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1. 发明授权

US09176075B2 Contamination inspection method and contamination inspection device 有权
标题翻译：污染检查方法和污染检查装置
公开(公告)号：US09176075B2
公开(公告)日：2015-11-03
申请号：US13390958
申请日：2010-06-21
申请人： Masanori Gunji , Tomonari Morioka , Hiroshi Akiyama , Hideki Fukushima
发明人： Masanori Gunji , Tomonari Morioka , Hiroshi Akiyama , Hideki Fukushima
IPC分类号： G01N21/00 , G01N21/956 , G01N21/94
CPC分类号： G01N21/95623 , G01N21/94
摘要： Provided are a contamination inspection method and a contamination inspection device for highly accurately detecting a defect in a wafer, a liquid crystal substrate and media or the like including patterns, for example, a semiconductor device or the like. The first aspect of the present invention is a contamination inspection device comprising: an irradiation optical system for irradiating lights on the inspection target substrate; and a spatial filter for shading diffracted lights form the inspection target substrate. Herein, the spatial filter comprises: a plurality of light shading materials; a control member for changing at least one of parameters selected from a shape, an angle and an interval with respect to the light shading material, and a control unit for controlling the control members.
摘要翻译：提供了用于高精度地检测包括图案的晶片，液晶基板和介质等的缺陷的污染检查方法和污染检查装置，例如半导体装置等。本发明的第一方面是一种污染检查装置，包括：照射光学系统，用于在检查对象基板上照射光; 并且用于遮蔽衍射光的空间滤光器形成检查对象基板。这里，空间滤波器包括：多个遮光材料; 用于改变相对于遮光材料的形状，角度和间隔中选择的参数中的至少一个的控制构件，以及用于控制控制构件的控制单元。

2. 发明申请

US20120147364A1 CONTAMINATION INSPECTION METHOD AND CONTAMINATION INSPECTION DEVICE 有权
标题翻译：污染检查方法和污染检查装置
公开(公告)号：US20120147364A1
公开(公告)日：2012-06-14
申请号：US13390958
申请日：2010-06-21
申请人： Masanori Gunji , Tomonari Morioka , Hiroshi Akiyama , Hideki Fukushima
发明人： Masanori Gunji , Tomonari Morioka , Hiroshi Akiyama , Hideki Fukushima
IPC分类号： G01N21/94
CPC分类号： G01N21/95623 , G01N21/94
摘要： Provided are a contamination inspection method and a contamination inspection device for highly accurately detecting a defect in a wafer, a liquid crystal substrate and media or the like including patterns, for example, a semiconductor device or the like. The first aspect of the present invention is a contamination inspection device comprising: an irradiation optical system for irradiating lights on the inspection target substrate; and a spatial filter for shading diffracted lights form the inspection target substrate. Herein, the spatial filter comprises: a plurality of light shading materials; a control member for changing at least one of parameters selected from a shape, an angle and an interval with respect to the light shading material, and a control unit for controlling the control members.
摘要翻译：提供了用于高精度地检测包括图案的晶片，液晶基板和介质等的缺陷的污染检查方法和污染检查装置，例如半导体装置等。本发明的第一方面是一种污染检查装置，包括：照射光学系统，用于在检查对象基板上照射光; 并且用于遮蔽衍射光的空间滤光器形成检查对象基板。这里，空间滤波器包括：多个遮光材料; 用于改变相对于遮光材料的形状，角度和间隔中选择的参数中的至少一个的控制构件，以及用于控制控制构件的控制单元。

3. 发明授权

US08847179B2 Treatment planning apparatus and particle therapy system 有权
标题翻译：治疗计划设备和颗粒治疗系统
公开(公告)号：US08847179B2
公开(公告)日：2014-09-30
申请号：US13448553
申请日：2012-04-17
申请人： Shinichiro Fujitaka , Yusuke Fujii , Rintaro Fujimoto , Kazuo Hiramoto , Hiroshi Akiyama
发明人： Shinichiro Fujitaka , Yusuke Fujii , Rintaro Fujimoto , Kazuo Hiramoto , Hiroshi Akiyama
IPC分类号： G21K5/04 , A61N5/10
CPC分类号： A61N5/1043 , A61N5/1036 , A61N5/1045 , A61N2005/1087
摘要： A charged particle beam reduces treatment time in the uniform scanning or in the conformal layer stacking irradiation. In the uniform scanning, an optimum charged particle beam scan path for uniformly irradiating a collimator aperture area is calculated. In the conformal layer stacking irradiation, an optimum charged particle beam scan path for uniformly irradiating a multi-leaf collimator aperture area of each layer for each of the layers obtained by partitioning the target volume is calculated. Alternatively, a minimum irradiation field size that covers the multi-leaf collimator aperture area of each layer is calculated, and a scan path corresponding to the irradiation field size, prestored in a memory of a particle therapy control apparatus, is selected. The charged particle beam scan path is optimally changed in the lateral directions in conformity with the collimator aperture area in the uniform scanning or in each layer in the conformal layer stacking irradiation.
摘要翻译：带电粒子束在均匀扫描或共形层层叠照射中减少处理时间。在均匀扫描中，计算用于均匀照射准直器孔径面积的最佳带电粒子束扫描路径。在保形层堆积照射中，计算用于对通过划分目标体积获得的每个层的各层的多叶准直器孔径面均匀地照射的最佳带电粒子束扫描路径。或者，计算覆盖各层的多叶准直器开口面积的最小照射场尺寸，并且选择预先存储在粒子治疗控制装置的存储器中的与照射场尺寸对应的扫描路径。带电粒子束扫描路径在均匀扫描中或在共形层堆积照射中每层中的准直器开口面积在横向上最佳地改变。

