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    • 3. 发明授权
    • Method for producing high alloy pipe
    • 高合金管生产方法
    • US08312751B2
    • 2012-11-20
    • US13153567
    • 2011-06-06
    • Hitoshi SuwabeToshihide Ono
    • Hitoshi SuwabeToshihide Ono
    • B21B17/00B21B23/00
    • C22C38/42B21B3/02B21B21/00B21C23/002B21C23/085C21D6/004C21D6/005C21D7/02C21D7/12C21D8/10C21D9/08C22C38/001C22C38/02C22C38/04C22C38/44
    • A method for producing a high alloy pipe having a minimum yield strength of 758.3 to 965.2 MPa, comprising: preparing a high alloy pipe having controlled amounts of C, Si, Mn, Ni, Cr, Mo, Cu, and N, the balance being Fe and impurities by a hot working or further by a solid-solution heat treatment; and then subsequently subjecting the high alloy pipe to a cold rolling. The cold rolling is performed such that the working ratio Rd, in terms of the reduction of area, in the final cold rolling step falls within a range of larger than 30% and equal to or less than 80%, and the following formula is satisfied: Rd(%)>(MYS−520)/3.1−(Cr+6×Mo+300×N) wherein Rd and MYS signify the working ratio (%) in terms of the reduction of area and the targeted yield strength (MPa), respectively, and Cr, Mo and N signify the mass % of the individual elements.
    • 一种制造具有最低屈服强度为758.3〜965.2MPa的高合金管的方法,其特征在于,包括:制备具有受控量的C,Si,Mn,Ni,Cr,Mo,Cu和N的高合金管,余量为 Fe和杂质通过热加工或进一步通过固溶热处理; 然后对高合金管进行冷轧。 进行冷轧,使得最终冷轧工序中的面积减少率的工作比率Rd在大于30%且等于或小于80%的范围内,并且满足以下公式: :Rd(%)>(MYS-520)/3.1-(Cr + 6×Mo + 300×N)其中Rd和MYS表示以面积的减少和目标屈服强度表示的加工率(%)(MPa ),Cr,Mo和N分别表示各元素的质量百分比。
    • 4. 发明授权
    • Method for producing duplex stainless steel pipe
    • 双相不锈钢管生产方法
    • US08293037B2
    • 2012-10-23
    • US13184732
    • 2011-07-18
    • Hitoshi SuwabeToshihide Ono
    • Hitoshi SuwabeToshihide Ono
    • C21D8/10
    • C22C38/02B21B3/02B21B21/00B21C23/085C21D6/004C21D8/105C21D9/14C21D2211/001C21D2211/005C22C38/001C22C38/04C22C38/20C22C38/42C22C38/44
    • A method for producing a duplex stainless steel pipe having a minimum yield strength of 758.3 to 965.2 MPa, comprises first hot working and optionally solution heat treating a duplex stainless steel material pipe having a chemical composition consisting, by mass %, of C: 0.03% or less, Si: 1% or less, Mn: 0.1 to 4%, Cr: 20 to 35%, Ni: 3 to 10%, Mo: 0 to 6%, W: 0 to 6%, Cu: 0 to 3% and N: 0.15 to 0.60%, the balance being Fe and impurities. The pipe is then cold rolled under conditions that the working ratio Rd, in terms of the reduction of area, in the final cold rolling step falls within a range from 10 to 80%, and formula (1) is satisfied: Rd=exp[{In(MYS)−In(14.5×Cr+48.3×Mo+20.7×W+6.9×N)}/0.195]  (1) wherein Rd is a reduction in area %, MYS is the targeted yield strength (MPa), and Cr, Mo, W and N are in mass %.
