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1. 发明授权

US08958078B2 Two-dimensional, position-sensitive sensor-based system for positioning object having six degrees of freedom in space 有权
标题翻译：用于定位物体的二维，位置敏感的基于传感器的系统具有六个自由度的空间
公开(公告)号：US08958078B2
公开(公告)日：2015-02-17
申请号：US14234870
申请日：2012-07-26
申请人： Ming Zhang , Yu Zhu , Zhao Liu , Jinchun Hu , Dengfeng Xu , Kaiming Yang , Wensheng Yin , Haihua Mu
发明人： Ming Zhang , Yu Zhu , Zhao Liu , Jinchun Hu , Dengfeng Xu , Kaiming Yang , Wensheng Yin , Haihua Mu
IPC分类号： G01B11/00 , G01B11/03 , G01B11/14 , G01C1/00 , G01C9/00 , G03F7/20
CPC分类号： G01B11/14 , G03F7/70775
摘要： A two-dimensional, position-sensitive sensor-based system for positioning an object having six degrees of freedom in space, used for positioning of a silicon table and mask table of a lithography machine. The system comprises mainly a semiconductor laser 1, an optical fiber collimator 2, optical fibers 3, 7, 10, and 13, an optical fiber splitter 4, filter plates 6, 9, and 12, three PSD sensors 5, 8, and 11, and a signal processing system. Laser emitted by the semiconductor laser 1 is irradiated onto the optical fiber collimator 2, then transmitted respectively via three paths, and received by the PSD sensors 5, 8, and 11 after having background light filtered out by the filter plates 6, 9, and 12, while the positions of laser spots on the three PSD sensors 5, 8, and 11 are processed by the signal processing system to acquire the position and orientation.
摘要翻译：一种二维，位置敏感的基于传感器的系统，用于定位具有六个自由度的物体，用于定位硅平台和光刻机的掩模台。该系统主要包括半导体激光器1，光纤准直器2，光纤3,7,10和13，光纤分路器4，滤光板6,9和12，三个PSD传感器5,8和11 ，以及信号处理系统。由半导体激光器1发射的激光照射到光纤准直器2上，然后分别通过三条路径传输，并且由背景光被过滤板6,9滤掉后由PSD传感器5,8和11接收，在图12中，三个PSD传感器5,8和11上的激光点的位置由信号处理系统处理以获取位置和方位。

2. 发明申请

US20140160495A1 TWO-DIMENSIONAL, POSITION-SENSITIVE SENSOR-BASED SYSTEM FOR POSITIONING OBJECT HAVING SIX DEGREES OF FREEDOM IN SPACE 有权
标题翻译：用于定位具有六个自由度空间的物体的二维，位置敏感传感器系统
公开(公告)号：US20140160495A1
公开(公告)日：2014-06-12
申请号：US14234870
申请日：2012-07-26
申请人： Ming Zhang , Yu Zhu , Zhao Liu , Jinchun Hu , Dengfeng Xu , Kaiming Yang , Wensheng Yin , Haihua Mu
发明人： Ming Zhang , Yu Zhu , Zhao Liu , Jinchun Hu , Dengfeng Xu , Kaiming Yang , Wensheng Yin , Haihua Mu
IPC分类号： G01B11/14
CPC分类号： G01B11/14 , G03F7/70775
摘要： A two-dimensional, position-sensitive sensor-based system for positioning an object having six degrees of freedom in space, used for positioning of a silicon table and mask table of a lithography machine. The system comprises mainly a semiconductor laser 1, an optical fiber collimator 2, optical fibers 3, 7, 10, and 13, an optical fiber splitter 4, filter plates 6, 9, and 12, three PSD sensors 5, 8, and 11, and a signal processing system. Laser emitted by the semiconductor laser 1 is irradiated onto the optical fiber collimator 2, then transmitted respectively via three paths, and received by the PSD sensors 5, 8, and 11 after having background light filtered out by the filter plates 6, 9, and 12, while the positions of laser spots on the three PSD sensors 5, 8, and 11 are processed by the signal processing system to acquire the position and orientation.
摘要翻译：一种二维，位置敏感的基于传感器的系统，用于定位具有六个自由度的物体，用于定位硅平台和光刻机的掩模台。该系统主要包括半导体激光器1，光纤准直器2，光纤3,7,10和13，光纤分路器4，滤光板6,9和12，三个PSD传感器5,8和11 ，以及信号处理系统。由半导体激光器1发射的激光照射到光纤准直器2上，然后分别通过三条路径传输，并且由背景光被过滤板6,9滤掉后由PSD传感器5,8和11接收，在图12中，三个PSD传感器5,8和11上的激光点的位置由信号处理系统处理以获取位置和方位。

