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1. 发明授权

US6118525A Wafer inspection system for distinguishing pits and particles 失效
公开(公告)号：US6118525A
公开(公告)日：2000-09-12
申请号：US958230
申请日：1997-10-27
申请人： Michael E. Fossey , John C. Stover , Lee D. Clementi
发明人： Michael E. Fossey , John C. Stover , Lee D. Clementi
IPC分类号： G01N21/00 , G01N21/86
CPC分类号： G01N21/9501 , H01L22/12 , G01N2021/945
摘要： A surface inspection system and method is provided which detects defects such as particles or pits on the surface of a workpiece, such as a silicon wafer, and also distinguishes between pit defects and particle defects. The surface inspection system comprises an inspection station for receiving a workpiece and a scanner positioned and arranged to scan a surface of the workpiece at the inspection station. The scanner includes a light source arranged to project a beam of P-polarized light and a scanner positioned to scan the P-polarized light beam across the surface of the workpiece. The system further provides for detecting differences in the angular distribution of the light scattered from the workpiece and for distinguishing particle defects from pit defects based upon these differences.

2. 发明授权

US06509965B2 Wafer inspection system for distinguishing pits and particles 有权
标题翻译：用于区分凹坑和颗粒的晶圆检查系统
公开(公告)号：US06509965B2
公开(公告)日：2003-01-21
申请号：US09906062
申请日：2001-07-17
申请人： Michael E. Fossey , John C. Stover , Lee D. Clementi
发明人： Michael E. Fossey , John C. Stover , Lee D. Clementi
IPC分类号： G01N2100
CPC分类号： G01N21/9501 , G01N2021/945 , H01L22/12
摘要： A surface inspection system and method is provided which detects defects such as particles or pits on the surface of a workpiece, such as a silicon wafer, and also distinguishes between pit defects and particle defects. The surface inspection system comprises an inspection station for receiving a workpiece and a scanner positioned and arranged to scan a surface of the workpiece at the inspection station. The scanner includes a light source arranged to project a beam of P-polarized light and a scanner positioned to scan the P-polarized light beam across the surface of the workpiece. The system further provides for detecting differences in the angular distribution of the light scattered from the workpiece and for distinguishing particle defects from pit defects based upon these differences.
摘要翻译：提供了表面检查系统和方法，其检测诸如硅晶片的工件的表面上的诸如颗粒或凹坑的缺陷，并且还区分凹坑缺陷和颗粒缺陷。表面检查系统包括用于接收工件的检查站和定位和布置成在检查站扫描工件的表面的扫描仪。扫描仪包括布置成投射P偏振光束的光源和定位成扫描穿过工件表面的P偏振光束的扫描仪。该系统还提供了检测从工件散射的光的角度分布的差异，并且基于这些差异来区分颗粒缺陷和凹坑缺陷。

3. 发明授权

US6122047A Methods and apparatus for identifying the material of a particle occurring on the surface of a substrate 有权
标题翻译：用于识别发生在基底表面上的颗粒的材料的方法和装置
公开(公告)号：US6122047A
公开(公告)日：2000-09-19
申请号：US231685
申请日：1999-01-14
申请人： John C. Stover , Songping Gao , Michael E. Fossey , Lee Dante Clementi
发明人： John C. Stover , Songping Gao , Michael E. Fossey , Lee Dante Clementi
IPC分类号： G01N21/55 , G01N21/94 , G01N21/88
CPC分类号： G01N21/94 , G01N2021/556
摘要： The composition of a particle occurring on the surface of a smooth substrate is identified by impinging the surface with a light beam having a strong P-polarized component at an oblique angle of incidence to the surface, and collecting light scattered from the surface at forward, center, and back locations relative to the portion of the surface impinged by the incident beam. The intensities of the light collected at these locations are measured by detectors and converted into signals, and the magnitudes of the signals are compared to correlations of particle material as a function of the relative magnitudes of the forward-, center-, and back-scatter signals so as to identify the material whose correlation most nearly matches the measured detector signals. Preferably, a ratio of the back detector signal magnitude to forward detector signal magnitude is correlated with particle material and back detector signal magnitude. Alternatively or additionally, a ratio of back detector signal magnitude to center detector signal magnitude is correlated with particle material and back detector signal magnitude. Average particle diameter versus back detector signal magnitude is correlated with particle material.
摘要翻译：发生在光滑基板表面上的颗粒的组成通过用具有与表面倾斜的入射角的强P偏振分量的光束照射表面来识别表面，并且收集从表面向前散射的光，相对于被入射光束入射的表面的部分的中心和后部位置。在这些位置处收集的光的强度由检测器测量并转换为信号，并且将信号的大小与作为前向，中心和后向散射的相对幅度的函数的粒子材料的相关性进行比较信号，以便识别其相关性最接近于测量的检测器信号的材料。优选地，反向检测器信号幅度与正向检测器信号幅度的比率与粒子材料和反向检测器信号幅度相关。或者或另外，反向检测器信号幅度与中心检测器信号幅度的比率与颗粒材料和反向检测器信号幅度相关。平均粒径对背景检测器信号幅度与粒子物质相关。

