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1. 发明申请

US20110300364A1 POLYMER SHEET AND METHOD FOR PRODUCING SAME 有权
标题翻译：聚合物片及其制造方法
公开(公告)号：US20110300364A1
公开(公告)日：2011-12-08
申请号：US13138212
申请日：2010-01-21
申请人： Masamichi Hikosaka , Kiyoka Okada , Kaori Watanabe , Junichiro Washiyama , Hideharu Kimura , Koji Yamada , Takeshi Nakajima , Akihiro Otsubo
发明人： Masamichi Hikosaka , Kiyoka Okada , Kaori Watanabe , Junichiro Washiyama , Hideharu Kimura , Koji Yamada , Takeshi Nakajima , Akihiro Otsubo
IPC分类号： B32B27/32 , B29C43/24
CPC分类号： B29C47/14 , B29C47/0004 , B29C47/0019 , B29C47/0021 , B29C47/8845 , B29C47/8895 , B29K2023/12 , B29K2105/162 , B29K2105/256 , B29K2995/0017 , B29K2995/0026 , B29K2995/0077 , C08J5/18 , C08J2323/12 , Y10T428/254 , Y10T428/31855
摘要： A polymer sheet according to at least one embodiment of the present invention is a polymer sheet whose main component is oriented nanocrystals of a polymer, and which satisfies the following conditions (I), (II), and (III): (I) having a crystallinity of not less than 70%; (II) having a tensile strength at break of not less than 100 MPa and a tensile modulus of not less than 3 GPa; and (III) having an average thickness of not less than 0.15 mm. According to at least one embodiment of the present invention, it is possible to provide a polymer sheet excelling in properties such as mechanical strength, heat tolerance, and transparency, particularly a polymer sheet having excellent properties such as mechanical strength, heat tolerance, and transparency in general-purpose plastics such as polypropylene.
摘要翻译：根据本发明的至少一个实施方式的聚合物片是其主要成分为聚合物的取向纳米晶体的聚合物片材，其满足以下条件（I），（II）和（III）：（I）具有结晶度不小于70％; （II），断裂拉伸强度为100MPa以上，拉伸弹性模量不小于3GPa; 和（III）的平均厚度不小于0.15mm。根据本发明的至少一个实施方案，可以提供具有机械强度，耐热性和透明性等特性优异的聚合物片材，特别是具有优异性能例如机械强度，耐热性和透明性的聚合物片材在通用塑料如聚丙烯中。

2. 发明授权

US08728616B2 Polymer sheet and method for producing same 有权
标题翻译：聚合物片及其制造方法
公开(公告)号：US08728616B2
公开(公告)日：2014-05-20
申请号：US13138212
申请日：2010-01-21
申请人： Masamichi Hikosaka , Kiyoka Okada , Kaori Watanabe , Junichiro Washiyama , Hideharu Kimura , Koji Yamada , Takeshi Nakajima , Akihiro Otsubo
发明人： Masamichi Hikosaka , Kiyoka Okada , Kaori Watanabe , Junichiro Washiyama , Hideharu Kimura , Koji Yamada , Takeshi Nakajima , Akihiro Otsubo
IPC分类号： C08F110/00 , C08F110/06 , C08F6/26
CPC分类号： B29C47/14 , B29C47/0004 , B29C47/0019 , B29C47/0021 , B29C47/8845 , B29C47/8895 , B29K2023/12 , B29K2105/162 , B29K2105/256 , B29K2995/0017 , B29K2995/0026 , B29K2995/0077 , C08J5/18 , C08J2323/12 , Y10T428/254 , Y10T428/31855
摘要： A polymer sheet according to at least one embodiment of the present invention is a polymer sheet whose main component is oriented nanocrystals of a polymer, and which satisfies the following conditions (I), (II), and (III): (I) having a crystallinity of not less than 70%; (II) having a tensile strength at break of not less than 100 MPa and a tensile modulus of not less than 3 GPa; and (III) having an average thickness of not less than 0.15 mm. According to at least one embodiment of the present invention, it is possible to provide a polymer sheet excelling in properties such as mechanical strength, heat tolerance, and transparency, particularly a polymer sheet having excellent properties such as mechanical strength, heat tolerance, and transparency in general-purpose plastics such as polypropylene.
摘要翻译：根据本发明的至少一个实施方式的聚合物片是其主要成分为聚合物的取向纳米晶体的聚合物片材，其满足以下条件（I），（II）和（III）：（I）具有结晶度不低于70％; （II），断裂拉伸强度为100MPa以上，拉伸弹性模量不小于3GPa; 和（III）的平均厚度不小于0.15mm。根据本发明的至少一个实施方案，可以提供具有机械强度，耐热性和透明性等特性优异的聚合物片材，特别是具有优异性能例如机械强度，耐热性和透明性的聚合物片材在通用塑料如聚丙烯中。

