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1. 发明授权

US09602780B2 Apparatus for inspecting defect with time/spatial division optical system 有权
公开(公告)号：US09602780B2
公开(公告)日：2017-03-21
申请号：US13997496
申请日：2011-11-02
申请人： Masaaki Ito , Hidetoshi Nishiyama , Takahiro Jingu
发明人： Masaaki Ito , Hidetoshi Nishiyama , Takahiro Jingu
IPC分类号： H04N7/18 , G01N21/47 , G01N21/956 , H01L21/66 , G01N21/95
CPC分类号： H04N7/18 , G01N21/47 , G01N21/9501 , G01N21/956 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： In a defect inspecting apparatus, the strength of a fatal defect signal decreases due to miniaturization. Thus, in order to assure a high SN ratio, it is necessary to reduce noises caused by scattered light from a wafer. Roughness of a pattern edge and surface roughness which serve as a scattered-light source are spread over the entire wafer. The present invention has discovered the fact that reduction of an illuminated area is a technique effective for decreasing noises. That is to say, the present invention has discovered the fact that creation of an illuminated area having a spot shape and reduction of the dimension of a spot beam are effective. A plurality of temporally and spatially divided spot beams are radiated to the wafer serving as a sample.

2. 发明申请

US20140198321A1 SURFACE SHAPE MEASURING APPARATUS 有权
标题翻译：表面形状测量装置
公开(公告)号：US20140198321A1
公开(公告)日：2014-07-17
申请号：US14240669
申请日：2012-07-27
申请人： Masaaki Ito , Takahiro Jingu , Hisashi Hatano
发明人： Masaaki Ito , Takahiro Jingu , Hisashi Hatano
IPC分类号： G01B11/24 , G01N21/55
CPC分类号： G01B11/303 , G01B11/24 , G01B2210/56 , G01N21/4738 , G01N21/55 , G01N21/9501 , G01N2201/12
摘要： In related art, consideration is not given to that a spatial distribution of scattered light changes in various direction such as forward/backward/sideways according to a difference in micro roughness. Particularly, although a step-terrace structure appearing on an epitaxial growth wafer produces anisotropy in the scattered light distribution, consideration is not given to this point in the related art. The invention includes a process in which light is illuminated to a sample surface, plural detection optical systems mutually different in directions of optical axes detect a spatial distribution of scattered light, and a spatial frequency spectrum of the sample surface is calculated.
摘要翻译：在现有技术中，不考虑散射光的空间分布根据微粗糙度的差异而在各种方向如前后/侧面变化。特别地，虽然出现在外延生长晶片上的台阶平台结构在散射光分布中产生各向异性，但是在现有技术中没有考虑到这一点。本发明包括将光照射到样品表面的方法，在光轴方向上彼此不同的多个检测光学系统检测散射光的空间分布，并且计算样品表面的空间频谱。

3. 发明申请

US20130286191A1 INSPECTION APPARATUS 有权
标题翻译：检查装置
公开(公告)号：US20130286191A1
公开(公告)日：2013-10-31
申请号：US13997496
申请日：2011-11-02
申请人： Masaaki Ito , Hidetoshi Nishimura , Takahiro Jingu
发明人： Masaaki Ito , Hidetoshi Nishimura , Takahiro Jingu
IPC分类号： H04N7/18
CPC分类号： H04N7/18 , G01N21/47 , G01N21/9501 , G01N21/956 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： In a defect inspecting apparatus, the strength of a fatal defect signal decreases due to miniaturization. Thus, in order to assure a high SN ratio, it is necessary to reduce noises caused by scattered light from a wafer. Roughness of a pattern edge and surface roughness which serve as a scattered-light source are spread over the entire wafer. The present invention has discovered the fact that reduction of an illuminated area is a technique effective for decreasing noises. That is to say, the present invention has discovered the fact that creation of an illuminated area having a spot shape and reduction of the dimension of a spot beam are effective. A plurality of temporally and spatially divided spot beams are radiated to the wafer serving as a sample.
摘要翻译：在缺陷检查装置中，致命缺陷信号的强度由于小型化而降低。因此，为了确保高的SN比，需要减少由晶片散射的光产生的噪声。用作散射光源的图案边缘和表面粗糙度的粗糙度分布在整个晶片上。本发明已经发现，减少照明区域是有效降低噪声的技术。也就是说，本发明已经发现了具有斑点形状的照明区域的创建和点光束的尺寸的减小的事实是有效的。将多个时间上和空间上分开的光束照射到作为样品的晶片。

