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1. 发明授权

US4548891A Photopolymerizable compositions containing prepolymers with olefin double bonds and titanium metallocene photoinitiators 失效
标题翻译：含有烯烃双键的预聚物和钛茂金属光引发剂的光聚合组合物
公开(公告)号：US4548891A
公开(公告)日：1985-10-22
申请号：US576519
申请日：1984-02-02
申请人： Martin Riediker , Ottmar Rohde , Martin Roth , Niklaus Buhler
发明人： Martin Riediker , Ottmar Rohde , Martin Roth , Niklaus Buhler
IPC分类号： C08F2/00 , C08F2/50 , C08F290/00 , C08F299/00 , C08G73/00 , C08G73/10 , G03F7/029 , G03F7/032 , G03F7/037 , G03F7/038 , G03C1/70 , G03C5/16
CPC分类号： G03F7/037 , G03F7/029 , G03F7/0387 , Y10S430/117 , Y10S430/126 , Y10S430/148
摘要： The invention relates to photopolymerizable compositions comprising (a) a prepolymer containing photopolymerizable olefinic double bonds, (b) photoinitiator of the formula ##STR1## wherein R.sup.1, R.sup.2 and R.sup.3 are as defined in claim 1, and optionally (c) an ester of acrylic or methacrylic acid or an allyl ether or allyl ester of a polyol.Owing to their excellent light sensitivity, these compositions are suitable for the economic production of high temperature resistant protective layers and relief structures having excellent resolution and good contours.
摘要翻译：本发明涉及可光聚合组合物，其包含（a）含有可光聚合的烯属双键的预聚物，（b）式（II）的光引发剂，其中R 1，R 2和R 3如权利要求1中所定义，和（c）丙烯酸或甲基丙烯酸的酯或多元醇的烯丙基醚或烯丙基酯。由于它们具有优异的光敏性，这些组合物适用于经济地生产具有优异分辨率和良好轮廓的耐高温保护层和浮雕结构。