3. 发明授权

US09455650B2 Two-dimensional locating method of motion platform based on magnetic steel array 有权
标题翻译：基于磁钢阵列的运动平台二维定位方法
公开(公告)号：US09455650B2
公开(公告)日：2016-09-27
申请号：US13522788
申请日：2011-01-18
申请人： Jinchun Hu , Yu Zhu , Jinsong Wang , Ming Zhang , Kai Liao , Kaiming Yang , Dengfeng Xu , Wensheng Yin , Guanghong Duan
发明人： Jinchun Hu , Yu Zhu , Jinsong Wang , Ming Zhang , Kai Liao , Kaiming Yang , Dengfeng Xu , Wensheng Yin , Guanghong Duan
IPC分类号： G06F17/11 , H02N15/00 , G01D5/14
CPC分类号： H02N15/00 , G01D5/145
摘要： A two-dimensional locating method of a motion platform based on a magnetic steel array involves the following steps: placing more than four linear Hall sensors at any different positions within one or more polar distances of the magnetic steel array on the surface of the motion platform in a motion system; determining a magnetic flux density distribution model according to the magnetic steel array; determining the mounting positions of the above-mentioned linear Hall sensors, which are converted into phases with respect to the mass center of the motion platform; recording the magnetic flux density measured values of the linear Hall sensors as the motion proceeds; solving the phases of the mass center of the motion platform in a plane, with the measured values being served as observed quantities and the magnetic flux density distribution model being served as a computation model; and determining the position of the mass center of the motion platform with respect to an initial phase according to the phase, so as to realize the planar location of the motion platform. The present invention provides a simple, fast and robust method for computing mass center positions for a motion system containing a magnetic steel array.
摘要翻译：基于磁钢阵列的运动平台的二维定位方法包括以下步骤：将多于四个线性霍尔传感器放置在运动平台表面上的磁钢阵列的一个或多个极距离内的任何不同位置在运动系统中根据磁钢阵列确定磁通密度分布模型; 确定上述线性霍尔传感器的安装位置，其相对于运动平台的质心转换成相位; 在运动过程中记录线性霍尔传感器的磁通密度测量值; 解决平面中运动平台质心的相位，测量值作为观测量，磁通密度分布模型用作计算模型; 并根据相位确定运动平台的质量中心相对于初始相位的位置，以便实现运动平台的平面位置。本发明提供了一种用于计算包含磁钢阵列的运动系统的质心位置的简单，快速和鲁棒的方法。

