专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US5315022A Silicone type cinnamic acid derivative, preparation method thereof, UV-ray absorber, and external skin treatment agent 失效
标题翻译：硅酮型肉桂酸衍生物，其制备方法，紫外线吸收剂和外用皮肤处理剂
公开(公告)号：US5315022A
公开(公告)日：1994-05-24
申请号：US676127
申请日：1991-03-27
申请人： Masashi Yoshida , Kenichi Umishio , Keiichi Uehara , Tomiyuki Nanba
发明人： Masashi Yoshida , Kenichi Umishio , Keiichi Uehara , Tomiyuki Nanba
IPC分类号： A61K8/58 , A61Q17/04 , C07F7/08
CPC分类号： A61K8/585 , A61Q17/04 , C07F7/0852
摘要： A silicone type cinnamic acid derivative which is a siloxane having at least one unit represented by the formula (I): ##STR1## and having the other units which may exist in the siloxane being represented by the formula:O.sub.(4-m)/2 SiR.sub.m.sup.3wherein R.sup.1 represents an alkyl group having 1 to 4 carbon atoms, a phenyl group, or a trimethylsiloxy group, R.sup.2 is a divalent hydrocarbon group having at least two carbon atoms, which may include a heteroatom, O, X is an alkoxy group, n is an integer of 0 to 3, a is an integer of 2 or 3, R.sup.3 is an alkyl group having 1 to 4 carbon atoms, a phenyl group, or a trimethylsiloxy group, and m is an integer of 0 to 3.
摘要翻译：硅氧烷型肉桂酸衍生物，其是具有至少一个由式（I）表示的单元的硅氧烷：其中可能存在于硅氧烷中的其它单元由下式表示：O（4- m）/ 2SiRm3其中R 1表示具有1至4个碳原子的烷基，苯基或三甲基甲硅烷氧基，R 2是具有至少两个碳原子的二价烃基，其可以包括杂原子O，X是烷氧基，n为0〜3的整数，a为2或3的整数，R3为碳原子数1〜4的烷基，苯基或三甲基甲硅烷氧基，m为0〜 3。

2. 发明授权

US5093511A Silicone type cinnamic acid derivative, preparation method thereof, UV-ray absorber, and external skin treatment agent 失效
标题翻译：硅酮型乳酸衍生物，其制备方法，紫外线吸收剂和外用皮肤治疗剂
公开(公告)号：US5093511A
公开(公告)日：1992-03-03
申请号：US376321
申请日：1989-07-06
申请人： Masashi Yoshida , Tomiyuki Nanba , Keiichi Uehara
发明人： Masashi Yoshida , Tomiyuki Nanba , Keiichi Uehara
IPC分类号： A61K8/58 , A61Q17/04 , C07F7/08
CPC分类号： C07F7/0852 , A61K8/585 , A61Q17/04
摘要： A silicone type cinnamic acid derivative which is a siloxane having at least one unit represented by the formula (I): ##STR1## and having the other units which may exist in the siloxane being represented by the formula:O.sub.(4-m)/2 SiR.sup.3.sub.mwherein R.sup.1 represents an alkyl group having 1 to 4 carbon atoms, a phenyl group, or a trimethylsiloxy group, R.sup.2 is a divalent hydrocarbon group having at least two carbon atoms, which may include a heteroatom O, X is an alkoxy group, n is an integer of 0 to 3, a is an integer of 2 or 3, R.sup.3 is an alkyl group having 1 to 4 carbon atoms, a phenyl group, or a trimethylsiloxy group, and m is an integer of 0 to 3.