2. 发明授权

US5011755A Photoinitiator mixtures containing a titanocene and a 3-ketocoumarin 失效
标题翻译：含有二茂钛和3-酮香豆素的光引发剂混合物
公开(公告)号：US5011755A
公开(公告)日：1991-04-30
申请号：US473135
申请日：1990-01-30
申请人： Ottmar Rohde , Armin Schaffner , Martin Riediker , Kurt Meier
发明人： Ottmar Rohde , Armin Schaffner , Martin Riediker , Kurt Meier
IPC分类号： C08F2/50 , C08F290/00 , C08F299/02 , C08G73/10 , G03F7/028 , G03F7/029
CPC分类号： G03F7/029 , C08F2/50 , Y10S430/107 , Y10S430/12 , Y10S430/125 , Y10S430/148 , Y10S502/522
摘要： The present invention relates to compositions comprising(a) a titanocene photoinitiator of the formula I ##STR1## (b) a 3-ketocoumarin of the formula II ##STR2## in which both R.sup.1, R.sup.2 and R.sup.3 are as defined in claim 1, R.sup.4 is a radical of the formula V ##STR3## R.sup.5 is C.sub.1 -C.sub.20 alkyl, cycloalkyl having 5-7 ring carbon atoms, phenyl or naphthyl which are unsubstituted or substituted by one to three C.sub.1 -C.sub.6 alkyl groups, C.sub.1 -C.sub.6 alkoxy groups or halogen atoms or by one diphenylamino or C.sub.1 -C.sub.6 dialkylamino group, or is C.sub.7 -C.sub.9 aralkyl, a radical --(CH.dbd.CH).sub.a --C.sub.6 H.sub.5 or a radical of the formula V, a is 1 or 2, preferably 1, and R.sup.10, R.sup.11, R.sup.12, R.sup.13 and R.sup.14 independently of one another are hydrogen, C.sub.1 -C.sub.6 alkyl, C.sub.1 -C.sub.6 alkoxy, phenyl, tolyl, xylyl or benzyl, and R.sup.11 can additionally also be a group --NR.sup.15 R.sup.16 or --OR.sup.15, wherein R.sup.15 and R.sup.16 independently of one another are hydrogen or C.sub.1 -C.sub.6 alkyl, it also being possible for two or three of the radicals R.sup.10, R.sup.11, R.sup.12 and R.sup.13 together with the ring carbon atoms, to which they are attached, to form a fused ring having 5 or 6 ring atoms or a fused ring system having 5-membered or 6-membered rings. The photoinitiator mixtures can be used in combination with ethylenically unsaturated monomers, preferably with photopolymerizable precursors of thermally stable polymers. These mixtures can be processed especially on substrates having surfaces which are strongly scattering or strongly reflecting, to give relief structures with high resolution.
摘要翻译：本发明涉及组合物，其包含（a）式I的二茂钛光引发剂（I）（b）式II的3-酮香豆素（II），其中R1，R2和R3均为权利要求1中定义的R 4是式V的基团（V）R 5是C 1 -C 20烷基，具有5-7个环碳原子的环烷基，未被取代或被一至三个C 1 -C 6烷基取代的苯基或萘基 C 1 -C 6烷氧基或卤素原子或一个二苯基氨基或C 1 -C 6二烷基氨基，或者是C 7 -C 9芳烷基，基团 - （CH = CH）a -C 6 H 5或式V基团，a是1或2，优选 1和R 10，R 11，R 12，R 13和R 14彼此独立地是氢，C 1 -C 6烷基，C 1 -C 6烷氧基，苯基，甲苯基，二甲苯基或苄基，R 11还可以是基团-NR 15 R 16或-OR 15，其中 R 15和R 16彼此独立地是氢或C 1 -C 6烷基，基团R 10，R 11，R 12和R 13中的两个或三个与环碳原子一起也可以它们相连，形成具有5或6个环原子的稠环或具有5元环或6元环的稠环体系。光引发剂混合物可以与烯属不饱和单体组合使用，优选与热稳定聚合物的可光聚合前体一起使用。这些混合物可以特别在具有强散射或强烈反射的表面的基底上进行加工，以提供高分辨率的浮雕结构。

3. 发明授权

US4851506A Photostructurable polyimide mixtures 失效
标题翻译：可光聚酰亚胺混合物
公开(公告)号：US4851506A
公开(公告)日：1989-07-25
申请号：US135813
申请日：1987-12-21
申请人： Ottmar Rohde , Andre-Etienne Perret , Josef Pfeifer
发明人： Ottmar Rohde , Andre-Etienne Perret , Josef Pfeifer
IPC分类号： C08L79/08 , G03F7/038
CPC分类号： G03F7/0387 , C08L79/08
摘要： The present invention relates to compositions comprising(a) at least one polyimide having an inherent viscosity of at least 0.1 dl/g (measured at 25.degree. C. on a 0.5% by weight solution in N-methylpyrrolidone) and containing at least 50 mol % of structural units of the formula I ##STR1## in which m and p independently of one another are integers from 0 to 4, n is an integer from 0 to 3, R.sup.1 and R.sup.2 independently of one another are C.sub.1 -C.sub.6 -alkyl or C.sub.1 -C.sub.6 -alkoxy and R.sup.3 is a divalent radical of an aromatic diamine which is substituted in at least one ortho-position relative to at least one N atom by alkyl, alkoxy, alkoxyalkyl, cycloalkyl or aralkyl or in which two adjacent C atoms of the aromatic radical are substituted by alkylene, and(b) at least one aromatic polyimide which is soluble in organic solvents and photocrosslinkable and which contains at least 50 mol %, relative to the total quantity of diamine units, of radicals R.sup.3 and at least 50 mol %, relative to the total quantity of aromatic tetracarboxylic acid units, of tetravalent aromatic tetracarboxylic acid radicals including at least one benzophenone unit.The polyimide mixtures are distinguished by good adhesion to various substrates and have a high photosensitivity. They can be used for the production of protective coatings and relief structures and are particularly suitable for the production of etch masks.
摘要翻译：本发明涉及包含（a）至少一种具有至少0.1dl / g的特性粘度的聚酰亚胺（在25℃下在0.5重量％N-甲基吡咯烷酮溶液中测量）并且含有至少50mol 其中m和p彼此独立地为0至4的整数的式I的结构单元的％（I），n为0至3的整数，R 1和R 2彼此独立地为C 1 -C 6 - 烷基或C 1 -C 6 - 烷氧基，R 3是芳族二胺的二价基团，其在相对于至少一个N原子的至少一个邻位被烷基，烷氧基，烷氧基烷基，环烷基或芳烷基取代，或其中两个相邻芳族基团的C原子被亚烷基取代，和（b）至少一种芳族聚酰亚胺，其可溶于有机溶剂并可光致交联并且相对于二胺单元的总量为至少50mol％的基团R3和相对于总量的至少50mol％四羧酸单元，包括至少一个二苯甲酮单元的四价芳族四羧酸基团。聚酰亚胺混合物通过对各种基材的良好粘附性而具有高的光敏性。它们可以用于生产保护涂层和浮雕结构，并且特别适用于生产蚀刻掩模。