3. 发明申请

US20120018917A1 PROCESS AND APPARATUS FOR PRODUCING CRYSTALLINE RESIN FILM OR SHEET 有权
标题翻译：生产结晶树脂薄膜或薄片的方法和装置
公开(公告)号：US20120018917A1
公开(公告)日：2012-01-26
申请号：US13146009
申请日：2010-01-22
申请人： Junichiro Washiyama , Hideharu Kimura , Koji Yamada , Takeshi Nakajima , Akihiro Otsubo , Masamichi Hikosaka , Kiyoka Okada , Kaori Watanabe
发明人： Junichiro Washiyama , Hideharu Kimura , Koji Yamada , Takeshi Nakajima , Akihiro Otsubo , Masamichi Hikosaka , Kiyoka Okada , Kaori Watanabe
IPC分类号： B29C43/24
CPC分类号： B29C47/364 , B29C33/58 , B29C43/222 , B29C47/0019 , B29C47/0021 , B29C47/004 , B29C47/0057 , B29C47/32 , B29C47/34 , B29C47/367 , B29C47/38 , B29C47/884 , B29C47/8845 , B29C47/888 , B29C47/92 , B29C2947/92019 , B29C2947/92095 , B29C2947/92152 , B29C2947/92209 , B29C2947/9238 , B29C2947/9258 , B29C2947/9259 , B29C2947/926 , B29C2947/92647 , B29C2947/92704 , B29C2947/92885 , B29C2947/92923 , B29K2023/00 , B29K2023/04 , B29K2023/10 , B29K2025/04 , B29K2027/06 , B29K2995/0041 , B29L2007/008 , C08J5/18 , C08J2323/12
摘要： A process and apparatus for manufacturing a crystalline resin film or sheet. This manufacturing apparatus includes: an extruder that melts crystalline resin while supplying it; a gear pump that is provided on the downstream side of the extruder; a die which is provided on the downstream side of the gear pump, and which has a slit-shaped aperture; a cooling apparatus which cools film-shaped or sheet-shaped crystalline resin (A) discharged in a melted state from the die to a temperature which is not less than the crystallization temperature but not more than the melting point; and a pair of pinch rolls that press-roll between them the film-shaped or sheet-shaped crystalline resin (B) which has passed through the cooling apparatus (40), wherein the pair of guide rolls are positioned such that the thickness of the film-shaped or sheet-shaped crystalline resin (B) which has passed through the cooling apparatus is between 1.3 and 8.0 times the thickness of the film or sheet (C, D) after it has been press-rolled.
摘要翻译：用于制造结晶树脂膜或片的方法和装置。该制造装置包括：挤出机，其在供给时熔化结晶性树脂; 设置在挤出机的下游侧的齿轮泵; 模具，其设置在齿轮泵的下游侧，并且具有狭缝形孔; 将从熔融状态排出的膜状或片状结晶性树脂（A）从模具冷却至不低于结晶温度但不高于熔点的温度的冷却装置; 以及一对夹送辊，它们在它们之间挤压已经通过冷却装置（40）的薄膜状或片状结晶树脂（B），其中一对导辊定位成使得已经通过冷却装置的膜状或片状结晶性树脂（B）在被压制后的膜或片（C，D）的厚度的1.3〜8.0倍。

