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1. 发明申请

US20110304894A1 IMAGE PROCESSING APPARATUS AND COMPUTER READABLE MEDIUM 有权
标题翻译：图像处理设备和计算机可读介质
公开(公告)号：US20110304894A1
公开(公告)日：2011-12-15
申请号：US12878269
申请日：2010-09-09
申请人： Masashi OKANO , Masato SAITO , Hiromi KITA , Hiroshi HAYASHI
发明人： Masashi OKANO , Masato SAITO , Hiromi KITA , Hiroshi HAYASHI
IPC分类号： H04N1/46
CPC分类号： H04N1/40 , H04N1/46 , H04N1/60
摘要： An image processing apparatus includes a read unit and a first correction unit. The read unit reads a document and generates multilevel image data from the document. The first correction unit corrects the multilevel image data contained in a first range predetermined as a color indicating a fluorescent color so as to move the multilevel image data contained in the first range to an outside of a print color range when at least a part of the multilevel image data is contained in the first range.
摘要翻译：图像处理装置包括读取单元和第一校正单元。读取单元读取文档并从文档生成多级图像数据。第一校正单元将包含在预定的第一范围中的多级图像数据校正为指示荧光颜色的颜色，以将包含在第一范围中的多级图像数据移动到打印色域的外部，当至少一部分多级图像数据包含在第一范围内。

2. 发明申请

US20110287345A1 ELECTRON BEAM DRAWING APPARATUS, ELECTRON BEAM DRAWING METHOD, SEMICONDUCTOR DEVICE MANUFACTURING MASK MANUFACTURING METHOD, AND SEMICONDUCTOR DEVICE MANUFACTURING TEMPLATE MANUFACTURING METHOD 审中-公开
标题翻译：电子束绘图装置，电子束绘图方法，半导体器件制造掩模制造方法和半导体器件制造模板制造方法
公开(公告)号：US20110287345A1
公开(公告)日：2011-11-24
申请号：US13051935
申请日：2011-03-18
申请人： Masato SAITO
发明人： Masato SAITO
IPC分类号： G03F1/00 , G21K5/10 , G03F7/20
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , G03F1/78
摘要： According to one embodiment, there is provided a electron beam drawing apparatus includes an irradiation module which irradiates a resist coated onto a substrate with a electron beam, and a control module which controls the irradiation module and which acquires the relationship between an irradiation dose of the electron beam and a positional shift amount of a pattern, acquires a reference irradiation dose of the electron beam necessary to form a pattern on the resist, acquires an allowable positional shift amount allowed for the pattern, acquires a limit irradiation dose of the electron beam corresponding to the allowable positional shift amount on the basis of the relationship, acquires a saturated irradiation dose corresponding to a saturated positional shift amount on the basis of the relationship, and controls the irradiation module so as to irradiate all the divided pattern regions with a electron beam sequentially at least once.
摘要翻译：根据一个实施例，提供了一种电子束描绘装置，其包括用电子束照射涂覆在基板上的抗蚀剂的照射模块，以及控制模块，其控制照射模块，并且获取照射剂量电子束和图案的位置偏移量，获取在抗蚀剂上形成图案所需的电子束的基准照射剂量，获取对于图案允许的容许位置偏移量，获取对应于电子束的极限照射剂量基于该关系获得与容许位置偏移量的关系，基于该关系获取与饱和位置偏移量对应的饱和照射剂量，并且控制照射模块，以便利用电子束照射所有分割图案区域依次至少一次。

