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    • 2. 发明申请
    • BREMSSTRAHLUNG LASER (
    • BREMSSTRAHLUNG激光(“BLASER”)
    • US20080007817A1
    • 2008-01-10
    • US11477237
    • 2006-06-28
    • Michael HochbergTom Baehr-Jones
    • Michael HochbergTom Baehr-Jones
    • H01S3/00
    • H01S3/063H01S3/083H01S3/0903
    • A light generating system that comprises a narrow evacuated slot defined between at least two high index contrast waveguide elements. The apparatus can be fabricated using a material such as a SOI wafer having an oxide layer thickness of the order of 1 micron and a top silicon layer thickness of the order of 100-150 nm. Electrode contacts are provided to at least two waveguide elements fabricated in the top silicon layer, each waveguide element having a thickness comparable to the top silicon layer thickness, a width of some hundreds of nm, and having a slot having dimensions in the range of 50-200 nm defined therebetween. The length of the slot is at least as long as the slot width. Charged particles, such as electrons, that are emitted and accelerated across the slot by an applied electrical signal provide a source of photons as a consequence of being accelerated and/or decelerated.
    • 一种发光系统,包括限定在至少两个高折射率对比度波导元件之间的窄抽空槽。 可以使用诸如具有1微米级氧化物层厚度的SOI晶片和100-150nm量级的顶部硅层厚度的材料来制造该装置。 电极触点提供给制造在顶部硅层中的至少两个波导元件,每个波导元件的厚度可与顶部硅层厚度相当,宽度为几百nm,并且具有尺寸在50 -200nm。 槽的长度至少与槽宽度一样长。 通过施加的电信号在时隙上发射和加速的带电粒子,例如电子,作为加速和/或减速的结果提供光子源。