    • 具有758.3〜965.2MPa的最小屈服强度的双相不锈钢管的制造方法包括:第一热加工和任选的对具有以质量%计含有C:0.03%的化学组成的双相不锈钢材料管的溶液热处理, 以下,Si:1%以下,Mn:0.1〜4%,Cr:20〜35%,Ni:3〜10%,Mo:0〜6%,W:0〜6%,Cu:0〜3 %和N:0.15〜0.60%,余量为Fe和杂质。 然后在最终冷轧步骤中的面积减小方面的加工率Rd落在10〜80%的范围内的条件下冷却管,并且满足式(1):Rd = exp [ {In(MYS)-In(14.5×Cr + 48.3×Mo + 20.7×W + 6.9×N)} / 0.195](1)其中Rd是面积%的减小,MYS是目标屈服强度(MPa) Cr,Mo,W,N为质量%。
    • 8. 发明申请
    • Method for Producing Two-Phase Stainless Steel Pipe
    • 生产两相不锈钢管的方法
    • US20110024005A1
    • 2011-02-03
    • US12667667
    • 2008-07-08
    • Hitoshi Suwabe
    • Hitoshi Suwabe
    • C21D9/08B21C1/22
    • C22C38/02B21C1/003B21C1/22C21D6/001C21D6/002C21D6/004C21D6/005C21D7/02C21D8/10C21D8/105C21D9/08C21D2211/001C21D2211/004C21D2211/005C22C38/001C22C38/04C22C38/40C22C38/42C22C38/44
    • A two-phase stainless steel pipe that has not only a corrosion resistance required for oil well pipes but at the same time has a targeted strength is produced, without excessively adding alloying components, by selecting cold drawing conditions.A method for producing a two-phase stainless steel pipe, which comprises, preparing a two-phase stainless steel material having a chemical composition that consists of, by mass %, C: 0.03% or less, Si: 1% or less, Mn: 0.1 to 2%, Cr: 20 to 35%, Ni: 3 to 10%, Mo: 0 to 4%, W: 0 to 6%, Cu: 0 to 3% and N: 0.15 to 0.35%, and the balance being Fe and impurities, forming a material pipe by subjecting to a hot working or further a solid-solution heat treatment, and performing a cold drawing, where the cold drawing is characterized in being performed under the conditions that the working ratio Rd, in terms of the reduction of area, in the final cold drawing step is within a range from 5 to 35%, and the following formula (1) is satisfied: Rd(%)≧(MYS−55)/17.2−{1.2×Cr+3.0×(Mo+0.5×W)}  (1) wherein Rd and MYS signify the working ratio (%) in terms of the reduction of area and the targeted yield strength (MPa), respectively, and Cr, Mo and W signify the contents (mass %) of the individual elements, respectively.
    • 通过选择冷拔条件,不仅不会过分地添加合金成分,而且不仅具有油井管所需的耐腐蚀性,而且同时具有目标强度的两相不锈钢管。 一种两相不锈钢管的制造方法,其特征在于,制备具有以质量%计含有C:0.03%以下的Si:1%以下的化学成分的二相不锈钢材料,Mn:1%以下 :0.1〜2%,Cr:20〜35%,Ni:3〜10%,Mo:0〜4%,W:0〜6%,Cu:0〜3%,N:0.15〜0.35% 余量为Fe和杂质,通过进行热加工或进一步的固溶热处理形成材料管,并进行冷拉伸,其中冷拉伸的特征在于,在下述条件下进行: 在最终冷拉伸步骤中的面积减少度为5〜35%的范围,满足下式(1):Rd(%)≥(MYS-55)/17.2- {1.2×Cr + 3.0×(Mo + 0.5×W)}(1)其中Rd和MYS分别表示面积减小和目标屈服强度(MPa)的加工率(%),Cr,Mo和W表示 个人的内容(质量%) 元素。
    • 9. 发明授权
    • Polishing machine
    • 抛光机
    • US06916234B2
    • 2005-07-12
    • US10136872
    • 2002-05-01
    • Hitoshi Suwabe
    • Hitoshi Suwabe
    • B24B37/30B24B37/32B24B29/00
    • B24B37/32B24B37/30
    • A polishing machine in which adverse influence caused by a surface condition of a retainer ring can be reduced with a simple structure. The polishing machine includes a rotatable polishing plate; a top ring including a holding plate for holding and pressing a wafer onto a polishing cloth of the polishing plate; an independently rotating retainer ring in which the holding plate is freely inserted; and a positioning member for correctly positioning the retainer ring on the polishing cloth while the retainer ring is rotated. The retainer ring includes a pressing member which presses the polishing cloth along an outer edge of the wafer to make the level of the polishing cloth pressed by the pressing member substantially equal to that of the polishing cloth pressed by the wafer.
    • 能够以简单的结构减少由保持环的表面状态引起的不良影响的抛光机。 抛光机包括可旋转抛光板; 顶环,其包括用于将晶片保持并压在抛光板的抛光布上的保持板; 独立旋转的保持环,保持板自由地插入其中; 以及定位构件,用于在保持环旋转的同时将保持环正确地定位在抛光布上。 保持环包括沿着晶片的外边缘按压抛光布的按压构件,以使由按压构件按压的抛光布的水平基本上等于由晶片压制的抛光布的水平。