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1. 发明授权

US5203984A Monitoring system for plant operation condition and its in-situ electrochemical electrode 失效
标题翻译：植物营养条件监测系统及其现场电化学电极
公开(公告)号：US5203984A
公开(公告)日：1993-04-20
申请号：US573780
申请日：1990-08-28
申请人： Masanori Sakai , Katsumi Mabuchi , Toshiaki Arato , Takuya Takahashi , Masakiyo Izumiya , Isao Masaoka , Yoshitaka Kojima , Masahisa Inagaki , Katsumi Ohsumi , Makoto Hayashi , Fumio Sato , Masateru Suwa , Kimihiko Akahori
发明人： Masanori Sakai , Katsumi Mabuchi , Toshiaki Arato , Takuya Takahashi , Masakiyo Izumiya , Isao Masaoka , Yoshitaka Kojima , Masahisa Inagaki , Katsumi Ohsumi , Makoto Hayashi , Fumio Sato , Masateru Suwa , Kimihiko Akahori
IPC分类号： G01N17/02 , G01N27/26 , G01N27/27 , G01N27/30 , G01N27/333 , G01N27/401 , G01N27/403 , G01N27/416 , G01N27/48 , G01N33/18 , G21C17/02 , G21C17/022
CPC分类号： G01N27/30 , G01N33/18 , G21C17/022 , Y10S706/906
摘要： A plant operational status monitoring supervisory system comprising; means for extracting information directly relating to water quality of an objective portion consecutively for a period of time by means of an electrochemical water quality sensor installed in an objective portion to monitor in-situ in a plant; means for evaluating water quality based on thus extracted information; means for comparing an obtained water quality evaluation result with a reference value for a predetermined plant operation procedure; and means for displaying or storing necessary portion out of said comparison results; is disclosed.An electrochemical reference electrode used in this system being provided with an electrolyte layer containing ion of the electrode member; a porous ceramic layer surrounding the same without permeating liquid; and electrode member electrochemically contacting with said elec-trolyte layer; and a terminal electrically contacting with said electrode member; and further having a long life in high temperature water, various status of high temperature water in objective portions and that of nearby constituent members in a plant are possible to be monitored online by means of this reference electrode.Further, because monitored data are processed by means of a neural network, the higher precision level of monitoring has been achieved.

2. 发明授权

US5186798A Solution quantitative analysis apparatus, quantitative analysis methods, and nuclear reactor water quality control system 失效
标题翻译：解决方案定量分析仪器，定量分析方法和核反应堆水质控制系统
公开(公告)号：US5186798A
公开(公告)日：1993-02-16
申请号：US514970
申请日：1990-04-26
申请人： Masanori Sakai , Katsumi Ohsumi , Noriyuki Ohnaka , Eiji Kikuchi , Katsumi Mabuchi , Takuya Takahashi
发明人： Masanori Sakai , Katsumi Ohsumi , Noriyuki Ohnaka , Eiji Kikuchi , Katsumi Mabuchi , Takuya Takahashi
IPC分类号： G01N27/42
CPC分类号： G01N27/42
摘要： This invention comprises electrochemical analytical devices capable of performing electrolysis in multiple pulse modes. It relates to a method of quantitative analysis and equipment for performing quantitative analysis which uses a combination of these pulse modes to realize the measurement of concentrations of multiple substances to be measured, occurring in the test solution to be measured and also a nuclear reactor water quality control system employing such a quantitative analysis method.
摘要翻译：本发明包括能够以多种脉冲模式进行电解的电化学分析装置。它涉及一种定量分析方法和进行定量分析的设备，该方法采用这些脉冲模式的组合来实现要测量的测试溶液中发生的待测量的多种物质的浓度以及核反应堆的水质采用这种定量分析方法的控制系统。

