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1. 发明授权

US09305752B2 Method for operating substrate processing apparatus 有权
标题翻译：操作基板处理装置的方法
公开(公告)号：US09305752B2
公开(公告)日：2016-04-05
申请号：US13414953
申请日：2012-03-08
申请人： Yutaka Kokaze , Masahisa Ueda , Yoshiaki Yoshida
发明人： Yutaka Kokaze , Masahisa Ueda , Yoshiaki Yoshida
IPC分类号： B44C1/22 , H01J37/32 , H01L21/3213
CPC分类号： H01J37/32449 , H01J37/3244 , H01L21/32136
摘要： A method for operating a substrate processing apparatus is provided which can contain generation of particles by generating plasma in a stable manner. After a substrate is disposed in an evacuated vacuum chamber, a rare gas is initially supplied into the vacuum chamber, a voltage is applied to a plasma generating means, and plasma of the rare gas is generated. Subsequently, a reaction gas is supplied into the vacuum chamber, the reaction gas is brought into contact with the plasma of the rare gas, and plasma of the reaction gas is generated. The plasma of the reaction gas is brought into contact with the substrate; and the substrate is processed. Plasma is stably generated not by turning the reaction gas into plasma but by first turning the rare gas into plasma by the plasma generating means, and generation of particles is subsequently suppressed.
摘要翻译：提供了一种用于操作基板处理装置的方法，其可以通过以稳定的方式产生等离子体来包含颗粒的产生。将基板设置在真空室内后，最初向真空室供给稀有气体，向等离子体发生装置施加电压，产生稀有气体的等离子体。随后，将反应气体供给到真空室中，使反应气体与稀有气体的等离子体接触，产生反应气体的等离子体。使反应气体的等离子体与基板接触; 并处理基板。等离子体不是通过将反应气体转化为等离子体而是通过等离子体产生装置首先将稀有气体转化成等离子体而稳定地产生的，随后抑制了颗粒的产生。

2. 发明申请

US20120193323A1 METHOD FOR OPERATING SUBSTRATE PROCESSING APPARATUS 有权
标题翻译：操作基板加工设备的方法
公开(公告)号：US20120193323A1
公开(公告)日：2012-08-02
申请号：US13414953
申请日：2012-03-08
申请人： Yutaka KOKAZE , Masahisa Ueda , Yoshiaki Yoshida
发明人： Yutaka KOKAZE , Masahisa Ueda , Yoshiaki Yoshida
IPC分类号： H01B13/00 , B05C9/00 , B44C1/22
CPC分类号： H01J37/32449 , H01J37/3244 , H01L21/32136
摘要： A method for operating a substrate processing apparatus is provided which can contain generation of particles by generating plasma in a stable manner. After a substrate is disposed in an evacuated vacuum chamber, a rare gas is initially supplied into the vacuum chamber, a voltage is applied to a plasma generating means, and plasma of the rare gas is generated. Subsequently, a reaction gas is supplied into the vacuum chamber, the reaction gas is brought into contact with the plasma of the rare gas, and plasma of the reaction gas is generated. The plasma of the reaction gas is brought into contact with the substrate; and the substrate is processed. Plasma is stably generated not by turning the reaction gas into plasma but by first turning the rare gas into plasma by the plasma generating means, and generation of particles is subsequently suppressed.
摘要翻译：提供了一种用于操作基板处理装置的方法，其可以通过以稳定的方式产生等离子体来包含颗粒的产生。将基板设置在真空室内后，最初向真空室供给稀有气体，向等离子体发生装置施加电压，产生稀有气体的等离子体。随后，将反应气体供给到真空室中，使反应气体与稀有气体的等离子体接触，产生反应气体的等离子体。使反应气体的等离子体与基板接触; 并处理基板。等离子体不是通过将反应气体转化为等离子体而是通过等离子体产生装置首先将稀有气体转化成等离子体而稳定地产生的，随后抑制了颗粒的产生。