4. 发明授权

US09310190B2 Surface shape measuring apparatus 有权
标题翻译：表面形状测量装置
公开(公告)号：US09310190B2
公开(公告)日：2016-04-12
申请号：US14240669
申请日：2012-07-27
申请人： Masaaki Ito , Takahiro Jingu , Hisashi Hatano
发明人： Masaaki Ito , Takahiro Jingu , Hisashi Hatano
IPC分类号： G01B11/24 , G01N21/55 , G01B11/30 , G01N21/47 , G01N21/95
CPC分类号： G01B11/303 , G01B11/24 , G01B2210/56 , G01N21/4738 , G01N21/55 , G01N21/9501 , G01N2201/12
摘要： In related art, consideration is not given to that a spatial distribution of scattered light changes in various direction such as forward/backward/sideways according to a difference in micro roughness. Particularly, although a step-terrace structure appearing on an epitaxial growth wafer produces anisotropy in the scattered light distribution, consideration is not given to this point in the related art. The invention includes a process in which light is illuminated to a sample surface, plural detection optical systems mutually different in directions of optical axes detect a spatial distribution of scattered light, and a spatial frequency spectrum of the sample surface is calculated.
摘要翻译：在现有技术中，不考虑散射光的空间分布根据微粗糙度的差异而在各种方向如前后/侧面变化。特别地，虽然出现在外延生长晶片上的台阶平台结构在散射光分布中产生各向异性，但是在现有技术中没有考虑到这一点。本发明包括将光照射到样品表面的方法，在光轴方向上彼此不同的多个检测光学系统检测散射光的空间分布，并且计算样品表面的空间频谱。

5. 发明申请

US20110221886A1 PATTERN DEFECT INSPECTING APPARATUS AND METHOD 审中-公开
标题翻译：图案缺陷检查装置及方法
公开(公告)号：US20110221886A1
公开(公告)日：2011-09-15
申请号：US13059908
申请日：2009-07-08
申请人： Hidetoshi Nishiyama , Masaaki Ito , Sachio Uto , Kei Shimura
发明人： Hidetoshi Nishiyama , Masaaki Ito , Sachio Uto , Kei Shimura
IPC分类号： H04N7/18
CPC分类号： G01N21/956 , G01N21/94 , H01L22/12
摘要： In recent years, a wafer inspection time in semiconductor manufacturing processes is being required to be reduced for reduction in manufacturing time and for early detection of yield reduction factors. To meet this requirement, there is a need to reduce the time required for inspection parameter setup, as well as the time actually required for inspection. Based on the speed or position change information relating to a transport system 2, inspection is also conducted during acceleration/deceleration of the transport system 2 by controlling an accumulation time and/or operational speed of a detector or by correcting acquired images. Alternate display of review images of a detection region at fixed time intervals improves visibility of the detection region and makes it possible to confirm within a short time whether a defect is present.
摘要翻译：近年来，为了减少制造时间和减少因素的早期检测，需要减少半导体制造工序中的晶片检查时间。为了满足这一要求，需要减少检查参数设置所需的时间以及检查所需的时间。基于与运输系统2有关的速度或位置变化信息，通过控制检测器的累积时间和/或操作速度或通过校正所获取的图像，也可以在运输系统2的加速/减速期间进行检查。以固定的时间间隔交替显示检测区域的检查图像提高了检测区域的可视性，并且使得可以在短时间内确认是否存在缺陷。

