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1. 发明申请

US20050029687A1 Method for manufacturing magnetic recording medium substrates 审中-公开
标题翻译：磁记录介质基板的制造方法
公开(公告)号：US20050029687A1
公开(公告)日：2005-02-10
申请号：US10889474
申请日：2004-07-12
申请人： Masatoshi Ishii , Toshihiro Tsumori , Ken Ohashi
发明人： Masatoshi Ishii , Toshihiro Tsumori , Ken Ohashi
IPC分类号： B29D17/00 , G11B5/84
CPC分类号： G11B5/8404
摘要： Provided is a highly efficient method for manufacturing preferably a small diameter substrate for a magnetic recording medium. More specifically, provided is a method for manufacturing a substrate for a magnetic recording medium, comprising a step of coring for obtaining a plurality of doughnut-shaped substrates having a diameter at most 65 mm from a monocrystalline silicon wafer having a diameter at least 150 mm and at most 300 mm, wherein coring of an inner diameter and an outer diameter are carried out by different means. In said step of coring said coring of the inner diameter is preferably carried out by water jet cutting or laser cutting.
摘要翻译：本发明提供一种用于优选制造用于磁记录介质的小直径基板的高效方法。更具体地，提供了一种用于制造用于磁记录介质的基板的方法，包括从具有至少150mm的直径的单晶硅晶片获得直径至多65mm的多个环形基板的取芯步骤并且至多为300mm，其中内径和外径的取芯通过不同的方式进行。在所述取芯步骤中，所述内径的取芯优选通过水射流切割或激光切割进行。

2. 发明申请

US20050012245A1 Method for manufacturing magnetic recording medium substrates 审中-公开
标题翻译：磁记录介质基板的制造方法
公开(公告)号：US20050012245A1
公开(公告)日：2005-01-20
申请号：US10889272
申请日：2004-07-12
申请人： Masatoshi Ishii , Toshihiro Tsumori , Ken Ohashi
发明人： Masatoshi Ishii , Toshihiro Tsumori , Ken Ohashi
IPC分类号： B23K26/40 , G11B5/84 , H01S3/00 , B23K26/00 , B26D3/16
CPC分类号： G11B5/8404 , B23K26/40 , B23K2101/40 , B23K2103/50
摘要： Provided is a method for improving the productivity of a coring step. More specifically, provided is a method for manufacturing a substrate for a magnetic recording medium substrate, comprising a step of coring for obtaining a plurality of doughnut-shaped substrates having a diameter of at most 55 mm from a monocrystalline silicon wafer of a diameter having at least 150 mm and at most 300 mm, wherein the coring is performed such that a leftover wafer excluding the plurality of substrates remains in one piece. In said step of coring, the coring is preferably performed using a laser cutting or a water jet cutting such that said minimum width of said surface of said leftover wafer is 1.5 to 2.5 times the thickness of the wafer.
摘要翻译：提供了一种提高取芯步骤的生产率的方法。更具体地，提供了一种用于制造用于磁记录介质基板的基板的方法，包括以下步骤：从具有至少55mm直径的单晶硅晶片获得直径至多为55mm的多个环形基板至少150mm且至多300mm，其中进行取芯使得除了多个基板之外的剩余晶片保持一体。在所述取芯步骤中，所述取芯优选使用激光切割或水射流切割进行，使得所述剩余晶片的所述表面的所述最小宽度为所述晶片厚度的1.5至2.5倍。

