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    • 1. 发明授权
    • Microwave irradiation system
    • 微波辐射系统
    • US08222579B2
    • 2012-07-17
    • US12846433
    • 2010-07-29
    • Masami TaguchiNoboru BabaKazutaka OkamotoTomokatsu OguroToshio OguraMasumi Kuga
    • Masami TaguchiNoboru BabaKazutaka OkamotoTomokatsu OguroToshio OguraMasumi Kuga
    • H05B6/64H05B6/70
    • H05B6/701H05B6/707H05B6/806H05B2206/044
    • A microwave irradiation system includes first and second microwave generators, and an applicator which includes: a microwave transmission part connected to the first and second microwave generators; a reflecting plane, at an other end of the microwave transmission part of the applicator, configured to reflect microwaves from the first and the second microwave generators at such a location that a space of an object, in the microwave transmission part of the applicator between the end and the other end is irradiated with both a greater intensity of electric field and a smaller intensity of magnetic field generated by the first microwave generator and with both a greater intensity of magnetic field and a smaller intensity of electric field generated by the second microwave generator; and a filter part through which at least one of the first and second microwave generators is connected to the applicator.
    • 微波照射系统包括第一和第二微波发生器和施加器,其包括:微波传输部分,连接到第一和第二微波发生器; 在施加器的微波传输部分的另一端处的反射平面被配置为在来自第一和第二微波发生器的微波的位置处反射微波发生器的微波传播部分中的物体的空间 并且另一端用较大的电场强度和由第一微波发生器产生的较小的磁场强度照射,并且具有较大的磁场强度和由第二微波发生器产生的较小的电场强度 ; 以及过滤器部件,第一和第二微波发生器中的至少一个与涂布器连接。
    • 2. 发明申请
    • Microwave Irradiation System
    • 微波照射系统
    • US20110031239A1
    • 2011-02-10
    • US12846433
    • 2010-07-29
    • Masami TAGUCHINoboru BabaKazutaka OkamotoTomokatsu OguroToshio OguraMasumi Kuga
    • Masami TAGUCHINoboru BabaKazutaka OkamotoTomokatsu OguroToshio OguraMasumi Kuga
    • H05B6/64
    • H05B6/701H05B6/707H05B6/806H05B2206/044
    • A microwave irradiation system includes first and second microwave generators, and an applicator which includes: a microwave transmission part connected to the first and second microwave generators; a reflecting plane, at an other end of the microwave transmission part of the applicator, configured to reflect microwaves from the first and the second microwave generators at such a location that a space of an object, in the microwave transmission part of the applicator between the end and the other end is irradiated with both a greater intensity of electric field and a smaller intensity of magnetic field generated by the first microwave generator and with both a greater intensity of magnetic field and a smaller intensity of electric field generated by the second microwave generator; and a filter part through which at least one of the first and second microwave generators is connected to the applicator.
    • 微波照射系统包括第一和第二微波发生器和施加器,其包括:微波传输部分,连接到第一和第二微波发生器; 在施加器的微波传输部分的另一端处的反射平面被配置为在来自第一和第二微波发生器的微波的位置处反射微波发生器的微波传播部分中的物体的空间 并且另一端用较大的电场强度和由第一微波发生器产生的较小的磁场强度照射,并且具有较大的磁场强度和由第二微波发生器产生的较小的电场强度 ; 以及过滤器部件,第一和第二微波发生器中的至少一个与涂布器连接。