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    • 2. 发明申请
    • ELECTRON BEAM APPARATUS AND AN ABERRATION CORRECTION OPTICAL APPARATUS
    • 电子束装置和抛光校正光学装置
    • US20080067377A1
    • 2008-03-20
    • US11760235
    • 2007-06-08
    • Masahiro HatakeyamaTakeshi MurakamiNobuharu NojiMamoru NakasujiHirosi SobukawaSatoshi MoriTsutomu Karimata
    • Masahiro HatakeyamaTakeshi MurakamiNobuharu NojiMamoru NakasujiHirosi SobukawaSatoshi MoriTsutomu Karimata
    • G21K7/00
    • H01J37/153H01J37/065H01J2237/061H01J2237/06375H01J2237/083H01J2237/1534H01J2237/24592H01J2237/28
    • An electron beam apparatus for providing an evaluation of a sample, such as a semiconductor wafer, that includes a micro-pattern with a minimum line width not greater than 0.1 μm with high throughput. A primary electron beam generated by an electron gun is irradiated onto a sample and secondary electrons emanating from the sample are formed into an image on a detector by an image projection optical system. An electron gun 61 has a cathode 1 and a drawing electrode 3, and an electron emission surface 1a of the cathode defines a concave surface. The drawing electrode 3 has a convex surface 3a composed of a partial outer surface of a second sphere facing the electron emission surface 1a of the cathode and an aperture 73 formed through the convex surface for passage of the electrons. An aberration correction optical apparatus comprises two identically sized multi-polar Wien filters arranged such that their centers are in alignment with a 1/4 plane position and a ¾ plane position, respectively, along an object plane-image plane segment in the aberration correction optical apparatus, and optical elements having bidirectional focus disposed in an object plane position, an intermediate image-formation plane position and an image plane position, respectively, in the aberration correction optical apparatus.
    • 一种用于提供诸如半导体晶片的样品的评估的电子束装置,其包括具有不大于0.1μm的最小线宽的微量图案,具有高生产量。 由电子枪产生的一次电子束照射在样品上,从样品发出的二次电子通过图像投影光学系统形成检测器上的图像。 电子枪61具有阴极1和拉伸电极3,阴极的电子发射表面1a限定凹面。 拉制电极3具有由面对阴极的电子发射表面1a的第二球体的部分外表面和由电子通过凸面形成的孔73构成的凸面3a。 像差校正光学装置包括两个相同大小的多极维恩滤波器,其布置成使得它们的中心分别与像差校正光学中的物平面图像平面段的1/4平面位置和¾平面位置对准 装置和具有分别设置在像差校正光学装置中的物平面位置,中间图像形成平面位置和图像平面位置的双向焦点的光学元件。
    • 10. 发明授权
    • Bearingless rotary machine
    • 无轴承旋转机
    • US06078119A
    • 2000-06-20
    • US199338
    • 1998-11-25
    • Tadashi SatohMasaru OhsawaSatoshi Mori
    • Tadashi SatohMasaru OhsawaSatoshi Mori
    • F16C39/06H02K7/09H02K11/04H02K17/16F16C32/04
    • F16C32/0497F16C32/0444H02K11/33H02K7/09
    • An object of the present invention is to provide a bearingless rotary machine which is capable of stably controlling the levitated position of a rotor of an induction motor even if the rotor comprises a squirrel-cage type rotor that is simple in structure and can easily be manufactured.A bearingless rotary machine has a rotor having secondary current paths and a stator spaced from the rotor by a gap. The stator has two kinds of windings for imparting a rotating and a levitating and supporting force to the rotor. The rotary machine has a magnetic field command calculator, magnetic flux distribution detecting means and correcting means for adjusting the detected control magnetic flux distribution to coincide with the magnetic field distribution command.
    • 本发明的目的是提供一种能够稳定地控制感应电动机的转子的悬浮位置的无轴承旋转机械,即使转子包括结构简单且容易制造的鼠笼式转子 。 无轴承旋转机具有具有次级电流路径的转子和与转子间隔开的定子。 定子具有两种绕组,用于向转子施加旋转和悬浮和支撑力。 旋转机具有磁场指令计算器,磁通分布检测装置和校正装置,用于调整检测到的控制磁通量分布以与磁场分布指令一致。