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1. 发明授权

US5252827A Method and apparatus for analysis of gases using plasma 失效
标题翻译：使用等离子体分析气体的方法和装置
公开(公告)号：US5252827A
公开(公告)日：1993-10-12
申请号：US753633
申请日：1991-08-30
申请人： Masataka Koga , Toyoharu Okumoto , Hiromi Yamashita , Katuo Kawachi , Yukio Okamoto
发明人： Masataka Koga , Toyoharu Okumoto , Hiromi Yamashita , Katuo Kawachi , Yukio Okamoto
IPC分类号： G01N27/68 , G01N21/73 , H01J49/04 , B01D59/44 , H01J49/00
CPC分类号： H01J49/0422 , H01J49/105
摘要： In the analysis of a specimen gas for at least one impurity, the specimen is fed to a microwave-induced plasma and the plasma is analyzed for the impurity. The plasma is formed by gases fed to it via an inner tube and an outer tube around said inner tube. The specimen is fed in undiluted form via the inner tube and a second gas which may be a standard gas is fed via the outer tube. The specimen gas and the second gas have compositions which are the same as to at least 75% by volume, e.g. are both air. A variety of analysis processes is made available.

2. 发明授权

US5202562A High sensitive element analyzing method and apparatus of the same 失效
标题翻译：高灵敏度元素分析方法及装置
公开(公告)号：US5202562A
公开(公告)日：1993-04-13
申请号：US724179
申请日：1991-07-01
申请人： Masataka Koga , Toyoharu Okumoto , Masatoshi Kitagawa , Masamichi Tsukada , Yukio Okamoto
发明人： Masataka Koga , Toyoharu Okumoto , Masatoshi Kitagawa , Masamichi Tsukada , Yukio Okamoto
IPC分类号： G01N27/62 , H01J37/244 , H01J49/04 , H01J49/26
CPC分类号： H01J49/04
摘要： A standard containing the same elements as a sample is prepared. Concentrations of the elements of the standard are known previously. When signal intensities of an element of the standard solution and the sample exceed an upper limit of a pulse counter of an element analyzing apparatus, a transmitting rate of a passage, through which ionized elements of the standard and the sample pass, is controlled to be less than the ordinal transmitting rate of the passage in synchronism to the passing time of the elements. The concentrations of the elements of the sample is calculated based on output signals of the pulse counter concerning the elements of the standard and the sample and known concentration of the standard.
摘要翻译：制备含有与样品相同元素的标准品。标准要素的浓度先前已知。当标准溶液和样品的元素的信号强度超过元素分析装置的脉冲计数器的上限时，将标准品和样品通过的通道的透射率控制为小于通道的顺序传输速率与元件的通过时间同步。基于脉冲计数器的输出信号计算样品的元素浓度，该脉冲计数器与标准品和样品的元素以及标准品的已知浓度相关。

3. 发明授权

US4963735A Plasma source mass spectrometer 失效
标题翻译：等离子体质谱仪
公开(公告)号：US4963735A
公开(公告)日：1990-10-16
申请号：US432895
申请日：1989-11-07
申请人： Yukio Okamoto , Tsutomu Komoda , Satoshi Shimura , Seiichi Murayama , Masataka Koga
发明人： Yukio Okamoto , Tsutomu Komoda , Satoshi Shimura , Seiichi Murayama , Masataka Koga
IPC分类号： H01J49/10
CPC分类号： H01J49/10
摘要： A plasma source mass spectrometer in which ions in a plasma generated in a high pressure (.ltoreq.1 atm) region are introduced into a low pressure (.ltoreq.10.sup.-5 Torr) region to analysis the ion mass includes a moderate pressure (.gtoreq.10.sup.-3 Torr) region which is provided between the high pressure region and the low pressure region. The plasma generated in the high pressure region is diffused to the moderate pressure region in order to produce a diffused plasma. Ions are extracted from the diffused plasma by an ion extraction electrode having an ion extraction opening. In the vicinity of the ion extraction opening a convex-shaped toward the diffused plasma whereby ion sheath is formed, whereby the ions can be extracted toward the low pressure region with a high efficiency.
摘要翻译：一种等离子体质谱仪，其中将高压（ / = 10-3Torr）区域，其设置在高压区域和低压区域之间。在高压区域中产生的等离子体扩散到中等压力区域以产生漫射等离子体。通过具有离子提取开口的离子提取电极从扩散的等离子体中提取离子。在离子提取开口附近，向扩散等离子体形成凸状，从而形成离子鞘，能够高效地向低压区域取出离子。