4. 发明授权

US09138933B2 Process and apparatus for producing crystalline resin film or sheet 有权
标题翻译：用于生产结晶树脂膜或片的方法和装置
公开(公告)号：US09138933B2
公开(公告)日：2015-09-22
申请号：US13146009
申请日：2010-01-22
申请人： Junichiro Washiyama , Hideharu Kimura , Koji Yamada , Takeshi Nakajima , Akihiro Otsubo , Masamichi Hikosaka , Kiyoka Okada , Kaori Watanabe
发明人： Junichiro Washiyama , Hideharu Kimura , Koji Yamada , Takeshi Nakajima , Akihiro Otsubo , Masamichi Hikosaka , Kiyoka Okada , Kaori Watanabe
IPC分类号： B29C47/00 , B29C47/36 , B29C33/58 , B29C43/22 , B29C47/32 , B29C47/92 , C08J5/18 , B29C47/38 , B29C47/34 , B29C47/88 , B29K23/00 , B29K25/00 , B29K27/06 , B29L7/00
CPC分类号： B29C47/364 , B29C33/58 , B29C43/222 , B29C47/0019 , B29C47/0021 , B29C47/004 , B29C47/0057 , B29C47/32 , B29C47/34 , B29C47/367 , B29C47/38 , B29C47/884 , B29C47/8845 , B29C47/888 , B29C47/92 , B29C2947/92019 , B29C2947/92095 , B29C2947/92152 , B29C2947/92209 , B29C2947/9238 , B29C2947/9258 , B29C2947/9259 , B29C2947/926 , B29C2947/92647 , B29C2947/92704 , B29C2947/92885 , B29C2947/92923 , B29K2023/00 , B29K2023/04 , B29K2023/10 , B29K2025/04 , B29K2027/06 , B29K2995/0041 , B29L2007/008 , C08J5/18 , C08J2323/12
摘要： A process and apparatus for manufacturing a crystalline resin film or sheet. This manufacturing apparatus includes: an extruder that melts crystalline resin while supplying it; a gear pump that is provided on the downstream side of the extruder; a die which is provided on the downstream side of the gear pump, and which has a slit-shaped aperture; a cooling apparatus which cools film-shaped or sheet-shaped crystalline resin (A) discharged in a melted state from the die to a temperature which is not less than the crystallization temperature but not more than the melting point; and a pair of pinch rolls that press-roll between them the film-shaped or sheet-shaped crystalline resin (B) which has passed through the cooling apparatus (40), wherein the pair of guide rolls are positioned such that the thickness of the film-shaped or sheet-shaped crystalline resin (B) which has passed through the cooling apparatus is between 1.3 and 8.0 times the thickness of the film or sheet (C, D) after it has been press-rolled.
摘要翻译：用于制造结晶树脂膜或片的方法和装置。该制造装置包括：挤出机，其在供给时熔化结晶性树脂; 设置在挤出机的下游侧的齿轮泵; 模具，其设置在齿轮泵的下游侧，并且具有狭缝形孔; 将从熔融状态排出的膜状或片状结晶性树脂（A）从模具冷却至不低于结晶温度但不高于熔点的温度的冷却装置; 以及一对夹送辊，其在它们之间挤压已经通过冷却装置（40）的膜状或片状结晶树脂（B），其中一对导辊定位成使得已经通过冷却装置的膜状或片状结晶性树脂（B）在被压制后的膜或片（C，D）的厚度的1.3〜8.0倍。

5. 发明授权

US08735523B2 Polymer crystalline materials 有权
标题翻译：聚合物结晶材料
公开(公告)号：US08735523B2
公开(公告)日：2014-05-27
申请号：US12449848
申请日：2008-02-27
申请人： Masamichi Hikosaka , Kaori Watanabe , Kiyoka Okada
发明人： Masamichi Hikosaka , Kaori Watanabe , Kiyoka Okada
IPC分类号： C08F110/06 , B29C55/18 , B29C55/00 , B29C43/02
CPC分类号： C08F10/06 , C08F110/06 , C08J5/00 , C08J2323/00 , Y10T428/2982 , C08F2500/15 , C08F2500/11 , C08F2500/04 , C08F2500/26
摘要： One embodiment of the present invention provides polymer crystalline materials containing crystals of the polymer and satisfying the following requirements (I) and (II) or the following requirements (I) and (III): (I) the polymer crystalline materials a crystallinity of 70% or greater; (II) the crystals are 300 nm or less in size; and (III) the crystals have a number density of 40 μm−3 or greater. This allows an embodiment of the present invention to provide polymer crystalline materials which are excellent in properties such as mechanical strength, heat tolerance, and transparency or, in particular, polymer crystalline materials, based on a general-purpose plastic such as PP, which is excellent in properties such as mechanical strength, heat tolerance, and transparency.
摘要翻译：本发明的一个实施方案提供含聚合物晶体并满足以下要求（I）和（II）或以下要求（I）和（III））的聚合物结晶材料：（I）聚合物结晶材料的结晶度为70 ％以上; （II）晶体尺寸为300nm以下。和（III）晶体的数密度为40μm-3以上。这允许本发明的一个实施方案提供基于诸如PP的通用塑料，其特性如机械强度，耐热性和透明度特别优选聚合物结晶材料，特别是聚合物结晶材料，其为性能如机械强度，耐热性和透明度优异。