4. 发明申请

US20130024157A1 TWO-DIMENSIONAL LOCATING METHOD OF MOTION PLATFORM BASED ON MAGNETIC STEEL ARRAY 有权
标题翻译：基于磁钢阵列的运动平台二维定位方法
公开(公告)号：US20130024157A1
公开(公告)日：2013-01-24
申请号：US13522788
申请日：2011-01-18
申请人： Jinchun Hu , Yu Zhu , Jinsong Wang , Ming Zhang , Kai Liao , Kaiming Yang , Dengfeng Xu , Wensheng Yin , Guanghong Duan
发明人： Jinchun Hu , Yu Zhu , Jinsong Wang , Ming Zhang , Kai Liao , Kaiming Yang , Dengfeng Xu , Wensheng Yin , Guanghong Duan
IPC分类号： G06F17/11 , G01B7/14
CPC分类号： H02N15/00 , G01D5/145
摘要： A two-dimensional locating method of a motion platform based on a magnetic steel array involves the following steps: placing more than four linear Hall sensors at any different positions within one or more polar distances of the magnetic steel array on the surface of the motion platform in a motion system; determining a magnetic flux density distribution model according to the magnetic steel array; determining the mounting positions of the above-mentioned linear Hall sensors, which are converted into phases with respect to the mass center of the motion platform; recording the magnetic flux density measured values of the linear Hall sensors as the motion proceeds; solving the phases of the mass center of the motion platform in a plane, with the measured values being served as observed quantities and the magnetic flux density distribution model being served as a computation model; and determining the position of the mass center of the motion platform with respect to an initial phase according to the phase, so as to realize the planar location of the motion platform. The present invention provides a simple, fast and robust method for computing mass center positions for a motion system containing a magnetic steel array.
摘要翻译：基于磁钢阵列的运动平台的二维定位方法包括以下步骤：将多于四个线性霍尔传感器放置在运动平台表面上的磁钢阵列的一个或多个极距离内的任何不同位置在运动系统中根据磁钢阵列确定磁通密度分布模型; 确定上述线性霍尔传感器的安装位置，其相对于运动平台的质心转换成相位; 在运动过程中记录线性霍尔传感器的磁通密度测量值; 解决平面中运动平台质心的相位，测量值作为观测量，磁通密度分布模型用作计算模型; 并根据相位确定运动平台的质量中心相对于初始相位的位置，以便实现运动平台的平面位置。本发明提供了一种用于计算包含磁钢阵列的运动系统的质心位置的简单，快速和鲁棒的方法。

5. 发明授权

US09030648B2 Dual wafer stage exchanging system for lithographic device 有权
标题翻译：用于光刻设备的双晶片台交换系统
公开(公告)号：US09030648B2
公开(公告)日：2015-05-12
申请号：US13262802
申请日：2010-04-02
申请人： Yu Zhu , Ming Zhang , Jingsong Wang , Li Tian , Dengfeng Xu , Wensheng Yin , Guanghong Duan , Jinchun Hu
发明人： Yu Zhu , Ming Zhang , Jingsong Wang , Li Tian , Dengfeng Xu , Wensheng Yin , Guanghong Duan , Jinchun Hu
IPC分类号： G03B27/58 , G03F7/20
CPC分类号： G03F7/70733 , G03F7/70716
摘要： A dual wafer stage exchanging system for a lithographic device is disclosed, said system comprises two wafer stages running between an exposure workstation and a pre-processing workstation, and said two stages are set on a base and suspended above the upper surface of the base by air bearings. Each wafer stages is passed through by a Y-direction guide rail respectively, wherein one end of said guide rail is connected with a main driving unit and another end of said guide rail is detachably coupled with one of the two X-direction auxiliary driving units with single degree of freedom, and said two wafer stages are capable of moving in Y-direction along the guide rails and moving in X-direction under the drive of the auxiliary driving units with single degree of freedom. The position exchange of said two wafer stages can be enabled by the detachment and connection of the Y-direction guide rails and the auxiliary units with single degree of freedom.
摘要翻译：公开了一种用于光刻设备的双晶片台交换系统，所述系统包括在曝光工作站和预处理工作站之间运行的两个晶片台，并且所述两个阶段被设置在基座上并且悬挂在基座的上表面上方的上表面上方空气轴承。每个晶片台分别通过Y方向导轨穿过，其中所述导轨的一端与主驱动单元连接，并且所述导轨的另一端可拆卸地与两个X方向辅助驱动单元中的一个具有单自由度，并且所述两个晶片台能够沿着导轨在Y方向上移动，并且在辅助驱动单元的驱动下以单自由度在X方向上移动。所述两个晶片台的位置交换可以通过Y方向导轨和辅助单元以单个自由度的分离和连接来实现。

