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1. 发明授权

US5444753A X-ray lithography mask, light exposure apparatus and process therefore 失效
标题翻译：因此，X射线光刻掩模，曝光装置和工艺
公开(公告)号：US5444753A
公开(公告)日：1995-08-22
申请号：US203752
申请日：1994-03-01
申请人： Masami Hayashida , Yutaka Watanabe
发明人： Masami Hayashida , Yutaka Watanabe
IPC分类号： G03F1/22 , G03F7/20 , H01L21/027 , G21K5/00
CPC分类号： G03F7/70075 , G03F7/702
摘要： Disclosed are an X-ray lithography mask, an exposure apparatus and an exposure process such as an X-ray lithography exposure apparatus and an X-ray lithography exposure process. An X-ray lithography mask includes an X-ray transmission membrane, a transfer pattern depicted on the X-ray transmission membrane and a frame for supporting the X-ray transmission membrane. The transfer pattern is depicted on the basis of a changing direction of a film thickness profile of the X-ray transmission membrane. In the exposure apparatus and process, a changing direction of an intensity profile of a radiation light illuminated on an exposure area of a mask is coincident with a changing direction of a film thickness profile of a light transmission membrane on the mask and an illumination time of the radiation light for the exposure area is changed on the basis of the intensity profile of the radiation light and the thickness profile of the light transmission membrane so that the intensity of a transfer patter image formed by the transmission of the radiation light through the light transmission membrane is rendered uniform.
摘要翻译：公开了X射线光刻掩模，曝光装置和曝光处理，例如X射线光刻曝光装置和X射线光刻曝光工艺。 X射线光刻掩模包括X射线透射膜，X射线透射膜上所示的转印图案和用于支撑X射线透过膜的框架。基于X射线透过膜的膜厚分布的变化方向来描绘转印图案。在曝光装置和处理中，照射在掩模的曝光区域上的辐射光的强度分布的改变方向与掩模上的透光膜的膜厚分布的变化方向一致，并且照射时间基于辐射光的强度分布和透光膜的厚度分布来改变曝光区域的辐射光，使得通过透射光透过而形成的转印图案图像的强度膜均匀。

2. 发明授权

US5204887A X-ray microscope 失效
标题翻译： X光显微镜
公开(公告)号：US5204887A
公开(公告)日：1993-04-20
申请号：US945578
申请日：1992-09-16
申请人： Masami Hayashida , Yutaka Watanabe , Masahito Niibe , Takashi Iizuka , Yasuaki Fukuda
发明人： Masami Hayashida , Yutaka Watanabe , Masahito Niibe , Takashi Iizuka , Yasuaki Fukuda
IPC分类号： G21K1/06 , G21K7/00
CPC分类号： B82Y10/00 , G21K1/062 , G21K7/00 , G21K2201/061 , G21K2201/064
摘要： A method and device for imaging an object illuminated by an X-ray beam, through a zone plate, is disclosed. A concave mirror with a multilayered film is disposed on a path of the X-ray beam to reflect the same and collect the same onto the object.
摘要翻译：公开了一种用于通过区域板对由X射线束照射的物体成像的方法和装置。具有多层膜的凹面镜设置在X射线束的路径上以反射它，并将其收集到物体上。

