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1. 发明授权

US06335126B1 Method of manufacturing a pellicle 有权
标题翻译：防护薄膜制造方法
公开(公告)号：US06335126B1
公开(公告)日：2002-01-01
申请号：US09331015
申请日：1999-06-15
申请人： Masahiro Kondou , Minoru Fujita , Hiroaki Nakagawa , Hiroyuki Kurata
发明人： Masahiro Kondou , Minoru Fujita , Hiroaki Nakagawa , Hiroyuki Kurata
IPC分类号： G03F900
CPC分类号： G03F1/62
摘要： According to the present invention, a method of manufacturing a pellicle and a jig for manufacturing a pellicle are provided. The method of manufacturing a pellicle of the present invention comprising the steps of: temporarily coating a thin film which is a constituting member of a pellicle which is a dust cover for a mask used in patterning in manufacturing a semiconductor device or a liquid crystal display plate, on a frame larger than a specified frame which is another constituting member of the pellicle; coating an adhesive on said specified frame in advance; overlapping said larger frame on said specified frame coated with said adhesive; adhering said thin film temporarily coated on said larger frame to said specified frame with said adhesive; transferring said thin film coated on said larger frame to said specified frame from said larger frame; and cutting off a portion of said transferred thin film, the portion of which is protruded from said specified frame, with a physical trimming means, wherein a coating material consisting of an organic solvent and a specified resin dissolved therein is supplied to a cut-off portion intended to be cut off, by said physical trimming means, at the same time or before cutting off said protruded thin film with said physical trimming means.
摘要翻译：根据本发明，提供一种制造防护薄膜组件的方法和用于制造防护薄膜组件的夹具。本发明的防护薄膜组件的制造方法，其特征在于，包括以下步骤：在半导体装置或液晶显示板的制造中暂时涂布作为用于图案化的掩模的防尘罩的防护薄膜的构成部件的薄膜在大于作为防护薄膜组件的另一构成构件的指定框架的框架上; 预先在所述指定的框架上涂布粘合剂; 在涂有所述粘合剂的所述指定框架上重叠所述较大框架; 将所述较大框架上临时涂覆的所述薄膜用所述粘合剂粘附到所述指定的框架上; 将涂覆在所述较大框架上的所述薄膜从所述较大框架传送到所述指定框架; 并用物理修整装置切断其部分从所述指定框架突出的所述转移的薄膜的一部分，其中由有机溶剂和溶解在其中的特定树脂组成的涂层材料被供给到截止通过所述物理修整装置，同时或在用所述物理修整装置切断所述突出的薄膜之前，要切断的部分。

2. 发明申请

US20060257754A1 Pellicles having low adhesive residue 审中-公开
标题翻译：薄膜具有低粘合残留
公开(公告)号：US20060257754A1
公开(公告)日：2006-11-16
申请号：US11429955
申请日：2006-05-09
申请人： Katsuaki Harubayashi , Minoru Fujita , Masahiro Kondou , Yoshihisa Saimoto
发明人： Katsuaki Harubayashi , Minoru Fujita , Masahiro Kondou , Yoshihisa Saimoto
IPC分类号： A47G1/12 , G03F1/14 , G03F1/00 , G03C5/00
CPC分类号： G03F1/62
摘要： The present invention provides a pellicle, wherein a peel strength is from 0.004 N/mm to 0.10 N/mm when a non-surface-treated polyethylene terephthalate film having a thickness of 125 μm is peeled in a direction of 180 degrees at a temperature of 23° C. after the polyethylene terephthalate film has been adhered to the mask adhering surface of the pellicle.
摘要翻译：本发明提供一种防护薄膜组件，其中当在180度的温度下将厚度为125μm的非表面处理的聚对苯二甲酸乙二醇酯膜在180度的方向上剥离时，剥离强度为0.004N / mm至0.10N / mm，在聚对苯二甲酸乙二醇酯膜已经粘附到防护薄膜的掩模粘附表面之后23℃。

