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    • 7. 发明申请
    • 3D CHANNEL ARCHITECTURE FOR SEMICONDUCTOR DEVICES
    • 用于半导体器件的3D通道架构
    • US20100308402A1
    • 2010-12-09
    • US12480065
    • 2009-06-08
    • Suku KimDan CalafutIhsiu HoDan KinzerSteven SappAshok ChallaSeokjin JoMark Larsen
    • Suku KimDan CalafutIhsiu HoDan KinzerSteven SappAshok ChallaSeokjin JoMark Larsen
    • H01L29/78
    • H01L29/7813H01L29/0865H01L29/407H01L29/4236H01L29/4933
    • Semiconductor devices and methods for making such devices that contain a 3D channel architecture are described. The 3D channel architecture is formed using a dual trench structure containing with a plurality of lower trenches extending in an x and y directional channels and separated by a mesa and an upper trench extending in a y direction and located in an upper portion of the substrate proximate a source region. Thus, smaller pillar trenches are formed within the main line-shaped trench. Such an architecture generates additional channel regions which are aligned substantially perpendicular to the conventional line-shaped channels. The channel regions, both conventional and perpendicular, are electrically connected by their corner and top regions to produce higher current flow in all three dimensions. With such a configuration, higher channel density, a stronger inversion layer, and a more uniform threshold distribution can be obtained for the semiconductor device. Other embodiments are described.
    • 描述了用于制造包含3D通道架构的这种设备的半导体器件和方法。 3D通道架构使用双沟槽结构形成,该双沟槽结构包含多个下沟槽,该多个下沟槽在x和y定向沟槽中延伸并且被台面和上部沟槽隔开,该沟槽沿ay方向延伸并且位于基板的上部附近 源区。 因此,在主线状沟槽内形成较小的支柱沟槽。 这种架构产生基本垂直于常规线形通道排列的附加通道区域。 常规和垂直的通道区域通过其角部和顶部区域电连接以在所有三维空间中产生更高的电流。 通过这样的结构,半导体器件可以获得更高的沟道密度,更强的反转层和更均匀的阈值分布。 描述其他实施例。
    • 8. 发明授权
    • 3D channel architecture for semiconductor devices
    • 半导体器件的3D通道架构
    • US08072027B2
    • 2011-12-06
    • US12480065
    • 2009-06-08
    • Suku KimDan CalafutIhsiu HoDan KinzerSteven SappAshok ChallaSeokjin JoMark Larsen
    • Suku KimDan CalafutIhsiu HoDan KinzerSteven SappAshok ChallaSeokjin JoMark Larsen
    • H01L29/78
    • H01L29/7813H01L29/0865H01L29/407H01L29/4236H01L29/4933
    • Semiconductor devices and methods for making such devices that contain a 3D channel architecture are described. The 3D channel architecture is formed using a dual trench structure containing with a plurality of lower trenches extending in an x and y directional channels and separated by a mesa and an upper trench extending in a y direction and located in an upper portion of the substrate proximate a source region. Thus, smaller pillar trenches are formed within the main line-shaped trench. Such an architecture generates additional channel regions which are aligned substantially perpendicular to the conventional line-shaped channels. The channel regions, both conventional and perpendicular, are electrically connected by their corner and top regions to produce higher current flow in all three dimensions. With such a configuration, higher channel density, a stronger inversion layer, and a more uniform threshold distribution can be obtained for the semiconductor device. Other embodiments are described.
    • 描述了用于制造包含3D通道架构的这种设备的半导体器件和方法。 3D通道架构使用双沟槽结构形成,该双沟槽结构包含多个下沟槽,该多个下沟槽在x和y定向沟槽中延伸并且被台面和上部沟槽隔开,该沟槽沿ay方向延伸并且位于基板的上部附近 源区。 因此,在主线状沟槽内形成较小的支柱沟槽。 这种架构产生基本垂直于常规线形通道排列的附加通道区域。 常规和垂直的通道区域通过其角部和顶部区域电连接以在所有三维空间中产生更高的电流。 通过这样的结构,半导体器件可以获得更高的沟道密度,更强的反转层和更均匀的阈值分布。 描述其他实施例。