3. 发明授权

US5052033A Reflection type mask 失效
标题翻译：反射型面具
公开(公告)号：US5052033A
公开(公告)日：1991-09-24
申请号：US633181
申请日：1990-12-28
申请人： Tsutomu Ikeda , Yutaka Watanabe , Masayuki Suzuki , Masami Hayashida , Yasuaki Fukuda , Shigetaro Ogura , Takashi Iizuka , Masahito Niibe
发明人： Tsutomu Ikeda , Yutaka Watanabe , Masayuki Suzuki , Masami Hayashida , Yasuaki Fukuda , Shigetaro Ogura , Takashi Iizuka , Masahito Niibe
IPC分类号： G03F1/24 , G03F1/58 , G03F7/20
CPC分类号： B82Y10/00 , B82Y40/00 , G03F1/24 , G03F1/58 , G03F7/70033 , G03F7/70233 , G03F7/70283 , G03F7/70875 , G03F7/70958
摘要： A reflection type mask usable to print a pattern upon a semiconductor wafer by use of soft X-rays or otherwise is disclosed. A reflective surface is formed by a multilayered film which is formed on a substrate by layering different materials having different refractive indices in consideration of Bragg diffraction and Fresnel reflection. A non-reflective portion is formed on the reflecting surface to provide a desired pattern. Alternatively, a pattern comprising a multilayered structure may be formed upon a non-reflective substrate. The mask of the present invention assures pattern printing of high contrast.
摘要翻译：公开了一种可用于通过使用软X射线在半导体晶片上印刷图案的反射型掩模。考虑到布拉格衍射和菲涅尔反射，通过分层折射率不同的材料形成在基板上的多层膜形成反射表面。在反射表面上形成非反射部分以提供期望的图案。或者，包括多层结构的图案可以形成在非反射基板上。本发明的掩模确保高对比度的图案印刷。

4. 发明授权

US5549994A Exposure apparatus and reflection type mask to be used in the same 失效
标题翻译：曝光装置和反射型面罩一并使用
公开(公告)号：US5549994A
公开(公告)日：1996-08-27
申请号：US393676
申请日：1995-02-24
申请人： Yutaka Watanabe , Masami Hayashida
发明人： Yutaka Watanabe , Masami Hayashida
IPC分类号： G03F1/00 , G03F7/20 , G03F9/00 , G21K1/06 , H01L21/027
CPC分类号： B82Y10/00 , B82Y40/00 , G03F1/24 , G03F1/72 , G03F7/20 , G03F7/70283 , G03F9/70 , G21K1/062
摘要： A reflection type mask includes a reflective portion having a multilayered film, a non-reflective portion having an absorbing material and being formed on the multilayered film, and a non-reflective portion being defined by destroying the multilayered film.
摘要翻译：反射型掩模包括具有多层膜的反射部分，具有吸收材料并形成在多层膜上的非反射部分，以及通过破坏多层膜来限定非反射部分。

5. 发明授权

US5335259A X-ray exposure apparatus 失效
标题翻译： X射线曝光装置
公开(公告)号：US5335259A
公开(公告)日：1994-08-02
申请号：US15434
申请日：1993-02-09
申请人： Masami Hayashida , Yasuaki Fukuda , Yutaka Watanabe
发明人： Masami Hayashida , Yasuaki Fukuda , Yutaka Watanabe
IPC分类号： G03F7/20 , G21K1/10 , H01L21/027 , G21K1/00
CPC分类号： G03F7/70808 , G21K1/10
摘要： An X-ray apparatus includes an X-ray pickup window through which synchrotron radiation light is projected, the X-ray pickup window having an X-ray transmission film; and a correcting system for correcting an intensity distribution of the synchrotron radiation light; wherein the X-ray transmission film has at least one of a film thickness distribution and a transmissivity distribution changing substantially in a predetermined direction; and wherein the X-ray transmission film is so disposed that the predetermined direction is substantially aligned with the direction of change of the intensity distribution of the synchrotron radiation light.
摘要翻译： X射线装置包括X射线拾取窗口，X射线拾取窗口通过其投影同步加速器辐射光，X射线拾取窗口具有X射线透射膜; 以及用于校正同步加速器辐射光的强度分布的校正系统; 其中所述X射线透射膜具有基本上沿预定方向改变的膜厚度分布和透射率分布中的至少一个; 并且其中所述X射线透射膜被设置成使得所述预定方向基本上与所述同步加速器辐射光的强度分布的变化方向对准。

