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1. 发明授权

US09056955B2 Resin particle comprising microparticle made of a crystalline resin, and method for producing the same 有权
标题翻译：包含由结晶性树脂制成的微粒的树脂颗粒及其制造方法
公开(公告)号：US09056955B2
公开(公告)日：2015-06-16
申请号：US12922825
申请日：2009-03-23
申请人： Masahide Mizumori , Yasuhiro Shindo
发明人： Masahide Mizumori , Yasuhiro Shindo
IPC分类号： B32B5/16 , G03G9/093 , G03G9/113 , C08J3/12 , G03G9/08 , G03G9/087
CPC分类号： C08J3/12 , C08J2367/02 , G03G9/0804 , G03G9/0819 , G03G9/08795 , G03G9/08797 , Y02P20/544
摘要： A resin particle having a sufficiently narrow particle size distribution obtainable by using a supercritical fluid, and a production method for obtaining a resin particle having a sufficiently narrow particle size distribution by using a supercritical fluid are provided. The present invention provides a resin particle (C) having a microparticle (A) fixed to or formed as a film on a surface of a resin particle (B) containing a resin (b), wherein the degree of swelling of the microparticle (A) by liquid or supercritical carbon dioxide (X) at a temperature lower than the glass transition temperature or the melting point of the microparticle (A) is 16% or less, and the microparticle (A) is at least one kind selected from the group consisting of a crystalline resin (a1), a noncrystalline resin (a2), and an inorganic compound (a3).
摘要翻译：提供了通过使用超临界流体获得的具有足够窄的粒度分布的树脂颗粒，以及通过使用超临界流体获得具有足够窄的粒度分布的树脂颗粒的制备方法。本发明提供一种在包含树脂（b）的树脂颗粒（B）的表面上固定或形成为膜的微粒（A）的树脂颗粒（C），其中微粒（A ）在低于玻璃化转变温度或微粒（A）的熔点的温度下的液体或超临界二氧化碳（X）为16％以下，微粒（A）为选自以下的至少一种：由结晶性树脂（a1），非结晶性树脂（a2）和无机化合物（a3）构成。

2. 发明申请

US20110020741A1 RESIN PARTICLE AND METHOD FOR PRODUCING THE SAME 有权
标题翻译：树脂颗粒及其制造方法
公开(公告)号：US20110020741A1
公开(公告)日：2011-01-27
申请号：US12922825
申请日：2009-03-23
申请人： Masahide Mizumori , Yasuhiro Shindo
发明人： Masahide Mizumori , Yasuhiro Shindo
IPC分类号： G03G9/00 , C08J9/06
CPC分类号： C08J3/12 , C08J2367/02 , G03G9/0804 , G03G9/0819 , G03G9/08795 , G03G9/08797 , Y02P20/544
摘要： A resin particle having a sufficiently narrow particle size distribution obtainable by using a supercritical fluid, and a production method for obtaining a resin particle having a sufficiently narrow particle size distribution by using a supercritical fluid are provided. The present invention provides a resin particle (C) having a microparticle (A) fixed to or formed as a film on a surface of a resin particle (B) containing a resin (b), wherein the degree of swelling of the microparticle (A) by liquid or supercritical carbon dioxide (X) at a temperature lower than the glass transition temperature or the melting point of the microparticle (A) is 16% or less, and the microparticle (A) is at least one kind selected from the group consisting of a crystalline resin (a1), a noncrystalline resin (a2), and an inorganic compound (a3).
摘要翻译：提供了通过使用超临界流体获得的具有足够窄的粒度分布的树脂颗粒，以及通过使用超临界流体获得具有足够窄的粒度分布的树脂颗粒的制备方法。本发明提供一种在包含树脂（b）的树脂颗粒（B）的表面上固定或形成为膜的微粒（A）的树脂颗粒（C），其中微粒（A ）在低于玻璃化转变温度或微粒（A）的熔点的温度下的液体或超临界二氧化碳（X）为16％以下，微粒（A）为选自以下的至少一种：由结晶性树脂（a1），非结晶性树脂（a2）和无机化合物（a3）构成。

3. 发明授权

US5424368A Photosensitive resin comprising a polymer having an azide group in the side chain 失效
标题翻译：包含在侧链具有叠氮基的聚合物的感光树脂
公开(公告)号：US5424368A
公开(公告)日：1995-06-13
申请号：US191218
申请日：1994-02-03
申请人： Tadakazu Miyazaki , Masahide Mizumori , Miki Motomura
发明人： Tadakazu Miyazaki , Masahide Mizumori , Miki Motomura
IPC分类号： G03F7/004 , C08F8/30 , G03F7/012 , G03F7/033 , G03F7/038 , G03F7/20 , H01L21/027 , H05K3/00 , C08F265/00
CPC分类号： C09D11/101 , C08F8/44 , G03F7/012 , C08F2800/10
摘要： A photosensitive resin having at least one group as shown below in Chemical Formula (1) in a molecule. ##STR1## wherein n represents an integer from 1 to 10. Since the photosensitive resin has an azido group in a molecule having an adsorption region higher than 300 nm, the resin is highly sensitive. Therefore, an emulsion coating photo mask or a soda glass photo mask, which allows light permeation within the abosorption region of the azido group and is cheap in industry, can be used as the photo mask for the photosensitive resin of the invention. The photosensitive resin is particularly useful as a photo resist.
摘要翻译：在分子中具有化学式（1）所示的至少一个基团的感光性树脂。（1）其中n表示1〜10的整数。由于感光性树脂在吸附区域高于300nm的分子中具有叠氮基，所以树脂高度敏感。因此，作为本发明的感光性树脂的光掩模，可以使用能够使光吸收在叠氮化物的吸收区域内并且在工业上便宜的乳液涂布光掩模或钠玻璃光罩。光敏树脂特别适用于光刻胶。

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