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1. 发明授权

US06827787B2 Conveyor device and film formation apparatus for a flexible substrate 有权
标题翻译：用于柔性基底的输送装置和成膜装置
公开(公告)号：US06827787B2
公开(公告)日：2004-12-07
申请号：US09777280
申请日：2001-02-05
申请人： Masato Yonezawa , Naoto Kusumoto , Hisato Shinohara
发明人： Masato Yonezawa , Naoto Kusumoto , Hisato Shinohara
IPC分类号： C23C1600
CPC分类号： C23C16/545
摘要： With a conventional cylindrical can method, a region used as a film formation ground electrode is a portion of the cylindrical can, and an apparatus becomes larger in size in proportion to the surface area of the electrode. A conveyor device and a film formation apparatus having the conveyor device are provided, which have a unit for continuously conveying a flexible substrate from one end to the other end, and which are characterized in that a plurality of cylindrical rollers are provided between the one end and the other end along an arc with a radius R, the cylindrical rollers being arranged such that their center axes run parallel to each other, and that a mechanism for conveying the flexible substrate while the substrate is in contact with each of the plurality of cylindrical rollers is provided.
摘要翻译：采用常规的圆筒罐法，用作成膜接地电极的区域是圆筒形罐的一部分，并且设备的尺寸与电极的表面积成比例变大。本发明提供一种具有输送装置的输送装置和成膜装置，其具有从一端向另一端连续输送柔性基板的单元，其特征在于，在一端并且另一端沿着具有半径R的圆弧，所述圆柱滚子被布置成使得它们的中心轴彼此平行地延伸;以及用于在所述基板与所述多个圆柱体中的每一个接触的同时传送所述柔性基板的机构提供滚筒。

2. 发明申请

US20050061246A1 Conveyor device and film formation apparatus for a flexible substrate 有权
公开(公告)号：US20050061246A1
公开(公告)日：2005-03-24
申请号：US10981582
申请日：2004-11-05
申请人： Masato Yonezawa , Naoto Kusumoto , Hisato Shinohara
发明人： Masato Yonezawa , Naoto Kusumoto , Hisato Shinohara
IPC分类号： C23C16/505 , C23C16/00 , C23C16/54 , H01L21/205 , H01L21/677 , H01L31/04
CPC分类号： C23C16/545
摘要： With a conventional cylindrical can method, a region used as a film formation ground electrode is a portion of the cylindrical can, and an apparatus becomes larger in size in proportion to the surface area of the electrode. A conveyor device and a film formation apparatus having the conveyor device are provided, which have a unit for continuously conveying a flexible substrate from one end to the other end, and which are characterized in that a plurality of cylindrical rollers are provided between the one end and the other end along an arc with a radius R, the cylindrical rollers being arranged such that their center axes run parallel to each other, and that a mechanism for conveying the flexible substrate while the substrate is in contact with each of the plurality of cylindrical rollers is provided.

3. 发明授权

US07594479B2 Plasma CVD device and discharge electrode 有权
标题翻译：等离子体CVD装置和放电电极
公开(公告)号：US07594479B2
公开(公告)日：2009-09-29
申请号：US09820520
申请日：2001-03-28
申请人： Masato Yonezawa , Naoto Kusumoto , Hisato Shinohara
发明人： Masato Yonezawa , Naoto Kusumoto , Hisato Shinohara
IPC分类号： H01L21/306 , C23C16/00
CPC分类号： H01J37/3244 , C23C16/4401 , C23C16/50 , C23C16/545 , H01J2237/022
摘要： In a film formation chamber, a gas flow to be introduced is rectified in a direction away from the film formation surface of the substrate on which the film is to be formed, so as to exhaust the fine particles generated in the discharge space and the fragmental particles generated by exfoliation of the film from the wall of the vacuum chamber and the discharge electrode, thereby preventing the particles from adhering the film formation surface of the substrate. The fine particles and fragmental particles are sucked and exhausted from a plurality of apertures provided on the entire surface of the discharge electrode to establish a steady state in which the amount of a film deposited on the discharge electrode and the amount of an exfoliating film to be exhausted are equal to each other, thereby allowing continuous film formation without cleaning the discharge electrode over a long period.
摘要翻译：在成膜室中，将导入的气流沿着与要形成膜的基板的成膜面相反的方向被整流，从而排出在放电空间中产生的微粒和碎片通过从真空室的壁和放电电极剥离膜而产生的颗粒，从而防止颗粒粘附基材的成膜表面。从设置在放电电极的整个表面上的多个孔吸引和排出细颗粒和碎片颗粒，以建立稳定状态，其中沉积在放电电极上的膜的量和剥离膜的量为排气量相等，从而允许连续成膜而不用长时间清洗放电电极。