4. 发明申请

US20110249240A1 COUPLING LENS, ILLUMINATING DEVICE, AND ELECTRONIC DEVICE 有权
标题翻译：耦合透镜，照明装置和电子装置
公开(公告)号：US20110249240A1
公开(公告)日：2011-10-13
申请号：US13140732
申请日：2009-12-15
申请人： Yoshitaka Takahashi , Hiroshi Akiyama
发明人： Yoshitaka Takahashi , Hiroshi Akiyama
IPC分类号： G02B27/12 , G03B21/14 , F21V13/04 , F21V5/04 , F21V5/02
CPC分类号： G02B27/0905 , G02B3/10 , G02B27/104 , G02B27/145 , G02B27/148
摘要： A coupling lens for coupling first light having a first wavelength from a first light source with a second light having a second wavelength from a second light source disposed adjacent to the first light source in substantially the same direction includes a first surface disposed to face the first and second light sources, the first surface including a first region transmitting the first light and having a first region curvature and a second region transmitting the second light and having a second region curvature, and a second surface opposite to the first surface and having a second-surface curvature. A position of a center of the first region curvature differs from a position of a center of the second region curvature. A center of the second surface curvature and the center of the first region curvature are disposed on an optical axis of the first or second light source.
摘要翻译：用于将具有来自第一光源的第一波长的第一光与具有第二波长的第二光耦合的耦合透镜，所述第二光具有与第一光源相邻设置的第二光源基本相同的方向，包括设置成面对第一光源的第一光和第二光源，所述第一表面包括透射所述第一光并具有第一区域曲率的第一区域和透射所述第二光并具有第二区域曲率的第二区域以及与所述第一表面相对的第二表面，并且具有第二光源表面曲率。第一区域曲率的中心的位置与第二区域曲率的中心的位置不同。第二表面曲率的中心和第一区域曲率的中心设置在第一或第二光源的光轴上。

5. 发明申请

US20100302513A1 PROJECTION-TYPE IMAGE DISPLAYING APPARATUS 审中-公开
标题翻译：投影型图像显示装置
公开(公告)号：US20100302513A1
公开(公告)日：2010-12-02
申请号：US12790150
申请日：2010-05-28
申请人： YOSHITAKA TAKAHASHI , Hiroshi Akiyama
发明人： YOSHITAKA TAKAHASHI , Hiroshi Akiyama
IPC分类号： G03B21/14
CPC分类号： G03B33/12 , G03B21/2066
摘要： A projection-type image display apparatus for displaying an image on a projected plane, includes light sources each configured to emit a light, a light-path combining element configured to combine light paths of the lights each emitted from the light sources, a light path splitting element configured to split the lights on the combined light path into first and second lights, a scanning mirror configured to reflect the first lights to scan the projected plane with the first lights, a light receiving element configured to receive the second lights to detect light amounts of the received second lights, and a control circuit configured to control the scanning mirror to scan an image forming area of the projected plane with the first lights based on image data and control the light sources so as to reproduce a color based on the image data. The control circuit is configured to control the light receiving element to detect the light amounts of the light sources when the image forming area is scanned with the first light, and adjust emitting light amounts of the light sources based on the detected light amounts of the light sources.
摘要翻译：一种投影型图像显示装置，用于在投影平面上显示图像，包括各自被配置为发光的光源，光路组合元件，被配置为组合从光源发射的光的光路，光路分配元件，被配置为将组合光路上的光分成第一和第二光;扫描镜，被配置为反射第一光以用第一光扫描投影平面;光接收元件，被配置为接收第二光以检测光所接收的第二光的量，以及控制电路，被配置为基于图像数据控制扫描反射镜以第一灯扫描投影平面的图像形成区域并控制光源，以便基于图像再现颜色数据。控制电路被配置为当用第一光扫描图像形成区域时，控制光接收元件来检测光源的光量，并且基于检测到的光量调节光量的发光来源。

