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    • 3. 发明授权
    • Semiconductor photocathode
    • 半导体光电阴极
    • US06917058B2
    • 2005-07-12
    • US10433060
    • 2001-12-18
    • Minoru NiigakiToru HirohataHirofumi KanKuniyoshi Mori
    • Minoru NiigakiToru HirohataHirofumi KanKuniyoshi Mori
    • H01J1/34H01J29/38H01J31/50H01J40/06H01L29/24
    • H01J1/34H01J2201/3423
    • In the case of a thick light-absorbing layer 2, a phenomenon of a decrease in the time resolution occurs. However, when the thickness of the light-absorbing layer 2 is limited, a portion of low electron concentration in one electron group is cut out, and hence overlap regions of adjacent electron concentration distributions decrease. Therefore, by shortening the transit time necessary for the passage of electrons, regions of overlapping electron distributions due to diffusion can also be suppressed. Furthermore, the strength of an electric field within a light-absorbing layer can be increased by thinning the light-absorbing layer. Therefore, the time resolution of infrared rays can be remarkably improved by a synergistic action of these effects. If it is assumed that the time resolution is 40 ps (picoseconds), for example, when the thickness of a light-absorbing layer is 1.3 μm which is nearly equal to the wavelength of infrared, then a possible time resolution is 7.5 ps when this thickness is 0.19 μm.
    • 在厚光吸收层2的情况下,会发生时间分辨率降低的现象。 然而,当光吸收层2的厚度受限时,一个电子组中的低电子浓度部分被切掉,因此相邻电子浓度分布的重叠区域减小。 因此,通过缩短电子通过所需的通行时间,也可以抑制由扩散引起的重叠电子分布的区域。 此外,可以通过使光吸收层变薄来增加光吸收层内的电场强度。 因此,通过这些效果的协同作用,可以显着提高红外线的时间分辨率。 如果假设时间分辨率为40ps(皮秒),例如,当光吸收层的厚度为1.3μm,几乎等于红外线的波长时,则当这样的时间分辨率为7.5ps时 厚度为0.19毫米。
    • 4. 发明授权
    • Photocathode comprising a plurality of openings on an electron emission layer
    • 光电阴极包括在电子发射层上的多个开口
    • US07816866B2
    • 2010-10-19
    • US11585936
    • 2006-10-25
    • Kazutoshi NakajimaMinoru NiigakiTomoko MochizukiToru Hirohata
    • Kazutoshi NakajimaMinoru NiigakiTomoko MochizukiToru Hirohata
    • H01J40/06H01J37/08G21K5/10H01L29/12
    • H01J1/34H01J2201/3423
    • A semiconductor photocathode 1 includes: a transparent substrate 11; a first electrode 13, formed on the transparent substrate 11 and enabling passage of light that has been transmitted through the transparent substrate 11; a window layer 14, formed on the first electrode 13 and formed of a semiconductor material with a thickness of no less than 10 nm and no more than 200 nm; a light absorbing layer 15, formed on the window layer 14, formed of a semiconductor material that is lattice matched to the window layer 14, is narrower in energy band gap than the window layer 14, and in which photoelectrons are excited in response to the incidence of light; an electron emission layer 16, formed on the light absorbing layer 15, formed of a semiconductor material that is lattice matched to the light absorbing layer 15, and emitting the photoelectrons excited in the light absorbing layer 15 to the exterior from a surface; and a second electrode 18, formed on the electron emission layer.
    • 半导体光电阴极1包括:透明基板11; 第一电极13,其形成在透明基板11上,并能透过透明基板11的光通过; 窗口层14,其形成在第一电极13上并且由不小于10nm且不大于200nm的厚度的半导体材料形成; 形成在与窗口层14格子匹配的半导体材料的窗口层14上的光吸收层15的能带隙比窗口层14更窄,并且其中光电子响应于 光的发生; 由与光吸收层15晶格匹配的半导体材料形成的光吸收层15上形成的电子发射层16,并且将从光吸收层15激发的光电子从表面发射到外部; 以及形成在电子发射层上的第二电极18。
    • 10. 发明申请
    • Photocathode
    • 光电阴极
    • US20070096648A1
    • 2007-05-03
    • US11585936
    • 2006-10-25
    • Kazutoshi NakajimaMinoru NiigakiTomoko MochizukiToru Hirohata
    • Kazutoshi NakajimaMinoru NiigakiTomoko MochizukiToru Hirohata
    • H01J40/06
    • H01J1/34H01J2201/3423
    • A semiconductor photocathode 1 includes: a transparent substrate 11; a first electrode 13, formed on the transparent substrate 11 and enabling passage of light that has been transmitted through the transparent substrate 11; a window layer 14, formed on the first electrode 13 and formed of a semiconductor material with a thickness of no less than 10 nm and no more than 200 nm; a light absorbing layer 15, formed on the window layer 14, formed of a semiconductor material that is lattice matched to the window layer 14, is narrower in energy band gap than the window layer 14, and in which photoelectrons are excited in response to the incidence of light; an electron emission layer 16, formed on the light absorbing layer 15, formed of a semiconductor material that is lattice matched to the light absorbing layer 15, and emitting the photoelectrons excited in the light absorbing layer 15 to the exterior from a surface; and a second electrode 18, formed on the electron emission layer.
    • 半导体光电阴极1包括:透明基板11; 第一电极13,其形成在透明基板11上,并能透过透明基板11的光通过; 窗口层14,其形成在第一电极13上并且由不小于10nm且不大于200nm的厚度的半导体材料形成; 形成在与窗口层14格子匹配的半导体材料的窗口层14上的光吸收层15的能带隙比窗口层14更窄,并且其中光电子响应于 光的发生; 由与光吸收层15晶格匹配的半导体材料形成的光吸收层15上形成的电子发射层16,并且将从光吸收层15激发的光电子从表面发射到外部; 以及形成在电子发射层上的第二电极18。