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    • 4. 发明授权
    • Liquid phase growth method and liquid phase growth apparatus
    • 液相生长方法和液相生长装置
    • US06231667B1
    • 2001-05-15
    • US09200867
    • 1998-11-27
    • Masaaki IwaneIsao TanikawaKatsumi NakagawaTatsumi ShojiShoji NishidaNoritaka Ukiyo
    • Masaaki IwaneIsao TanikawaKatsumi NakagawaTatsumi ShojiShoji NishidaNoritaka Ukiyo
    • C30B1906
    • C30B19/062C30B19/00C30B29/06
    • A liquid phase growth apparatus of a dipping system has a plurality of liquid phase growth chambers and liquid phase growth operations of semiconductors are carried out on a plurality of substrates in the growth chambers. Another liquid phase growth apparatus of the dipping system has a liquid phase growth chamber and an annealing chamber, and is constructed in such structure that liquid phase growth of a semiconductor on one substrate is carried out in the liquid phase growth chamber and that an annealing operation of another substrate different from the aforementioned substrate is carried out in the annealing chamber. Another liquid phase growth apparatus of the dipping system has a liquid phase growth chamber and an annealing chamber, and is constructed in such structure that a semiconductor material is dissolved into a solvent in the liquid phase growth chamber and that the annealing operation of a substrate is carried out in the annealing chamber. These provide the liquid phase growth apparatus for formation of semiconductor layer in the dipping system, suitably applicable to mass production of large-area devices such as solar cells. In addition, the liquid phase growth method is also provided.
    • 浸渍系统的液相生长装置具有多个液相生长室,并且在生长室中的多个基板上进行半导体的液相生长操作。 浸渍系统的另一种液相生长装置具有液相生长室和退火室,并且构造成使得在液相生长室中进行一个基板上的半导体的液相生长,并且退火操作 在退火室中进行与上述基板不同的另一基板。 浸渍系统的另一种液相生长装置具有液相生长室和退火室,并且被构造成使半导体材料溶解在液相生长室中的溶剂中,并且基板的退火操作为 在退火室中进行。 这些提供了用于在浸渍系统中形成半导体层的液相生长装置,适用于批量生产诸如太阳能电池的大面积装置。 此外,还提供了液相生长方法。