4. 发明授权

US5102959A Auto-photocrosslinkable copolyimides and polyimide compositions 失效
标题翻译：自动光交联共聚酰亚胺和聚酰亚胺组合物
公开(公告)号：US5102959A
公开(公告)日：1992-04-07
申请号：US487563
申请日：1990-03-02
申请人： Ottmar Rohde , Stanley J. Jasne , Josef Pfeifer
发明人： Ottmar Rohde , Stanley J. Jasne , Josef Pfeifer
IPC分类号： C08G73/10 , C08L79/08 , G03F7/038
CPC分类号： G03F7/0387 , C08G73/1085 , C08L79/08
摘要： The present invention relates to copolyimides of 100-70 mol % of recurring structural units of the formula I and 0-30 mol % of recurring structural units of the formula II ##STR1## in which z.sup.a is a tetravalent aromatic tetracarboxylic acid radical other than that of thioxanthonetetracarboxylic acid, the carboxyl groups thereof in each case being located in pairs in the ortho-position or peri-position relative to one another, and x.sup.a is a divalent aromatic diamine radical which, in at least one ortho-position relative to at least one nitrogen atom, carries a hydrocarbon substituent having at least one aliphatic .alpha.-hydrogen atom or x.sup.a is a radical of the formula III ##STR2## in which X.sup.c is a divalent aromatic diamine radical which, in ortho-position relative to both nitrogen atoms, carries in each case at least one mono-valent hydrocarbon substituent having at least one aliphatic .alpha.-hydrogen atom, n assumes an average value of 1.0 to 2.5, Z.sup.b is as defined for Z.sup.a and X.sup.b is an aliphatic, cycloaliphatic, aromatic or araliphatic diamine radical, excluding a radical of the formula III, with the proviso that the proportion of radicals of the formula III in the formula I is selected such that the quantity of thioxanthonetetracarboxylic acid radicals, relative to the total quantity of tetracarboxylic acid units in the copolyimide, is between 1 and 30 mol %. These copolyimides have a high radiation-sensitivity and can be combined with structurally related polyimides to form photocrosslinkable compositions which can be employed for coating purposes.
摘要翻译：本发明涉及100-70摩尔％的式I的重复结构单元和0-30摩尔％式II（II）的重复结构单元的共聚酰亚胺，其中za是除了噻吨酮四羧酸以外的四价芳族四羧酸基团，其中每种情况下的羧基相对于彼此成对位于邻位或邻位，xa为二价芳族二胺基，其在至少一个邻位相对于至少一个氮原子，带有具有至少一个脂族α-氢原子的烃取代基，或者xa是式III的基团（III），其中Xc是二价芳族二胺基团在相对于两个氮原子的邻位，在每种情况下携带至少一个具有至少一个脂肪族α-氢原子的单价烃取代基，并且n为假定平均值为1.0至2.5，Zb为defi Za和Xb是脂族，脂环族，芳族或芳脂族二胺基团，不包括式III的基团，条件是式I中式III的基团的比例被选择为使得噻吨酮四羧酸的量相对于共聚酰亚胺中四羧酸单元的总量，自由基为1〜30摩尔％。这些共聚酰亚胺具有高的辐射敏感性，并且可以与结构相关的聚酰亚胺组合以形成可用于涂覆目的的可光致交联组合物。