3. 发明申请

US20070185355A1 Method for producing fluorine-containing halide 有权
标题翻译：含氟卤化物的制造方法
公开(公告)号：US20070185355A1
公开(公告)日：2007-08-09
申请号：US10593322
申请日：2005-03-11
申请人： Akinari Sugiyama , Kazuyoshi Ichihara , Noriyuki Shinoki , Toshiya Mantani , Masahiro Kondou
发明人： Akinari Sugiyama , Kazuyoshi Ichihara , Noriyuki Shinoki , Toshiya Mantani , Masahiro Kondou
IPC分类号： C07C19/08
CPC分类号： C07C41/22 , C07C17/093 , C07C19/14 , C07C43/17
摘要： The present invention provides a method for producing a fluorine-containing halide, comprising reacting a fluorine-containing sulfonyl halide or fluorine-containing disulfonyl chloride with a metal halide or metal component in the present or absence of a solvent. In accordance with the present invention, a fluorine-containing bromide, fluorine-containing iodide or fluorine-containing chloride can be readily produced in high yield at low cost, using an industrially advantageous process.
摘要翻译：本发明提供一种含氟卤化物的制造方法，其特征在于，在含或不存在溶剂的情况下，使含氟磺酰卤或含氟二磺酰氯与金属卤化物或金属成分反应。根据本发明，使用工业上有利的方法，可以以低成本容易地以高产率制备含氟溴化物，含氟碘化物或含氟氯化物。

4. 发明授权

US07692048B2 Method for producing fluorine-containing halide 有权
标题翻译：含氟卤化物的制造方法
公开(公告)号：US07692048B2
公开(公告)日：2010-04-06
申请号：US10593322
申请日：2005-03-11
申请人： Akinari Sugiyama , Kazuyoshi Ichihara , Noriyuki Shinoki , Toshiya Mantani , Masahiro Kondou
发明人： Akinari Sugiyama , Kazuyoshi Ichihara , Noriyuki Shinoki , Toshiya Mantani , Masahiro Kondou
IPC分类号： C07C19/08
CPC分类号： C07C41/22 , C07C17/093 , C07C19/14 , C07C43/17
摘要： The present invention provides a method for producing a fluorine-containing halide, comprising reacting a fluorine-containing sulfonyl halide or fluorine-containing disulfonyl chloride with a metal halide or metal component in the present or absence of a solvent. In accordance with the present invention, a fluorine-containing bromide, fluorine-containing iodide or fluorine-containing chloride can be readily produced in high yield at low cost, using an industrially advantageous process.
摘要翻译：本发明提供一种含氟卤化物的制造方法，其特征在于，在含或不存在溶剂的情况下，使含氟磺酰卤或含氟二磺酰氯与金属卤化物或金属成分反应。根据本发明，使用工业上有利的方法，可以以低成本容易地以高产率制备含氟溴化物，含氟碘化物或含氟氯化物。

5. 发明授权

US06747540B1 Ignition coil for internal combustion engine 失效
标题翻译：内燃机点火线圈
公开(公告)号：US06747540B1
公开(公告)日：2004-06-08
申请号：US08951317
申请日：1997-10-16
申请人： Yosimi Nakase , Shigemi Itou , Masahiro Kondou
发明人： Yosimi Nakase , Shigemi Itou , Masahiro Kondou
IPC分类号： H01F2729
CPC分类号： H01T13/44 , H01F27/04 , H01F27/36 , H01F38/12 , H01F2038/122 , H01F2038/125
摘要： A conductive member is disposed between a secondary spool and a high tension terminal to shield the wire connecting the secondary coil and the high tension terminal. The conductive member has a wide surface facing the low tension components to moderate the electric field strength around low tension components, thereby preventing treeings from growing in the insulating filler of the ignition coil.
摘要翻译：导电构件设置在次级线圈和高压端子之间以屏蔽连接次级线圈和高压端子的线。导电构件具有面向低张力构件的宽表面，以缓和低张力构件周围的电场强度，从而防止树丛在点火线圈的绝缘填料中生长。

6. 发明申请

US20090042107A1 PELLICLE FOR HIGH NUMERICAL APERTURE EXPOSURE DEVICE 审中-公开
标题翻译：高数值孔径曝光装置用透镜
公开(公告)号：US20090042107A1
公开(公告)日：2009-02-12
申请号：US12162420
申请日：2007-01-30
申请人： Masahiro Kondou , Toshihiko Nakano
发明人： Masahiro Kondou , Toshihiko Nakano
IPC分类号： G03F1/00
CPC分类号： G03F1/62
摘要： A pellicle that is used in a semiconductor lithography process and that can be used in an exposure device with an optical system having a numerical aperture of 1.0 or above, is provided. The pellicle of the present invention uses a pellicle film that has had its film thickness adjusted so as to exhibit transmittance of 95% or above at angles of incidence of exposure light with respect to the pellicle film in the range of from 0° to 20°. By using the pellicle of the present invention, it is possible to produce a semiconductor having an unprecedented fine circuit pattern at good yield while preventing adherence of dust to a reticle.
摘要翻译：提供了用于半导体光刻工艺中并且可以用于具有数值孔径为1.0或更大的光学系统的曝光装置中的防护薄膜组件。本发明的防护薄膜组件使用其薄膜厚度调整为使曝光光相对于防护薄膜的入射角在0°〜20°范围内的透射率为95％以上的防护薄膜组件。通过使用本发明的防护薄膜组件，可以以良好的成品率制造具有前所未有的微细电路图案的半导体，同时防止灰尘附着在掩模版上。