3. 发明授权

US4937038A Solution quantitative analysis apparatus, quantitative analysis methods, and nuclear reactor water quality control system 失效
标题翻译：解决方案定量分析仪器，定量分析方法和核反应堆水质控制系统
公开(公告)号：US4937038A
公开(公告)日：1990-06-26
申请号：US281212
申请日：1988-12-08
申请人： Masanori Sakai , Katsumi Ohsumi , Noriyuki Ohnaka , Eiji Kikuchi , Katsumi Mabuchi , Takuya Takahashi
发明人： Masanori Sakai , Katsumi Ohsumi , Noriyuki Ohnaka , Eiji Kikuchi , Katsumi Mabuchi , Takuya Takahashi
IPC分类号： G01N27/48 , G01N27/42 , G21C17/02 , G21C19/307 , G21D3/08
CPC分类号： G01N27/42 , Y10T436/206664
摘要： This invention comprises electrochemical analytical devices capable of performing electrolysis in multiple pulse modes. It relates to a method of quantitative analysis and equipment for performing quantitative analysis which uses a combinaiton of these pulse modes to realize the measurement of concentrations of multiple substances to be measured, occurring in the test solution to be measured and also a nuclear reactor water quality control system employing such a quantitative analysis method.

4. 发明授权

US5519330A Method and apparatus for measuring degree of corrosion of metal materials 失效
标题翻译：测量金属材料腐蚀程度的方法和装置
公开(公告)号：US5519330A
公开(公告)日：1996-05-21
申请号：US126768
申请日：1993-09-27
申请人： Hiroshi Yamauchi , Masanori Sakai , Katsumi Mabuchi , Takuya Takahashi , Noriyuki Ohnaka , Shigeo Hattori
发明人： Hiroshi Yamauchi , Masanori Sakai , Katsumi Mabuchi , Takuya Takahashi , Noriyuki Ohnaka , Shigeo Hattori
IPC分类号： G01N17/02 , G01N27/06
CPC分类号： B82Y15/00 , G01N17/02 , Y10S977/852
摘要： A corrosion degree measuring method capable of field measurement for intergranular corrosion, particularly the sensitization degree, of the plant's structural materials in a narrow space. The metal electrode made of a material being measured and the counter electrode to the metal electrode are immersed in an electrolytic solution. A voltage is applied to the metal electrode in the anodic direction so as to raise the potential of the metal electrode up to the passive state potential and to keep the metal electrode at the passive state potential. The passive state potential is used as a reference potential, and a pulse-like potential signal is applied to the metal electrode in the cathodic direction. At the time of the application of the pulse potential signal, a current between the metal electrode and the counter electrode is measured, and the corrosion degree of the material being measured is determined from the intensity of the current.
摘要翻译：一种腐蚀度测量方法，能够在狭窄的空间内对植物的结构材料进行晶间腐蚀，特别是致敏程度的现场测量。由被测量材料制成的金属电极和与金属电极对置的电极浸入电解液中。在阳极方向上向金属电极施加电压，以将金属电极的电位升高到被动状态电位，并将金属电极保持在被动状态。将被动状态电位用作参考电位，并且在阴极方向上向金属电极施加脉冲状电位信号。在应用脉冲电位信号时，测量金属电极和对电极之间的电流，并根据电流强度确定测量材料的腐蚀程度。

5. 发明申请

US20100306886A1 Probe Microscope 审中-公开
标题翻译：探头显微镜
公开(公告)号：US20100306886A1
公开(公告)日：2010-12-02
申请号：US12789796
申请日：2010-05-28
申请人： Motoko HARADA , Kyoko Honbo , Katsumi Mabuchi
发明人： Motoko HARADA , Kyoko Honbo , Katsumi Mabuchi
IPC分类号： G01Q30/00
CPC分类号： G01Q60/44 , G01Q60/02
摘要： An object of the present invention is to provide a probe microscope that permits qualitative and quantitative evaluation on ions existing near the surface of a sample and permits to detect further simply and easily such as impurities, flaws and corrosion origins existing on the sample in high sensitivity. A probe microscope according to the present invention is provided with a test cell that holds a sample and permits to receive liquid, a probe, a counter electrode, a reference electrode, a drive mechanism that causes the probe to follow the surface of the sample as well as to scan the same, a potential control portion that controls a potential between the probe and the reference electrode and a current measuring portion that measures a current flowing between the probe and the counter electrode, and is characterized in that the material of the probe is constituted by a conductive body containing any of gold or gold alloy, carbon or carbon compound, boron, zinc, lead, tin and mercury.
摘要翻译：本发明的目的是提供一种探针显微镜，其允许对存在于样品表面附近的离子进行定性和定量评估，并且允许以高灵敏度进一步简单且容易地检测样品中存在的杂质，缺陷和腐蚀起源。。根据本发明的探针显微镜设置有容纳样品并允许接收液体，探针，对电极，参比电极，使探针跟随样品表面的驱动机构的测试电池，以及扫描相同的电位控制部分，其控制探针和参考电极之间的电势;以及电流测量部分，其测量在探针和对电极之间流动的电流，其特征在于探针的材料由含有金或金合金，碳或碳化合物，硼，锌，铅，锡和汞的导电体构成。

