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    • 7. 发明授权
    • Gas supply method in a CVD coating system for precursors with a low vapor pressure
    • 用于具有低蒸气压的前体的CVD涂覆系统中的气体供应方法
    • US07413767B2
    • 2008-08-19
    • US11014488
    • 2004-12-16
    • Hartmut BauchLars BewigLutz KlippeThomas Küpper
    • Hartmut BauchLars BewigLutz KlippeThomas Küpper
    • C23C16/00
    • C23C16/448
    • A method for producing optical functional coatings comprising niobium, tantalum, titanium or aluminum by supplying a precursor gas of low vapor pressure in a CVD coating system. A precursor selected from the group consisting of Nb, Ta, Ti, and Al compounds having a vapor pressure is maintained within a first supply container at a first temperature T1 and a first pressure p1. Precursor vapor of the precursor is supplied from the first supply container to an intermediate storage device through a first gas line which fluidly communicates the first supply container and the intermediate storage device. A carrier gas or reaction gas is supplied to the first gas line such that a mixture of the precursor with the carrier gas or the reaction gas is provided. The mixture is maintained in the intermediate storage device at a constant second pressure p2 lower than the first pressure p1 and at a second temperature T2 lower than the first temperature T1, and the mixture is supplied from the intermediate storage device through a second gas line.
    • 一种通过在CVD涂覆系统中提供低蒸气压的前体气体来制造包括铌,钽,钛或铝的光学功能涂层的方法。 选自具有蒸气压的Nb,Ta,Ti和Al化合物的前体的前体在第一温度T 1和第一压力p 1下保持在第一供应容器内。 前体的前体蒸气通过与第一供给容器和中间储存装置流体连通的第一气体管线从第一供给容器供给到中间储存装置。 向第一气体管线供给载气或反应气体,使得前体与载体气体或反应气体的混合物被提供。 将混合物以比第一压力p 1低的恒定的第二压力p 2和低于第一温度T 1的第二温度T 2保持在中间储存装置中,并且将混合物从中间储存装置通过 第二条天然气线。