7. 发明授权

US07348386B2 Process for producing fluorocopolymer, fluorocopolymer, and molded object 失效
公开(公告)号：US07348386B2
公开(公告)日：2008-03-25
申请号：US10518014
申请日：2003-06-16
申请人： Takuya Arase , Masahiro Kondou , Kenji Ishii , Tadaharu Isaka
发明人： Takuya Arase , Masahiro Kondou , Kenji Ishii , Tadaharu Isaka
IPC分类号： C08F12/30
CPC分类号： C08F214/262 , C08F214/182 , C08J5/225 , C08J2327/12 , H01M8/1023 , H01M8/1039 , H01M8/1072 , H01M10/052 , H01M10/0565 , H01M2300/0082 , Y02P70/56
摘要： The present invention relates to a method for producing a fluorocopolymer which comprises a polymerization reaction of a fluorine-containing ethylenic monomer with a fluorovinyl ether derivative represented by the following general formula (I): CF2═CF—O—[CF2CF(CF3)O]n—(CF2)m-A (I) (wherein n represents an integer of 0 to 3, m represents an integer of 1 to 5, and A represents —SO2X or —COOY; X represents a halogen atom or —NR1R2; R1 and R2 are the same or different and each represents a hydrogen atom, an alkali metal, an alkyl group or a sulfonyl-containing group and Y represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms) to give a fluorocopolymer, said fluorine-containing ethylenic monomer being a perhaloethylenic monomer represented by the following general formula (II): CF2═CF—Rf1 (II) (wherein Rf1 represents a fluorine atom, a chlorine atom, Rf2 or ORf2; Rf2 represents a straight or branched perfluoroalkyl group having 1 to 9 carbon atoms, which may have an ether oxygen atom(s)) and/or a hydrogen-containing fluoroethylenic monomer represented by the following general formula (III): CHX1═CFX2 (III) (wherein X1 represents a hydrogen atom or a fluorine atom and X2 represents a hydrogen atom, a fluorine atom, a chlorine atom, Rf3 or ORf3; Rf3 represents a straight or branched perfluoroalkyl group having 1 to 9 carbon atoms, which may have an ether oxygen atom(s)), and said polymerization reaction being carried out in a saturated perfluorohydrocarbon while additional feeding of the fluorine-containing ethylenic monomer and fluorovinyl ether derivative being carried out.

8. 发明申请

US20080004473A1 Method for Producing Fluorine-Containing Fluorosulfonyl Alkylvinyl Ether 审中-公开
标题翻译：生产含氟氟磺酰基烷基乙烯基醚的方法
公开(公告)号：US20080004473A1
公开(公告)日：2008-01-03
申请号：US11667672
申请日：2005-10-28
申请人： Akinari Sugiyama , Kazuyoshi Ichihara , Noriyuki Shinoki , Toshiya Mantani , Masahiro Kondou
发明人： Akinari Sugiyama , Kazuyoshi Ichihara , Noriyuki Shinoki , Toshiya Mantani , Masahiro Kondou
IPC分类号： C07C315/04
CPC分类号： C07C303/22 , C07C309/82
摘要： The present invention provides a method of producing a fluorine-containing fluorosulfonylalkyl vinyl ether represented by the formula CF2=CFOCF2CF2SO2F, the method comprising reacting a fluorine-containing chlorosulfonylalkyl vinyl ether represented by the formula CF2=CFOCF2CF2SO2Cl with a fluorinating agent represented by the formula KF·(HF)n (wherein n is 0 to 5) in a polar organic solvent at a temperature not higher than 70° C. The method of the invention produces the fluorine-containing fluorosulfonylalkyl vinyl ether in high yield at low cost in a simple, industrially advantageous manner.
摘要翻译：本发明提供一种制备由式CF 2/2 CF 2 CF 2 O 2 SO 2 SUB表示的含氟氟代磺酰基烷基乙烯基醚的方法 > 2 F的方法，该方法包括使由式CF 2/2 CF 2 CF 2 CF 2 O 2表示的含氟氯磺烷基烷基乙烯基醚（HF）N（其中n为0至5）的氟化剂在极性有机溶剂中的温度不高于SO 2 SO 2 70℃以上。本发明的方法以简单，工业上有利的方式以低成本高产率生产含氟氟磺酰基烷基乙烯基醚。