3. 发明申请

US20050011860A1 Substrate for magnetic recording medium, method for manufacturing the same and magnetic recording medium 审中-公开
标题翻译：磁记录介质用基板，其制造方法及磁记录介质
公开(公告)号：US20050011860A1
公开(公告)日：2005-01-20
申请号：US10886769
申请日：2004-07-08
申请人： Masatoshi Ishii , Toshihiro Tsumori , Ken Ohashi
发明人： Masatoshi Ishii , Toshihiro Tsumori , Ken Ohashi
IPC分类号： G11B5/62 , B44C1/22 , C03C25/68 , C30B29/06 , C30B29/60 , C30B33/00 , G11B5/84 , H01L21/76
CPC分类号： C30B29/06 , C30B29/60 , C30B33/00
摘要： Provided is a substrate for a magnetic recording medium, preferably a substrate having a small diameter of not more than 65 mm, which is advantageous in respect of physical properties and cost. More specifically, provided is a substrate for a magnetic recording medium, using a monocrystalline silicon wafer which has been heated and/or etched at least once before. Moreover, provided is a method for manufacturing a substrate for a magnetic recording medium, the method comprising a step of coring for obtaining a plurality of doughnut-shaped substrates having an outer diameter of not more than 65 mm from a monocrystalline silicon wafer having a diameter of at least 150 mm and at most 300 mm which has undergone heating and/or etching at least once. The method may preferably further comprise a step of chamfering for removing edges of inner and outer circumferential faces of said doughnut-shaped substrate; and a step of circumferential face-polishing for polishing the chamfered inner and outer circumferential faces.
摘要翻译：提供了一种用于磁记录介质的基板，优选具有不大于65mm的小直径的基板，这在物理性能和成本方面是有利的。更具体地，提供了一种用于磁记录介质的基板，其使用已经被加热和/或蚀刻至少一次的单晶硅晶片。此外，提供了一种用于制造用于磁记录介质的基板的方法，该方法包括以下步骤：从具有直径不大于65mm的单晶硅晶片获得外径不大于65mm的多个环形基板至少150mm且至多300mm，其经过加热和/或蚀刻至少一次。该方法可以优选地还包括倒角步骤，用于去除所述环形基底的内周面和外周面的边缘; 以及用于研磨倒角的内周面和外周面的圆周面抛光步骤。

4. 发明授权

US06956233B2 Plated substrate for hard disk medium 失效
标题翻译：用于硬盘介质的镀覆基板
公开(公告)号：US06956233B2
公开(公告)日：2005-10-18
申请号：US10646500
申请日：2003-08-22
申请人： Toshihiro Tsumori , Masatoshi Ishii , Naofumi Shinya , Yu Hamaguchi , Yukimi Jyoko
发明人： Toshihiro Tsumori , Masatoshi Ishii , Naofumi Shinya , Yu Hamaguchi , Yukimi Jyoko
IPC分类号： G11B5/73 , G11B5/84 , H01L29/04
CPC分类号： G11B5/7315 , G11B5/8404 , Y10T428/12847 , Y10T428/12854 , Y10T428/12931
摘要： In plating on an Si substrate, it has been strongly demanded to apply a treatment for providing an excellent adhesion so as to resist a post-processing such as polishing and for facilitating plating. Then, provided is a plated substrate adapted for hard disk medium comprising an Si single crystal; an amorphous layer on the substrate, the amorphous layer having thickness of 2 to 200 nm and containing Si and one or more metals selected from a group consisting of Ni, Cu and Ag; a multicrystal layer on the amorphous layer, the multicrystal layer having thickness of 5 to 1000 nm and containing Si and one or more metals selected from a group consisting of Ni, Cu and Ag. Moreover, provided is a method for manufacturing a plated substrate adapted for hard disk medium comprising steps of applying a chemical etching treatment of a natural oxide film and a surface Si portion on an Si single crystal substrate; and forming a film on the etched surface of the substrate in a sulfate or hydrochloride bath containing no reductant within a pH range of 7.2 to 12.8 at liquid temperature of 70 to 100° C.
摘要翻译：在Si衬底上的电镀中，强烈要求施加用于提供优异的粘附性的处理，以便抵抗诸如抛光的后处理和便于电镀。然后，提供适于包含Si单晶的硬盘介质的电镀基板; 在所述基板上的非晶层，所述非晶层的厚度为2〜200nm，并且含有Si和选自Ni，Cu和Ag中的一种以上的金属; 在所述非晶层上的多晶层，所述多晶层的厚度为5〜1000nm，并且含有Si和选自Ni，Cu和Ag中的一种或多种金属。此外，提供一种适用于硬盘介质的电镀基板的制造方法，包括以下步骤：在Si单晶基板上施加天然氧化膜和表面Si部分的化学蚀刻处理; 并在70至100℃的液体温度下，在7.2至12.8的pH范围内，在不含还原剂的硫酸盐或盐酸浴中，在基板的蚀刻表面上形成薄膜。