6. 发明申请

US20100063235A1 POLYMER CRYSTALLINE MATERIALS 有权
标题翻译：聚合物结晶材料
公开(公告)号：US20100063235A1
公开(公告)日：2010-03-11
申请号：US12449848
申请日：2008-02-27
申请人： Masamichi Hikosaka , Kaori Watanabe , Kiyoka Okada
发明人： Masamichi Hikosaka , Kaori Watanabe , Kiyoka Okada
IPC分类号： C08F110/06 , B32B5/16
CPC分类号： C08F10/06 , C08F110/06 , C08J5/00 , C08J2323/00 , Y10T428/2982 , C08F2500/15 , C08F2500/11 , C08F2500/04 , C08F2500/26
摘要： One embodiment of the present invention provides polymer crystalline materials containing crystals of the polymer and satisfying the following requirements (I) and (II) or the following requirements (I) and (III): (I) the polymer crystalline materials a crystallinity of 70% or greater; (II) the crystals are 300 nm or less in size; and (III) the crystals have a number density of 40 μm−3 or greater. This allows an embodiment of the present invention to provide polymer crystalline materials which are excellent in properties such as mechanical strength, heat tolerance, and transparency or, in particular, polymer crystalline materials, based on a general-purpose plastic such as PP, which is excellent in properties such as mechanical strength, heat tolerance, and transparency.
摘要翻译：本发明的一个实施方案提供含聚合物晶体并满足以下要求（I）和（II）或以下要求（I）和（III））的聚合物结晶材料：（I）聚合物结晶材料的结晶度为70 ％以上; （II）晶体尺寸为300nm以下。和（III）晶体的数密度为40μm-3以上。这允许本发明的一个实施方案提供基于诸如PP的通用塑料，其特性如机械强度，耐热性和透明度特别优选聚合物结晶材料，特别是聚合物结晶材料，其为性能如机械强度，耐热性和透明度优异。