9. 发明申请

US20050245707A1 Process for producing fluorocopolymer, fluorocopolymer, and molded object 失效
公开(公告)号：US20050245707A1
公开(公告)日：2005-11-03
申请号：US10518014
申请日：2003-06-16
申请人： Takuya Arase , Masahiro Kondou , Kenji Ishii , Tadaharu Isaka
发明人： Takuya Arase , Masahiro Kondou , Kenji Ishii , Tadaharu Isaka
IPC分类号： C08F214/18 , C08F214/26 , C08F16/24
CPC分类号： C08F214/262 , C08F214/182 , C08J5/225 , C08J2327/12 , H01M8/1023 , H01M8/1039 , H01M8/1072 , H01M10/052 , H01M10/0565 , H01M2300/0082 , Y02P70/56
摘要： The present invention relates to a method for producing a fluorocopolymer which comprises a polymerization reaction of a fluorine-containing ethylenic monomer with a fluorovinyl ether derivative represented by the following general formula (I): CF2═CF—O—[CF2CF(CF3)O]n—(CF2)m-A (I) (wherein n represents an integer of 0 to 3, m represents an integer of 1 to 5, and A represents —SO2X or —COOY; X represents a halogen atom or —NR1R2; R1 and R2 are the same or different and each represents a hydrogen atom, an alkali metal, an alkyl group or a sulfonyl-containing group and Y represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms) to give a fluorocopolymer, said fluorine-containing ethylenic monomer being a perhaloethylenic monomer represented by the following general formula (II): CF2═CF—Rf1 (II) (wherein Rf1 represents a fluorine atom, a chlorine atom, Rf2 or ORf2; Rf2 represents a straight or branched perfluoroalkyl group having 1 to 9 carbon atoms, which may have an ether oxygen atom(s)) and/or a hydrogen-containing fluoroethylenic monomer represented by the following general formula (III): CHX1═CFX2 (III) (wherein X1 represents a hydrogen atom or a fluorine atom and X2 represents a hydrogen atom, a fluorine atom, a chlorine atom, Rf3 or ORf3; Rf3 represents a straight or branched perfluoroalkyl group having 1 to 9 carbon atoms, which may have an ether oxygen atom(s)), and said polymerization reaction being carried out in a saturated perfluorohydrocarbon while additional feeding of the fluorine-containing ethylenic monomer and fluorovinyl ether derivative being carried out.

10. 发明授权

US07423174B2 Method of separating acid 有权
标题翻译：分离酸的方法
公开(公告)号：US07423174B2
公开(公告)日：2008-09-09
申请号：US10477198
申请日：2002-05-30
申请人： Masaki Irie , Masahiro Kondou
发明人： Masaki Irie , Masahiro Kondou
IPC分类号： C01B31/00 , C07C51/64 , C08F226/06
CPC分类号： C07C51/64 , C01B7/0706 , C01B7/093 , C01B7/195 , C01B32/80
摘要： The present invention provides a process for selectively separating HF and like acids present along with water-unstable organic acid fluorides. In particular, the invention provides a process for separating an acid from a system in which the acid and an organic acid fluoride are present, the organic acid fluoride being represented by formula (I): RCOF (I) wherein R is a fluorine atom; a C1-20 linear, branched or cyclic alkyl or halogenated alkyl group that may contain a heteroatom; or a C6-20 aryl or halogenated aryl group that may contain a heteroatom; the process comprising using as a deacidifying agent an aromatic heterocyclic compound having a boiling point of at least 50° C. and having one or more nitrogen atoms as heteroatom.
摘要翻译：本发明提供了选择性分离与水不稳定的有机酸氟化物一起存在的HF等酸的方法。特别地，本发明提供了从存在酸和有机酸氟化物的体系中分离酸的方法，有机酸氟化物由式（I）表示：<β在线式描述=“In “公式”end =“lead”？> RCOF（I）<？in-line-formula description =“In-line formula”end =“tail”？>其中R是氟原子; 可以含有杂原子的C 1-20烷基或卤代烷基; 或可含有杂原子的C 6-20芳基或卤代芳基; 该方法包括使用沸点为至少50℃并具有一个或多个氮原子作为杂原子的芳族杂环化合物作为脱酸剂。

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