4. 发明授权

US5148021A Mass spectrometer using plasma ion source 失效
标题翻译：使用等离子体源的质谱仪
公开(公告)号：US5148021A
公开(公告)日：1992-09-15
申请号：US630554
申请日：1990-12-20
申请人： Yukio Okamoto , Satoshi Shimura , Konosuke Oishi , Masataka Koga , Makoto Yasuda , Takahashi Iino
发明人： Yukio Okamoto , Satoshi Shimura , Konosuke Oishi , Masataka Koga , Makoto Yasuda , Takahashi Iino
IPC分类号： G01N27/62 , H01J49/06 , H01J49/12 , H01J49/26
CPC分类号： H01J49/06
摘要： A mass spectrometer using a plasma ion source for analyzing an ultra-trace element includes a plasma generation system for generating a plasma including the composition of a sample, an ion beam formation system for extracting ions in the form of a beam from the plasma generating the ions, a mass spectrometry system for performing mass spectrometry of the ion beamn, and an ion detection system for detecting the ions subjected to the mass spectrometry, in which a lens system made up of a cylindrical first electrode, a cylindrical second electrode with a photon stopper disposed on the central axis thereof, and a cylindrical third electrode is further provided between the ion beam formation system and the mass spectrometry system. By the provision of the lens system, the ions generated in the plasma are transported more efficiently to the side of the mass spectrometry system and by the provision of the photon stopper in the above described position, it is achieved, with a simpler structure, to prevent photons from entering the ion detection system.
摘要翻译：使用等离子体离子源分析超微量元素的质谱仪包括：等离子体产生系统，用于产生包含样品组成的等离子体;离子束形成系统，用于从等离子体中提取离子的形式，离子，用于进行离子束的质谱分析的质谱系统和用于检测进行质谱分析的离子的离子检测系统，其中由圆柱形第一电极构成的透镜系统，具有光子的圆柱形第二电极止动件设置在其中心轴上，并且在离子束形成系统和质谱系统之间还设置有圆柱形的第三电极。通过设置透镜系统，在等离子体中产生的离子更有效地传输到质谱系统的侧面，并且通过在上述位置提供光子停止器，以更简单的结构实现防止光子进入离子检测系统。

5. 发明授权

US5086255A Microwave induced plasma source 失效
标题翻译：微波诱导等离子体源
公开(公告)号：US5086255A
公开(公告)日：1992-02-04
申请号：US473430
申请日：1990-02-01
申请人： Yukio Okamoto , Makoto Yasuda , Masataka Koga
发明人： Yukio Okamoto , Makoto Yasuda , Masataka Koga
IPC分类号： H01J49/12 , H01J49/10 , H05H1/46
CPC分类号： H01J49/105 , H05H1/46
摘要： A microwave induced plasma source includes a coaxial waveguide made up of a cylindrical outer conductor and an inner conductor which has the form of a helical coil, a discharge tube inserted into the helical coil in the axial direction thereof, and having an inner tube for introducing a sample and an outer tube for introducing a plasma gas so that a double tube structure is formed, a discharge-tube cooling device for causing a cooling gas to flow along the outer periphery of the discharge tube in directions parallel to the axis thereof, and a microwave power source for supplying microwave power to the coaxial waveguide. When the microwave induced plasma source is used as the light source of a spectrometer or the ion source of a mass spectrometer, a trace element can be readily determined qualitatively or quantitatively.
摘要翻译：微波感应等离子体源包括由圆柱形外导体和内导体组成的同轴波导，该导体具有螺旋线圈的形式，沿轴向插入螺旋线圈的放电管，并具有用于引入的内管用于引入等离子体气体以形成双管结构的样品和外管，用于使冷却气体沿着平行于其轴线的方向沿着排出管的外周流动的放电管冷却装置，以及用于向同轴波导提供微波功率的微波电源。当微波感应等离子体源用作光谱仪的光源或质谱仪的离子源时，微量元素可以容易地定性或定量地确定。

