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1. 发明授权

US07507305B2 Wear-resistant copper-based alloy 有权
标题翻译：耐磨铜基合金
公开(公告)号：US07507305B2
公开(公告)日：2009-03-24
申请号：US10580463
申请日：2004-12-10
申请人： Minoru Kawasaki , Tadashi Oshima , Takao Kobayashi , Kazuyuki Nakanishi , Hideo Tachikawa
发明人： Minoru Kawasaki , Tadashi Oshima , Takao Kobayashi , Kazuyuki Nakanishi , Hideo Tachikawa
IPC分类号： C22C9/06
CPC分类号： C22C9/06 , C22C9/00
摘要： This aims to provide a wear-resistant copper-based alloy, which is advantages in not only enhancing wear resistance in a high temperature range but also enhancing crack resistance and machinability and which is especially suitable for forming a cladding layer. The wear-resistant copper-based alloy comprises, by weight, 4.7 to 22.0% nickel, 0.5 to 5.0% silicon, 2.7 to 22.0% iron, 1.0 to 15.0% chromium, 0.01 to 2.00% cobalt, 2.7 to 22.0% one or more of tantalum, titanium, zirconium and hafnium, and the balance of copper with inevitable impurities.
摘要翻译：本发明的目的在于提供一种耐磨铜基合金，其优点在于不仅在高温范围内提高耐磨性，而且提高抗裂性和切削性，特别适合于形成包覆层。耐磨铜基合金按重量计含有4.7〜22.0％的镍，0.5〜5.0％的硅，2.7〜22.0％的铁，1.0〜15.0％的铬，0.01〜2.00％的钴，2.7〜22.0％的一种或多种的钽，钛，锆和铪，余量为铜与不可避免的杂质。

2. 发明申请

US20070125458A1 Wear-resistant copper-based alloy 有权
标题翻译：耐磨铜基合金
公开(公告)号：US20070125458A1
公开(公告)日：2007-06-07
申请号：US10580463
申请日：2004-12-10
申请人： Minoru Kawasaki , Tadashi Oshima , Takao Kobayashi , Kazuyuki Nakanishi , Hideo Tachikawa
发明人： Minoru Kawasaki , Tadashi Oshima , Takao Kobayashi , Kazuyuki Nakanishi , Hideo Tachikawa
IPC分类号： C22C9/06 , C22C9/00
CPC分类号： C22C9/06 , C22C9/00
摘要： This aims to provide a wear-resistant copper-based alloy, which is advantages in not only enhancing wear resistance in a high temperature range but also enhancing crack resistance and machinability and which is especially suitable for forming a cladding layer. The wear-resistant copper-based alloy comprises, by weight, 4.7 to 22.0% nickel, 0.5 to 5.0% silicon, 2.7 to 22.0% iron, 1.0 to 15.0% chromium, 0.01 to 2.00% cobalt, 2.7 to 22.0% one or more of tantalum, titanium, zirconium and hafnium, and the balance of copper with inevitable impurities.
摘要翻译：本发明的目的在于提供一种耐磨铜基合金，其优点在于不仅在高温范围内提高耐磨性，而且提高抗裂性和切削性，特别适合于形成包覆层。耐磨铜基合金按重量计含有4.7〜22.0％的镍，0.5〜5.0％的硅，2.7〜22.0％的铁，1.0〜15.0％的铬，0.01〜2.00％的钴，2.7〜22.0％的一种或多种的钽，钛，锆和铪，余量为铜与不可避免的杂质。

