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    • 6. 发明申请
    • TRANSISTOR, MEOMORY CELL ARRAY AND METHOD OF MANUFACTURING A TRANSISTOR
    • 晶体管,晶体管阵列和制造晶体管的方法
    • US20070096182A1
    • 2007-05-03
    • US11556897
    • 2006-11-06
    • Till SchloesserRolf WeisUlrike Gruening-von Schwerin
    • Till SchloesserRolf WeisUlrike Gruening-von Schwerin
    • H01L29/94H01L27/108H01L29/76H01L31/119
    • G11C11/404H01L27/0207H01L27/10873H01L27/10879H01L29/66795H01L29/66818H01L29/785H01L29/7854
    • A transistor, memory cell array and method of manufacturing a transistor are disclosed. In one embodiment, the invention refers to a transistor, which is formed at least partially in a semiconductor substrate, comprising a first and a second source/drain regions, a channel region connecting said first and second source/drain regions, said channel region being disposed in said semiconductor substrate, and a gate electrode disposed along said channel region and being electrically isolated from said channel region, for controlling an electrical current flowing between said first and second source/drain regions, wherein said channel region comprises a fin-region in which the channel has the shape of a ridge, said ridge comprising a top side and two lateral sides in a cross section perpendicular to a line connecting said first and second source/drain regions, wherein said top side is disposed beneath a surface of said semiconductor substrate and said gate electrode is disposed along said top side and said two lateral sides.
    • 公开了晶体管,存储单元阵列和制造晶体管的方法。 在一个实施例中,本发明涉及至少部分地形成在半导体衬底中的晶体管,包括第一和第二源极/漏极区域,连接所述第一和第二源极/漏极区域的沟道区域,所述沟道区域是 设置在所述半导体衬底中,以及栅电极,沿着所述沟道区设置并与所述沟道区电隔离,用于控制在所述第一和第二源/漏区之间流动的电流,其中所述沟道区包括 所述通道具有脊的形状,所述脊包括垂直于连接所述第一和第二源极/漏极区的线的横截面中的顶侧和两个侧边,其中所述顶侧设置在所述半导体的表面下方 基板和所述栅电极沿着所述顶侧和所述两个横向侧面设置。
    • 7. 发明授权
    • Integrated circuit having a resistive switching device
    • 具有电阻式开关装置的集成电路
    • US07539039B2
    • 2009-05-26
    • US11694393
    • 2007-03-30
    • Ulrike Gruening-von SchwerinTill Schloesser
    • Ulrike Gruening-von SchwerinTill Schloesser
    • G11C11/00
    • G11C13/0011G11C13/0004G11C2213/79
    • An integrated circuit, a memory cell, memory device and method of operating the memory device is disclosed. In one embodiment, an integrated circuit having a resistively switching memory cell includes a bitline electrode and a second electrode having a lower voltage potential than the bitline electrode; a switching active volume and a selection transistor connected in series between the bitline electrode and the second electrode. The second electrode is connected, via a connection transistor, to a third electrode having the same or a lower voltage potential than the second electrode; wherein the second electrode includes a buried electrode at least partially positioned below the bitline electrode and the third electrode.
    • 公开了一种集成电路,存储单元,存储器件和操作存储器件的方法。 在一个实施例中,具有电阻切换存储单元的集成电路包括位线电极和具有比位线电极低的电压电位的第二电极; 开关有源体积和串联连接在位线电极和第二电极之间的选择晶体管。 第二电极通过连接晶体管连接到具有与第二电极相同或更低电压电位的第三电极; 其中所述第二电极包括至少部分地位于所述位线电极和所述第三电极下方的掩埋电极。
    • 9. 发明申请
    • INTEGRATED CIRCUIT AND METHOD FOR PRODUCTION
    • 集成电路和生产方法
    • US20080099814A1
    • 2008-05-01
    • US11554335
    • 2006-10-30
    • Ulrike Gruening-von SchwerinTill Schloesser
    • Ulrike Gruening-von SchwerinTill Schloesser
    • H01L27/10H01L21/336H01L21/82
    • H01L27/2454G11C13/0004H01L27/2463H01L45/06H01L45/1233H01L45/144
    • An array of vertical transistor cells formed in a substrate for selecting one of a plurality of memory cells by selecting a word line and a bit line is disclosed. In one embodiment, for minimizing the area of a cell and reducing complexity in production a plurality of parallel insulating trenches filled with an insulating material and a plurality of perpendicular gate electrode trenches is formed, the gate electrode trenches filled with a suitable gate electrode material disrupted by the insulating material thus forming separate gate electrodes arranged below the reference plane. The insulating trenches and the gate electrode trenches form distinct active areas of transistors in the substrate, wherein two gate electrodes located at opposing sidewalls of an active area form a double gate electrode of a transistor, and wherein a plurality of gate electrodes is coupled to a word line running perpendicular to the gate electrode trenches and above the reference plane.
    • 公开了通过选择字线和位线而形成在用于选择多个存储单元中的一个的基板中的垂直晶体管单元的阵列。 在一个实施例中,为了最小化单元的面积并降低生产的复杂性,形成多个平行的绝缘沟槽,其填充有绝缘材料和多个垂直的栅极电极沟槽,栅电极沟槽填充有合适的栅电极材料中断 由绝缘材料形成分开的栅极电极,布置在参考平面下方。 绝缘沟槽和栅极电极沟槽在衬底中形成晶体管的不同有源区,其中位于有源区的相对侧壁处的两个栅电极形成晶体管的双栅电极,并且其中多个栅电极耦合到 字线垂直于栅极电极沟槽并在参考平面上方延伸。