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    • 2. 发明公开
    • A method for manufacturing an anti-reflection film of a display device
    • 一种制造显示装置的抗反射膜的方法
    • EP0834901A2
    • 1998-04-08
    • EP97119904.7
    • 1994-11-27
    • MATSUSHITA ELECTRONICS CORPORATION
    • Hayama, HidekazuMiura, YasunoriSuzuki, AtsushiIshiai, Keizou
    • H01J29/89
    • H01J29/868H01J2229/8915
    • A method for manufacturing an anti-reflection film of a display device comprises steps of forming a first layer (2) which is an electrically-conductive thin film having a first refractive index, and which is deposited on an outer surface of a glass face panel (1), forming a second layer (3) which is a thin film having a second refractive index lower than said first refractive index, and which is deposited on an outer surface of said first layer (2), and forming a third layer (4) which is deposited on said second layer (3), and which has a large number of concave regions (6) each surrounded by convex regions (5) on an exposed surface of said display device. According to the invention said first layer (2), said second layer (3) and said third layer (4) form said antireflection film which has a luminous reflectance of 1.5% or less, and a reflectance of 3% or less between the wavelength of 436 nm and 700 nm.
    • 一种用于制造显示装置的抗反射膜的方法包括以下步骤:形成第一层(2),该第一层(2)是具有第一折射率的导电薄膜并且沉积在玻璃面板的外表面上 (1)中,形成第二层(3),所述第二层(3)是具有低于所述第一折射率的第二折射率的薄膜并且沉积在所述第一层(2)的外表面上,并且形成第三层 4),其沉积在所述第二层(3)上,并且在所述显示装置的暴露表面上具有多个由凸起区域(5)围绕的凹形区域(6)。 根据本发明,所述第一层(2),所述第二层(3)和所述第三层(4)形成所述抗反射膜,其具有1.5%或更低的光反射率和3%或更低的波长 为436nm和700nm。
    • 4. 发明公开
    • Cathode-ray tube
    • 阴极射线管
    • EP1032019A2
    • 2000-08-30
    • EP00103787.8
    • 2000-02-23
    • Matsushita Electronics Corporation
    • Miura, Yasunori
    • H01J29/86H01J29/89
    • H01J29/868H01J2229/0023H01J2229/8631
    • A surface treatment film (8) composed of a conductive film (3) with a surface resistance of 1 × 10 3 Ω/□ or more and an antireflection film (4) is provided on the surface of a glass panel (1). A ground electrode (6) is provided on the surface treatment film (8) so as to be electrically connected with the conductive film (3). The ground electrode (6) is grounded in a circuit manner. An area of the surface treatment film (8) covered with the ground electrode (6) is set at 500 mm 2 or more. Thus, even in the case where the conductive film (3) has a resistance of 1 × 10 3 Ω/□ or more, an effect of suppressing a leakage electric field to 1.0 V/m or less, which satisfies the TCO guideline, can be realized.
    • 在玻璃面板(1)的表面设置由表面电阻为1×103Ω/□以上的导电膜(3)和防反射膜(4)构成的表面处理膜(8)。 接地电极(6)设置在表面处理膜(8)上以与导电膜(3)电连接。 接地电极(6)以电路方式接地。 被接地电极(6)覆盖的表面处理膜(8)的面积为500mm 2以上。 因此,即使在导电膜(3)具有1×10 3Ω/□或更大的电阻的情况下,满足TCO准则的抑制漏电场至1.0V / m或更小的效果可以是 实现。