3. 发明申请

US20120077420A1 METHOD OF MANUFACTURING ANNULAR BODY 有权
标题翻译：制造环形体的方法
公开(公告)号：US20120077420A1
公开(公告)日：2012-03-29
申请号：US13022205
申请日：2011-02-07
申请人： Hiroshi SHIBUYA , Yoshitake OGURA , Masato SAITO
发明人： Hiroshi SHIBUYA , Yoshitake OGURA , Masato SAITO
IPC分类号： B24C1/06 , B24C1/00
CPC分类号： B24C1/06
摘要： A method includes: charging a polishing material into a polishing apparatus that polishes a surface of a cylindrical film including a resin; alternately and repeatedly performing a surface-roughening operation of causing the polishing material to collide with the surface of the cylindrical film, thereby roughening the surface, and a cylindrical film replacing operation of replacing the cylindrical film on which roughening of the surface has been completed with another cylindrical film on which roughening of the surface has not been completed; replacing the polishing material by partially discharging the polishing material, and charging a new polishing material so that the percentage of the new polishing material with respect to the total amount of the polishing material after the new polishing material is charged becomes 30% by weight or more; and alternately and repeatedly performing the surface-roughening operation and the cylindrical film replacing operation again.
摘要翻译：一种方法包括：将抛光材料装入抛光装置中，抛光装置对包括树脂的圆柱形膜的表面进行抛光; 交替重复进行表面粗糙化操作，使抛光材料与圆筒形膜的表面碰撞，从而使表面变粗糙，并且更换已经完成表面粗糙化的圆筒形膜的圆柱形膜更换操作，另一个圆柱形薄膜，其表面的粗糙化尚未完成; 通过部分地抛光抛光材料来代替抛光材料，并且对新的抛光材料进行充电，使得新抛光材料相对于新抛光材料被加料后的研磨材料的总量的百分数为30重量％以上 ; 并且再次交替重复地执行表面粗糙化操作和圆筒形膜替换操作。

4. 发明申请

US20110062632A1 TEMPLATE WITH IDENTIFICATION MARK AND METHOD OF MANUFACTURING THE SAME 审中-公开
标题翻译：具有识别标记的模板及其制造方法
公开(公告)号：US20110062632A1
公开(公告)日：2011-03-17
申请号：US12883969
申请日：2010-09-16
申请人： Masato SAITO
发明人： Masato SAITO
IPC分类号： B29C59/16 , B29C35/08
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： According to one embodiment, a template with an identification mark for use in SFIL includes a pattern formation template including a main pattern region where a desired pattern is formed as a convex/concave pattern on the upper surface of a light-transmitting substrate, and an identification mark that is formed on the lower surface of the substrate to partially overlap the main pattern region, and makes the template identifiable.
摘要翻译：根据一个实施例，具有用于SFIL的识别标记的模板包括图案形成模板，其包括在透光衬底的上表面上形成作为凸/凹图案的期望图案的主图案区域，以及识别标记形成在基板的下表面上以部分地与主图案区域重叠，并使模板可识别。

5. 发明申请

US20110062623A1 METHOD OF FORMING A PATTERN FORMATION TEMPLATE 审中-公开
标题翻译：形成模式的方法
公开(公告)号：US20110062623A1
公开(公告)日：2011-03-17
申请号：US12881844
申请日：2010-09-14
申请人： Masato SAITO
发明人： Masato SAITO
IPC分类号： B29C33/42
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： According to one embodiment, a concavo-convex pattern of a first template where a concavo-convex main pattern has been formed in a main pattern region and a concavo-convex peripheral pattern has been formed in a peripheral region is transferred to a second template substrate by imprint techniques. Then, a second template with a step between a region corresponding to the main pattern region and a region corresponding to the peripheral region is formed by retreating the peripheral region of the second template substrate by etching.
摘要翻译：根据一个实施例，在周边区域中已经形成在主图案区域中形成凹凸主图案的凹凸主图案和凹凸周边图案的第一模板的凹凸图案被转印到第二模板基板通过印记技术。然后，通过蚀刻来退回第二模板基板的周边区域，形成具有与主图案区域对应的区域与对应于周边区域的区域之间的台阶的第二模板。