5. 发明授权

US4925912A Auto-photocrosslinkable copolyimides and polyimide compositions 失效
标题翻译：自动光交联共聚酰亚胺和聚酰亚胺组合物
公开(公告)号：US4925912A
公开(公告)日：1990-05-15
申请号：US281429
申请日：1988-12-08
申请人： Ottmar Rohde , Stanley J. Jasne , Josef Pfeifer
发明人： Ottmar Rohde , Stanley J. Jasne , Josef Pfeifer
IPC分类号： C08G73/10 , C08L79/08 , G03F7/038
CPC分类号： G03F7/0387 , C08G73/1085 , C08L79/08 , Y10S430/107
摘要： The present invention relates to copolyimides of 100-70 mol % of recurring structural units of the formula I and 0-30 mol % of recurring structural units of the formula II ##STR1## in which Z.sup.a is a tetravalent aromatic tetracarboxylic acid radical other than that of thioxanthonetetracarboxylic acid, the carboxyl groups thereof in each case being located in pairs in the ortho-position or peri-position relative to one another, and X.sup.a is a divalent aromatic diamine radical which, in at least one ortho-position relative to at least one nitrogen atom, carries a hydrocarbon substituent having at least one aliphatic .alpha.-hydrogen atom or X.sup.a is a radical of the formula III ##STR2## in which X.sup.c is a divalent aromatic diamine radical which, in ortho-position relative to both nitrogen atoms, carries in each case at least one monovalent hydrocarbon substituent having at least one aliphatic .alpha.-hydrogen atom, n assumes an average value of 1.0 to 2.5, Z.sup.b is as defined for Z.sup.a and X.sup.b is an aliphatic, cycloaliphatic, aromatic or araliphatic diamine radical, excluding a radical of the formula III, with the proviso that the proportion of radicals of the formula III in the formula I is selected such that the quantity of thioxanthonetetracarboxylic acid radicals, relative to the total quantity of tetracarboxylic acid units in the copolyimide, is between 1 and 30 mol %. These copolyimides have a high radiation-sensitivity and can be combined with structurally related polyimides to form photocrosslinkable compositions which can be employed for coating purposes.
摘要翻译：本发明涉及100-70摩尔％的式I的重复结构单元和0-30摩尔％式II（II）的重复结构单元的共聚酰亚胺，其中Za是除了噻吨酮四羧酸以外的四价芳族四羧酸基团，其各自的羧基相对于彼此成对位于邻位或邻位，Xa为二价芳族二胺基，其在至少一个相对于至少一个氮原子的邻位，带有具有至少一个脂族α-氢原子的烃取代基或Xa是式III的基团（III），其中Xc是二价芳族二胺基团在相对于两个氮原子的邻位，在每种情况下携带至少一个具有至少一个脂族α-氢原子的单价烃取代基，并且n和n的平均值为1.0至2.5，Zb为定义 Za和Xb是脂族，脂环族，芳族或芳脂族二胺基团，不包括式III的基团，条件是选择式I中式III的基团的比例使得噻吨酮四羧酸的量相对于共聚酰亚胺中四羧酸单元的总量，自由基为1〜30摩尔％。这些共聚酰亚胺具有高的辐射敏感性，并且可以与结构相关的聚酰亚胺组合以形成可用于涂覆目的的可光致交联组合物。