4. 发明申请

US20050235914A1 Conveyor device and film formation apparatus for a flexible substrate 有权
公开(公告)号：US20050235914A1
公开(公告)日：2005-10-27
申请号：US11157925
申请日：2005-06-22
申请人： Masato Yonezawa , Naoto Kusumoto , Hisato Shinohara
发明人： Masato Yonezawa , Naoto Kusumoto , Hisato Shinohara
IPC分类号： C23C16/505 , C23C16/00 , C23C16/54 , H01L21/205 , H01L21/677 , H01L31/04
CPC分类号： C23C16/545
摘要： With a conventional cylindrical can method, a region used as a film formation ground electrode is a portion of the cylindrical can, and an apparatus becomes larger in size in proportion to the surface area of the electrode. A conveyor device and a film formation apparatus having the conveyor device are provided, which have a unit for continuously conveying a flexible substrate from one end to the other end, and which are characterized in that a plurality of cylindrical rollers are provided between the one end and the other end along an arc with a radius R, the cylindrical rollers being arranged such that their center axes run parallel to each other, and that a mechanism for conveying the flexible substrate while the substrate is in contact with each of the plurality of cylindrical rollers is provided.

5. 发明授权

US06916509B2 Conveyor device and film formation apparatus for a flexible substrate 有权
标题翻译：用于柔性基底的输送装置和成膜装置
公开(公告)号：US06916509B2
公开(公告)日：2005-07-12
申请号：US10981582
申请日：2004-11-05
申请人： Masato Yonezawa , Naoto Kusumoto , Hisato Shinohara
发明人： Masato Yonezawa , Naoto Kusumoto , Hisato Shinohara
IPC分类号： C23C16/505 , C23C16/00 , C23C16/54 , H01L21/205 , H01L21/677 , H01L31/04 , H01F1/00 , H01L21/00
CPC分类号： C23C16/545
摘要： With a conventional cylindrical can method, a region used as a film formation ground electrode is a portion of the cylindrical can, and an apparatus becomes larger in size in proportion to the surface area of the electrode. A conveyor device and a film formation apparatus having the conveyor device are provided, which have a unit for continuously conveying a flexible substrate from one end to the other end, and which are characterized in that a plurality of cylindrical rollers are provided between the one end and the other end along an arc with a radius R, the cylindrical rollers being arranged such that their center axes run parallel to each other, and that a mechanism for conveying the flexible substrate while the substrate is in contact with each of the plurality of cylindrical rollers is provided.
摘要翻译：采用常规的圆筒罐法，用作成膜接地电极的区域是圆筒形罐的一部分，并且设备的尺寸与电极的表面积成比例变大。本发明提供一种具有输送装置的输送装置和成膜装置，其具有从一端向另一端连续输送柔性基板的单元，其特征在于，在一端并且另一端沿着具有半径R的圆弧，所述圆柱滚子被布置成使得它们的中心轴彼此平行地延伸;以及用于在所述基板与所述多个圆柱体中的每一个接触的同时传送所述柔性基板的机构提供滚筒。

6. 发明授权

US07510901B2 Conveyor device and film formation apparatus for a flexible substrate 有权
标题翻译：用于柔性基底的输送装置和成膜装置
公开(公告)号：US07510901B2
公开(公告)日：2009-03-31
申请号：US11157925
申请日：2005-06-22
申请人： Masato Yonezawa , Naoto Kusumoto , Hisato Shinohara
发明人： Masato Yonezawa , Naoto Kusumoto , Hisato Shinohara
IPC分类号： H01L21/00
CPC分类号： C23C16/545
摘要： With a conventional cylindrical can method, a region used as a film formation ground electrode is a portion of the cylindrical can, and an apparatus becomes larger in size in proportion to the surface area of the electrode. A conveyor device and a film formation apparatus having the conveyor device are provided, which have a unit for continuously conveying a flexible substrate from one end to the other end, and which are characterized in that a plurality of cylindrical rollers are provided between the one end and the other end along an arc with a radius R, the cylindrical rollers being arranged such that their center axes run parallel to each other, and that a mechanism for conveying the flexible substrate while the substrate is in contact with each of the plurality of cylindrical rollers is provided.
摘要翻译：采用常规的圆筒罐法，用作成膜接地电极的区域是圆筒形罐的一部分，并且设备的尺寸与电极的表面积成比例变大。本发明提供一种具有输送装置的输送装置和成膜装置，其具有从一端向另一端连续输送柔性基板的单元，其特征在于，在一端并且另一端沿着具有半径R的圆弧，所述圆柱滚子被布置成使得它们的中心轴彼此平行地延伸;以及用于在所述基板与所述多个圆柱体中的每一个接触的同时传送所述柔性基板的机构提供滚筒。

7. 发明授权

US06620288B2 Substrate treatment apparatus 有权
公开(公告)号：US06620288B2
公开(公告)日：2003-09-16
申请号：US09812327
申请日：2001-03-19
申请人： Hisato Shinohara , Naoto Kusumoto , Masato Yonezawa
发明人： Hisato Shinohara , Naoto Kusumoto , Masato Yonezawa
IPC分类号： H01L21306
CPC分类号： H01L21/67017 , C23C14/562 , C23C16/545 , H01J37/32458 , H01J37/34
摘要： In the substrate treatment apparatus including substrate treatment chambers (301 and 303) and a buffer chamber (302) having an exhaust system (306b) independent of the substrate treatment chambers, connection tubes (304a and 304b) are provided between the substrate treatment chambers and the buffer chamber, and gas inlets are respectively provided for the connection tubes. A gas (308) for treating a substrate flows from the connection tube (304a) into the substrate treatment chamber (301) and the buffer chamber (302), while a gas (309) for treating a substrate flows from the connection tube (304b) into the substrate treatment chamber (303) and the buffer chamber (302). Accordingly, the gas does not move from the substrate treatment chamber to the buffer chamber against a gas flow, thereby allowing the separation between ambiences.