6. 发明申请

US20110057630A1 Vehicular Alternator, and Rectifier of Vehicular Alternator 审中-公开
标题翻译：车辆发电机和车辆发电机整流器
公开(公告)号：US20110057630A1
公开(公告)日：2011-03-10
申请号：US12859959
申请日：2010-08-20
申请人： Masato SAITO , Shuichi Kokubun , Shoju Masumoto
发明人： Masato SAITO , Shuichi Kokubun , Shoju Masumoto
IPC分类号： H02P9/02
CPC分类号： H02M7/02
摘要： A rectifier of vehicular alternator that rectifies AC electrical power into DC electrical power comprises: a rectifier that includes a plurality of MOS FETs that are used as rectifier elements; a control circuit that applies drive signals to the gates of the plurality of MOS FETs via gate drive signal lines, and that thereby commands continuity and discontinuity of the plurality of MOS FETs; and a plurality of load circuits, one connected between the gate and the source of each of the MOS FETs, for bleeding down electric charge accumulated by gate capacitance of the MOS FET if the gate drive signal line is interrupted.
摘要翻译：将AC电力整流为DC电力的车辆交流发电机的整流器包括：整流器，其包括用作整流元件的多个MOS FET; 控制电路，经由栅极驱动信号线向多个MOS FET的栅极施加驱动信号，从而命令多个MOS FET的连续性和不连续性; 以及多个负载电路，一个连接在每个MOS FET的栅极和源极之间，用于如果栅极驱动信号线被中断，则会降低由MOS FET的栅极电容累积的电荷。

7. 发明申请

US20110222795A1 IMAGE PROCESSING APPARATUS, IMAGE PROCESSING METHOD, AND STORAGE MEDIUM 有权
标题翻译：图像处理设备，图像处理方法和存储介质
公开(公告)号：US20110222795A1
公开(公告)日：2011-09-15
申请号：US12862321
申请日：2010-08-24
申请人： Hiroshi NIINA , Toshiyuki YAMADA , Kiyotaka TSUCHIBUCHI , Junichi SHIMIZU , Minoru SODEURA , Masato SAITO , Zhenrui ZHANG
发明人： Hiroshi NIINA , Toshiyuki YAMADA , Kiyotaka TSUCHIBUCHI , Junichi SHIMIZU , Minoru SODEURA , Masato SAITO , Zhenrui ZHANG
IPC分类号： G06K9/03
CPC分类号： H04N1/40062 , G06K9/00456 , H04N1/387
摘要： An image processing apparatus of the present invention includes: a separation section that separates image components having different attributes contained in electronic document data expressing an original image; a selection section that selects which mode from plural modes including a reusability emphasis mode for performing predetermined re-laying out of the image components with emphasis on reusability; and a generation section that re-lays the image components separated by the separation section according to the mode selected by the selection section, and generates software data corresponding to software for use.
摘要翻译：本发明的图像处理装置包括：分离单元，分离包含在表示原始图像的电子文档数据中的具有不同属性的图像分量; 选择部，其从多个模式中选择哪个模式，包括用于执行预先重新布置图像分量的可重用性强调模式，重点是可重用性; 以及生成部，其根据由选择部所选择的模式重新分割由分离部分隔的图像成分，生成与使用的软件对应的软件数据。

8. 发明申请

US20100237469A1 PHOTOMASK, SEMICONDUCTOR DEVICE, AND CHARGED BEAM WRITING APPARATUS 审中-公开
标题翻译： PHOTOMASK，SEMICONDUCTOR DEVICE，AND CHARGED BEAM WRITING APPARATUS
公开(公告)号：US20100237469A1
公开(公告)日：2010-09-23
申请号：US12726052
申请日：2010-03-17
申请人： Masato SAITO , Hidehiro WATANABE
发明人： Masato SAITO , Hidehiro WATANABE
IPC分类号： H01L23/544 , H01J37/317 , H01J37/147 , H01J37/302 , G06F17/50
CPC分类号： H01J37/3026 , B82Y10/00 , B82Y40/00 , G03F1/68 , G03F1/78 , H01J37/3174
摘要： A photomask has a pattern formed by writing of a charged beam on basis of a charged beam control data. The charged beam control data is produced by: setting a plurality of correction points in a writing area on pattern data; performing a simulation of writing with a charged beam on basis of the pattern data to divide the writing area, at time of writing each of the correction points, into a written area of writing been already completed and an unwritten area of writing yet to be performed; deriving, for each of the correction points, a first charging amount distribution due to a fogging effect around each of the correction points using a subset of the pattern data belonging to the written area; deriving, for each of the correction points, a second charging amount distribution modified from the first charging amount distribution on basis of an effect by which the charging amount due to the fogging effect is reduced at a position irradiated with the charged beam; deriving amount of pattern displacement at each of the correction points on basis of the second charging amount distribution; and deriving correction parameters of pattern position on basis of the amount of pattern displacement.
摘要翻译：光掩模具有基于带电波束控制数据写入带电波束形成的图案。带电波束控制数据通过以下方式产生：在图形数据上的写入区域中设置多个校正点; 在写入每个校正点的时候，根据图形数据执行用充电波束写入的模拟，以将写入区域写入已经完成的写入区域和尚未执行的写入区域 ; 对于每个校正点，使用属于所述写入区域的图案数据的子集，得出由于每个所述校正点周围的起雾效应引起的第一充电量分布; 对于每个校正点，根据在被充电束照射的位置减少由于起雾效果引起的充电量的效果，导出从第一充电量分布修改的第二充电量分布; 基于第二充电量分布导出每个校正点处的图案位移量; 并基于图案位移量导出图案位置的校正参数。

