprises a block polyamide acid imide, which includes a block comprising a repeating structural unit represented by specified formula (1A) and a block comprising a repeating structural unit represented by specified formula (1B). The liquid crystal alignment film is formed of a block polyimide including a block comprising a repeating structural unit represented by specified formula (2A) and a block comprising a repeating structural unit represented by specified formula (1B).
摘要翻译：要解决的问题为了提供一种液晶单元的取向性能极好的液晶单元的外观和透明性，同时实现低的热膨胀系数和成本降低两者的液晶取向膜，并提供能够实现上述优异效果的液晶取向剂。解决方案：液晶取向剂包括嵌段聚酰胺酰亚胺，其包括包含由特定式（1A）表示的重复结构单元的嵌段和包含由指定式（1B）表示的重复结构单元的嵌段。液晶取向膜由包括由特定式（2A）表示的重复结构单元的嵌段和包含由特定式（1B）表示的重复结构单元的嵌段组成的嵌段聚酰亚胺形成。版权所有（C）2013，JPO＆INPIT

5. 发明专利

JP2013052604A Heat-resistant double-sided metal laminated plate, heat-resistant transparent film using the same, and heat-resistant transparent circuit board 有权
标题翻译：耐高温双面金属层压板，耐热透明膜及耐热透明电路板
公开(公告)号：JP2013052604A
公开(公告)日：2013-03-21
申请号：JP2011192886
申请日：2011-09-05
申请人： Mitsui Chemicals Inc , 三井化学株式会社
发明人： SAKATA YOSHIHIRO , FUKUKAWA KENICHI , OKAZAKI MASAKI , URAGAMI TATSUNOBU , YAMASHITA WATARU , MATSUDA TOSHINORI , ONO YOSUKE , KAGAYAMA AKISHI
IPC分类号： B32B15/088 , B32B15/08 , B32B27/34 , C08G73/10 , H05K1/03
摘要： PROBLEM TO BE SOLVED: To obtain a heat-resistant double-sided metal laminated plate having metal layers on both sides of a polyimide film, having superior adhesiveness to metal, in which there is no change in dimensions even during soldering work, and in which there is less change in dimensions even during etching of the metal layers.SOLUTION: The heat-resistant double-sided metal laminate is obtained by preparing two laminates including: a metal foil; a first layer obtained by coating a block polyamic acid imide solution containing a specific block polyamic acid imide and a solvent over the metal foil and heating and drying the same; and a second layer obtained by coating a polyamic acid solution containing a specific polyamic acid and a solvent over the first layer and heating and drying the same. The two layers are made to face each other and are applied with thermo-compression bonding at 250-300°C.
摘要翻译：要解决的问题为了获得在聚酰亚胺膜的两侧具有金属层的耐热双面金属层压板，即使在焊接加工中也不会发生尺寸变化，对金属具有优良的粘合性，即使在金属层的蚀刻期间也存在较小的尺寸变化。解决方案：耐热双面金属层压板通过制备两个层压板获得，包括：金属箔; 通过在金属箔上涂覆含有特定嵌段聚酰胺酰亚胺和溶剂的嵌段聚酰胺酰亚胺溶液并加热并干燥而获得的第一层; 以及通过在第一层上涂布含有特定聚酰胺酸和溶剂的聚酰胺酸溶液并加热并干燥而获得的第二层。使两层相互面对并在250-300℃下进行热压接。版权所有（C）2013，JPO＆INPIT