6. 发明授权

US08860927B2 Dual-stage exchange system for lithographic apparatus 有权
标题翻译：光刻设备双级交换系统
公开(公告)号：US08860927B2
公开(公告)日：2014-10-14
申请号：US13262829
申请日：2010-04-02
申请人： Yu Zhu , Ming Zhang , Jingsong Wang , Li Tian , Dengfeng Xu , Wensheng Yin , Guanghong Duan , Jinchun Hu
发明人： Yu Zhu , Ming Zhang , Jingsong Wang , Li Tian , Dengfeng Xu , Wensheng Yin , Guanghong Duan , Jinchun Hu
IPC分类号： G03B27/58 , G03F7/20
CPC分类号： G03F7/70733
摘要： A dual-stage exchange system for a lithographic apparatus comprises a silicon chip stage (13) operating in an exposure workstation (3) and a silicon chip (14) stage operating in a pre-processing workstation (4). The two silicon chip stages (13, 14) are provided on the same base stage (1), and suspended on an upper surface (2) of the base stage by air bearings. The two silicon chip stages (13, 14) can move along guide rails (15, 16) in the Y direction. One end of each guide rail (15, 16) is connected to a main driving unit (11, 12), and the other end of each guide rail (15, 16) is butt-jointed with an X-direction single-freedom auxiliary driving unit (7, 8). The silicon chip stages (13, 14) are driven by the single-freedom auxiliary driving units (7, 8) cooperated with the main driving units (11, 12) to move along the X direction. The single-freedom auxiliary driving units (7, 8) can be separated from or precisely butt-jointed with the Y-direction guide rails (15, 16), thereby achieving the position exchange of the two silicon chip stages (13, 14).
摘要翻译：用于光刻设备的双级交换系统包括在暴露工作站（3）中操作的硅芯片级（13）和在预处理工作站（4）中操作的硅芯片（14）级。两个硅片级（13,14）设置在同一基台（1）上，并通过空气轴承悬挂在基台的上表面（2）上。两个硅芯片级（13,14）可沿Y方向的导轨（15,16）移动。每个导轨（15,16）的一端连接到主驱动单元（11,12），并且每个导轨（15,16）的另一端与X方向单自由度辅助驱动单元（7,8）。硅片级（13,14）由与主驱动单元（11,12）配合的单自由度辅助驱动单元（7,8）驱动以沿X方向移动。单向辅助驱动单元（7,8）可以与Y方向导轨（15,16）分离或精确对接，从而实现两个硅芯片级（13,14）的位置交换，。

7. 发明申请

US20120127448A1 DUAL WAFER STAGE EXCHANGING SYSTEM FOR LITHOGRAPHIC DEVICE 有权
标题翻译：用于LITHOGRAPHIC设备的双波段交换系统
公开(公告)号：US20120127448A1
公开(公告)日：2012-05-24
申请号：US13262802
申请日：2010-05-25
申请人： Yu Zhu , Ming Zhang , Jingsong Wang , Li Tian , Dengfeng Xu , Wensheng Yin , Guanghong Duan , Jinchun Hu
发明人： Yu Zhu , Ming Zhang , Jingsong Wang , Li Tian , Dengfeng Xu , Wensheng Yin , Guanghong Duan , Jinchun Hu
IPC分类号： G03B27/58
CPC分类号： G03F7/70733 , G03F7/70716
摘要： A dual wafer stage exchanging system for a lithographic device is disclosed, said system comprises two wafer stages running between an exposure workstation and a pre-processing workstation, and said two stages are set on a base and suspended above the upper surface of the base by air bearings. Each wafer stages is passed through by a Y-direction guide rail respectively, wherein one end of said guide rail is connected with a main driving unit and another end of said guide rail is detachably coupled with one of the two X-direction auxiliary driving units with single degree of freedom, and said two wafer stages are capable of moving in Y-direction along the guide rails and moving in X-direction under the drive of the auxiliary driving units with single degree of freedom. The position exchange of said two wafer stages can be enabled by the detachment and connection of the Y-direction guide rails and the auxiliary units with single degree of freedom.
摘要翻译：公开了一种用于光刻设备的双晶片台交换系统，所述系统包括在曝光工作站和预处理工作站之间运行的两个晶片台，并且所述两个阶段被设置在基座上并且悬挂在基座的上表面上方的上表面上方空气轴承。每个晶片台分别通过Y方向导轨穿过，其中所述导轨的一端与主驱动单元连接，并且所述导轨的另一端可拆卸地与两个X方向辅助驱动单元中的一个具有单自由度，并且所述两个晶片台能够沿着导轨在Y方向上移动，并且在辅助驱动单元的驱动下以单自由度在X方向上移动。所述两个晶片台的位置交换可以通过Y方向导轨和辅助单元以单个自由度的分离和连接来实现。

