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    • 2. 发明授权
    • Light guide and line illuminating device
    • 导光和线路照明装置
    • US06783254B2
    • 2004-08-31
    • US09794736
    • 2001-02-27
    • Kozo FujinoVladimir Victrovich SerikovShinji KawamotoMasafumi Taguchi
    • Kozo FujinoVladimir Victrovich SerikovShinji KawamotoMasafumi Taguchi
    • F21V704
    • G02B6/0038G02B2006/0098H04N1/02815H04N1/02835H04N1/02885H04N1/0289H04N1/0315
    • A light guide 1 is provided at the reverse side thereof with triangular uneven surfaces 1b at a predetermined pitch. The uneven surfaces 1b are integrally formed with the light guide 1 when the latter 1 is injection-molded. Incident light from a light incident plane is caused to be scattered at uneven surfaces 1b within the light guide and to spread in a main scanning direction. The light scattered is emitted from an emission plane. Intensity of light in the main scattering direction can be made uniform by lengthening the uneven surfaces 1b as the uneven surfaces extend from the light incident plane. A position where the light intensity becomes maximum in a sub-scanning direction can be changed by adjusting an angle between the ridgeline of the uneven surfaces 1b and the sub-scanning direction, and distributed characteristics of the light intensity in the sub-scanning direction can be also changed.
    • 导光体1的背面以规定的间距设置有三角形的凹凸面1b。 当后者1注射成型时,不平坦表面1b与导光体1一体地形成。 使来自光入射面的入射光在导光体内的不均匀表面1b处散射并沿主扫描方向扩散。 散射的光从发射平面发射。 通过随着不平坦表面从光入射面延伸而延长不平坦表面1b,可以使主散射方向的光强度均匀。 可以通过调整不平坦面1b的棱线与副扫描方向之间的角度来改变副扫描方向上的光强度变得最大的位置,并且可以通过调整副扫描方向上的光强度的分布特性 也改变了。