6. 发明专利

JP2012251080A Novel polyimide and its use 有权
标题翻译：新型聚酰亚胺及其用途
公开(公告)号：JP2012251080A
公开(公告)日：2012-12-20
申请号：JP2011125171
申请日：2011-06-03
申请人： Mitsui Chemicals Inc , 三井化学株式会社
发明人： URAGAMI TATSUNOBU , OKAZAKI MASAKI , FUKUKAWA KENICHI , SAKATA YOSHIHIRO , YAMASHITA WATARU
IPC分类号： C08G73/10
摘要： PROBLEM TO BE SOLVED: To provide a novel polyimide high in transparency and capable of being melt molded.SOLUTION: In the polyimide having a repeating unit derived from an acid anhydride component and a diamine component and represented by formula (1A), the acid anhydride component contains an alicyclic acid anhydride represented by formulae (2A) and/or (2B) as an essential component, which is contained in a ratio of 20 to 100 mol% in the whole acid anhydride; and the diamine component contains an aromatic diamine represented by formulae (3A) and/or (3B) as an essential component, which is contained in a ratio of 20 to 100 mol% in the whole diamine.
摘要翻译：要解决的问题：提供一种透明度高且能够熔融成型的新型聚酰亚胺。解决方案：在具有由酸酐组分衍生的重复单元和由式（1A）表示的二胺组分的聚酰亚胺中，酸酐组分含有由式（2A）和/或（2B）表示的脂环酸酐）作为必需成分，其在全部酸酐中的比例为20〜100摩尔％二胺成分含有作为主要成分的式（3A）和/或（3B）所示的芳香族二胺，其比例在全部二胺中为20〜100摩尔％。版权所有（C）2013，JPO＆INPIT

7. 发明专利

JP2003327951A Photo-setting resin composition for sealing material 审中-公开
标题翻译：用于密封材料的光固化树脂组合物
公开(公告)号：JP2003327951A
公开(公告)日：2003-11-19
申请号：JP2002135756
申请日：2002-05-10
申请人： Mitsui Chemicals Inc , 三井化学株式会社
发明人： YAMAMOTO YUGO , TAKAMATSU YASUSHI , SAKATA YOSHIHIRO , KUWAZUKA TOSHIAKI
IPC分类号： G02F1/1339 , C08G59/20 , C08G65/18 , C09K3/10
摘要： PROBLEM TO BE SOLVED: To obtain a photo-setting resin composition for a sealing material having excellent photo-setting properties and good adhesion and moisture permeation resistance. SOLUTION: This photo-setting resin composition for the sealing material comprises (A) a compound having an oxetane ring, (B) a polycyclic compound having at least one epoxy group and (C) a photocationic initiator and has a viscosity at 25°C within the range of 0.01-300 Pas. The photo-setting resin composition comprises (G) a cationic polymerizable compound and (C) the photocationic initiator and has the viscosity at 25°C within the range of 0.01-300 Pas. A cured product has 50-200 N/mm 2.5 film stiffness strength. COPYRIGHT: (C)2004,JPO
摘要翻译：要解决的问题：获得具有优异的光固化性和良好的粘合性和耐湿透性的密封材料的光固化树脂组合物。解决方案：这种用于密封材料的光固化树脂组合物包括（A）具有氧杂环丁烷环的化合物，（B）具有至少一个环氧基的多环化合物和（C）光阳离子引发剂，并且在 25°C，范围为0.01-300 Pas。光固性树脂组合物包含（G）阳离子可聚合化合物和（C）光阳离子引发剂，并且在25℃下的粘度在0.01-300Pa·s的范围内。固化产品具有50-200N / mm 2.5 膜刚度强度。版权所有（C）2004，JPO

8. 发明专利

JP2008063298A Imide oligomer and method for producing the same 审中-公开
标题翻译：其它低分子及其制备方法
公开(公告)号：JP2008063298A
公开(公告)日：2008-03-21
申请号：JP2006244947
申请日：2006-09-11
申请人： Mitsui Chemicals Inc , 三井化学株式会社
发明人： TORIIDA MASAHIRO , SAKATA YOSHIHIRO , OKAZAKI MASAKI , ONISHI HITOSHI , YAMASHITA WATARU
IPC分类号： C07D403/14 , C07D487/04 , C08G73/10
摘要： PROBLEM TO BE SOLVED: To provide a new imide oligomer having high heat resistance and being hardly volatilized even when the imide oligomer is heated singly or in the state of a mixture with a polyamic acid, a polyimide, an organic solvent or the like; and to provide a method for producing the imide oligomer.
SOLUTION: The imide oligomer is represented by general formula (1). For example, oxydiphthalic dianhydride and pyromellitic dianhydride as a tetracarboxylic acid, maleic anhydride and nadic anhydride as a dicarboxylic acid, and 1,3-bis(3-aminophenoxy)benzene or the like as a diamine are used as starting materials for the production.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：即使当酰亚胺低聚物单独加热或与聚酰胺酸，聚酰亚胺，有机溶剂或混合物的混合物的状态下，提供具有高耐热性并且几乎不挥发的新型酰亚胺低聚物喜欢; 并提供了制备酰亚胺低聚物的方法。解决方案：酰亚胺低聚物由通式（1）表示。例如，作为四羧酸的氧联二邻苯二甲酸二酐和均苯四酸二酐，作为二羧酸的马来酸酐和纳迪克酸酐以及作为二胺的1,3-双（3-氨基苯氧基）苯等用作生产的原料。版权所有（C）2008，JPO＆INPIT