3. 发明授权

US07833626B2 Amorphous carbon film, process for forming the same, and high wear-resistant sliding member with amorphous carbon film provided 有权
标题翻译：非晶碳膜，其形成方法和具有非晶碳膜的高耐磨滑动构件
公开(公告)号：US07833626B2
公开(公告)日：2010-11-16
申请号：US11720154
申请日：2005-11-24
申请人： Takashi Iseki , Hideo Tachikawa , Hiroyuki Mori , Kazuyuki Nakanishi , Munehisa Matsui , Shintaro Igarashi , Fumio Shimizu , Yoshinari Tsuchiya , Tadashi Oshima
发明人： Takashi Iseki , Hideo Tachikawa , Hiroyuki Mori , Kazuyuki Nakanishi , Munehisa Matsui , Shintaro Igarashi , Fumio Shimizu , Yoshinari Tsuchiya , Tadashi Oshima
IPC分类号： B32B9/00 , H05H1/24
CPC分类号： C23C16/26 , Y10T428/30
摘要： An amorphous carbon film includes carbon as a major component, and silicon in an amount of from 0.1 atomic % or more to 10 atomic % or less when the entire amorphous carbon film is taken as 100 atomic %. The carbon is composed of carbon having an sp2 hybrid orbital in an amount of from 60 atomic % or more to 90 atomic % or less when the entire carbon amount is taken as 100 atomic %. Also disclosed is a process for producing the amorphous carbon film.
摘要翻译：当非晶碳膜的整体为100原子％时，无定形碳膜以碳为主成分，硅为0.1原子％以上且10原子％以下。当全部碳量为100原子％时，碳由具有60原子％以上至90原子％以下的量的sp2混合轨道的碳构成。还公开了一种制备无定形碳膜的方法。

4. 发明授权

US07396735B2 Semiconductor element heat dissipating member, semiconductor device using same, and method for manufacturing same 失效
标题翻译：半导体元件散热构件，使用其的半导体装置及其制造方法
公开(公告)号：US07396735B2
公开(公告)日：2008-07-08
申请号：US10538222
申请日：2003-12-09
申请人： Kazuyuki Nakanishi , Tadashi Oshima , Hideo Hasegawa , Hiroyuki Mori , Hideo Tachikawa , Yukio Miyachi , Yasushi Yamada , Hiroyuki Ueda , Masayasu Ishiko
发明人： Kazuyuki Nakanishi , Tadashi Oshima , Hideo Hasegawa , Hiroyuki Mori , Hideo Tachikawa , Yukio Miyachi , Yasushi Yamada , Hiroyuki Ueda , Masayasu Ishiko
IPC分类号： H01L21/76
CPC分类号： H01L23/3732 , H01L2224/48091 , H01L2224/48247 , H01L2224/49109 , H01L2924/1305 , H01L2924/13055 , H01L2924/13091 , H01L2924/19107 , H01L2924/3025 , H01L2924/00014 , H01L2924/00
摘要： A semiconductor element heat dissipating member is provided which has excellent heat dissipation characteristics and adhesion characteristics and enables production of a semiconductor device at a low cost. A semiconductor device using the same, and a method of producing the same are also provided. The semiconductor element heat dissipating member has a conductive substrate and an electrically insulating amorphous carbon film containing hydrogen, and the electrically insulating amorphous carbon film is formed at least on a region of the conductive substrate on which region a semiconductor element is to be mounted.
摘要翻译：提供了具有优异的散热特性和粘合特性的半导体元件散热构件，并且能够以低成本制造半导体器件。还提供了使用该半导体器件的半导体器件及其制造方法。半导体元件散热构件具有导电基板和含有氢的电绝缘非晶碳膜，并且至少在导电基板的要安装半导体元件的区域的区域上形成电绝缘非晶碳膜。