7. 发明授权

US07871548B2 Process for producing polymer oriented crystal, polymer oriented crystal produced by said production process, and method for determining critical elongation strain rate of polymer melt 有权
标题翻译：用于生产聚合物取向晶体的方法，通过所述制备方法制备的聚合物取向晶体以及用于确定聚合物熔体的临界伸长应变速率的方法
公开(公告)号：US07871548B2
公开(公告)日：2011-01-18
申请号：US12065197
申请日：2006-08-31
申请人： Masamichi Hikosaka , Kaori Watanabe
发明人： Masamichi Hikosaka , Kaori Watanabe
IPC分类号： G01B21/32 , G01N3/00 , B29C47/92
CPC分类号： B29C47/8815 , B29C47/0016 , B29C47/0021 , B29C47/8845 , B29C47/92 , B29C55/00 , B29C2947/92571 , B29C2947/92647 , B29C2947/92704 , B29C2947/92761 , B29C2947/92904 , B29C2947/92923 , B29K2023/06 , B29K2023/12 , B29K2025/00 , B29K2027/18 , B29K2067/00 , B29K2077/00 , B29K2105/0079 , B29K2995/0041 , B29L2017/005 , B29L2031/3005 , C08F110/06 , G01N3/08 , G01N2011/0026 , G01N2203/0019 , G01N2203/0094 , G01N2203/0226 , G01N2203/0682 , C08F2500/15
摘要： A method and means for determining a critical elongation strain rate of a polymer melt, which make it possible to subject a polymer melt to elongation to prepare a bulk oriented melt, are established, and a process for producing bulk polymer oriented crystals and polymer oriented crystals are provided. In the critical elongation strain rate determination process or critical elongation strain rate determining method, a polymer melt (3) in a disc shape having a radius x0 and a thickness of Δz0 is held between transparent plates (an upper transparent plate (1) and a lower transparent plate (2)). The polymer melt (3) is cooled to a supercooled state and is press in a thickness direction at a constant rate v by using the transparent plates. The critical point radius x*, at which the polymer melt (3) is turned to an oriented crystal, is measured, and the critical elongation strain rate ε is calculated by equation ε*=ax*3 wherein α=v/(2Δz0x03).
摘要翻译：建立了一种用于确定聚合物熔体的临界伸长应变速率的方法和装置，其使得可以使聚合物熔体伸长以制备体取向的熔体，并且制备主体聚合物取向晶体和聚合物取向晶体的方法被提供。在临界伸长应变速率测定法或临界伸长应变速率测定方法中，将半径为x0，厚度为＆Dgr; z0的圆盘状聚合物熔体（3）保持在透明板（上部透明板（1）和下透明板（2））。将聚合物熔体（3）冷却至过冷状态，并通过使用透明板以恒定速率v在厚度方向上压制。测量聚合物熔体（3）转向定向晶体的临界点半径x *，并且临界伸长应变速率＆通过等式＆egr * = ax * 3计算，其中α= v /（2＆Dgr; z0x03）。

8. 发明申请

US20090249883A1 PROCESS FOR PRODUCING POLYMER ORIENTED CRYSTAL, POLYMER ORIENTED CRYSTAL PRODUCED BY SAID PRODUCTION PROCESS, AND METHOD FOR DETERMINING CRITICAL ELONGATION STRAIN RATE OF POLYMER MELT 有权
标题翻译：用于生产聚合物晶体，通过生产方法生产的聚合物导向晶体的方法，以及用于确定聚合物熔体的关键延伸应变速率的方法
公开(公告)号：US20090249883A1
公开(公告)日：2009-10-08
申请号：US12065197
申请日：2006-08-31
申请人： Masamichi Hikosaka , Kaori Watanabe
发明人： Masamichi Hikosaka , Kaori Watanabe
IPC分类号： G01B5/30 , B29C55/00 , C08F110/06
CPC分类号： B29C47/8815 , B29C47/0016 , B29C47/0021 , B29C47/8845 , B29C47/92 , B29C55/00 , B29C2947/92571 , B29C2947/92647 , B29C2947/92704 , B29C2947/92761 , B29C2947/92904 , B29C2947/92923 , B29K2023/06 , B29K2023/12 , B29K2025/00 , B29K2027/18 , B29K2067/00 , B29K2077/00 , B29K2105/0079 , B29K2995/0041 , B29L2017/005 , B29L2031/3005 , C08F110/06 , G01N3/08 , G01N2011/0026 , G01N2203/0019 , G01N2203/0094 , G01N2203/0226 , G01N2203/0682 , C08F2500/15
摘要： A method and means for determining a critical elongation strain rate of a polymer melt, which make it possible to subject a polymer melt to elongation to prepare a bulk oriented melt, are established, and a process for producing bulk polymer oriented crystals and polymer oriented crystals are provided. In the critical elongation strain rate determination process or critical elongation strain rate determining method, a polymer melt (3) in a disc shape having a radius x0 and a thickness of Δz0 is held between transparent plates (an upper transparent plate (1) and a lower transparent plate (2)). The polymer melt (3) is cooled to a supercooled state and is press in a thickness direction at a constant rate v by using the transparent plates. The critical point radius x*, at which the polymer melt (3) is turned to an oriented crystal, is measured, and the critical elongation strain rate ε is calculated by equation ε=ax*3 wherein α=v/(2Δz0x03)
摘要翻译：建立了一种用于确定聚合物熔体的临界伸长应变速率的方法和装置，其使得可以使聚合物熔体伸长以制备体取向的熔体，并且制备主体聚合物取向晶体和聚合物取向晶体的方法被提供。在临界伸长率应变速率测定法或临界伸长应变速率测定方法中，将具有半径x0和厚度Deltaz0的圆盘状聚合物熔体（3）保持在透明板（上部透明板（1）和下透明板（2））。将聚合物熔体（3）冷却至过冷状态，并通过使用透明板以恒定速率v在厚度方向上压制。测量聚合物熔体（3）转向定向晶体的临界点半径x *，并且临界伸长率应变速率ε由方程ε= ax * 3计算，其中α= v /（2Deltaz0×03）