9. 发明公开

KR20180022879A 리튬 이온 이차 전지의 음극용의 합재 페이스트, 리튬 이온 이차 전지용의 음극, 리튬 이온 이차 전지용의 음극의 제조 방법 및 리튬 이온 이차 전지 审中-公开
标题翻译：负电极的锂离子层压材料膏的二次电池，锂离子二次电池用负极，一种制造锂离子二次电池和锂离子二次电池的负极的方法
公开(公告)号：KR20180022879A
公开(公告)日：2018-03-06
申请号：KR20187002576
申请日：2016-08-03
申请人： MITSUI CHEMICALS INC
发明人： NISHIURA KATSUNORI , SARUYAMA MASAKI , SAKATA YOSHIHIRO , ONISHI HITOSHI , EDA AKIRA , FANG NAN
IPC分类号： H01M4/131 , H01M4/04 , H01M4/133 , H01M4/1391 , H01M4/1393 , H01M4/36 , H01M4/62 , H01M10/0525
CPC分类号： H01M4/13 , H01M4/133 , H01M4/139 , H01M4/1393 , H01M4/36 , H01M4/48 , H01M4/62
摘要： 본발명은, 체적변화에의한사이클열화가생기기어렵고, 또한충전시의폴리이미드의환원에의한초회충방전효율의저하가생기기어려운리튬이온이차전지용음극을제조하기위한합재페이스트를제공하는것을목적으로한다. 상기목적은, 다이아민화합물과테트라카복실산이무수물로부터얻어지는폴리아마이드산및/또는대응하는폴리이미드를포함하고, 상기다이아민화합물이, 하기화학식(I) 또는 (II)로표시되는다이아민을포함하는바인더수지용조성물과, SiO(0.5≤x≤1.5)로표시되는규소산화물및 탄소입자를함유하는음극활물질을포함하는, 리튬이온이차전지음극용합재페이스트에의해해결된다.
摘要翻译：本发明是难以引起体积变化的循环劣化，并且其目的在于提供一种用于第二制造的层压材料糊在充电期间发生蛔虫通过还原聚酰亚胺的放电效率的困难锂离子二次电池负极的劣化的。上述目的是，二胺化合物和四羧酸包括被从酐得到的聚酰胺酸和/或相应的聚酰亚胺，并以所述二胺化合物，其包含由通式（I）表示的或式（II）的二胺并且，含有由SiO（0.5＆lt; x＆lt; 1.5）表示的氧化硅和碳粒子的负极活性物质，其中，该组合物为粘合剂树脂。

10. 发明专利

DE69423321D1 未知
公开(公告)号：DE69423321D1
公开(公告)日：2000-04-13
申请号：DE69423321
申请日：1994-11-22
申请人： MITSUI CHEMICALS INC
发明人： OKAWA YUICHI , YAMAGUCHI AKIHIRO , SAKATA YOSHIHIRO , YAMASHITA WATARU , IIYAMA KATSUAKI , TAMAI SHOJI
IPC分类号： C08G73/10 , C08K7/02 , C08L79/08
摘要： The present invention relates to an extremely fatigue-resistant polyimide resin composition comprising 100 parts by weight of polyimide having from 0.5 (exclusive) to 1.0 (inclusive) mole ratio of recurring structural units represented by the formula (1) and from 0 (inclusive) to 0.5 (exclusive) mole ratio of recurring structural units represented by the formula (2) : wherein X is in the formulas (1) and (2), and having an inherent viscosity of 0.45 d l /g or more ; and 5 SIMILAR 65 parts by weight of a carbon fiber, glass fiber, aromatic polyamide fiber and/or potassium titanate fiber, and an injection molded article made from the polyimide resin composition.

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