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    • 7. 发明申请
    • Thin film transistor array substrate
    • 薄膜晶体管阵列基板
    • US20070063280A1
    • 2007-03-22
    • US11246611
    • 2005-10-06
    • Fu-Yuan ShiauChien-Chih JenMeng-Chi Liou
    • Fu-Yuan ShiauChien-Chih JenMeng-Chi Liou
    • H01L27/12
    • H01L27/124
    • A thin film transistor array substrate having a display area and a non-display area is provided. Pixel units, scan lines and data lines are disposed within the display area, and the scan line and data line are electrically connected to the corresponding pixel units. The non-display region has first chip bonding area and at least one first connecting line disposed within the non-display region. Scan line terminals and first bonding pads are disposed within the first chip bonding area. The scan line terminal is electrically connected to the corresponding scan line. The first connecting line is arranged between two of the adjacent chip bonding areas for making the first bonding pads within the adjacent chip bonding areas electrically connect to each other. The first connecting line comprises conductive layers which are electrically connected to one another.
    • 提供具有显示区域和非显示区域的薄膜晶体管阵列基板。 像素单元,扫描线和数据线被布置在显示区域内,并且扫描线和数据线电连接到相应的像素单元。 非显示区域具有第一芯片接合区域和设置在非显示区域内的至少一个第一连接线。 扫描线端子和第一接合焊盘设置在第一芯片接合区域内。 扫描线端子电连接到相应的扫描线。 第一连接线布置在两个相邻的芯片接合区域之间,用于使相邻芯片粘合区域内的第一焊盘彼此电连接。 第一连接线包括彼此电连接的导电层。
    • 8. 发明申请
    • EXPOSURE PROCESS
    • 曝光过程
    • US20070031764A1
    • 2007-02-08
    • US11161430
    • 2005-08-03
    • Meng-Chi LiouFu-Yuan Shiau
    • Meng-Chi LiouFu-Yuan Shiau
    • G03F7/20
    • G03F7/0007G03F1/00G03F7/70475
    • An exposure process is provided. First, a plurality of optical modules is provided. The optical modules are arranged in order and a partially overlap areas is formed at the overlapping region between each two adjacent optical modules. A photo mask with pluralities of first device patterns and pluralities of second device patterns thereon is provided and disposed under the optical modules. The locations of the first device patterns are corresponding to the partially overlap areas, and the locations of the second device patterns are corresponding to the other area. In particular, the first device patterns have a dimension different from that of the second device patterns. A photo resist layer is provided under the photo mask. The optical modules and the photo mask are used to perform an exposure step to transfer the first device patterns and the second device patterns to the photo resist layer.
    • 提供曝光过程。 首先,提供多个光模块。 光学模块按顺序布置,并且在每个两个相邻的光学模块之间的重叠区域处形成部分重叠的区域。 具有多个第一器件图案和多个第二器件图案的光掩模被设置并设置在光学模块的下方。 第一设备图案的位置对应于部分重叠区域,并且第二设备图案的位置对应于其他区域。 特别地,第一设备图案的尺寸与第二设备图案的尺寸不同。 在光掩模下方设有光刻胶层。 光学模块和光掩模用于执行曝光步骤以将第一装置图案和第二装置图案转印到光致抗蚀剂层。