8. 发明申请

US20100208227A1 DUAL-STAGE SWITCHING SYSTEM FOR LITHOGRAPHIC MACHINE 有权
标题翻译：用于雕刻机的双级切换系统
公开(公告)号：US20100208227A1
公开(公告)日：2010-08-19
申请号：US12669671
申请日：2008-03-14
申请人： Yu Zhu , Ming Zhang , Jinsong Wang , Guang Li , Dengfeng Xu , Wensheng Yin , Guanghong Duan , Kaiming Yang
发明人： Yu Zhu , Ming Zhang , Jinsong Wang , Guang Li , Dengfeng Xu , Wensheng Yin , Guanghong Duan , Kaiming Yang
IPC分类号： G03B27/58
CPC分类号： G03F7/70725 , G03F7/70733
摘要： A dual-stage switching system for lithographic machine includes a wafer stage to be operated in an exposure station and another wafer stage to be operated in a pre-processing station. The two wafer stages are provided on a base, with four 2-DOF driving units capable of moving along X direction and Y direction being provided along the edge of the base, and the wafer stages being disposed in a space surrounded by the four 2-DOF driving units and suspended on an upper surface of the base by air bearings. Each of the 2-DOF driving units includes upper and lower linear guides and a guiding sleeve, with the upper and lower linear guides being installed vertical to each other in their corresponding guiding sleeve. Two adjacent 2-DOF driving units cooperatively drive the wafer stage) to move in the X direction and Y direction.
摘要翻译：用于光刻机的双级切换系统包括在曝光站中操作的晶片台和在预处理站中操作的另一晶片台。两个晶片台设置在基座上，四个2-DOF驱动单元能够沿着X方向移动，Y方向沿着基座的边缘设置，并且晶片台被布置在由四个2- DOF驱动单元，并通过空气轴承悬挂在基座的上表面上。每个2自由度驱动单元包括上和下线性引导件和引导套筒，其中上和下线性引导件在其相应的导向套筒中彼此垂直地安装。两个相邻的2-DOF驱动单元协同驱动晶片台）沿X方向和Y方向移动。

9. 发明申请

US20120099095A1 DUAL-STAGE EXCHANGE SYSTEM FOR LITHOGRAPHIC APPARATUS 有权
标题翻译：用于平面设备的双级交换系统
公开(公告)号：US20120099095A1
公开(公告)日：2012-04-26
申请号：US13262829
申请日：2010-04-02
申请人： Yu Zhu , Ming Zhang , Jingsong Wang , Li Tian , Dengfeng Xu , Wensheng Yin , Guanghong Duan , Jinchun Hu
发明人： Yu Zhu , Ming Zhang , Jingsong Wang , Li Tian , Dengfeng Xu , Wensheng Yin , Guanghong Duan , Jinchun Hu
IPC分类号： G03B27/58
CPC分类号： G03F7/70733
摘要： A dual-stage exchange system for a lithographic apparatus comprises a silicon chip stage (13) operating in an exposure workstation (3) and a silicon chip (14) stage operating in a pre-processing workstation (4). The two silicon chip stages (13, 14) are provided on the same base stage (1), and suspended on an upper surface (2) of the base stage by air bearings. The two silicon chip stages (13, 14) can move along guide rails (15, 16) in the Y direction. One end of each guide rail (15, 16) is connected to a main driving unit (11, 12), and the other end of each guide rail (15, 16) is butt-jointed with an X-direction single-freedom auxiliary driving unit (7, 8). The silicon chip stages (13, 14) are driven by the single-freedom auxiliary driving units (7, 8) cooperated with the main driving units (11, 12) to move along the X direction. The single-freedom auxiliary driving units (7, 8) can be separated from or precisely butt-jointed with the Y-direction guide rails (15, 16), thereby achieving the position exchange of the two silicon chip stages (13, 14).
摘要翻译：用于光刻设备的双级交换系统包括在暴露工作站（3）中操作的硅芯片级（13）和在预处理工作站（4）中操作的硅芯片（14）级。两个硅片级（13,14）设置在同一基台（1）上，并通过空气轴承悬挂在基台的上表面（2）上。两个硅芯片级（13,14）可沿Y方向的导轨（15,16）移动。每个导轨（15,16）的一端连接到主驱动单元（11,12），并且每个导轨（15,16）的另一端与X方向单自由度辅助驱动单元（7,8）。硅片级（13,14）由与主驱动单元（11,12）配合的单自由度辅助驱动单元（7,8）驱动以沿X方向移动。单向辅助驱动单元（7,8）可以与Y方向导轨（15,16）分离或精确对接，从而实现两个硅芯片级（13,14）的位置交换，。