6. 发明申请

US20110141272A1 APPARATUS AND METHOD FOR INSPECTING AN OBJECT SURFACE DEFECT 审中-公开
标题翻译：用于检查物体表面缺陷的装置和方法
公开(公告)号：US20110141272A1
公开(公告)日：2011-06-16
申请号：US13059523
申请日：2009-07-10
申请人： Sachio Uto , Hidetoshi Nishiyama , Kei Shimura , Masaaki Ito
发明人： Sachio Uto , Hidetoshi Nishiyama , Kei Shimura , Masaaki Ito
IPC分类号： H04N7/18 , G01N21/956
CPC分类号： G01N21/95607 , G01N21/94 , G01N21/9501
摘要： Disclosed is an apparatus having a light source of a deep ultraviolet ray for detecting a small foreign matter or pattern defect, which may arise during a process for manufacturing a semiconductor device or the like, in high resolution. The apparatus comprises a means for detecting a damage on an optical system due to a wavelength reduction thereby to save a damaged portion, and a means for comparing an optical system arrangement with that at the manufacturing time and detecting the abnormality thereof, to thereby make a correction, so that the apparatus can inspect the defect on an object substrate stably at a high speed and in high sensitivity. Also disclosed is a method for the stable inspection. The apparatus is provided, in the optical path of the optical system, with a means for detecting the intensity and the convergent state of an illumination light, and a means for detecting the abnormality of the optics system and for saving an abnormal portion from alignment with an optical axis. The apparatus is constituted such that the optical system is adjusted to make corrections for the optical conditions at the manufacturing time, thereby to elongate the lifetime of the optical system in the inspecting apparatus and to detect the small defect stably.
摘要翻译：公开了一种具有用于检测在高分辨率的半导体器件等的制造工艺期间可能出现的小异物或图案缺陷的深紫外线光源的装置。该装置包括用于检测由于波长减小而导致的光学系统的损坏从而节省损坏部分的装置，以及用于将光学系统布置与制造时间布置进行比较并检测其异常的装置，从而使校正，使得设备可以高速和高灵敏度稳定地检查对象基板上的缺陷。还公开了用于稳定检查的方法。该装置在光学系统的光路中设置有用于检测照明光的强度和收敛状态的装置，以及用于检测光学系统的异常并且用于保存异常部分与对准的装置光轴。该装置被构造成使得光学系统被调整以对制造时的光学条件进行校正，从而延长了检查装置中的光学系统的寿命并且稳定地检测小缺陷。

7. 发明申请

US20130250297A1 INSPECTION APPARATUS AND INSPECTION SYSTEM 审中-公开
标题翻译：检查装置和检查系统
公开(公告)号：US20130250297A1
公开(公告)日：2013-09-26
申请号：US13990103
申请日：2011-10-11
申请人： Masaaki Ito , Minori Noguchi
发明人： Masaaki Ito , Minori Noguchi
IPC分类号： G01N21/95
CPC分类号： G01N21/9501 , G01N21/95607
摘要： Disclosed here is a macro inspection apparatus for a sample such as a semiconductor wafer having a pattern formed thereon, the apparatus being capable of detecting abnormalities in dimension and size with high sensitivity.The inspection apparatus for a sample having pattern formed thereon includes: an illumination optical system which illuminates the sample having the pattern formed thereon; a detection optical system which receives scattered light from the pattern; an imaging device which is disposed over a pupil plane of the detection optical system, the imaging device acquiring Fourier images of the pattern; and a processing unit which compares the Fourier images with the Fourier image of the normal pattern to detect an irregularity of the pattern.
摘要翻译：这里公开了一种用于诸如其上形成有图案的半导体晶片的样品的宏观检查装置，该装置能够以高灵敏度检测尺寸和尺寸的异常。用于其上形成有图案的样品的检查装置包括：照射具有形成在其上的图案的样品的照明光学系统; 检测光学系统，其接收来自图案的散射光; 成像装置，其设置在所述检测光学系统的光瞳平面上，所述成像装置获取所述图案的付里叶图像; 以及处理单元，其将傅立叶图像与正常图案的傅里叶图像进行比较，以检测图案的不规则性。