8. 发明授权

US07528057B2 Laser annealing method and laser annealing device 失效
标题翻译：激光退火方法和激光退火装置
公开(公告)号：US07528057B2
公开(公告)日：2009-05-05
申请号：US11382079
申请日：2006-05-08
申请人： Naoto Kusumoto , Toru Takayama , Masato Yonezawa
发明人： Naoto Kusumoto , Toru Takayama , Masato Yonezawa
IPC分类号： H01L21/20
CPC分类号： H01L21/67167 , H01L21/02068 , H01L21/02422 , H01L21/02488 , H01L21/02532 , H01L21/02672 , H01L21/02686 , H01L21/67207 , H01L21/67213 , H01L27/1296 , H01L29/66757 , Y10S438/905 , Y10S438/906
摘要： A laser-annealing method includes the steps of a first step of cleaning a non-monocrystal silicon film formed on a substrate, and a second step of laser-annealing the non-monocrystal silicon film in an atmosphere containing oxygen therein, wherein the first and second steps are conducted continuously without being exposed to the air. Also, a laser-annealing device includes a cleaning chamber, and a laser irradiation chamber, wherein a substrate to be processed is transported between the cleaning chamber and the laser irradiation chamber without being exposed to the air.
摘要翻译：激光退火方法包括清洗形成在基板上的非单晶硅膜的第一步骤和在其中含有氧的气氛中对非单晶硅膜进行激光退火的第二步骤，其中第一和连续地进行第二步骤而不暴露于空气。此外，激光退火装置包括清洁室和激光照射室，其中待处理的基板在清洁室和激光照射室之间传送而不暴露于空气。

9. 发明申请

US20060211182A1 Laser Annealing Method and Laser Annealing Device 失效
标题翻译：激光退火方法和激光退火装置
公开(公告)号：US20060211182A1
公开(公告)日：2006-09-21
申请号：US11382079
申请日：2006-05-08
申请人： Naoto Kusumoto , Toru Takayama , Masato Yonezawa
发明人： Naoto Kusumoto , Toru Takayama , Masato Yonezawa
IPC分类号： H01L21/84 , H01L21/302 , H01L21/00 , H01L21/461
CPC分类号： H01L21/67167 , H01L21/02068 , H01L21/02422 , H01L21/02488 , H01L21/02532 , H01L21/02672 , H01L21/02686 , H01L21/67207 , H01L21/67213 , H01L27/1296 , H01L29/66757 , Y10S438/905 , Y10S438/906
摘要： A laser-annealing method includes the steps of a first step of cleaning a non-monocrystal silicon film formed on a substrate, and a second step of laser-annealing the non-monocrystal silicon film in an atmosphere containing oxygen therein, wherein the first and second steps are conducted continuously without being exposed to the air. Also, a laser-annealing device includes a cleaning chamber, and a laser irradiation chamber, wherein a substrate to be processed is transported between the cleaning chamber and the laser irradiation chamber without being exposed to the air.
摘要翻译：激光退火方法包括清洗形成在基板上的非单晶硅膜的第一步骤和在其中含有氧的气氛中对非单晶硅膜进行激光退火的第二步骤，其中第一和连续地进行第二步骤而不暴露于空气。此外，激光退火装置包括清洁室和激光照射室，其中待处理的基板在清洁室和激光照射室之间传送而不暴露于空气。

10. 发明授权

US6027960A Laser annealing method and laser annealing device 失效
公开(公告)号：US6027960A
公开(公告)日：2000-02-22
申请号：US735554
申请日：1996-10-23
申请人： Naoto Kusumoto , Toru Takayama , Masato Yonezawa
发明人： Naoto Kusumoto , Toru Takayama , Masato Yonezawa
IPC分类号： H01L29/786 , H01L21/00 , H01L21/20 , H01L21/336 , H01L21/84
CPC分类号： H01L21/67167 , H01L21/02068 , H01L21/02422 , H01L21/02488 , H01L21/02532 , H01L21/02672 , H01L21/02686 , H01L21/67207 , H01L21/67213 , H01L29/66757 , H01L27/1296 , Y10S438/905 , Y10S438/906
摘要： A laser-annealing method includes the steps of a first step of cleaning a non-monocrystal silicon film formed on a substrate, and a second step of laser-annealing the non-monocrystal silicon film in an atmosphere containing oxygen therein, wherein the first and second steps are conducted continuously without being exposed to the air. Also, a laser-annealing device includes a cleaning chamber, and a laser irradiation chamber, wherein a substrate to be processed is transported between the cleaning chamber and the laser irradiation chamber without being exposed to the air.

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