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    • 2. 发明授权
    • Method for manufacturing a microstructure
    • 微结构制造方法
    • US07526863B2
    • 2009-05-05
    • US11108700
    • 2005-04-19
    • Masashi MiyagawaMasahiko Kubota
    • Masashi MiyagawaMasahiko Kubota
    • B23P17/00B41J2/015G01D15/00
    • B41J2/1639B41J2/1603B41J2/1631Y10T29/49128Y10T29/4913Y10T29/49131Y10T29/49156Y10T29/49169Y10T29/49401
    • A method for manufacturing a microstructure comprises the steps of forming positive type resist layer (PMMA) on a base plate having heater formed thereon; forming positive type resist layer (PMIPK) on the aforesaid positive type resist layer; exposing the positive type resist layer on the upper layer to ionizing radiation of the wavelength region that gives decomposition reaction to the positive type resist layer (PMIPK) for the formation of a designated pattern by development; exposing the positive type resist layer on the lower layer to ionizing radiation of the wavelength region that givens decomposition reaction to the positive type resist layer (PMMA) for the formation of a designated pattern by development; and coating photosensitive resin film having adhesive property on the resist pattern formed by the positive type resist layer (PMMA) and positive type resist layer (PMIPK); and then, dissolving the resist pattern to be removed after the resin film having adhesive property is hardened.
    • 微结构的制造方法包括在其上形成有加热器的基板上形成正型抗蚀剂层(PMMA)的步骤; 在上述正型抗蚀剂层上形成正型抗蚀剂层(PMIPK); 将上层的正型抗蚀剂层暴露于通过显影而形成指定图案的正型抗蚀剂层(PMIPK)的分解反应的波长区域的电离辐射; 使下层的正型抗蚀剂层暴露于通过显影而形成指定图案的正型抗蚀剂层(PMMA)的分解反应的波长区域的电离辐射; 在由正型抗蚀剂层(PMMA)和正型抗蚀剂层(PMIPK)形成的抗蚀剂图案上涂布具有粘合性的感光性树脂膜。 然后在具有粘合性的树脂膜硬化后溶解待除去的抗蚀剂图案。
    • 9. 发明授权
    • Liquid discharge head, producing method therefor and liquid discharge apparatus
    • 排液头,其制造方法和排液装置
    • US06378993B1
    • 2002-04-30
    • US09452184
    • 1999-12-02
    • Teruo OzakiIchiro SaitoToshio KashinoYoshiyuki ImanakaMasahiko KubotaMuga MochizukiYoshiaki KuriharaMasashi MiyagawaShuji Koyama
    • Teruo OzakiIchiro SaitoToshio KashinoYoshiyuki ImanakaMasahiko KubotaMuga MochizukiYoshiaki KuriharaMasashi MiyagawaShuji Koyama
    • B41J205
    • B41J2/14048B41J2/055
    • There is provided a liquid discharge head provided with an element substrate and a ceiling plate fixed in a mutually opposed state, plural liquid path lateral walls provided between the ceiling plate and the element substrate and defining plural light flow paths, plural discharge energy generating elements arranged in parallel on the surface of the element substrate so as to be respectively positioned in the plural liquid paths, plural movable members in the form of a beam supported at an end, provided on the element substrate so as to be respectively opposed to the plural discharge energy generating elements and provided with fixed ends at the upstream side in the liquid flowing direction in the liquid paths and free ends at the downstream ends, and plural projections provided on the ceiling plate for respectively limiting the amount of displacement of the plural movable members, the element substrate and the ceiling plate being composed of similar materials, wherein the liquid path lateral walls are formed on the element substrate, and, on the ceiling plate, there is provided an engaging layer having recesses for fitting with the upper end faces of the liquid path lateral walls.
    • 设置有设置有相互相对的状态的元件基板和顶板的液体排出头,设置在顶板与元件基板之间并限定多个光流路的多个液体流路侧壁,多个排出能量产生元件 在元件基板的表面上平行地分别设置在多个液体通道中的多个可移动部件,其形式为支撑在一端的梁,设置在元件基板上,以分别与多个放电 能量产生元件,并且在液体流道的上游侧和下游端的自由端处设置有固定端,并且在顶板上设置有分别限制多个可动构件的位移量的多个突起, 元件基板和顶板由类似的材料组成,其中液体路径1 在该元件基板上形成有一个隔壁,并且在顶板上设有一个接合层,该接合层具有用于与液体通道侧壁的上端面相配合的凹槽。