3. 发明授权

US5589165A Cosmetic 失效
标题翻译：化妆品
公开(公告)号：US5589165A
公开(公告)日：1996-12-31
申请号：US361598
申请日：1994-12-22
申请人： Masashi Yoshida , Tomiyuki Nanba , Keiichi Uehara , Osamu Sakurai , Hideki Takahashi , Hiroshi Fukui
发明人： Masashi Yoshida , Tomiyuki Nanba , Keiichi Uehara , Osamu Sakurai , Hideki Takahashi , Hiroshi Fukui
IPC分类号： A61K8/894 , A61K8/897 , A61Q1/02 , A61Q17/04 , A61K31/74 , A61K7/027
CPC分类号： A61Q1/02 , A61K8/897 , A61Q17/04 , Y10S514/845 , Y10S514/846 , Y10S514/847
摘要： A cosmetic with good water resistance, perspiration resistance and oil resistance, as well as long lasting cosmetic effects, which characteristically containing an organofluorated modified silicone resin comprising units (1), (2) and (3) shown below:(1) R.sub.3 SiO.sub. 1/2 units(2) SiO.sub.2 units(3) Rf.sub.2 SiO unit and/or RfRSiO unitsin which R denotes a hydrocarbon group with a carbon number of 1-6 or a phenyl group, and Rf denotes --(CH.sub.2).sub.m C.sub.n F.sub.2n+1, m is an integer 2-4, and n is an integer 1-12.
摘要翻译：具有耐水性，耐汗水性和耐油性的化妆品以及持久的美容效果，其特征在于含有下述单元（1），（2）和（3）的有机氟改性有机硅树脂：（1）R3SiO + E，fra 1/2 + EE单元（2）SiO2单元（3）Rf2SiO单元和/或RfRSiO单元，其中R表示碳数为1-6的烃基或苯基，Rf表示 - （CH2 ）mCnF2n + 1，m为整数2-4，n为1-12的整数。

4. 发明授权

US5475126A Benzophenone derivative, an ultraviolet light absorbent and an endermic liniment 失效
标题翻译：二苯甲酮衍生物，紫外光吸收剂和皮肤外用剂
公开(公告)号：US5475126A
公开(公告)日：1995-12-12
申请号：US346300
申请日：1994-11-23
申请人： Masashi Yoshida , Keiichi Uehara
发明人： Masashi Yoshida , Keiichi Uehara
IPC分类号： A61K8/00 , A61K8/58 , A61K8/89 , A61K8/891 , A61Q1/00 , A61Q1/12 , A61Q17/04 , C07F7/08 , C08L83/04 , C09K3/00
CPC分类号： A61Q17/04 , A61K8/585 , C07F7/0847
摘要： A silicone-type benzophenone derivative represented by Formula 1 below, an ultraviolet light absorbent and an endermic liniment which contains it. ##STR1## The silicone-type benzophenone derivative of the present invention exhibits a superior ability to absorb UV-A and UV-B and is compatible with silicone-type bases.
摘要翻译：由下述通式1表示的硅氧烷型二苯甲酮衍生物，含有紫外线吸收剂和含有外用搽剂的硅酮类二苯甲酮衍生物。本发明的硅氧烷型二苯甲酮衍生物显示出优异的吸收UV-A和UV-B的能力，并与硅酮型基质相容。

5. 发明申请

US20120212834A1 ZOOM LENS SYSTEM 有权
标题翻译：变焦镜头系统
公开(公告)号：US20120212834A1
公开(公告)日：2012-08-23
申请号：US13399656
申请日：2012-02-17
申请人： Masashi Yoshida
发明人： Masashi Yoshida
IPC分类号： G02B15/14
CPC分类号： G02B15/173 , G02B15/14
摘要： A zoom lens system has a combined focal length fw at the wide angle end and includes, in order from an object side, a first lens group with positive refractive power and combined focal length f1; a second lens group with negative refractive power; a third lens group with positive refractive power; a fourth lens group with positive refractive power; and a fifth lens group with positive refractive power and including, in order from the object side, a negative biconcave lens with focal length f51 and a positive biconvex lens with focal length f52, the negative biconcave lens and the positive biconvex lens disposed with an air space shorter than a center thickness of the negative biconcave lens in between and both surfaces of the positive biconvex lens being aspherical. The system satisfies the following conditions: 13.5
摘要翻译：变焦透镜系统在广角端具有组合焦距fw，从物体侧依次包括具有正折光力的第一透镜组和组合焦距f1; 具有负屈光力的第二透镜组; 具有正屈光力的第三透镜组; 具有正屈光力的第四透镜组; 以及具有正屈光力的第五透镜组，并且从物体侧依次包括具有焦距f51的负双凸透镜和焦距为f52的正双凸透镜，负双凸透镜和正双凸透镜配置有空气空心短于正双凸透镜之间的负双凸透镜的中心厚度，其正面为非球面。该系统满足以下条件：13.5

