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    • 4. 发明授权
    • Multiple elliptical ball plasma apparatus
    • 多椭圆球等离子体装置
    • US07128805B2
    • 2006-10-31
    • US10640740
    • 2003-08-13
    • Wen-Liang HuangTing-Wei HuangJau-Chyn HuangChing-Sung HsiaoJu-Chia Kuo
    • Wen-Liang HuangTing-Wei HuangJau-Chyn HuangChing-Sung HsiaoJu-Chia Kuo
    • H01L21/306C23C16/00
    • H01J37/32247H01J37/32192H05H1/46
    • A plasma generating device, has a plurality of cavities shaped like half-ellipsoids, a plasma cavity, and microwave sources. The present invention takes advantage of geometrical properties of the propagation of electromagnetic waves by enclosing an electromagnetic field in the microwave range in overlapping cavities that together are shaped like a plurality of half ellipsoids. Each of the cavities has a first focus and a second focus, with the first foci of the cavities place close to each other. Microwaves entering the cavities at the second foci propagate inside the cavity and are focused at the first foci. The area around the first foci of both half ellipsoids forms a plasma cavity, providing a large volume filled with a microwave field. Thereby an increased volume of an electromagnetic field and thus of a plasma is achieved.
    • 等离子体产生装置具有多个形状为半椭圆形的空腔,等离子体腔和微波源。 本发明通过将微波范围内的电磁场包围在一起成形为多个半椭圆的重叠空腔中,利用电磁波传播的几何特性。 每个空腔具有第一焦点和第二焦点,空腔的第一焦点彼此靠近。 进入第二灶处的腔的微波在空腔内传播并聚焦在第一灶。 两个半椭圆体的第一焦点周围的区域形成等离子体空腔,提供充满微波场的大体积。 从而实现了电磁场的增加,从而实现了等离子体的增加。
    • 5. 发明授权
    • Microwave plasma processing apparatus
    • 微波等离子体处理装置
    • US06908530B2
    • 2005-06-21
    • US10331479
    • 2002-12-31
    • Chih-Yung HuangTing-Wei HuangChing-Sung Hsiao
    • Chih-Yung HuangTing-Wei HuangChing-Sung Hsiao
    • H01J37/32C23C16/00H01L21/00
    • H01J37/32229H01J37/32192
    • A microwave plasma processing apparatus is provided, which includes a microwave generator, a plasma promoter, a microwave plasma processing chamber, a vacuum gas-discharging chamber, and a loading elevator, wherein microwave produced from the microwave generator is gradually transformed into a desirable mode through the use of a microwave coupling resonator, and processing gas supplied by a gas supply system is evenly introduced via slantwise gas outlets of an annular gas distribution panel into the microwave processing chamber. The microwave is used to induce the processing gas to form a plasma sphere in the microwave plasma processing chamber; by reducing pressure in the microwave plasma processing chamber via the vacuum gas-discharging chamber, a vapor deposition process can be performed on a sample disposed on a sample holder of the loading elevator.
    • 提供了一种微波等离子体处理装置,其包括微波发生器,等离子体促进器,微波等离子体处理室,真空气体放电室和负载升降机,其中由微波发生器产生的微波逐渐转变为期望的模式 通过使用微波耦合谐振器,并且由气体供应系统供应的处理气体通过环形气体分配板的倾斜气体出口均匀地引入到微波处理室中。 微波用于诱导处理气体在微波等离子体处理室中形成等离子体球; 通过经由真空气体放电室减小微波等离子体处理室中的压力,可以对设置在装载电梯的样品架上的样品进行气相沉积处理。
    • 10. 发明授权
    • Enhanced plane light source
    • 增强平面光源
    • US07586253B2
    • 2009-09-08
    • US11417039
    • 2006-05-04
    • Yi-Ping LinJung-Yu LiChing-Sung Hsiao
    • Yi-Ping LinJung-Yu LiChing-Sung Hsiao
    • H01J1/62
    • H01J61/305C09K11/65H01J63/04
    • An enhanced plane light source has a luminescent layer independently disposed in each recess formed on a light-transmittable substrate, so that field emission electrons directly impact the luminescent layer to produce light, which is not shielded by the cathode. The enhanced plane light source also includes a substrate forming a bottom structure thereof. The bottom substrate has a metal reflection surface to increase the reflectivity and upgrade light-emitting efficiency and luminous intensity. The recesses on the light-transmittable substrate have an approximate semi-circular or semi-parabolic cross section to increase the high field region at the cathode and the effective luminescent area at the anode, so that the luminous intensity and evenness are also largely increased.
    • 增强平面光源具有独立地设置在形成在透光性基板上的每个凹部中的发光层,使得场发射电子直接冲击发光层以产生未被阴极屏蔽的光。 增强平面光源还包括形成其底部结构的基板。 底部基板具有金属反射面以增加反射率并提高发光效率和发光强度。 透光性基板上的凹部具有大致半圆形或半抛物面的截面,以增加阴极处的高场区域和阳极处的有效发光区域,使得发光强度和均匀性也大大增加。