5. 发明申请

US20050142284A1 Method for manufacturing a plated substrate adapted for hard disk medium 审中-公开
标题翻译：适用于硬盘介质的电镀基板的制造方法
公开(公告)号：US20050142284A1
公开(公告)日：2005-06-30
申请号：US11068153
申请日：2005-02-28
申请人： Toshihiro Tsumori , Masatoshi Ishii , Naofumi Shinya , Yu Hamaguchi , Yukimi Jyoko
发明人： Toshihiro Tsumori , Masatoshi Ishii , Naofumi Shinya , Yu Hamaguchi , Yukimi Jyoko
IPC分类号： G11B5/73 , G11B5/84 , B05D5/12
CPC分类号： G11B5/7315 , G11B5/8404 , Y10T428/12847 , Y10T428/12854 , Y10T428/12931
摘要： In plating on an Si substrate, it has been strongly demanded to apply a treatment for providing an excellent adhesion so as to resist a post-processing such as polishing and for facilitating plating. Then, provided is a plated substrate adapted for hard disk medium comprising an Si single crystal; an amorphous layer on the substrate, the amorphous layer having thickness of 2 to 200 nm and containing Si and one or more metals selected from a group consisting of Ni, Cu and Ag; a multicrystal layer on the amorphous layer, the multicrystal layer having thickness of 5 to 1000 nm and containing Si and one or more metals selected from a group consisting of Ni, Cu and Ag. Moreover, provided is a method for manufacturing a plated substrate adapted for hard disk medium comprising steps of applying a chemical etching treatment of a natural oxide film and a surface Si portion on an Si single crystal substrate; and forming a film on the etched surface of the substrate in a sulfate or hydrochloride bath containing no reductant within a pH range of 7.2 to 12.8 at liquid temperature of 70 to 100° C.
摘要翻译：在Si衬底上的电镀中，强烈要求施加用于提供优异的粘附性的处理，以便抵抗诸如抛光的后处理和便于电镀。然后，提供适于包含Si单晶的硬盘介质的电镀基板; 在所述基板上的非晶层，所述非晶层的厚度为2〜200nm，并且含有Si和选自Ni，Cu和Ag中的一种以上的金属; 在所述非晶层上的多晶层，所述多晶层的厚度为5〜1000nm，并含有Si和选自Ni，Cu和Ag中的一种以上的金属。此外，提供一种适用于硬盘介质的电镀基板的制造方法，包括以下步骤：在Si单晶基板上施加天然氧化膜和表面Si部分的化学蚀刻处理; 并在70至100℃的液体温度下，在7.2至12.8的pH范围内，在不含还原剂的硫酸盐或盐酸浴中，在基板的蚀刻表面上形成薄膜。

6. 发明申请

US20050008900A1 Substrate for magnetic recording medium 审中-公开
标题翻译：磁记录介质基板
公开(公告)号：US20050008900A1
公开(公告)日：2005-01-13
申请号：US10886119
申请日：2004-07-07
申请人： Masatoshi Ishii , Toshihiro Tsumori , Yu Hamaguchi
发明人： Masatoshi Ishii , Toshihiro Tsumori , Yu Hamaguchi
IPC分类号： G11B5/667 , G11B5/73 , G11B5/84 , G11B5/64
CPC分类号： G11B5/667 , G11B5/7315 , G11B5/8404 , Y10T428/31
摘要： Provided are a surface-treated substrate for a magnetic recording medium which has uniform properties with regards to film formation above a non-magnetic substrate and can contain thick film, and the magnetic recoding medium comprising a recording layer. More specifically, it has been found that it is effective that the surface-treated substrate for the magnetic recording medium comprises a non-magnetic substrate and a primer plating layer disposed on the non-magnetic substrate wherein the non-magnetic substrate has been subjected to hydrophilic treatment. It has been also found that a magnetic recording medium comprising the surface-treated substrate for a magnetic recording medium, a soft magnetic layer and a recording layer is preferable as a perpendicular magnetic recording medium. Furthermore, it has been found that it is effective that the surface-treated substrate for a magnetic recording medium comprises a non-magnetic substrate and a primer plating layer on the non-magnetic substrate wherein a surface of the non-magnetic substrate comprises dimple shapes of a diameter at least 50 nm and less than 1000 nm, and of a depth less than the diameter.
摘要翻译：提供了一种用于磁记录介质的表面处理基板，其在非磁性基板上形成膜时具有均匀的性质，并且可以包含厚膜，并且磁记录介质包括记录层。更具体地，已经发现，用于磁记录介质的经表面处理的基板包括非磁性基板和设置在非磁性基板上的底涂层，其中非磁性基板已经经受亲水处理。还发现，作为垂直磁记录介质，优选包括用于磁记录介质的表面处理衬底，软磁层和记录层的磁记录介质。此外，已经发现，表面处理的磁记录介质的基板在非磁性基板上包括非磁性基板和底漆镀层是有效的，其中非磁性基板的表面包括凹坑形状直径小于50nm且小于1000nm，深度小于直径。