5. 发明申请

US20080188383A1 Amorphous Carbon Film, Process For Forming the Same, and High Wear-Resistant Sliding Member With Amorphous Carbon Film Provided 有权
标题翻译：无定形碳膜，其形成方法和具有无定形碳膜的高耐磨滑动构件
公开(公告)号：US20080188383A1
公开(公告)日：2008-08-07
申请号：US11720154
申请日：2005-11-24
申请人： Takashi Iseki , Hideo Tachikawa , Hiroyuki Mori , Kazuyuki Nakanishi , Munehisa Matsui , Shintaro Igarashi , Fumio Shimizu , Yoshinari Tsuchiya , Tadashi Oshima
发明人： Takashi Iseki , Hideo Tachikawa , Hiroyuki Mori , Kazuyuki Nakanishi , Munehisa Matsui , Shintaro Igarashi , Fumio Shimizu , Yoshinari Tsuchiya , Tadashi Oshima
IPC分类号： F16C33/20 , H05H1/24
CPC分类号： C23C16/26 , Y10T428/30
摘要： An amorphous carbon film includes carbon as a major component, and silicon in an amount of from 0.1 atomic % or more to 10 atomic % or less when the entire amorphous carbon film is taken as 100 atomic %. The carbon is composed of carbon having an sp2 hybrid orbital in an amount of from 60 atomic % or more to 90 atomic % or less when the entire carbon amount is taken as 100 atomic %. Also disclosed is a process for producing the amorphous carbon film.
摘要翻译：当非晶碳膜的整体为100原子％时，无定形碳膜以碳为主成分，硅为0.1原子％以上且10原子％以下。当全部碳量为100原子％时，碳由具有60原子％以上至90原子％以下的量的sp 2 SUB混合轨道的碳构成。还公开了一种制备无定形碳膜的方法。

6. 发明申请

US20060057768A1 Semiconductor element heat dissipating member, semiconductor device using same and manufacturing same 失效
标题翻译：半导体元件散热构件，使用其的半导体器件及其制造
公开(公告)号：US20060057768A1
公开(公告)日：2006-03-16
申请号：US10538222
申请日：2003-12-09
申请人： Kazuyuki Nakanishi , Tadashi Oshima , Hideo Hasegawa , Hiroyuki Mori , Hideo Tachikawa , Yukio Miyachi , Yasushi Yamada , Hiroyuki Ueda , Masayasu Ishiko
发明人： Kazuyuki Nakanishi , Tadashi Oshima , Hideo Hasegawa , Hiroyuki Mori , Hideo Tachikawa , Yukio Miyachi , Yasushi Yamada , Hiroyuki Ueda , Masayasu Ishiko
IPC分类号： H01L21/44
CPC分类号： H01L23/3732 , H01L2224/48091 , H01L2224/48247 , H01L2224/49109 , H01L2924/1305 , H01L2924/13055 , H01L2924/13091 , H01L2924/19107 , H01L2924/3025 , H01L2924/00014 , H01L2924/00
摘要： A semiconductor element heat dissipating member is provided which has excellent heat dissipation characteristics and adhesion characteristics and enables production of a semiconductor device at a low cost. A semiconductor device using the same, and a method of producing the same are also provided. The semiconductor element heat dissipating member has a conductive substrate and an electrically insulating amorphous carbon film containing hydrogen, and the electrically insulating amorphous carbon film is formed at least on a region of the conductive substrate on which region a semiconductor element is to be mounted.
摘要翻译：提供了具有优异的散热特性和粘合特性的半导体元件散热构件，并且能够以低成本制造半导体器件。还提供了使用该半导体器件的半导体器件及其制造方法。半导体元件散热构件具有导电基板和含有氢的电绝缘非晶碳膜，并且至少在导电基板的要安装半导体元件的区域的区域上形成电绝缘非晶碳膜。