9. 发明申请

US20120063683A1 IMAGE PROCESSING APPARATUS, IMAGE PROCESSING METHOD, AND COMPUTER-READABLE RECORDING MEDIUM 有权
标题翻译：图像处理装置，图像处理方法和计算机可读记录介质
公开(公告)号：US20120063683A1
公开(公告)日：2012-03-15
申请号：US13011486
申请日：2011-01-21
申请人： Toshiyuki YAMADA , Kiyotaka TSUCHIBUCHI , Junichi SHIMIZU , Minoru SODEURA , Masato SAITO , Hiroshi NIINA , Zhenrui ZHANG
发明人： Toshiyuki YAMADA , Kiyotaka TSUCHIBUCHI , Junichi SHIMIZU , Minoru SODEURA , Masato SAITO , Hiroshi NIINA , Zhenrui ZHANG
IPC分类号： G06K9/34
CPC分类号： H04N1/40062 , G06K9/00456 , H04N1/00413 , H04N1/00482 , H04N1/41 , H04N2201/0094
摘要： An image processing apparatus includes a separating unit, a setting unit, and a determining unit. The separating unit separates an image into types of partial images other than a specific type, which is likely to be erroneously separated. The setting unit makes setting designating whether or not predetermined two types of partial images of the separated partial images are to be easily determined to be partial images of the specific type. The determining unit determines whether or not at least one of the predetermined two types of the partial images is the partial image of the specific type or not based upon the setting.
摘要翻译：一种图像处理装置，包括分离单元，设置单元和确定单元。分离单元将图像分离成可能被错误分离的特定类型以外的部分图像的类型。设置单元进行设置，指定分离的部分图像的预定的两种类型的部分图像是否容易被确定为特定类型的部分图像。确定单元基于该设置来确定预定的两种类型的部分图像中的至少一种是否是特定类型的部分图像。

10. 发明申请

US20110318501A1 TEMPLATE FORMING METHOD 有权
标题翻译：模板形成方法
公开(公告)号：US20110318501A1
公开(公告)日：2011-12-29
申请号：US13051883
申请日：2011-03-18
申请人： Masato SAITO
发明人： Masato SAITO
IPC分类号： B05D5/00 , B05D3/06 , C08J7/04
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： According to one embodiment, there is provided a template forming method that transfers a pattern from a first template to a to-be-processed substrate and subjects the to-be-processed substrate to a processing process to form a second template by using an imprinting method, includes forming a first resist film on a pattern forming region on the to-be-processed substrate, selectively forming a second resist film on a mark forming region on the to-be-processed substrate, transferring a concavo-convex pattern formed on the first template to the first resist film, and processing the to-be-processed substrate with the first resist film to which the concavo-convex pattern is transferred and the second resist film used as a mask.
摘要翻译：根据一个实施例，提供了一种模板形成方法，其将图案从第一模板转移到待处理衬底，并使待处理衬底经受处理过程以通过使用压印形成第二模板方法包括在待处理衬底上的图案形成区域上形成第一抗蚀剂膜，在被处理衬底的标记形成区上选择性地形成第二抗蚀剂膜，将形成在将第一模板涂覆到第一抗蚀剂膜上，并且将第一抗蚀剂膜以凹凸图案转印并将第二抗蚀剂膜用作掩模来处理待处理的基板。

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