8. 发明授权

US07819159B2 Substrate assembly apparatus and substrate assembly method 有权
标题翻译：基板装配装置和基板装配方法
公开(公告)号：US07819159B2
公开(公告)日：2010-10-26
申请号：US11439953
申请日：2006-05-25
申请人： Masaaki Ito , Yukinori Nakayama , Tatsuharu Yamamoto , Hiroaki Imai
发明人： Masaaki Ito , Yukinori Nakayama , Tatsuharu Yamamoto , Hiroaki Imai
IPC分类号： B29C65/00 , B32B37/00
CPC分类号： G02F1/1341 , G02F1/1303 , G02F2001/133354 , G02F2001/13415 , G02F2202/28
摘要： A bonding apparatus, suitable for accurately bonding large substrates for a liquid crystal display, includes Z-axis drive mechanisms, and upper and lower chambers. The Z-axis drive mechanisms for moving an upper frame vertically are disposed at four corners of a mount. The upper chamber is supported by the upper frame and has an upper table inside. The lower chamber has a lower table inside and is supported on the mount. The upper and lower chambers are united through a seal ring to define a vacuum chamber. Moving the upper frame moves the upper chamber vertically to open or close the vacuum chamber. The lower table is supported via a free joint stage between the plurality of support legs and the table, and is moved horizontally by a side thrust mechanism disposed outside of the vacuum chamber.
摘要翻译：适合于将液晶显示器的大基板精确地接合的接合装置包括Z轴驱动机构和上下室。用于垂直移动上框架的Z轴驱动机构设置在底座的四个角处。上部腔室由上部框架支撑，内部具有上部工作台。下腔室内有一个较低的台面，并支撑在支架上。上部和下部腔室通过密封环联合以限定真空室。移动上框架使上室垂直移动以打开或关闭真空室。下表通过多个支撑腿和台之间的自由关节台支撑，并且通过设置在真空室外部的侧推力机构水平移动。

9. 发明授权

US07746659B2 Electro-optical device and electronic apparatus 有权
标题翻译：电光装置和电子设备
公开(公告)号：US07746659B2
公开(公告)日：2010-06-29
申请号：US12072165
申请日：2008-02-25
申请人： Masaaki Ito
发明人： Masaaki Ito
IPC分类号： H05K1/18
CPC分类号： G02F1/13452 , G02F1/133385
摘要： The invention provides a heat dissipater such as a heat dissipation member that dissipates heat of an integrated circuit that is formed on a flexible substrate such as a flexible printed circuit board. The heat dissipater according to an aspect of the invention includes; a main body section that is formed in the shape of a hollow sleeve in such a manner that the flexible substrate can be inserted through and inserted inside the main body section; and an adhering section that is formed on an inner surface of the main body section in such a manner that the main body section and the integrated circuit are adhered to each other via the adhering section.
摘要翻译：本发明提供一种散热器，例如散热构件，其散热形成在诸如柔性印刷电路板的柔性基板上的集成电路的热量。根据本发明的一个方面的散热器包括：主体部，其形成为中空套筒的形状，使得柔性基板能够插入并插入到主体部内; 以及粘附部，其以主体部和集成电路经由粘接部彼此粘合形成在主体部的内表面上。

10. 发明申请

US20090202138A1 INSPECTION APPARATUS 有权
标题翻译：检查装置
公开(公告)号：US20090202138A1
公开(公告)日：2009-08-13
申请号：US12361954
申请日：2009-01-29
申请人： Masaaki Ito , Minori Noguchi , Shigeru Matsui
发明人： Masaaki Ito , Minori Noguchi , Shigeru Matsui
IPC分类号： G06K9/00
CPC分类号： G01N21/9501 , G01N21/95623 , G01N2021/8822 , G06K9/74
摘要： The present invention provides an inspection apparatus having a high throughput and high sensitivity with respect to a number of various manufacturing processes and defects of interest in inspection of a specimen such as a semiconductor wafer on which a pattern is formed. The apparatus illuminates with light the specimen having the pattern formed thereon, forms an image of the specimen on an image sensor through a reflective optics, and determines the existence/nonexistence of a defect. The reflective optics has a conjugate pair of Fourier transform optics. An aberration of the reflective optics is corrected off-axis. The reflective optics has a field of view in non-straight-line slit form on the specimen surface. Also, the optics is of a reflection type, includes a conjugate pair of Fourier transform optics and has a field of view in non-straight-line slit form. An optimum wavelength band is selected according to the specimen (FIG. 1).
摘要翻译：本发明提供了一种检测装置，其相对于在其上形成有图案的半导体晶片的样本的检查中的多种制造工艺和多个不同的制造工艺和缺陷而具有高生产率和高灵敏度。该装置用光照射具有形成在其上的图案的样本，通过反射光学元件在图像传感器上形成样本的图像，并且确定缺陷的存在/不存在。反射光学器件具有傅立叶变换光学器件的共轭对。反射光学器件的像差被偏离校正。反射光学元件在样品表面上具有非直线狭缝形式的视场。此外，光学器件是反射型的，包括傅立叶变换光学器件的共轭对，并且具有非直线狭缝形式的视场。根据样品选择最佳波长带（图1）。

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