7. 发明授权

US07455824B2 Amorphous carbon, amorphous-carbon coated member, and process for forming amorphous carbon film 有权
标题翻译：无定形碳，无定形碳涂层构件和形成无定形碳膜的方法
公开(公告)号：US07455824B2
公开(公告)日：2008-11-25
申请号：US11002125
申请日：2004-12-03
申请人： Kazuyuki Nakanishi , Tadashi Oshima , Hideo Hasegawa , Hiroyuki Mori , Takashi Iseki , Hideo Tachikawa , Munehisa Matsui
发明人： Kazuyuki Nakanishi , Tadashi Oshima , Hideo Hasegawa , Hiroyuki Mori , Takashi Iseki , Hideo Tachikawa , Munehisa Matsui
IPC分类号： B32B9/00
CPC分类号： C23C16/26 , Y10T428/30
摘要： To provide a soft amorphous carbon exhibiting a low elastic modulus, an amorphous-carbon coated member provided with a coated film comprising the amorphous carbon, and a process for forming an amorphous carbon film. The amorphous carbon comprises carbon as a major component and hydrogen in an amount of from more than 30 atomic % to 60 atomic % or less, and exhibits an elastic modulus of from 40 or more to 150 GPa or less. Moreover, the amorphous-carbon coated member comprises a conductive substrate, and a coated film fixed on at least a part of a surface of the substrate and composed of the amorphous carbon. In addition, in a process for forming the amorphous-carbon coated film, an amorphous carbon film is formed on a surface of conductive substrates by a plasma CVD method. Not only a plurality of the substrates are disposed on a substrate holder, which is disposed in a film-forming furnace and is connected with a negative electrode, in such a state that they face to each other, but also a processing gas pressure and a plasma power source are operated so as to overlap negative glows of the neighboring two substrates.
摘要翻译：为了提供具有低弹性模量的软无定形碳，设置有包含无定形碳的涂膜的非晶碳涂覆部件以及形成非晶碳膜的方法。无定形碳包含碳为主要成分，氢为超过30原子％至60原子％以下的量，弹性模量为40以上且150GPa以下。此外，无定形碳涂覆部件包括导电基板和固定在基板表面的至少一部分上并由非晶碳构成的涂膜。另外，在形成非晶碳涂膜的方法中，通过等离子体CVD法在导电性基板的表面上形成无定形碳膜。不仅多个基板被设置在基板保持器上，所述基板保持器设置在成膜炉中并且与负极连接，并且彼此相对的状态，而且处理气体压力和等离子体动力源被操作成与相邻两个基板的负发光重叠。

8. 发明授权

US07404866B2 Sliding member and method for manufacture thereof 失效
标题翻译：滑动构件及其制造方法
公开(公告)号：US07404866B2
公开(公告)日：2008-07-29
申请号：US10480653
申请日：2002-06-26
申请人： Kazuyuki Nakanishi , Hideo Tachikawa , Hiroyuki Mori , Tadashi Oshima
发明人： Kazuyuki Nakanishi , Hideo Tachikawa , Hiroyuki Mori , Tadashi Oshima
IPC分类号： C22C38/12 , C22C9/00 , C22C21/00 , C22C47/16
CPC分类号： F16H57/041 , B22F7/08 , B22F2999/00 , C23C4/04 , C23C4/06 , C23C4/08 , C23C4/12 , C23C8/02 , C23C24/08 , F16C33/06 , F16C33/12 , F16C2204/20 , F16C2204/60 , B22F3/115
摘要： A sliding member includes a superficial portion forming a sliding surface. The superficial portion includes an oxygen-containing alloy containing at least one metallic element selected from the group consisting of molybdenum and tungsten in an amount of from 2 to 80% by weight; and oxygen in an amount of from 0.5 to 15% by weight. The sliding member sustains lubricating characteristics given to the sliding surface over a long period of time to maintain a low friction coefficient and durability.
摘要翻译：滑动构件包括形成滑动表面的表面部分。表面部分包括含有至少一种金属元素的含氧合金，其含量为2-80重量％的钼和钨组成的组; 和氧浓度为0.5〜15重量％。滑动构件在长时间内保持给予滑动面的润滑特性，以保持低摩擦系数和耐久性。