3. 发明申请

US20120152889A1 METHOD FOR MANUFACTURING PIEZOELECTRIC ELEMENT 审中-公开
标题翻译：制造压电元件的方法
公开(公告)号：US20120152889A1
公开(公告)日：2012-06-21
申请号：US13365652
申请日：2012-02-03
申请人： Masahisa Ueda , Yoshiaki Yoshida , Yutaka Kokaze
发明人： Masahisa Ueda , Yoshiaki Yoshida , Yutaka Kokaze
IPC分类号： H01L41/22
CPC分类号： H01L41/332
摘要： A method for manufacturing a piezoelectric element, in which a ferroelectric film is processed in an appropriate shape by plasma etching, is provided. A metal mask made of a metal thin film which is hard to be etched by oxygen gas is placed on an object to be processed formed by laminating a lower electrode layer and a ferroelectric film on a substrate in this order. An etching gas containing a mixture gas of the oxygen gas and a reactive gas including fluorine in a chemical structure is turned into plasma and is brought into contact with the metal mask and the object to be processed. An AC voltage is applied to an electrode disposed beneath the object to be processed so that ions in the plasma are caused to enter the object to be processed to perform anisotropic etching on the ferroelectric film.
摘要翻译：提供了一种通过等离子体蚀刻将强电介质膜加工成适当形状的压电元件的制造方法。将由氧气难以蚀刻的金属薄膜制成的金属掩模放置在通过在基板上依次层叠下电极层和铁电体膜而形成的被处理物体。在化学结构中含有氧气和包含氟的反应性气体的混合气体的蚀刻气体变成等离子体，并与金属掩模和待处理物体接触。将AC电压施加到设置在待处理物体下方的电极，使得等离子体中的离子进入被处理物体，以在铁电体膜上进行各向异性蚀刻。

4. 发明申请

US20130284701A1 METHOD OF MANUFACTURING DIELECTRIC DEVICE AND ASHING METHOD 审中-公开
标题翻译：制造电介质器件和方法的方法
公开(公告)号：US20130284701A1
公开(公告)日：2013-10-31
申请号：US13995846
申请日：2011-12-19
申请人： Yoshiaki Yoshida , Yutaka Kokaze
发明人： Yoshiaki Yoshida , Yutaka Kokaze
IPC分类号： H01B19/04
CPC分类号： H01B19/04 , G03F7/427 , H01L21/0206 , H01L21/02071 , H01L21/31122 , H01L21/31138 , H01L21/32136 , H01L28/55
摘要： [Object] To provide a method of manufacturing a dielectric device and an ashing method that are capable of suppressing the occurrence of resist residue.[Solving Means] In the ashing method, a base material having a surface etched by a plasma of chlorine gas or fluorocarbon gas via a resist mask (6) formed of an organic material is disposed in a chamber, bombardment treatment is performed on the resist mask (6) by using oxygen ions in the chamber, and the resist mask is removed by using oxygen radicals in the chamber. According to the ashing method described above, etching reactants adhering to the surface of the resist mask are physically removed by the bombardment treatment using oxygen ions. Thus, it is possible to suppress the occurrence of resist residue due to the etching reactants and efficiently remove the resist mask from the surface of the base material.
摘要翻译：提供能够抑制抗蚀剂残留物的发生的制造电介质器件的方法和灰化方法。 [解决方案]在灰化方法中，通过由有机材料形成的抗蚀剂掩模（6）将具有由氯气等离子体或氟碳化合物气体蚀刻的表面的基材设置在室中，对抗蚀剂进行轰击处理通过在室中使用氧离子来形成掩模（6），并且通过在室中使用氧自由基去除抗蚀剂掩模。根据上述灰化方法，通过使用氧离子的轰击处理物理去除附着在抗蚀剂掩模表面上的蚀刻反应物。因此，可以抑制由于蚀刻反应物引起的抗蚀剂残留的发生，并且有效地从基材的表面除去抗蚀剂掩模。

5. 发明申请

US20110151058A1 DRINK, HYDROGEN-REDUCED WATER AND PRODUCTION METHOD AND STORAGE METHOD THEREFOR 审中-公开
标题翻译：饮用水，减水水及其生产方法及储存方法
公开(公告)号：US20110151058A1
公开(公告)日：2011-06-23
申请号：US12735613
申请日：2009-01-28
申请人： Yoshiaki Yoshida
发明人： Yoshiaki Yoshida
IPC分类号： C01B5/00 , A23L2/00 , A23L2/42 , A23L2/54
CPC分类号： C02F1/4618 , A23L2/44 , A23L2/54 , A23L3/3436 , C02F1/02 , C02F1/283 , C02F1/444 , C02F1/68 , C02F9/00 , C02F2001/4619 , C02F2103/026 , C02F2201/4618
摘要： An object of the present invention is to provide hydrogen-reduced water which contains a relatively large amount of dissolved hydrogen as a reactive substance having a relatively high reaction rate with respect to active oxygen in human body, has a relatively high rate of temperature change, and therefore is able to efficiently remove active oxygen, and also provide a production method and a storage method of the hydrogen-reduced water. To achieve the object, the present invention provides hydrogen-reduced water, having under a predetermined temperature condition a rate of temperature change higher than that of a water not containing hydrogen therein.
摘要翻译：本发明的目的在于提供含有相当大量溶解氢作为反应物质的氢还原水，其具有相对于人体活性氧相对较高的反应速率，具有较高的温度变化率，因此能够有效地除去活性氧，并且还提供了氢还原水的制备方法和储存方法。为了达到上述目的，本发明提供了在预定温度条件下具有比不含氢的水的温度变化率更高的氢还原水。