6. 发明授权

US5641593A Lithographic mask and exposure apparatus using the same 失效
标题翻译：平版印刷掩模和使用其的曝光装置
公开(公告)号：US5641593A
公开(公告)日：1997-06-24
申请号：US592607
申请日：1996-01-26
申请人： Yutaka Watanabe , Masami Hayashida
发明人： Yutaka Watanabe , Masami Hayashida
IPC分类号： G03F1/22 , G03F1/24 , G03F1/32 , G03F1/54 , G03F1/68 , G03F7/20 , H01L21/027 , G03F9/00
CPC分类号： G03F1/24 , B82Y10/00 , B82Y40/00 , G03F1/32 , G03F1/54 , G03F7/2039 , G03F7/70233 , G03F7/70283 , G03F7/70575
摘要： A reflection type mask includes a reflective portion effective to reflect soft X-rays or vacuum ultraviolet rays, and an absorbent material pattern formed on the reflecting portion, wherein, when the wavelength of the soft X-rays or vacuum ultraviolet rays is denoted by .lambda. and the optical constant of the material constituting the absorbent material pattern is denoted by 1-.delta.-ik (where .delta. and k are real numbers while i is an imaginary number), a relation 0.29
摘要翻译：反射型掩模包括有效地反射软X射线或真空紫外线的反射部分和形成在反射部分上的吸收材料图案，其中当软X射线或真空紫外线的波长由λ 并且构成吸收材料图案的材料的光学常数由1-Δ-ik（其中δ和k是实数，而i是虚数）表示，关系0.29

7. 发明授权

US5461657A X-ray mirror, and x-ray exposure apparatus and device manufacturing method employing the same 失效
标题翻译： X射线镜，X射线曝光装置及其制造方法
公开(公告)号：US5461657A
公开(公告)日：1995-10-24
申请号：US266749
申请日：1994-06-28
申请人： Masami Hayashida , Yutaka Watanabe
发明人： Masami Hayashida , Yutaka Watanabe
IPC分类号： G03F7/20 , G21K1/06 , G21K1/00
CPC分类号： G03F7/70058 , G03F7/708 , G21K1/06 , G21K2201/06 , G21K2201/064 , G21K2201/067
摘要： An X-ray mirror has a silicon carbide substrate having a convex cylindrical surface, and a carbon layer coated on a surface of said substrate to a thickness ranging from 10 nm to 1 .mu.m by evaporation, such as CVD. In the X-ray mirror in which the carbon layer is coated thereon beforehand, changes in the intensity of reflected light, caused by a contaminating carbon layer attached to the surface of the mirror, can be restricted. When such a mirror is used in an X-ray lithographic apparatus, the number of times the intensity of X-rays is measured or corrected or the mirror is cleaned can be greatly reduced.
摘要翻译： X射线镜具有具有凸圆柱形表面的碳化硅衬底和通过诸如CVD的蒸发在所述衬底的表面上涂覆至10nm至1μm的厚度的碳层。在预先涂覆有碳层的X射线反射镜中，可以限制由附着在反射镜表面上的污染碳层引起的反射光强度的变化。当在X射线光刻设备中使用这样的镜子时，可以大大减少测量或校正X射线强度或镜子被清洁的次数。

8. 发明申请

US20120199043A1 BODYSHELL STRUCTURE OF RAILROAD VEHICLE 有权
标题翻译：铁路车辆的车身结构
公开(公告)号：US20120199043A1
公开(公告)日：2012-08-09
申请号：US13390617
申请日：2010-04-21
申请人： Masayasu Matsuoka , Hiroyuki Kido , Taro Hayashi , Makoto Taguchi , Toshiyuki Yamada , Naoaki Kawakami , Yasufumi Minamimoto , Akira Ukita , Masami Hayashida
发明人： Masayasu Matsuoka , Hiroyuki Kido , Taro Hayashi , Makoto Taguchi , Toshiyuki Yamada , Naoaki Kawakami , Yasufumi Minamimoto , Akira Ukita , Masami Hayashida
IPC分类号： B61D25/00 , B61D15/06 , B61D17/00
CPC分类号： B61D17/043 , B61D15/06 , B61D17/06 , B61D17/08
摘要： A bodyshell of a railcar includes side outside plates, end bodyshells, and guiding plates. The side outside plate are located at both end portions of a carbody in a vehicle width direction. The end bodyshell includes an end outside plate and a corner post. The end outside plates are located at both end portions of the carbody in the longitudinal direction. The corner posts are located at four corners of the carbody. The corner post is joined to the adjacent end outside plate and the adjacent side outside plate. The guiding plate is provided at the side outside plate so as to cover the corner post from a vehicle exterior. The guiding plate includes an inclined portion and a joining portion. The inclined portion is provided in front of the corner post and inclined to the rear side toward the side outside plate.
摘要翻译：轨道车的一个外壳包括侧面外板，端部机身和引导板。侧面外侧板位于车体宽度方向的两端部。最终的外壳包括一个端外板和一个角柱。端外板位于车身纵向方向的两端部。角柱位于车身的四个角落。角柱与相邻的端部外侧板和相邻的侧部外侧板接合。引导板设置在侧板外侧，以便从车辆外部覆盖角柱。引导板包括倾斜部分和接合部分。倾斜部设置在角柱的前方，向后侧朝向侧板侧倾斜。