9. 发明授权

US06444010B1 Platinum group impurity recovery liquid and method for recovering platinum group impurity 失效
标题翻译：铂族杂质回收液及铂族杂质回收方法
公开(公告)号：US06444010B1
公开(公告)日：2002-09-03
申请号：US09709288
申请日：2000-11-13
申请人： Kaori Watanabe
发明人： Kaori Watanabe
IPC分类号： C22B1100
CPC分类号： C23F1/30 , C22B11/046 , H01L21/32134 , Y02P10/214
摘要： A mixed aqueous solution containing HCl with a concentration of 10 to 25% by weight, H2O2 with a concentration of 2 to 5% by weight, and HF with a concentration of 0.01 to 2% by weight or a mixed aqueous solution containing H2SO4 with a concentration of 65 to 82% by weight, H2O2 with a concentration of 4 to 16% by weight, and HF with a concentration of 0.01 to 2% by weight is used as a platinum group impurity recovery liquid. The recovery liquid is dripped onto a silicon substrate surface or a film thereon so as to scan the entire surface of the substrate with the droplets. As a result, the platinum group impurity is dissolved into the recovery liquid, and the platinum group impurity is thus recovered.
摘要翻译：浓度为10〜25重量％的浓度为2〜5重量％的H 2 O 2，浓度为0.01〜2重量％的HF和含有H 2 SO 4的混合水溶液的混合水溶液，浓度为65〜82重量％，浓度为4〜16重量％的H 2 O 2，浓度为0.01〜2重量％的HF用作铂族杂质回收液。将回收液滴在硅衬底表面或其上的膜上，以便用液滴扫描衬底的整个表面。结果，铂族杂质溶解在回收液中，从而回收铂族杂质。

10. 发明授权

US07566663B2 Method for manufacturing semiconductor device or semiconductor wafer using a chucking unit 有权
标题翻译：使用夹持单元制造半导体器件或半导体晶片的方法
公开(公告)号：US07566663B2
公开(公告)日：2009-07-28
申请号：US11641913
申请日：2006-12-20
申请人： Kaori Watanabe , Hiroyuki Itoh , Takatoshi Hattori
发明人： Kaori Watanabe , Hiroyuki Itoh , Takatoshi Hattori
IPC分类号： H01L21/302
CPC分类号： H01L21/67051 , H01L21/67219
摘要： A method for manufacturing a semiconductor device or a semiconductor wafer using a chucking unit is provided to remove a slurry that adheres to the back surface of the semiconductor wafer. An edge portion of a semiconductor wafer is polished while a back surface of the semiconductor wafer is chucked to a chucking unit of a first polishing unit. The polished semiconductor wafer is then dechucked from the chucking unit of the first polishing unit. Next, a gap is formed above the chucking unit of the second polishing unit, and the semiconductor wafer is disposed therein. Water is discharged from the chucking unit of the second polishing unit to clean the back surface of the semiconductor wafer W. Thereafter, the back surface of the semiconductor wafer is chucked to the chucking unit of the second polishing unit, and the semiconductor wafer is polished.
摘要翻译：提供使用夹持单元制造半导体器件或半导体晶片的方法，以去除粘附到半导体晶片的背面的浆料。抛光半导体晶片的边缘部分，同时将半导体晶片的背面夹持到第一抛光单元的夹持单元。然后将抛光的半导体晶片从第一抛光单元的夹持单元中拔出。接下来，在第二研磨单元的夹持单元的上方形成间隙，并且在其中配置半导体晶片。水从第二研磨单元的夹持单元排出，以清洁半导体晶片W的背面。然后，将半导体晶片的背面夹持到第二研磨单元的夹持单元，并且半导体晶片被抛光。

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