9. 发明申请

US20050142361A1 Amorphous carbon, amorphous-carbon coated member, and process for forming amorphous carbon film 有权
标题翻译：无定形碳，无定形碳涂层构件和形成无定形碳膜的方法
公开(公告)号：US20050142361A1
公开(公告)日：2005-06-30
申请号：US11002125
申请日：2004-12-03
申请人： Kazuyuki Nakanishi , Tadashi Oshima , Hideo Hasegawa , Hiroyuki Mori , Takashi Iseki , Hideo Tachikawa , Munehisa Matsui
发明人： Kazuyuki Nakanishi , Tadashi Oshima , Hideo Hasegawa , Hiroyuki Mori , Takashi Iseki , Hideo Tachikawa , Munehisa Matsui
IPC分类号： C01B31/02 , B32B9/00 , C23C16/26 , H01L21/205 , H05H1/24
CPC分类号： C23C16/26 , Y10T428/30
摘要： To provide a soft amorphous carbon exhibiting a low elastic modulus, an amorphous-carbon coated member provided with a coated film comprising the amorphous carbon, and a process for forming an amorphous carbon film. The amorphous carbon comprises carbon as a major component and hydrogen in an amount of from more than 30 atomic % to 60 atomic % or less, and exhibits an elastic modulus of from 40 or more to 150 GPa or less. Moreover, the amorphous-carbon coated member comprises a conductive substrate, and a coated film fixed on at least a part of a surface of the substrate and composed of the amorphous carbon. In addition, in a process for forming the amorphous-carbon coated film, an amorphous carbon film is formed on a surface of conductive substrates by a plasma CVD method. Not only a plurality of the substrates are disposed on a substrate holder, which is disposed in a film-forming furnace and is connected with a negative electrode, in such a state that they face to each other, but also a processing gas pressure and a plasma power source are operated so as to overlap negative glows of the neighboring two substrates.
摘要翻译：为了提供具有低弹性模量的软无定形碳，设置有包含无定形碳的涂膜的非晶碳涂覆部件以及形成非晶碳膜的方法。无定形碳包含碳为主要成分，氢为超过30原子％至60原子％以下的量，弹性模量为40以上且150GPa以下。此外，无定形碳涂覆部件包括导电基板和固定在基板表面的至少一部分上并由非晶碳构成的涂膜。另外，在形成非晶碳涂膜的方法中，通过等离子体CVD法在导电性基板的表面上形成无定形碳膜。不仅多个基板被设置在基板保持器上，所述基板保持器设置在成膜炉中并且与负极连接，并且彼此相对的状态，而且处理气体压力和等离子体动力源被操作成与相邻两个基板的负发光重叠。

10. 发明授权

US07721642B2 Sliding member 有权
标题翻译：滑动构件
公开(公告)号：US07721642B2
公开(公告)日：2010-05-25
申请号：US12021673
申请日：2008-01-29
申请人： Takahiro Sugioka , Takayuki Kato , Shuichi Yasuda , Atsushi Saito , Masahiro Suzuki , Hitotoshi Murase , Takashi Iseki , Hideo Tachikawa , Kazuyuki Nakanishi , Takao Kobayashi , Ken-ichi Suzuki
发明人： Takahiro Sugioka , Takayuki Kato , Shuichi Yasuda , Atsushi Saito , Masahiro Suzuki , Hitotoshi Murase , Takashi Iseki , Hideo Tachikawa , Kazuyuki Nakanishi , Takao Kobayashi , Ken-ichi Suzuki
IPC分类号： F01B31/10
CPC分类号： F04B27/1054 , F05C2203/0817 , F05C2203/0882 , F05C2225/00 , F05C2251/14 , F05C2253/12 , F16C33/201
摘要： To provide a sliding member that exhibits excellent durability and is free of lead. A swash plate for a compressor as the sliding member of the invention contains a base material having on the surface thereof a sliding layer constituting at least a sliding surface, on which shoes slide. The sliding layer contains a first layer that contains an amorphous hard carbon (diamond-like carbon) film containing Si (DLC-Si film) and is formed on the base material, and a second layer that is formed on the first layer and contains polyamideimide (PAI) containing a solid lubricant such as MoS2.
摘要翻译：提供具有优异耐久性且不含铅的滑动构件。作为本发明的滑动构件的压缩机的斜盘包含基材，其表面上具有至少构成滑动面的滑动层，滑块滑动。滑动层含有含有Si（DLC-Si膜）的无定形硬碳（类金刚石碳）薄膜并形成在基材上的第一层，第二层形成在第一层上并含有聚酰胺酰亚胺（PAI），其包含固体润滑剂如MoS2。

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