6. 发明授权

US08008049B2 DNA coding for polypeptide participating in biosynthesis of pladienolide 有权
标题翻译：编码参与pladienolide生物合成的多肽的DNA
公开(公告)号：US08008049B2
公开(公告)日：2011-08-30
申请号：US11630689
申请日：2005-07-19
申请人： Kazuhiro Machida , Akira Arisawa , Susumu Takeda , Masashi Yoshida , Toshio Tsuchida
发明人： Kazuhiro Machida , Akira Arisawa , Susumu Takeda , Masashi Yoshida , Toshio Tsuchida
IPC分类号： C12P17/16 , C07H21/04 , C07K2/00 , C12N9/00 , C12N15/63 , C12N1/00
CPC分类号： C12P17/08 , C07K14/36 , C12N9/0071 , C12N9/0073 , C12N15/52 , C12P17/162
摘要： The present invention provides polypeptides that participate in the biosynthesis of the pladienolide macrolide compounds, DNA that encodes these polypeptides and variants of this DNA, transformants that maintain all or a portion of this DNA or variant thereof, and a method of producing the pladienolide macrolide compounds using these transformants. More particularly, it provides an isolated pure DNA that contains at least one region encoding a polypeptide that participates in pladienolide biosynthesis; polypeptide encoded by this DNA; a self-replicating or integrated-replicating recombinant plasmid carrying this DNA; a transformant maintaining this DNA; and a method of producing a pladienolide, characterized by culturing this transformant on culture medium and collecting pladienolide from this culture medium.
摘要翻译：本发明提供了参与扁平二烯内酰脲大环内酯化合物的生物合成的多肽，编码这些多肽的DNA和该DNA的变体，保持该DNA或其变体的全部或一部分的转化体，以及生产该扁桃苷内酰胺大环内酯化合物的方法使用这些转化体。更具体地，其提供了分离的纯DNA，其含有至少一个编码参与泛二烯内酯生物合成的多肽的区域; 由该DNA编码的多肽; 携带该DNA的自我复制或整合复制重组质粒; 维持该DNA的转化体以及生产普拉二烯内酯的方法，其特征在于在培养基上培养该转化体并从该培养基中收集普拉二烯内酯。

7. 发明申请

US20100323524A1 Method of etching the back side of a wafer 审中-公开
标题翻译：刻蚀晶片背面的方法
公开(公告)号：US20100323524A1
公开(公告)日：2010-12-23
申请号：US12801594
申请日：2010-06-16
申请人： Masashi Yoshida
发明人： Masashi Yoshida
IPC分类号： H01L21/3065
CPC分类号： B81C1/00801 , B81C2201/0132 , B81C2201/053
摘要： To etch the back side of a wafer, the front side of the wafer is first coated with a positive photoresist to form a protective film. The surface of the protective film is hardened by heating, or by heating and ultraviolet curing. The wafer is then placed in a plasma etching apparatus with the hardened surface of the protective film in contact with an electrode of the etching apparatus, and the back side of the wafer is patterned by plasma etching. When the etching is completed, the front side of the wafer is separated from the electrode and the wafer is removed from the plasma etching apparatus. The hardened positive photoresist prevents the wafer from sticking to the electrode.
摘要翻译：为了蚀刻晶片的背面，首先用正性光致抗蚀剂涂覆晶片的正面以形成保护膜。保护膜的表面通过加热或加热和紫外线固化而硬化。然后将晶片放置在等离子体蚀刻装置中，其中保护膜的硬化表面与蚀刻装置的电极接触，并且通过等离子体蚀刻对晶片的背面进行图案化。当蚀刻完成时，晶片的前侧与电极分离，晶片从等离子体蚀刻装置中除去。硬化的正性光致抗蚀剂防止晶片粘到电极上。

8. 发明申请

US20100214420A1 IMAGE PROCESSING APPARATUS, METHOD OF CONTROLLING THE SAME, AND STORAGE MEDIUM 有权
标题翻译：图像处理装置，其控制方法和存储介质
公开(公告)号：US20100214420A1
公开(公告)日：2010-08-26
申请号：US12680706
申请日：2008-12-02
申请人： Masashi Yoshida
发明人： Masashi Yoshida
IPC分类号： H04N5/225
CPC分类号： H04N1/00326 , H04N1/00331 , H04N1/00347 , H04N1/00408 , H04N1/0044 , H04N1/00474 , H04N1/00477 , H04N1/2112 , H04N1/32037 , H04N1/32048 , H04N1/32064 , H04N1/32096 , H04N5/23219 , H04N2101/00 , H04N2201/0036 , H04N2201/0039 , H04N2201/0044 , H04N2201/0055 , H04N2201/0084
摘要： In an apparatus, object information and information on a transmission destination representing the transmission destination of image data are registered in correspondence with each other. An object in the image data is identified. The image data is transmitted to a transmission destination represented by information on a transmission destination corresponding to identified object information. The transmission status of the image data by a transmission unit is displayed on a display unit together with the image data.
摘要翻译：在装置中，对象信息和表示图像数据的发送目的地的发送目的地的信息相互对应地登记。识别图像数据中的对象。图像数据被发送到由与所识别的对象信息相对应的发送目的地的信息表示的发送目的地。发送单元的图像数据的发送状态与图像数据一起显示在显示单元上。