4. 发明授权

US06292259B1 Wafer inspection system for distinguishing pits and particles 有权
公开(公告)号：US06292259B1
公开(公告)日：2001-09-18
申请号：US09624502
申请日：2000-07-24
申请人： Michael E. Fossey , John C. Stover
发明人： Michael E. Fossey , John C. Stover
IPC分类号： G01N2100
CPC分类号： G01N21/9501 , G01N2021/945 , H01L22/12
摘要： A surface inspection system and method is provided which detects defects such as particles or pits on the surface of a workpiece, such as a silicon wafer, and also distinguishes between pit defects and particle defects. The surface inspection system comprises an inspection station for receiving a workpiece and a scanner positioned and arranged to scan a surface of the workpiece at the inspection station. The scanner includes a light source arranged to project a beam of P-polarized light and a scanner positioned to scan the P-polarized light beam across the surface of the workpiece. The system further provides for detecting differences in the angular distribution of the light scattered from the workpiece and for distinguishing particle defects from pit defects based upon these differences.

5. 发明申请

US20130258323A1 Device and Method for Subaperture Stray Light Detection and Diagnosis 有权
标题翻译：用于子孔径杂散光检测和诊断的装置和方法
公开(公告)号：US20130258323A1
公开(公告)日：2013-10-03
申请号：US13726154
申请日：2012-12-23
申请人： William P. Kuhn , John C. Stover , Robert S. LeCompte
发明人： William P. Kuhn , John C. Stover , Robert S. LeCompte
IPC分类号： G01B11/26
CPC分类号： G01B11/26 , G01J1/00 , G01J1/0214 , G01J1/0228 , G01J1/0266 , G01J1/0411 , G01J1/0437
摘要： A device and method for subaperture stray light detection and diagnosis in an optical system. A test light beam is generated with a width whose cross sectional area is less than the cross sectional area of a system aperture. Stray light is detected at a system detection surface. Based on the stray light and the location and direction angles of the light beam, potential paths that light may have taken to arrive at the detection surface are determined so as to identify physical features of the optical system that may have produced the stray light. A testing device comprises a test light beam source, preferably including a beam width magnifier, whereby the cross sectional area of the test light beam is made less than the cross sectional area of the system aperture. A relative lateral positioning stage and an angular beam directing stage launch the test light beam into the aperture at a selected position and selected directional angles. A detector and a data processing system produce a data set relating the stray light to the location and directional angles of the test light beam. A light trap and complementary test light beam delivery system are also provided.
摘要翻译：一种用于光学系统中亚光谱杂散光检测和诊断的装置和方法。产生具有横截面积小于系统孔径横截面面积的宽度的测试光束。在系统检测表面检测到杂散光。基于杂散光和光束的位置和方向角度，确定光可能到达检测表面的电势路径，以便识别可能产生杂散光的光学系统的物理特征。测试装置包括测试光束源，优选地包括光束宽度放大镜，由此使测试光束的横截面积小于系统孔径的横截面面积。相对的侧向定位台和角度光束定向台将测试光束在所选择的位置和选定的方向角度发射到孔中。检测器和数据处理系统产生将杂散光与测试光束的位置和方向角相关联的数据集。还提供了光阱和补充测试光束传送系统。

6. 外观设计

USD256724S Heat exchanger grid for an electric heater 失效
公开(公告)号：USD256724S
公开(公告)日：1980-09-02
申请号：US712762
申请日：1976-08-09
申请人： Alben C. Boggs , John C. Stover
设计人： Alben C. Boggs , John C. Stover

7. 发明授权

US09030657B2 Device and method for subaperture stray light detection and diagnosis 有权
标题翻译：子孔杂散光检测和诊断的装置和方法
公开(公告)号：US09030657B2
公开(公告)日：2015-05-12
申请号：US13726154
申请日：2012-12-23
申请人： William P. Kuhn , John C. Stover , Robert S. LeCompte
发明人： William P. Kuhn , John C. Stover , Robert S. LeCompte
IPC分类号： G01N21/00 , G01B9/00 , G01B11/26 , G01J1/00
CPC分类号： G01B11/26 , G01J1/00 , G01J1/0214 , G01J1/0228 , G01J1/0266 , G01J1/0411 , G01J1/0437
摘要： A device and method for subaperture stray light detection and diagnosis. A test light beam is generated. Stray light is detected. Based on the detected stray light, potential paths that light may have taken to arrive at the detection surface are determined. A testing device comprises a test light beam source whereby the cross sectional area of the test light beam is made less than the cross sectional area of the system aperture. A relative lateral positioning stage and an angular beam directing stage launch the test light beam into the aperture. A detector and a data processing system produce a data set relating the stray light to the location and directional angles of the test light beam to identify the sources of stray light. A light trap and test light beam delivery system are provided.
摘要翻译：一种用于亚光谱杂散光检测和诊断的装置和方法。产生测试光束。检测到杂散光。基于检测到的杂散光，确定光可能到达检测表面的电势路径。测试装置包括测试光束源，使得测试光束的横截面积小于系统孔径的横截面面积。相对的横向定位台和角光束定向台将测试光束发射到孔中。检测器和数据处理系统产生将杂散光与测试光束的位置和方向角相关联以识别杂散光源的数据集。提供了光阱和测试光束传送系统。

