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    • 10. 发明授权
    • Electron emission element with schottky junction
    • 具肖特基结的电子发射元件
    • US5554859A
    • 1996-09-10
    • US557678
    • 1995-11-13
    • Takeo TsukamotoNobuo WatanabeToshihiko TakedaMasahiko Okunuki
    • Takeo TsukamotoNobuo WatanabeToshihiko TakedaMasahiko Okunuki
    • H01J1/308H01J9/02H01L29/06H01L29/12
    • H01J1/308H01J9/022
    • This is an electron emission with a semiconductor substrate having a p-type semiconductor layer whose impurity concentration falls within a concentration range for causing an avalanche breakdown in a least a portion of a surface of the semiconductor layer. A Schottky electrode is connected to the semiconductor layer. There are a means for applying a reverse bias voltage between the Schottky electrode and the p-type semiconductor layer to cause the Schotty electrode to emit electrons, and a lead electrode, formed at a proper position, for externally guiding the emitted electrons. At least a portion of the Schottky electrode is formed of a thin film of a material selected from metals of Group 1A, Group 2A, Group 3A, and lanthanoids, metal silicides of Group 1A, Group 2A, Group Group 3A, and lanthanoids, and metal borides of Group 1A, Group 2A, Group 3A, and lanthanoids, and metal carbides of Group 4A. A film thickness of the Schotty electrode is set to be not more than 100 .ANG..
    • 这是具有半导体衬底的电子发射,其半导体衬底具有p型半导体层,其杂质浓度落在半导体层的表面的至少一部分中引起雪崩击穿的浓度范围内。 肖特基电极连接到半导体层。 存在在肖特基电极和p型半导体层之间施加反向偏置电压以使Schotty电极发射电子的装置和形成在适当位置的引线电极,用于外部引导发射的电子。 肖特基电极的至少一部分由选自组1A,组2A,组3A和镧系元素的金属的薄膜,组1A,组2A,组3A和镧系元素的金属硅化物形成,以及 第1A组,第2A组,第3A组和镧系金属硼化物,以及4A组金属碳化物。 将Schotty电极的膜厚设定为不超过100。