6. 发明授权

US4451976A Mounting apparatus for leadless electronic parts 失效
标题翻译：无铅电子零件安装装置
公开(公告)号：US4451976A
公开(公告)日：1984-06-05
申请号：US414256
申请日：1982-08-12
申请人： Takayuki Fujita , Yoshiaki Yoshida , Toshiyuki Higashiura , Kunio Tanaka
发明人： Takayuki Fujita , Yoshiaki Yoshida , Toshiyuki Higashiura , Kunio Tanaka
IPC分类号： H05K13/04 , H05K3/32
CPC分类号： H05K13/0404 , H05K13/0465 , Y10T29/49144 , Y10T29/53178
摘要： The present invention relates to a mounting apparatus for leadless electronic parts wherein leadless electronic parts 3 supplied through a cylindrical chute 5 are dropped one by one into a part holding hole 7 of a part feeding pusher 6, with the part holding hole having a cutout, the part feeding pusher 6 transports the leadless electronic part 3 between chucks 10 and 11, and then a main block 8 including the chucks 10 and 11 is pivoted such that the leadless electronic parts 3 are taken out and mounted on a mounting portion of a printed circuit board 1 rapidly and reliably.
摘要翻译： PCT No.PCT / JP81 / 00386 Sec。 371日期1982年8月12日 102（e）日期1982年8月12日PCT提交1981年12月16日PCT公布。公开号WO82 / 02136 日本1982年6月24日。无铅电子部件的安装装置技术领域本发明涉及一种无铅电子部件的安装装置，其中通过圆筒形滑槽5供给的无引线电子部件3一个接一个地落入部件供给推动器6的部件保持孔7中，部件保持孔具有切口，部件供给推动器6将无引线电子部件3传送到卡盘10和11之间，然后包括卡盘10和11的主块8枢转，使得无引线电子部件3被取出并安装快速且可靠地在印刷电路板1的安装部分上。

7. 发明授权

US5328045A Lid device for wide-mouthed container and method for making the same 失效
标题翻译：广口容器用盖装置及其制作方法
公开(公告)号：US5328045A
公开(公告)日：1994-07-12
申请号：US870868
申请日：1992-04-20
申请人： Yoshiaki Yoshida
发明人： Yoshiaki Yoshida
IPC分类号： B29C45/14 , B65D17/34 , B65D17/40 , B65D17/50 , B65D51/18
CPC分类号： B65D17/508 , B29C45/14221 , B29C45/14467 , B65D17/502 , B65D2517/0013 , B65D2517/0061 , B65D2517/5013 , B65D2517/5027 , B65D2517/5032 , B65D2517/5056 , B65D2517/5083
摘要： A lid device for a wide-mouthed container comprises a metallic lid body having an inner margin defining an opening of a predetermined shape, a resinous rim member extending along and anchored to the inner margin of the lid body, and a closure film attached to the rim member to close the opening of the lid body. The lid body is fittable to an open mouth of the container. For opening, the closure film may be peeled off the rim member or torn along the rim member.
摘要翻译：用于宽口容器的盖装置包括金属盖体，其具有限定预定形状的开口的内部边缘，沿盖体延伸并固定到盖体的内缘的树脂边缘构件，以及附接到盖体的封闭膜边缘构件以关闭盖体的开口。盖体可装配到容器的开口。为了打开，封闭膜可以从边缘构件剥离或者沿着边缘构件撕裂。

8. 发明授权

US4923586A Enzyme electrode unit 失效
标题翻译：酶电极单元
公开(公告)号：US4923586A
公开(公告)日：1990-05-08
申请号：US407672
申请日：1989-09-14
申请人： Hideo Katayama , Yoshiaki Yoshida , Tatsuhiko Osaka
发明人： Hideo Katayama , Yoshiaki Yoshida , Tatsuhiko Osaka
IPC分类号： C12Q1/00
CPC分类号： C12Q1/006 , C12Q1/001 , Y10S435/817
摘要： An enzyme electrode unit having, on the surfaces of the base electrodes thereof, an enzyme-immobilized membrane for oxidizing or reducing a target substance to be measured, and a diffusion-limiting membrane unit of a two-layer structure disposed on the surface of the enzyme-immobilized membrane, only the diffusion-limiting membrane having a lower target substance diffusion limiting effect being replaceable, thus maintaining substantially constant the general target substance diffusion limiting effect of the diffusion-limiting membrane unit, even after the replaceable diffusion-limiting membrane has been replaced.
摘要翻译：一种酶电极单元，在其基极表面上具有用于氧化或还原被测定物质的酶固定膜，以及设置在所述测定对象物的表面上的两层结构的扩散限制膜单元酶固定膜，只有具有较低目标物扩散限制效果的扩散限制膜是可替换的，因此即使在可更换的扩散限制膜具有被替换