10. 发明申请

US20120099094A1 DUAL-STAGE EXCHANGE SYSTEM FOR LITHOGRAPHIC APPARATUS 有权
标题翻译：用于平面设备的双级交换系统
公开(公告)号：US20120099094A1
公开(公告)日：2012-04-26
申请号：US13262783
申请日：2010-04-02
申请人： Yu Zhu , Ming Zhang , Jingsong Wang , Li Tian , Dengfeng Xu , Wensheng Yin , Guanghong Duan , Jinchun Hu
发明人： Yu Zhu , Ming Zhang , Jingsong Wang , Li Tian , Dengfeng Xu , Wensheng Yin , Guanghong Duan , Jinchun Hu
IPC分类号： G03B27/58
CPC分类号： H01L21/682 , G03F7/70733 , G03F7/70758
摘要： A dual-stage exchange system for a lithographic apparatus comprises a silicon chip stage (10) operating in an exposure workstation (6) and a silicon chip stage (12) operating in a pre-processing workstation (7). Each silicon chip stage (10, 12) is supported by a six-freedom micro-motion stage, respectively. The silicon chip stage (10, 12) and the six-freedom micro-motion stage form a silicon chip stage group. The two silicon chip stage groups are provided on the same rectangular base stage (1) and suspended on an upper surface (2) of the base sage by air bearings. A double-freedom driving unit (21a, 21b, 22a, 22b) is provided on each edge of the base stage (1), respectively. The six-freedom micro-motion stage of the silicon chip stage group has an upper layer driver and a lower layer driver, capable of achieving six-freedom control. The double-freedom driving units (21a, 21b) on the long edges of the base stage are connected with the bases (62) of the six-freedom micro-motion stages, and the double-freedom driving units (22a, 22b) on the short edges of the base stage are connected with the stator coils (63) of the upper layer drivers of the six-freedom micro-motion stages.
摘要翻译：用于光刻设备的双级交换系统包括在暴露工作站（6）中操作的硅芯片级（10）和在预处理工作站（7）中操作的硅芯片级（12）。每个硅芯片级（10,12）分别由六自由度微动平台支撑。硅片级（10,12）和六自由度微运动级形成硅芯片级组。两个硅芯片台组设置在相同的矩形基台（1）上，并通过空气轴承悬挂在基座的上表面（2）上。分别在基台（1）的每个边缘上设置双自由度驱动单元（21a，21b，22a，22b）。硅片级组的六自由度微动阶段具有能够实现六自由度控制的上层驱动器和下层驱动器。基台的长边缘上的双重自由度驱动单元（21a，21b）与六自由度微动台的基座（62）连接，双重自由度驱动单元（22a，22b）在基台的短边缘与六自由度微动级的上层驱动器的定子线圈（63）连接。

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