9. 发明授权

US08931418B2 Bodyshell structure of railcar 有权
标题翻译：轨道车身体结构
公开(公告)号：US08931418B2
公开(公告)日：2015-01-13
申请号：US13390617
申请日：2010-04-21
申请人： Masayasu Matsuoka , Hiroyuki Kido , Taro Hayashi , Makoto Taguchi , Toshiyuki Yamada , Naoaki Kawakami , Yasufumi Minamimoto , Akira Ukita , Masami Hayashida
发明人： Masayasu Matsuoka , Hiroyuki Kido , Taro Hayashi , Makoto Taguchi , Toshiyuki Yamada , Naoaki Kawakami , Yasufumi Minamimoto , Akira Ukita , Masami Hayashida
IPC分类号： B61D17/00 , B61D17/04 , B61D15/06 , B61D17/06 , B61D17/08
CPC分类号： B61D17/043 , B61D15/06 , B61D17/06 , B61D17/08
摘要： A bodyshell of a railcar includes side outside plates, end bodyshells, and guiding plates. The side outside plate are located at both end portions of a carbody in a vehicle width direction. The end bodyshell includes an end outside plate and a corner post. The end outside plates are located at both end portions of the carbody in the longitudinal direction. The corner posts are located at four corners of the carbody. The corner post is joined to the adjacent end outside plate and the adjacent side outside plate. The guiding plate is provided at the side outside plate so as to cover the corner post from a vehicle exterior. The guiding plate includes an inclined portion and a joining portion. The inclined portion is provided in front of the corner post and inclined to the rear side toward the side outside plate.
摘要翻译：轨道车的一个外壳包括侧面外板，端部机身和引导板。侧面外侧板位于车体宽度方向的两端部。最终的外壳包括一个端外板和一个角柱。端外板位于车身纵向方向的两端部。角柱位于车身的四个角落。角柱与相邻的端部外侧板和相邻的侧部外侧板接合。引导板设置在侧板外侧，以便从车辆外部覆盖角柱。引导板包括倾斜部分和接合部分。倾斜部设置在角柱的前方，向后侧朝向侧板侧倾斜。

10. 发明授权

US5145649A Apparatus for cleaning an optical element for use with a radiation beam 失效
标题翻译：用于清洁使用辐射束的光学元件的装置
公开(公告)号：US5145649A
公开(公告)日：1992-09-08
申请号：US592302
申请日：1990-10-02
申请人： Takashi Iizuka , Yasuaki Fukuda , Masami Hayashida , Masahito Niibe
发明人： Takashi Iizuka , Yasuaki Fukuda , Masami Hayashida , Masahito Niibe
IPC分类号： B08B7/00 , C23F4/00 , G02B27/00 , G03F7/20 , H05H13/04
CPC分类号： G03F7/70058 , B08B7/0035 , G02B27/0006 , G03F7/702 , G03F7/70841 , G03F7/70925
摘要： A method and apparatus for removing unclear matter on an optical element used with a radiation beam is disclosed. A filter is used to introduce light of a desired wavelength into a chamber in which the optical element is accommodated; a gas supplying device is used to supply a reactive gas which is reactable with the unclear matter on the surface of the optical element; and a vacuum-evacuating device is used to vacuum-evacuate the inside of the chamber.

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