6. 发明授权

US07602690B2 Aberration adjustment device, method thereof, optical pickup, and optical information recording apparatus 失效
标题翻译：畸变调整装置，方法，光学拾取器和光学信息记录装置
公开(公告)号：US07602690B2
公开(公告)日：2009-10-13
申请号：US10937600
申请日：2004-09-10
申请人： Hiroshi Akiyama
发明人： Hiroshi Akiyama
IPC分类号： G11B7/00
CPC分类号： G11B7/13925 , G11B7/0053 , G11B7/1369 , G11B7/1376 , G11B7/24082 , G11B2007/0013 , G11B2007/13727
摘要： A method for adjusting an aberration is disclosed that adjusts the aberration existing in a light spot by using a control signal generated from a wobbling signal and a reproduction signal, and thereby maintaining an appropriate S/N ratio for both the wobbling signal and the reproduction signal even when astigmatism, spherical aberration, or other aberrations are present. In an optical pickup, by moving a collimator lens along a light path, a spherical aberration is generated on the light emitted from a light source, a reproduction signal (RF signal) is obtained from the light reflected from an optical disk, a wobbling signal is obtained from the light reflected from grooves on the optical disk, and the correction aberration is adjusted based on the RF signal and the wobbling signal.
摘要翻译：公开了一种用于调整像差的方法，其通过使用从摆动信号和再现信号产生的控制信号来调整存在于光点中的像差，从而为摆动信号和再现信号保持适当的S / N比即使存在散光，球面像差或其它像差。在光拾取器中，通过沿着光路移动准直透镜，对从光源发出的光产生球面像差，从光盘反射的光获得再现信号（RF信号），摆动信号是从光盘上的凹槽反射的光获得的，并且基于RF信号和摆动信号调整校正像差。

7. 再颁专利

USRE40414E1 Optical pickup apparatus 失效
标题翻译：光拾取装置
公开(公告)号：USRE40414E1
公开(公告)日：2008-07-01
申请号：US09577006
申请日：2000-05-22
申请人： Yoshitaka Takahashi , Hiroshi Akiyama , Masami Emoto
发明人： Yoshitaka Takahashi , Hiroshi Akiyama , Masami Emoto
IPC分类号： G11B7/00
CPC分类号： G11B7/1356 , G11B7/123 , G11B7/1359 , G11B7/22 , G11B11/10543
摘要： Small-sized and light-weighted optical pickup apparatus capable of eliminating the effect due to the flaring light rays and performing the signal detection of high reliability is provided.In the apparatus, the quarter-wave (λ/4) plate and the reflection-type birefringent prime provided with the deflecting function of deflecting the reflection light rays reflected on the optical information recording medium and the light rays flux separating function of separating the reflected light rays from the outgoing light rays are disposed in the optical path between the semiconductor laser constructing the optical pickup portion and the objective lens, and the light-receiving element for receiving the reflection light rays from the optical information recording medium which are defleced and separated by the reflection-type birefringent prism is disposed on a single (same) substrate together with the semiconductor laser.
摘要翻译：提供了能够消除由于扩张光线引起的影响并执行高可靠性的信号检测的小型和轻量级的光学拾取装置。在该装置中，四分之一波长（λ/ 4）板和反射型双折射源具有偏转反射光反射的光学信息记录介质上的反射光的偏转功能和分离反射的光线通量分离功能来自出射光线的光线设置在构成光学拾取部分的半导体激光器和物镜之间的光路中，以及用于接收来自光信息记录介质的反射光线的光接收元件，其被去除和分离通过反射型双折射棱镜与半导体激光器一起设置在单个（相同）基板上。

