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    • 1. 发明授权
    • Physical quantity sensor having multiple through holes
    • 物理量传感器具有多个通孔
    • US07337670B2
    • 2008-03-04
    • US11649254
    • 2007-01-04
    • Minoru MurataKenichi YokoyamaMakoto Asai
    • Minoru MurataKenichi YokoyamaMakoto Asai
    • G01P15/00
    • G01C19/5719G01P15/125
    • A semiconductor physical quantity sensor includes: a substrate; a semiconductor layer supported on the substrate; a trench disposed in the semiconductor layer; and a movable portion disposed in the semiconductor layer and separated from the substrate by the trench. The movable portion includes a plurality of through-holes, each of which penetrates the semiconductor layer in a thickness direction. The movable portion is capable of displacing on the basis of a physical quantity applied to the movable portion so that the physical quantity is detected by a displacement of the movable portion. The movable portion has a junction disposed among the through-holes. The junction has a trifurcate shape.
    • 半导体物理量传感器包括:基板; 支撑在基板上的半导体层; 设置在所述半导体层中的沟槽; 以及可移动部分,其设置在所述半导体层中并且通过所述沟槽与所述衬底分离。 可动部包括在厚度方向上贯穿半导体层的多个贯通孔。 可移动部分能够基于施加到可移动部分的物理量来移位,使得通过可移动部分的位移来检测物理量。 可动部分具有设置在通孔中的接合部。 交界处有三叉形。
    • 10. 发明申请
    • Radiation-sensitive resin composition
    • 辐射敏感树脂组合物
    • US20050095527A1
    • 2005-05-05
    • US10679367
    • 2003-10-07
    • Kenichi YokoyamaFumihisa MiyajimaTomoki NagaiEiji Yoneda
    • Kenichi YokoyamaFumihisa MiyajimaTomoki NagaiEiji Yoneda
    • G03F7/004G03C1/76G03F7/038G03F7/039H01L21/027
    • G03F7/0382G03F7/0392Y10S430/106Y10S430/111Y10S430/115Y10S430/12Y10S430/122
    • A positive tone radiation-sensitive resin composition comprising (A) a 1-substituted imidazole, (B) a photoacid generator, and (C-a) a resin protected by an acid-dissociable group, insoluble or scarcely soluble in alkali, but becoming soluble in alkali when the acid-dissociable group dissociates or (C-b) an alkali-soluble resin and an alkali solubility controller, and a negative tone radiation-sensitive resin composition comprising (A), (B), (D) an alkali-soluble resin, and (E) a compound that can crosslink the alkali-soluble resin in the presence of an acid. The radiation-sensitive resin composition of the present invention is a chemically amplified resist exhibiting high resolution and high storage stability as a composition, and suitable for microfabrication sensible to active radiations, for example, ultraviolet rays such as g-lines and i-lines, deep ultraviolet rays represented by a KrF excimer laser, ArF excimer laser, F2 excimer laser, and EUV excimer laser, and electron beams.
    • 一种正色散辐射敏感性树脂组合物,其包含(A)1-取代咪唑,(B)光酸产生剂和(Ca)由酸解离基团保护的树脂,其不溶或几乎不溶于碱,但可溶于 (Cb)碱溶性树脂和碱溶性控制剂,以及包含(A),(B),(D)碱溶性树脂的负色调辐射敏感性树脂组合物, 和(E)可在酸存在下使碱溶性树脂交联的化合物。 本发明的放射线敏感性树脂组合物是作为组合物具有高分辨率和高储存稳定性的化学放大型抗蚀剂,适用于对活性辐射敏感的微细加工,例如,γ-线和i线等紫外线, 由KrF准分子激光器,ArF准分子激光器,F 2激子和EUV准分子激光器表示的深紫外线以及电子束。