6. 发明授权

US4902099A Trace element spectrometry with plasma source 失效
标题翻译：带有等离子体源的微量元素光谱
公开(公告)号：US4902099A
公开(公告)日：1990-02-20
申请号：US285754
申请日：1988-12-16
申请人： Yukio Okamoto , Makoto Yasuda , Seiichi Murayama , Masataka Koga
发明人： Yukio Okamoto , Makoto Yasuda , Seiichi Murayama , Masataka Koga
IPC分类号： H01J49/36 , G01N21/73 , G01N27/62 , H01J27/16 , H01J37/08 , H01J49/10 , H05H1/46
CPC分类号： G01N21/73
摘要： A plasma trace element spectrometer comprises a microwave generator for generating microwave power, a microwave feeder for guiding and transforming the generated microwave power into microwave power of TE.sub.01 mode and supplying the microwave power of TE.sub.01 mode, a plasma producer having, at one end, an introduction port for a carrier gas and a sample and at the other end an opening and being cooperative with the supplied microwave power of TE.sub.01 mode to produce plasma of the carrier gas and sample introduced through the introduction port, and a spectrometer for analyzing constituent elements of the sample by measuring the produced plasma by way of the opening.
摘要翻译：等离子体微量元素光谱仪包括微波发生器，用于产生微波功率;微波馈线，用于引导和转换所产生的微波功率为TE01模式的微波功率，并提供TE01模式的微波功率;等离子体生产器的一端为用于载气和样品的引入口，另一端为开口，与TE01模式的所提供的微波功率协调，以产生载气和通过引入口引入的样品的等离子体，以及用于分析通过开口测量产生的等离子体的样品。

7. 发明授权

US5130537A Plasma analyzer for trace element analysis 失效
标题翻译：等离子体分析仪用于跟踪元素分析
公开(公告)号：US5130537A
公开(公告)日：1992-07-14
申请号：US674407
申请日：1991-03-25
申请人： Yukio Okamoto , Takashi Iino , Satoshi Shimura , Masamichi Tsukada , Hiromi Yamashita , Masatoshi Kitagawa
发明人： Yukio Okamoto , Takashi Iino , Satoshi Shimura , Masamichi Tsukada , Hiromi Yamashita , Masatoshi Kitagawa
IPC分类号： G01N27/62 , G01N21/73 , H01J49/04
CPC分类号： G01N21/73
摘要： A plasma analyzer for trace element analysis has a gas supply system comprising a plurality of gas sources, an electromagnetic valve provided on a line connecting each gas source to a plasma generating space, a buffer tank provided after the electromagnetic valve on the line, and a flow regulating flowmeter provided after the buffer tank on the line. Each electromagnetic valves is controlled for on-off operation and the corresponding buffer tank suppresses the sudden change of the flow rate of the corresponding gas, so that the composition of the gas supplied to the plasma generating space changes gradually in spite of the simple on-off operation of the electromagnetic valves. Thus, the fluctuation and extinction of the plasma attributable to the sudden change of the composition of the gas supplied to the plasma generating space can be effectively prevented.
摘要翻译：一种用于微量元素分析的等离子体分析器具有包括多个气体源的气体供给系统，设置在将每个气体源连接到等离子体产生空间的线路上的电磁阀，设置在该线路上的电磁阀之后的缓冲罐，以及流量调节流量计提供在缓冲罐上的线路上。每个电磁阀被控制为开 - 关操作，并且相应的缓冲罐抑制相应气体的流量的突然变化，使得提供给等离子体产生空间的气体的组成逐渐变化，关闭电磁阀的操作。因此，可以有效地防止由于供给到等离子体产生空间的气体的组成突然变化引起的等离子体的波动和消光。

8. 发明授权

US07767987B2 Electron beam irradiation method, electron beam irradiation apparatus, and electron beam irradiation apparatus for open-mouthed container 有权
标题翻译：电子束照射方法，电子束照射装置和开口容器的电子束照射装置
公开(公告)号：US07767987B2
公开(公告)日：2010-08-03
申请号：US12065681
申请日：2006-09-21
申请人： Shiro Eguchi , Isao Hashimoto , Shigekatsu Sato , Hidenobu Koide , Nobuyuki Hashimoto , Takayuki Suzuki , Satoru Gozaki , Tomoyuki Hikosaka , Yukio Okamoto , Hiroyuki Fujita
发明人： Shiro Eguchi , Isao Hashimoto , Shigekatsu Sato , Hidenobu Koide , Nobuyuki Hashimoto , Takayuki Suzuki , Satoru Gozaki , Tomoyuki Hikosaka , Yukio Okamoto , Hiroyuki Fujita
IPC分类号： G21K1/08 , H01J3/14 , H01J3/26 , H01J49/42
CPC分类号： A23L3/26 , A61L2/087 , A61L2202/122 , A61L2202/21 , A61L2202/23 , B65B55/027 , B65B55/08 , G21K5/00
摘要： There are provided an electron beam application method and an electron beam application device capable of uniformly applying electron beams to an object even if the electron beams have a low energy. For this, electron beams (EB) are applied to a beverage container (30) (object) within a magnetic barrier (MF) formed by combining a plurality of magnetic fields generated in an electron beam application region.
摘要翻译：提供了即使电子束具有低能量也能够均匀地向物体施加电子束的电子束施加方法和电子束施加装置。为此，电子束（EB）被施加到通过组合在电子束施加区域中产生的多个磁场而形成的磁屏障（MF）内的饮料容器（30）（物体）。