9. 发明授权

US4338777A Method and apparatus for starting and stopping an open end spinning machine 失效
标题翻译：用于启动和停止开口纺纱机的方法和装置
公开(公告)号：US4338777A
公开(公告)日：1982-07-13
申请号：US147549
申请日：1980-05-05
申请人： Osamu Suzuki , Toshio Yoshizawa , Yoshiaki Yoshida , Keiji Onoue , Kazuo Seiki
发明人： Osamu Suzuki , Toshio Yoshizawa , Yoshiaki Yoshida , Keiji Onoue , Kazuo Seiki
IPC分类号： D01H1/32 , D01H4/44 , D01H4/50 , D01H15/02 , D01H1/135
CPC分类号： D01H4/44
摘要： When an open end spinning machine is stopped, a fiber supply to a spinning rotor is first stopped and thereafter, substantially simultaneously with stoppage of both a yarn take-up roller and a yarn winding roller, a yarn end is held by a yarn holding device at a time when it still remains in a region which undergoes the suction effect of a subatmospheric pressure produced in the spinning rotor. The spinning rotor is subsequently stopped. On starting, the holding of the yarn end by the yarn holding device continues even after restarting of the spinning machine until the subatmospheric pressure produced in the spinning rotor reaches substantially the same value as that produced during a normal spinning operation. Therefore, there is prevented any snarling phenomenon, resulting in a greatly increased success rate in the operation of connecting yarn ends on re-starting of the spinning machine.
摘要翻译：当开放式纺纱机停止时，首先停止对纺丝转子的纤维供给，然后在纱线卷取辊和纱线卷绕辊停止的同时基本同时，纱线端部由纱线保持装置此时它仍然保留在经受在纺丝转子中产生的低于大气压的吸力作用的区域中。纺纱转子随后停止。起动时，纱线保持装置的纱线端部的保持继续，即使在纺纱机重新起动之后，直到在纺丝转子中产生的低于大气压的压力达到与正常纺丝操作期间产生的大致相同的值。因此，防止发生嘶嘶声现象，导致纺纱机再起动时连接纱线端部的操作成功率大大提高。

10. 发明授权

US4288975A Method and apparatus for starting a spinning machine 失效
标题翻译：启动纺纱机的方法和装置
公开(公告)号：US4288975A
公开(公告)日：1981-09-15
申请号：US131132
申请日：1980-03-17
申请人： Yoshiaki Yoshida , Osamu Suzuki , Keiji Onoue , Kazuo Seiki
发明人： Yoshiaki Yoshida , Osamu Suzuki , Keiji Onoue , Kazuo Seiki
IPC分类号： D01H1/34 , D01H4/44 , D01H4/50 , D01H15/02 , D01H1/30
CPC分类号： D01H4/44
摘要： According to this invention, a spinning rotor is increased in speed until it reaches a predetermined higher speed beyond a lower speed region and then decreased in speed until it falls within the lower speed region, in which a yarn ending is effected. Thereafter, the speed of the spinning rotor is increased to a normal spinning speed beyond the predetermined higher speed. During rotation of the spinning rotor at the predetermined higher speed, sufficient subatmospheric pressure is produced in the spinning rotor to stretch out the yarn end thereby to prevent the yarn end from being snarled. Also, during this higher speed rotation of the spinning rotor, sufficient fibers in the spinning rotor can be collected in a maximum diameter portion in the spinning rotor to be connected with the snarl-free yarn end in a favorable condition. The period of time, during which the speed of the spinning rotor is decreased from the predetermined higher speed and falls within the lower speed region, is relatively short being in the order of a few or several seconds. Therefore, it will be understood that there is no fear that both the yarn end and the remaining fibers are restored to their initial state during that period of time.
摘要翻译：根据本发明，旋转转子的速度增加，直到其超过低速区域达到预定的较高速度，然后降低速度，直到其落入进行纱线结束的低速区域内。此后，将纺丝转子的速度提高到超过预定的较高速度的正常纺丝速度。在旋转转子以预定的较高速度旋转时，在纺丝转子中产生足够的低于大气压的伸出纱线端部，从而防止纱线端部嘶嘶响。此外，在纺丝转子的这种较高速度的旋转中，纺丝转子中的足够的纤维可以收集在纺丝转子的最大直径部分中，以在有利的条件下与无卷曲纱线端部连接。纺纱转子的速度从预定的较高速度降低并落在低速区域内的时间段相对较短，为几秒或数秒左右。因此，应当理解，在该时间段内，纱线末端和剩余的纤维都不会恢复到初始状态。

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