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    • 8. 发明申请
    • CONDUCTIVE ROUTINGS IN INTEGRATED CIRCUITS USING UNDER BUMP METALLIZATION
    • 使用BUMP METALLIZATION的集成电路中的导电路由
    • US20130037963A1
    • 2013-02-14
    • US13454968
    • 2012-04-24
    • Ilija JergovicEfren M. Lacap
    • Ilija JergovicEfren M. Lacap
    • H01L23/48
    • H01L23/5226H01L23/4824H01L23/522H01L23/53238H01L24/05H01L24/13H01L2224/0401H01L2224/05624H01L2224/05647H01L2224/131H01L2924/00014H01L2924/14H01L2924/01014H01L2924/00
    • An integrated circuit structure includes a first conductive layer and an under bump metallization layer over the first conductive layer. The first conductive layer has a first conductive region and a second conductive region electrically isolated from the first conductive region. The under bump metallization layer has a first conductive area and a second conductive area electrically isolated from the first conductive area, the first conductive area substantially located over the first conductive region and the second conductive area substantially located over the second conductive region. At least one of the first conductive area or the first conductive region includes a first protrusion extending toward the second conductive area or second conductive region, respectively. Conductive vias connect the first conductive region to the second conductive area and connect the second conductive region to the first conductive area, and the vias include at least one via connected to the first protrusion.
    • 集成电路结构包括在第一导电层上的第一导电层和凸块下金属化层。 第一导电层具有与第一导电区电绝缘的第一导电区域和第二导电区域。 凸块下金属化层具有第一导电区域和与第一导电区域电隔离的第二导电区域,第一导电区域基本上位于第一导电区域上方,第二导电区域基本上位于第二导电区域上方。 第一导电区域或第一导电区域中的至少一个分别包括朝向第二导电区域或第二导电区域延伸的第一突起。 导电通孔将第一导电区域连接到第二导电区域并且将第二导电区域连接到第一导电区域,并且通孔包括连接到第一突起的至少一个通孔。