9. 发明申请

US20090134338A1 Electron Beam Irradiation Method, Electron Beam Irradiation Apparatus, and Electron Beam Irradiation Apparatus for Open-Mouthed Container 有权
标题翻译：电子束照射方法，电子束照射装置和开放式容器的电子束照射装置
公开(公告)号：US20090134338A1
公开(公告)日：2009-05-28
申请号：US12065681
申请日：2006-09-21
申请人： Shiro Eguchi , Isao Hashimoto , Shigekatsu Sato , Hidenobu Koide , Nobuyuki Hashimoto , Takayuki Suzuki , Satoru Gozaki , Tomoyuki Hikosaka , Yukio Okamoto , Hiroyuki Fujita
发明人： Shiro Eguchi , Isao Hashimoto , Shigekatsu Sato , Hidenobu Koide , Nobuyuki Hashimoto , Takayuki Suzuki , Satoru Gozaki , Tomoyuki Hikosaka , Yukio Okamoto , Hiroyuki Fujita
IPC分类号： H01J3/14 , A61N5/00
CPC分类号： A23L3/26 , A61L2/087 , A61L2202/122 , A61L2202/21 , A61L2202/23 , B65B55/027 , B65B55/08 , G21K5/00
摘要： There are provided an electron beam application method and an electron beam application device capable of uniformly applying electron beams to an object even if the electron beams have a low energy. For this, electron beams (EB) are applied to a beverage container (30) (object) within a magnetic barrier (MF) formed by combining a plurality of magnetic fields generated in an electron beam application region.
摘要翻译：提供了即使电子束具有低能量也能够均匀地向物体施加电子束的电子束施加方法和电子束施加装置。为此，电子束（EB）被施加到通过组合在电子束施加区域中产生的多个磁场而形成的磁屏障（MF）内的饮料容器（30）（物体）。

10. 发明授权

US07359668B2 Image fixing device 有权
标题翻译：图像定影装置
公开(公告)号：US07359668B2
公开(公告)日：2008-04-15
申请号：US11158691
申请日：2005-06-21
申请人： Hiroshi Funabiki , Yukio Okamoto
发明人： Hiroshi Funabiki , Yukio Okamoto
IPC分类号： G03G15/20
CPC分类号： G03G15/2053 , G03G15/2028 , G03G15/206 , G03G2215/2016 , G03G2215/2032 , G03G2215/2048 , G03G2221/1639
摘要： There is described a fixing device equipped in an image forming apparatus, which employs an electro-photographic method for forming an image on a transfer material, and having a lifetime longer than conventional one. The fixing device includes a first roller having a first elastic layer formed in a cylindrical shape on an outer surface of the first roller; and a second roller having a second elastic layer formed in a cylindrical shape on an outer surface of the second roller. A hardness of the second elastic layer is higher than that of the first elastic layer, and a nip section is formed between the first elastic layer and the second elastic layer. A longitudinal length of the first elastic layer in an axial direction of the first roller is greater than that of the second elastic layer in an axial direction of the second roller.
摘要翻译：描述了一种装配在图像形成装置中的定影装置，其使用电转印法在转印材料上形成图像，并且具有比传统材料更长的寿命。定影装置包括：第一辊，其具有在第一辊的外表面上形成为圆柱形的第一弹性层; 以及第二辊，其具有在所述第二辊的外表面上形成为圆柱形的第二弹性层。第二弹性层的硬度高于第一弹性层的硬度，并且在第一弹性层和第二弹性层之间形成夹持部。第一弹性层在第一辊的轴向上的纵向长度大于第二弹性层在第二辊的轴向方向上的纵向长度。

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