6. 发明授权

US6096137A Pickling plant and method of controlling the same 失效
标题翻译：酸洗厂及其控制方法
公开(公告)号：US6096137A
公开(公告)日：2000-08-01
申请号：US33243
申请日：1998-03-03
申请人： Katsumi Mabuchi , Tomoko Kikuchi , Yasunobu Kani , Tsuneo Nakamura , Shinichi Yokosuka
发明人： Katsumi Mabuchi , Tomoko Kikuchi , Yasunobu Kani , Tsuneo Nakamura , Shinichi Yokosuka
IPC分类号： C23G1/02 , C23G3/02 , B08B1/02 , B08B3/08 , C23G1/08
CPC分类号： C23G3/02 , C23G1/02
摘要： A pickling plant for a steel strip and a method for controlling the pickling plant, including monitoring at least one quantity of state represented by thickness, width and quantity of scale of the steel strip, and at least one quantity of state of operation of a plant represented by concentration, quantity and temperature of acid supplied into a pickling tank of the pickling plant, line speed of the steel strip, and temperature of the steel strip immediately before entering the pickling tank calculating on the basis of values of said quantity of state and quantity of state of operation, at least one of concentration distribution of acid, concentration distribution of iron and descaling rate at optional plural positions, and on the basis of the calculating the optimum quantity of state for operation of the plant is determined.
摘要翻译：用于钢带的酸洗设备和控制酸洗设备的方法，包括监测由钢带的厚度，宽度和数量表示的至少一种状态，以及至少一个工厂的运行状态以酸洗设备的酸洗槽供给的酸的浓度，数量和温度，钢带的线速度，以及刚刚进入酸洗槽之前的钢带的温度根据所述状态数量和确定操作状态的数量，确定酸的浓度分布，铁的浓度分布和任选的多个位置的除垢率中的至少一种，以及计算植物的最佳操作状态量的基础。

7. 发明授权

US08367573B2 Glass composition and its applications 有权
标题翻译：玻璃组成及其应用
公开(公告)号：US08367573B2
公开(公告)日：2013-02-05
申请号：US12366829
申请日：2009-02-06
申请人： Takashi Naito , Shinichi Tachizono , Kei Yoshimura , Hiroki Yamamoto , Hiroshi Yoshida , Shinji Yamada , Katsumi Mabuchi
发明人： Takashi Naito , Shinichi Tachizono , Kei Yoshimura , Hiroki Yamamoto , Hiroshi Yoshida , Shinji Yamada , Katsumi Mabuchi
IPC分类号： C03C3/21 , C03C8/00 , C03C8/14 , C03C8/08
CPC分类号： H01J9/261 , C03C3/062 , C03C3/21 , C03C8/24 , H01J17/183 , H01L31/022425 , Y02E10/50
摘要： A glass composition substantially free from lead and bismuth and containing vanadium oxide and phosphor oxide as main ingredients, wherein the sintered glass of the glass composition exhibits 109 Ωcm or more at 25° C.
摘要翻译：基本上不含铅和铋并含有氧化钒和磷氧化物作为主要成分的玻璃组合物，其中玻璃组合物的烧结玻璃在25℃下显示出109＆OHgr·cm或更高。

8. 发明申请

US20080105651A1 Polishing Slurry for Cmp 审中-公开
标题翻译：抛光浆料为Cmp
公开(公告)号：US20080105651A1
公开(公告)日：2008-05-08
申请号：US11572321
申请日：2005-08-09
申请人： Katsumi Mabuchi , Haruo Akahoshi , Yasuo Kamigata , Masanobu Habiro , Hiroshi Ono
发明人： Katsumi Mabuchi , Haruo Akahoshi , Yasuo Kamigata , Masanobu Habiro , Hiroshi Ono
IPC分类号： C09K13/00 , C03C15/00
CPC分类号： H01L21/3212 , C09G1/02
摘要： A polishing liquid for CMP has a composition loaded with, for example, an inorganic salt, a protective film forming agent and a surfactant capable of imparting a dissolution accelerating activity to enlarge a difference between polishing speed under non-load and polishing speed under load. By virtue of this polishing liquid for CMP, there can be simultaneously accomplished a speed increase for increasing CMP productivity, and wiring planarization for miniaturization and multilayer formation of wiring.
摘要翻译：用于CMP的抛光液具有负载有例如无机盐，保护膜形成剂和能够赋予溶解促进活性的表面活性剂的组合物，以增加负载下的抛光速度和负载下的抛光速度之间的差异。由于该CMP用抛光液，可以同时实现提高CMP生产率的速度增加，以及用于小型化和布线的多层形成的布线平面化。