7. 发明申请

US20050191525A1 Magnetic recording medium and magnetic recording medium substrate 审中-公开
标题翻译：磁记录介质和磁记录介质基板
公开(公告)号：US20050191525A1
公开(公告)日：2005-09-01
申请号：US11063154
申请日：2005-02-22
申请人： Toshihiro Tsumori , Yu Hamaguchi
发明人： Toshihiro Tsumori , Yu Hamaguchi
IPC分类号： G11B5/147 , G11B5/66 , G11B5/73 , G11B5/84 , H01F1/00 , H01F10/16 , H01F41/24 , H01F41/32
CPC分类号： G11B5/8404 , G11B5/667 , G11B5/7315 , H01F10/16 , H01F41/24 , H01F41/32
摘要： A magnetic recording medium substrate has a diameter of not more than 90 mm and disposed thereon a soft magnetic film plating layer comprising an alloy that comprises at least two metals selected from the group consisting of Co, Ni and Fe. In a concentric circular direction within the substrate plane, a value of the coercive force obtained by a VSM magnetization measurement, is less than 30 oersteds, and a ratio of saturation magnetization to residual magnetization is from 50/1 to 5/1. Spike noise deterioration of signal reproduction caused by leaking magnetic fields is reduced in the soft magnetic layer.
摘要翻译：磁记录介质基板的直径不大于90mm，并且在其上设置包括合金的软磁性电镀层，所述合金包含选自由Co，Ni和Fe组成的组中的至少两种金属。在基板平面内的同心圆形方向上，通过VSM磁化测量获得的矫顽力的值小于30奥斯特，饱和磁化强度与剩余磁化强度的比值为50/1至5/1。在软磁层中降低了由磁场泄漏引起的信号再现的尖峰噪声恶化。

8. 发明申请

US20050057855A1 Magnetic recording medium and substrate for magnetic recording medium 失效
标题翻译：磁记录介质和磁记录介质用基板
公开(公告)号：US20050057855A1
公开(公告)日：2005-03-17
申请号：US10935519
申请日：2004-09-07
申请人： Tetsuya Osaka , Toru Asahi , Tokihiko Yokoshima , Toshihiro Tsumori
发明人： Tetsuya Osaka , Toru Asahi , Tokihiko Yokoshima , Toshihiro Tsumori
IPC分类号： G11B5/00 , G11B5/667 , G11B5/73 , G11B5/74 , G11B5/84 , G11B5/82 , G11B15/64 , G11B17/32
CPC分类号： G11B5/667 , G11B5/00 , G11B5/7315 , G11B5/74 , G11B5/8404 , G11B2005/001 , G11B2005/0029
摘要： When a soft magnetic layer for a double layer type perpendicular magnetic recording medium is formed by a plating method, there is the problem of the occurrence of an isolated pulse noise called spike noise so that signal reproduction characteristics are lost. In order to solve this problem, provided are a surface-treated substrate for a magnetic recording medium comprising a substrate having a diameter of not more than 90 mm, and a soft magnetic plating layer comprising an alloy of at least two metals selected from the group consisting of Co, Ni and Fe, which is provided above the substrate, wherein the soft magnetic layer has a coercivity of less than 20 oersted (Oe) in a direction that is parallel to a substrate surface, and wherein a ratio of saturation magnetization to residual magnetization in a direction that is parallel to a surface of the substrate is from 4:1 to 4:3; and a magnetic recording medium comprising the magnetic recording medium substrate.
摘要翻译：当通过电镀法形成双层型垂直磁记录介质的软磁性层时，存在称为尖峰噪声的孤立脉冲噪声的问题，从而丢失了信号再现特性。为了解决这个问题，提供了一种用于磁记录介质的经表面处理的基板，其包括直径不大于90mm的基板，以及软磁性镀层，该软磁性镀层包含选自以下的至少两种金属由Co，Ni和Fe组成，其设置在衬底上方，其中软磁性层在平行于衬底表面的方向上具有小于20奥斯特（Oe）的矫顽力，并且其中饱和磁化强度与在平行于衬底表面的方向上的剩余磁化强度为4:1至4:3; 以及包括磁记录介质基板的磁记录介质。