9. 发明授权

US07687296B2 Semiconductor device fabrication method 失效
标题翻译：半导体器件制造方法
公开(公告)号：US07687296B2
公开(公告)日：2010-03-30
申请号：US11513130
申请日：2006-08-31
申请人： Masashi Yoshida
发明人： Masashi Yoshida
IPC分类号： H01L21/00
CPC分类号： G03F7/168
摘要： Circuit elements, such as aluminum interconnects, and a protective film for protecting these circuit elements are formed on a surface of a semiconductor substrate. Resist is formed covering the protective film. The semiconductor substrate on which the resist covering the protective film is formed is dipped into pure water so as to allow the water to filter into a gap between the resist and semiconductor substrate. Then the semiconductor substrate having the resist thereon is dried in high temperature air, and the resist is adhered to the semiconductor substrate by a sticking function due to the surface tension generated when the water is decreasing. The semiconductor substrate to which the resist is adhered is cleaned by a hydrogen fluoride aqueous solution.
摘要翻译：诸如铝互连的电路元件和用于保护这些电路元件的保护膜形成在半导体衬底的表面上。形成覆盖保护膜的抗蚀剂。将形成有保护膜的抗蚀剂的半导体基板浸入纯水中，以使水过滤到抗蚀剂和半导体衬底之间的间隙。然后将其上具有抗蚀剂的半导体衬底在高温空气中干燥，并且由于当水下降时产生的表面张力，抗蚀剂通过粘附功能粘附到半导体衬底。用氟化氢水溶液清洗附着有抗蚀剂的半导体衬底。

10. 发明授权

US07667052B2 Bioactive substance 有权
标题翻译：生物活性物质
公开(公告)号：US07667052B2
公开(公告)日：2010-02-23
申请号：US11213962
申请日：2005-08-30
申请人： Yoshiharu Mizui , Takashi Sakai , Satoshi Yamamoto , Keisuke Komeda , Masanori Fujita , Akifumi Okuda , Kumiko Kishi , Jun Niijima , Mitsuo Nagai , Kiyoshi Okamoto , Masao Iwata , Yoshihiko Kotake , Toshimitsu Uenaka , Naoki Asai , Motoko Matsufuji , Tomohiro Sameshima , Naoto Kawamura , Kazuyuki Dobashi , Takashi Nakashima , Masashi Yoshida , Toshio Tsuchida , Susumu Takeda , Tomonari Yamada , Koji Norihisa , Takao Yamori
发明人： Yoshiharu Mizui , Takashi Sakai , Satoshi Yamamoto , Keisuke Komeda , Masanori Fujita , Akifumi Okuda , Kumiko Kishi , Jun Niijima , Mitsuo Nagai , Kiyoshi Okamoto , Masao Iwata , Yoshihiko Kotake , Toshimitsu Uenaka , Naoki Asai , Motoko Matsufuji , Tomohiro Sameshima , Naoto Kawamura , Kazuyuki Dobashi , Takashi Nakashima , Masashi Yoshida , Toshio Tsuchida , Susumu Takeda , Tomonari Yamada , Koji Norihisa , Takao Yamori
IPC分类号： C07D313/00 , C07D407/06 , A61K31/365
CPC分类号： C07D405/14 , A61K31/335 , A61K31/336 , A61K31/4025 , A61K31/4427 , A61K31/4523 , A61K31/455 , A61K31/496 , A61K31/5377 , A61K31/74 , C07D313/00 , C07D407/06 , C07D407/14 , C07D493/04 , C07D493/08 , C12P17/02
摘要： The present invention provides a novel bioactive substance having an antitumor activity and a process for producing it, and a medical use thereof. Namely, it provides a 12-membered ring macrolide compound represented by the following formula obtained from the incubation solution of Streptomyces sp. Mer. 11107 or a variant thereof, a pharmacologically acceptable salt thereof or a hydrate of them, and a process for producing it.
摘要翻译：本发明提供了具有抗肿瘤活性的新型生物活性物质及其制造方法及其医疗用途。即，它提供了由下列公式表示的12元环大环内酯化合物，其由Streptomyces sp。梅尔 11107或其变体，其药理学上可接受的盐或它们的水合物及其制备方法。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式