9. 发明申请

US20070153419A1 Perpendicular magnetic record medium and magnetic storage system 审中-公开
标题翻译：垂直磁记录介质和磁存储系统
公开(公告)号：US20070153419A1
公开(公告)日：2007-07-05
申请号：US11645252
申请日：2006-12-21
申请人： Reiko Arai , Katsumi Mabuchi , Mitsuhiro Shoda , Hiroyuki Matsumoto , Hiroyuki Nakagawa
发明人： Reiko Arai , Katsumi Mabuchi , Mitsuhiro Shoda , Hiroyuki Matsumoto , Hiroyuki Nakagawa
IPC分类号： G11B5/74 , G11B5/02
CPC分类号： G11B5/4555 , G11B5/7379
摘要： Embodiments in accordance with the invention realize a perpendicular magnetic record medium with a high media S/N and excellent corrosion resistance. In a perpendicular magnetic record medium in accordance with an embodiment of the present invention prepared by forming an adhesion layer, an underlayer, a seed layer, an intermediate layer, and a recording layer sequentially on a substrate, the seed layer is specified to have a laminated structure consisting of a first seed layer and a second seed layer. The first seed layer consists of an amorphous alloy containing Cr and the second seed layer consists of an amorphous alloy predominantly composed of Ni with an fcc structure.
摘要翻译：根据本发明的实施例实现了具有高介质S / N和优异耐腐蚀性的垂直磁记录介质。在根据本发明的实施例的垂直磁记录介质中，通过在基板上依次形成粘合层，底层，种子层，中间层和记录层而制备，种子层被规定为具有层叠结构由第一种子层和第二种子层构成。第一晶种层由含有Cr的非晶合金构成，第二晶种层由主要由具有fcc结构的Ni构成的非晶合金构成。

10. 发明申请

US20070147551A1 Abrasive-free polishing slurry and CMP process 审中-公开
标题翻译：无磨料抛光浆和CMP工艺
公开(公告)号：US20070147551A1
公开(公告)日：2007-06-28
申请号：US11643691
申请日：2006-12-22
申请人： Katsumi Mabuchi , Haruo Akahoshi , Masanobu Habiro , Takafumi Sakurada , Yutaka Nomura
发明人： Katsumi Mabuchi , Haruo Akahoshi , Masanobu Habiro , Takafumi Sakurada , Yutaka Nomura
IPC分类号： H03D1/00
CPC分类号： C09G1/04
摘要： A CMP slurry is mixed with an oxidant in polishing and contains a copper rust inhibitor, a water-soluble polymer, a pH controller capable of forming a complex with copper, and water, and is substantially free from abrasive. The CMP slurry effectively reduces dishing in chemical polishing of copper and forms reliable wiring. Preferably, the contents of the rust inhibitor, the water-soluble polymer, and the oxidant are 0.1 to 5 wt %, 0.05 to 5 wt %, and 0.01 to 5M relative to 1 liter of the CMP slurry, respectively, and the amount of the pH controller is a necessary amount for adjusting pH of the CMP slurry to 1.5 to 2.5.
摘要翻译：将CMP浆料与抛光中的氧化剂混合，并含有铜锈病抑制剂，水溶性聚合物，能够与铜形成络合物的pH控制剂和水，并且基本上不含研磨剂。 CMP浆料有效减少了铜化学抛光中的凹陷，形成了可靠的布线。防锈剂，水溶性聚合物和氧化剂的含量优选分别相对于1升CMP浆料为0.1〜5重量％，0.05〜5重量％，0.01〜5微米， pH控制器是将CMP浆料的pH调节至1.5至2.5的必需量。

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