9. 发明申请

US20120286439A1 PREPARATION OF PARTICULATE POSITIVE ELECTRODE MATERIAL FOR LITHIUM ION CELLS 审中-公开
标题翻译：用于锂离子电池的颗粒状阳极电极材料的制备
公开(公告)号：US20120286439A1
公开(公告)日：2012-11-15
申请号：US13462033
申请日：2012-05-02
申请人： Toshihiro Tsumori , Yasushi Takai
发明人： Toshihiro Tsumori , Yasushi Takai
IPC分类号： H01M4/08 , B29B9/00
CPC分类号： H01M4/5825 , C01B25/37 , C01B25/45 , H01M4/625 , H01M2004/021
摘要： A particulate positive electrode material for lithium ion cells is prepared by dispersing manganese(II) sulfate, iron(II) sulfate, and lithium phosphate and/or lithium hydrogenphosphate in water to form a slurry, effecting hydrothermal reaction in an autoclave to synthesize a lithium compound: LiMnxFe1-xPO4 wherein x=0.05 to 0.5 as primary particles, preparing a dispersion comprising the primary particles and an organic substance, spraying the dispersion, granulating, and drying to form aggregated particles having an average particle size of 0.5-4 μm, and firing the aggregated particles at 600-780° C. for carbonizing the organic substance therein, yielding secondary particles having a reduced carbon content.
摘要翻译：通过将硫酸锰（II），硫酸铁（II）和磷酸锂和/或磷酸氢锂分散在水中以形成浆料来制备用于锂离子电池的颗粒状正极材料，在高压釜中进行水热反应以合成锂化合物：LiMnxFe1-xPO4，其中x = 0.05〜0.5作为一次粒子，制备包含一次粒子和有机物质的分散液，喷雾分散体，造粒和干燥，形成平均粒径为0.5-4μm的凝集粒子，并在600-780℃下烧结聚集的颗粒，以使其中的有机物质碳化，得到具有降低的碳含量的二次颗粒。

10. 发明授权

US07238384B2 Substrate for perpendicular magnetic recording hard disk medium and method for producing the same 失效
标题翻译：用于垂直磁记录硬盘介质的基板及其制造方法
公开(公告)号：US07238384B2
公开(公告)日：2007-07-03
申请号：US11181109
申请日：2005-07-14
申请人： Toshihiro Tsumori
发明人： Toshihiro Tsumori
IPC分类号： B05D5/12 , C03C27/00 , C03C29/00
CPC分类号： G11B5/667 , G11B5/8404
摘要： Proposed are a substrate that comprises an easily producible soft magnetic backing film and can reduce spike noise from the soft magnetic backing film, and a method for producing the substrate. More specifically, provided are a substrate for a perpendicular magnetic recording hard disk medium, comprising an Si single crystal substrate (1) having a diameter of 65 mm or less, a thickness of 1 mm or less and an average surface roughness (Rms) of 1 nm or more and 1000 nm or less; an under-plated layer (2) formed on the substrate, the layer (2) comprising one or more metals selected from a group consisting of Ni, Cu and Ag and having a thickness of 1 nm to 300 nm; and a plated soft magnetic layer (3) formed on the under-plated layer, the layer (3) having a thickness of 50 nm or more and less than 1000 nm, a coercivity of 20 Oe(oersteds) or less and a saturation magnetization of 1T or more, wherein the average surface roughness (Rms) of the plated soft magnetic layer is 0.1 nm or more and 5 nm or less.
摘要翻译：提出的是包含易于制造的软磁背衬膜并可以减少来自软磁性背衬膜的尖峰噪声的基板，以及用于制造基板的方法。更具体地说，提供一种用于垂直磁记录硬盘介质的基板，包括直径为65mm或更小，厚度为1mm或更小的Si单晶基板（1）和平均表面粗糙度（Rms）为 1nm以上且1000nm以下; 形成在所述基板上的下镀层（2），所述层（2）包含选自Ni，Cu和Ag中的一种或多种金属，并且具有1nm至300nm的厚度; 以及形成在所述下镀层上的镀层软磁性层（3），所述层（3）的厚度为50nm以上且小于1000nm，矫顽磁力为20Oe（奥斯特）以下，饱和磁化强度为1T以上，其中，所述电镀软磁性层的平均表面粗糙度（Rms）为0.1nm以上且5nm以下。

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