6. 发明授权

US4935320A Adhesively bonded photostructurable polyimide film 失效
标题翻译：粘合光致聚酰亚胺膜
公开(公告)号：US4935320A
公开(公告)日：1990-06-19
申请号：US231323
申请日：1988-08-12
申请人： Ottmar Rohde , Armin Schaffner
发明人： Ottmar Rohde , Armin Schaffner
IPC分类号： G03F7/038 , H05K1/00 , H05K1/03 , H05K3/34 , H05K3/38
CPC分类号： G03F7/0387 , H05K1/0346 , H05K3/3452 , H05K3/386 , H05K3/4676 , Y10S430/148 , Y10T428/24273 , Y10T428/31515 , Y10T428/31721 , Y10T428/31855
摘要： Coated material containing in successive order(a) a substrate,(b) a photostructurable negative-working thermostable adhesive and(c) a self-supporting photocrosslinkable polyimide film.This arrangement can be used for producing relief images by means of photolithhographic processes.

7. 发明授权

US4786569A Adhesively bonded photostructurable polyimide film 失效
标题翻译：粘合光致聚酰亚胺膜
公开(公告)号：US4786569A
公开(公告)日：1988-11-22
申请号：US901095
申请日：1986-08-27
申请人： Ottmar Rohde , Armin Schaffner
发明人： Ottmar Rohde , Armin Schaffner
IPC分类号： G03F7/038 , H05K1/00 , H05K1/03 , H05K3/34 , H05K3/38 , G03C5/16 , G03C1/80 , G03C1/84
CPC分类号： G03F7/0387 , H05K1/0346 , H05K3/3452 , H05K3/386 , H05K3/4676 , Y10S430/148 , Y10T428/24273 , Y10T428/31515 , Y10T428/31721 , Y10T428/31855
摘要： Coated material containing in successive order(a) a substrate,(b) a photostructurable negative-working thermostable adhesive and(c) a self-supporting photocrosslinkable polyimide film. This arrangement can be used for producing relief images by means of photolithographic processes.
摘要翻译：包含连续顺序的涂覆材料（a）基材，（b）可光致印制的负性耐热粘合剂和（c）自支撑光致交联聚酰亚胺膜。这种布置可以用于通过光刻工艺制造浮雕图像。

8. 发明授权

US4656116A Radiation-sensitive coating composition 失效
标题翻译：辐射敏感性涂料组合物
公开(公告)号：US4656116A
公开(公告)日：1987-04-07
申请号：US657868
申请日：1984-10-04
申请人： Ottmar Rohde , Josef Pfeifer
发明人： Ottmar Rohde , Josef Pfeifer
IPC分类号： C08L79/08 , C09D5/00 , C09D179/08 , G03C1/695 , G03F7/008 , G03F7/012 , G03F7/038 , G03C1/71 , G03C1/52
CPC分类号： C08L79/08 , G03F7/012 , G03F7/0125 , G03F7/0387 , Y10S430/128
摘要： Polyimides of aromatic tetracarboxylic acid derivatives and aromatic diamines where both ortho-positions relative to a phenylene radical bonded to an imide group of the polymer are substituted by alkyl groups can be radiation-crosslinked with organic chromophoric polyazides. Solutions of said polyimides and polyazides in organic solvents can be used as radiation-sensitive coating compositions for, for example, preparing insulating and protective films and in particular for producing printed circuits and integrated circuits.
摘要翻译：芳族四羧酸衍生物和芳族二胺的聚酰亚胺，其中相对于与聚合物的酰亚胺基键合的亚苯基的两个邻位被烷基取代，可以与有机发色聚叠氮化物辐射交联。所述聚酰亚胺和聚叠氮化物在有机溶剂中的溶液可用作辐射敏感性涂料组合物，例如制备绝缘和保护膜，特别是用于制备印刷电路和集成电路。

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