8. 发明授权

US06760100B2 Method and apparatus for classifying defects occurring at or near a surface of a smooth substrate 失效
标题翻译：用于分类出现在光滑基底表面处或附近的缺陷的方法和装置
公开(公告)号：US06760100B2
公开(公告)日：2004-07-06
申请号：US09804218
申请日：2001-03-12
申请人： Vladimir I. Ivakhnenko , John C. Stover
发明人： Vladimir I. Ivakhnenko , John C. Stover
IPC分类号： G01N2100
CPC分类号： G01N21/94 , G01N15/0211 , G01N21/9501 , G01N21/9506 , G01N2021/556
摘要： In an optical inspection system, defects such as particles, pits, subsurface voids, mounds, or other defects occurring at or near the smooth surface of a substrate are classified by type and size based on the magnitude S of a signal produced by collected light for each of a plurality N of different test configurations, yielding a plurality of signal magnitudes S1 through SN. A database is consulted, comprising a relationship of S versus defect size d for each test configuration and for each of a plurality of idealized defect types, so as to determine a defect size d corresponding to each measured signal magnitude S, and an average defect size is determined for each defect type. Signal magnitudes through that would be produced by a defect of the average size are determined for each defect type, and defect type is determined based on a smallest deviation between the measured magnitudes and the determined magnitudes.
摘要翻译：在光学检查系统中，基于通过收集的光产生的信号的幅度S将类型和尺寸分类在基板的光滑表面处或附近出现的诸如颗粒，凹坑，地下空隙，墩或其他缺陷之类的缺陷，多个N个不同测试配置中的每一个，产生多个信号幅度S1至SN。参考数据库，其包括针对每个测试配置和多个理想化缺陷类型中的每一个的S与缺陷尺寸d的关系，以便确定对应于每个测量信号幅度S的缺陷尺寸d和平均缺陷尺寸确定每种缺陷类型。针对每种缺陷类型确定由平均尺寸的缺陷产生的信号幅度至，并且基于所测量的幅度与所确定的幅度之间的最小偏差来确定缺陷类型。

9. 外观设计

USD263734S Metal extrusion for an electric heating element 失效
公开(公告)号：USD263734S
公开(公告)日：1982-04-06
申请号：US132790
申请日：1980-03-24
申请人： Donald M. Cunningham , Richard W. Brent , John C. Stover
设计人： Donald M. Cunningham , Richard W. Brent , John C. Stover

10. 发明授权

US06833028B1 Particle deposition system with enhanced speed and diameter accuracy 失效
标题翻译：颗粒沉积系统具有提高的速度和直径精度
公开(公告)号：US06833028B1
公开(公告)日：2004-12-21
申请号：US10074354
申请日：2002-02-11
申请人： Craig A. Scheer , John C. Stover
发明人： Craig A. Scheer , John C. Stover
IPC分类号： B05C1500
CPC分类号： H01L21/67253 , G01N15/065 , H01L21/6715
摘要： In a method for depositing particles onto a substrate a flow of gas containing particles is provided along a flow path that bypasses a deposition chamber. The flow path may direct the flow of the gas containing the particles to a vacuum. To deposit particles onto a substrate in the deposition chamber, the flow path of the gas containing the particles is diverted into the deposition chamber so that particles are deposited onto the substrate. After a desired amount of particles have been deposited onto the substrate, the flow path of the flow of the gas containing the particles is changed to the flow path that bypasses the deposition chamber. A particle deposition system and a method for maintaining particle diameter during deposition of particles onto a substrate also are described.
摘要翻译：在将颗粒沉积到基底上的方法中，沿着绕过沉积室的流动路径设置含有颗粒的气体流。流动路径可以将含有颗粒的气体的流动引导至真空。为了将颗粒沉积在沉积室中的基底上，含有颗粒的气体的流动路径被转移到沉积室中，使得颗粒沉积到基底上。在将所需量的颗粒沉积到基底上之后，含有颗粒的气体的流动的流动路径被改变为绕过沉积室的流动路径。还描述了颗粒沉积系统和在将颗粒沉积到基底上时保持颗粒直径的方法。

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