8. 发明授权

US07355189B2 Charged particle therapy system, range modulation wheel device, and method of installing range modulation wheel device 失效
标题翻译：带电粒子治疗系统，范围调制轮装置以及安装范围调制轮装置的方法
公开(公告)号：US07355189B2
公开(公告)日：2008-04-08
申请号：US11399371
申请日：2006-04-07
申请人： Masaki Yanagisawa , Hiroshi Akiyama , Koji Matsuda , Hisataka Fujimaki
发明人： Masaki Yanagisawa , Hiroshi Akiyama , Koji Matsuda , Hisataka Fujimaki
IPC分类号： G01J1/00
CPC分类号： G21K1/10 , A61N2005/1087 , A61N2005/1095 , G21K1/043
摘要： The invention provides a charged particle therapy system capable of increasing the number of patients treated. An irradiation filed forming apparatus for irradiating a charged particle beam extracted from a charged particle beam generator to an irradiation target includes an RMW device. The RMW device comprises a housing and an RMW disposed within the housing. A rotary shaft of the RMW is rotatably mounted to the housing. The RMW device is detachably installed in an RMW holding member providied in a casing of the irradiation filed forming apparatus. The housing can be placed in contact with the RMW holding member, and hence positioning of the rotary shaft of the RMW to a predetermined position can be performed in a short time. This contributed to cutting a time required for treatment per patient and increasing the number of patients treated.
摘要翻译：本发明提供一种能够增加治疗患者数量的带电粒子治疗系统。用于将从带电粒子束发生器提取的带电粒子束照射到照射目标的照射成像装置包括RMW装置。 RMW装置包括壳体和设置在壳体内的RMW。 RMW的旋转轴可旋转地安装在壳体上。 RMW装置可拆卸地安装在提供在照射成形装置的壳体中的RMW保持构件中。壳体可以放置成与RMW保持构件接触，因此可以在短时间内将RMW的旋转轴定位到预定位置。这有助于减少患者治疗所需的时间，并增加治疗患者的数量。

9. 发明申请

US20070209759A1 Plasma etching apparatus and plasma etching method 审中-公开
标题翻译：等离子体蚀刻装置和等离子体蚀刻方法
公开(公告)号：US20070209759A1
公开(公告)日：2007-09-13
申请号：US11501814
申请日：2006-08-10
申请人： Go Miya , Naoshi Itabashi , Seiichiro Kanno , Akitaka Makino , Hiroshi Akiyama
发明人： Go Miya , Naoshi Itabashi , Seiichiro Kanno , Akitaka Makino , Hiroshi Akiyama
IPC分类号： H01L21/306 , C23F1/00
CPC分类号： H01L21/32137 , H01J37/32192 , H01J37/3244
摘要： In performing plasma etching with the aim to form a gate electrode on a large-diameter substrate, it is difficult according to prior art methods to ensure the in-plane uniformity of CD shift of the gate electrode. The present invention solves the problem by supplying processing gases having different flow rates and compositions respectively through openings formed at positions opposing to the substrate and at the upper corner or side wall of the processing chamber.
摘要翻译：为了在大直径基板上形成栅电极进行等离子体蚀刻，根据现有技术的方法难以确保栅电极的CD偏移的平面内均匀性。本发明通过分别通过形成在与基板相对的位置处的开口和在处理室的上角或侧壁处分别提供具有不同流速和组成的处理气体来解决该问题。

10. 发明申请

US20070199657A1 Apparatus and method for plasma etching 审中-公开
标题翻译：用于等离子体蚀刻的装置和方法
公开(公告)号：US20070199657A1
公开(公告)日：2007-08-30
申请号：US11500360
申请日：2006-08-08
申请人： Naoyuki Kofuji , Hiroshi Akiyama
发明人： Naoyuki Kofuji , Hiroshi Akiyama
IPC分类号： H01L21/306 , C23F1/00
CPC分类号： H01L21/32137 , H01J37/3244 , H01J37/32935
摘要： The invention aims at solving the problems of throughput deterioration, reproducibility deterioration and plasma discharge instability when performing continuous discharge during multiple steps of plasma etching. According to the present invention, the gas supply unit is operated while determining the timing for switching conditions of a plurality of plasma etching steps, and the gas flow rate and gas pressure are controlled so that the pressure of processing gas supplied from the gas supply unit to the processing chamber does not fall below a predetermined pressure immediately subsequent to switching steps. For example, upon switching processing gases, the end point of a step is predicted based on an interference film thickness meter, and prior to the end point by two seconds or more, the flow rate of MFC is set to the gas flow rate for the subsequent step and the gas is flown to the exhaust device, so that simultaneously as when the end point signal is received, the processing gases are switched by switching valves.
摘要翻译：本发明旨在解决在等离子体蚀刻的多个步骤期间执行连续放电时的吞吐量劣化，再现性劣化和等离子体放电不稳定性的问题。根据本发明，在确定多个等离子体蚀刻步骤的切换条件的定时的同时操作气体供给单元，并且控制气体流量和气体压力，使得从气体供应单元供应的处理气体的压力到切换步骤之后，处理室不会下降到预定压力以下。例如，在切换处理气体时，基于干涉膜厚度计预测台阶的终点，并且在终点2秒以上之前，将MFC的流量设定为随后的步骤和气体流到排气装置，从而同时当接收到终点信号时，处理气体由切换阀切换。

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